Abstract: A positioning system includes a stage configured to move while carrying an object thereon, an interferometer configured to measure a position of the stage, a driving unit configured to drive the stage, a heater provided between a light path of the interferometer and a coil which is a component element of the driving unit, and a cooling jacket configured to cover the coil and to circulate a cooling medium therein. The heater is provided on a surface of the cooling jacket.

Abstract: An exposure apparatus including a moving member movable with a substrate, an interferometer configured to measure a position of the moving member, a blower device for blowing temperature-conditioned air, a plurality of supply openings communicating with the blower device, and a flow rate adjusting device configured to adjust a gas flow rate blown through the plurality of supply openings based on an operation of the moving member.

Abstract: A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

Abstract: In a liquid-immersion exposure method and a liquid-immersion exposure apparatus, on the basis of a liquid repellency distribution at a surface which an immersion liquid contacts as a result of a movement of a stage, a path where a movement time of the stage becomes the shortest is calculated, so that the stage is moved along this path.

Abstract: A stage system includes a fine-motion stage on which a substrate holding member for holding a substrate is mounted, a rough-motion stage on which the fine-motion stage is mounted, a stage for supporting and moving a substrate, and a probe configured to measure a potential of the substrate without contact thereto, the probe being supported by the rough-motion stage so as to be opposed to one of a bottom face and a side face of the substrate.

Abstract: A substrate holding system including a substrate attracting device, an exhausting device, and a control device to operate the exhausting device so that a pressure around the substrate and a pressure at an interval between the substrate and the substrate attracting device are lowered to a first pressure and that only the pressure at the interval is subsequently lowered to a second pressure, which is lower than the first pressure.

Abstract: A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

Abstract: Disclosed is a temperature adjusting system for adjusting temperature of a sample, that includes a sample container for containing a sample therein, and a cooling unit for applying a liquid to a surface of the sample container, to cool the sample on the basis of heat of vaporization of the liquid on the surface of the sample container.

Abstract: An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the coolant flowing in the channel, and a UV sterilization unit which performs UV sterilization processing for the coolant flowing in the channel.

Abstract: A stage apparatus includes a movable element including a plurality of magnets, a stage fixed to the movable element, and a stator configured with layers of coils arranged opposite to the magnets with a gap, in which (i) respective layers of coils serve as a plurality of driving axes for driving the movable element in two-dimensional directions, (ii) the stage apparatus generates a driving force in the movable stage by applying power to coils corresponding to respective layers, (iii) a conductive area of a section having a normal coil in a coil winding direction is made so that heat generation amounts of coils corresponding to the respective layers are substantially equal, and (iv) the conductive area of the section having a normal in the coil winding direction in the respective layers of coils is made relatively larger than coils having a smaller driving force constant.

Abstract: A scanning immersion exposure apparatus includes a stage capable of delivering an area in contact with liquid to another member. The stage has a delivery portion configured to enable the area to the another member and one or more reference marks for positioning the stage with respect to a reticle. The delivery portion is disposed on the side opposite to a reference mark that is measured immediately before exposure relative to a first line that passes through the center of the substrate and extends perpendicular to a scanning direction.

Abstract: In a liquid-immersion exposure method and a liquid-immersion exposure apparatus, on the basis of a liquid repellency distribution at a surface which an immersion liquid contacts as a result of a movement of a stage, a path where a movement time of the stage becomes the shortest is calculated, so that the stage is moved along this path.

Abstract: A stage device for driving a movable element, mounted with an object thereon, by using a plane motor, including: (i) a stator unit having a coil group; and (ii) the movable element which moves on the stator unit, the stator unit including: (a) a first region where the object is to be subjected to a first process; and (b) a second region where the object is to be subjected to a second process, wherein the coil group in the stator unit is temperature-controlled independently between the first and second regions.

Abstract: A stage device including a base, a stage movable portion being movable along said base without contact thereto, an interferometer configured to measure a position of the stage movable portion, at least one of a piping element and a wiring element connected to the stage movable portion, and at least one of a heat insulating material and a heat collecting unit configured to reduce a heat to be transmitted from the piping element or wiring element to a space through which measurement light of the interferometer passes.

Abstract: A substrate holding system having a chuck for vacuum attraction and electrostatic attraction of a substrate. The system includes a ring-like rim for carrying a substrate thereon, a plurality of first protrusions disposed inside the rim, for carrying the substrate thereon, and a plurality of second protrusions disposed inside the rim, for carrying the substrate thereon. A substrate carrying surface area of at least