Abstract: A positioning apparatus for performing position of a target object in a vacuum atmosphere. The apparatus includes a first structure, a second structure which is movable relative to the first structure and supports the target object, a radiation plate, which is arranged on the first structure, performing heat exchange between the radiation plate and the second temperature by utilizing radiation, and a temperature adjusting device for adjusting of a temperature of the radiation plate. The temperature adjusting device adjusts the temperature of the radiation plate to control a temperature of the second structure or the target object.

Abstract: A stage device for driving a movable element, mounted with an object thereon, by using a plane motor, including: (i) a stator unit having a coil group; and (ii) the movable element which moves on the stator unit, the stator unit including: (a) a first region where the object is to be subjected to a first process; and (b) a second region where the object is to be subjected to a second process, wherein the coil group in the stator unit is temperature-controlled independently between the first and second regions.

Abstract: Outflow of heat generated by a linear motor to the outside is suppressed. A linear motor according to the present invention is a linear motor used in a vacuum atmosphere, including a stator, a movable element movable relative to the stator, and a metal film formed on the surface of at least one of the stator and the movable element. This decreases the emissivity and reduces the outflow of heat by radiation from the linear motor.

Abstract: An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation device which generates the pure water flowing in the channel as the coolant with a resistivity of not less than 1 M?·cm.

Abstract: Disclosed is a unique and improved substrate holding technique in accordance with an aspect of which there is provided a substrate holding system having a chuck for vacuum attraction and electrostatic attraction of a substrate, and including a ring-like rim for carrying a substrate thereon, a plurality of first protrusions disposed inside the rim, for carrying the substrate thereon, and a plurality of second protrusions disposed inside the rim, for carrying the substrate thereon, wherein a substrate carrying surface area of at least one first protrusion is smaller than a substrate carrying surface area of at least one second protrusion and wherein a smallest interval of the first protrusions is smaller than a smallest interval of the second protrusions.

Abstract: A pipe structure includes a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe, and a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe. The double pipe is used in a vacuum chamber having a vacuum atmosphere.

Abstract: An exposure apparatus includes a movable stage which aligns a substrate in a vacuum chamber, and a pipe structure coupled to the stage. The pipe structure has a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe, and a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe. A pressure in the vacuum chamber is less than a pressure in the space between the inner pipe and the outer pipe.

Abstract: In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.

Abstract: Disclosed is a positioning apparatus, including a positioning unit, and a temperature adjusting unit which adjusts a temperature of at least a portion of the positioning unit, the temperature adjusting unit including a cooling mechanism based on vaporization heat of a liquid Also disclosed is a cooling apparatus, including a container, a supplying unit which supplies a liquid to the container, and an exhaust unit which exhausts the container.

Abstract: In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.

Abstract: Disclosed is a stage system that includes a stage for supporting and moving a substrate, and a probe for measuring a potential of a substrate without contact thereto, the probe being supported by the stage so as to be opposed to one of a bottom face and a side face of the substrate. Also disclosed is a stage system that includes a substrate holding member for holding a substrate, the substrate holding member having a protrusion and a first electrode, the first electrode being provided inside the substrate holding member and adjacent said protrusion, a terminal for adjusting a potential of said first electrode, and a stage for supporting and moving the substrate holding member through the terminal. Further, a substrate holding system is disclosed, that includes a plurality of protrusions to be supported by a stage, and a plurality of first electrodes disposed adjacent the plurality of protrusions, respectively, and for electrostatically attracting the stage.

Abstract: Some of linear motors which constitute an exposure apparatus have coils each obtained by winding a copper foil wire as a foil-like conductor having an insulating layer around a core member in a multilayered structure. The coil is fixed to a positioning portion serving as the coil fixing portion of the linear motor by using the core member. The core member is formed from the same insulating material with low thermal conductivity as that of the positioning portion of a linear motor housing or a material with almost the same linear expansion coefficient.

Abstract: A wafer stage (1) includes a stage base (6a) having a reference surface which axially supports a slider (13) so as to allow the slider (13) to move in the X- and Y-axis directions, linear motors (3A, 3B) which move the slider (13) in at least one of the X- and Y-axis directions on the reference surface of the stage base (6a) and align the slider (13) at a predetermined position, and stator bases (6b) which are provided separately from the stage base (6a) and support the linear motors (3A, 3B).

Abstract: A temperature adjustment apparatus for adjusting a temperature of an object to be temperature-controlled. The apparatus includes a first temperature adjustment mechanism for controlling the temperature of the object to be temperature-controlled, and a second temperature adjustment mechanism for controlling the temperature of the object to be temperature-controlled. The first and second temperature adjustment mechanisms have different temperature control responses, and control the temperature of the object to be temperature-controlled in cooperation with coarse adjustment and fine adjustment on the basis of a difference in response. Also, the first temperature adjustment mechanism and the second temperature adjustment mechanism are operatively connected so that the output of the first temperature adjustment mechanism controls the operation of the second temperature adjustment mechanism.

Abstract: An apparatus for processing an object includes a vessel which forms a pressure-reduced inner space and accommodates the object, a member which is supported by an inner side of the vessel through a heat insulator, and a temperature adjusting portion which adjusts a temperature of the member.

Abstract: A linear motor apparatus includes a movable member having a magnet, and a coil wound about the magnet so as to generate a drive force for driving the movable member and having a multi-layer structure formed by winding a foil-like conductor and an insulating layer. The foil-like conductor (i) has a plurality of partial coils having identical current application/rotation directions, and the plurality of partial coils are formed in such a way that the foil-like conductor forms a continuous, seamless strip, and (ii) is continuously wound in a multilayered, aligned state to form the coil, and adjacent layers of the foil-like conductor are insulated by the insulating layer.

Abstract: A stationary element (7) having coils (8) serving as heating elements of a linear motor for vertically driving a wafer stage is attached to a base member (9) via a Peltier element (20), and a coolant (19) temperature-managed by a cooling unit (17) is supplied. A cooling amount control unit (13) predicts the heat generation amount and temperature of each coil (8) on the basis of a control signal for exposure operation or the like from a controller (11); and sends the result to the cooling unit (17) and Peltier element (20). The Peltier element (20) moves heat generated by the coil (8) from the stationary element (7) to the base member (9). The cooling unit (17) controls the temperature and flow rate of the coolant (19) so as to minimize temperature changes of a movable element (5) and stage, and supplies the coolant (19) to the stationary element (7). The coolant 19 absorbs heat generated by the coil (8) to achieve high-precision temperature control.

Abstract: An EUV exposure apparatus is provided in which coils of an electromagnetic motor for driving a stage are kept from overheat damage as a result of heat generated by the coils themselves. In an EUV exposure apparatus for exposing a mask pattern to a wafer in a vacuum, the apparatus comprises an electromagnetic motor disposed in the vacuum and driving at least one of a mask stage and a wafer stage, and a cooling unit for cooling the electromagnetic motor to prevent overheat damage of the electromagnetic motor caused by heat generated by the electromagnetic motor.

Abstract: An exhaust apparatus for a differential exhaust mechanism having a labyrinth seal and a plurality of vacuum pockets includes a differential exhaust system for evacuating the vacuum pockets and an exhaust system for evacuating a chamber of exhaust gas. The differential exhaust system and the exhaust system are connected by control valves that can be opened and closed, enabling communication between the vacuum pockets and the interior of the chamber to be opened and closed (or connected and disconnected) as well. The valves are opened when a vacuum is being formed inside the chamber or when a malfunction occurs in the exhaust system, thus connecting the vacuum pockets and the chamber and preventing excessive pressure from building up on the hydrostatic bearing.

Abstract: An exposure apparatus includes a control device for controlling an operation of the exposure apparatus, a temperature adjusting device for adjusting temperature in a predetermined portion in which temperature is changeable with operation of the exposure apparatus, and a calculator for calculating an adjusting amount of the temperature adjusting device to the predetermined portion, prior to an occurrence of a temperature change in the predetermined portion, on the basis of a signal produced by the control device, the signal being able to control the operation of the exposure apparatus.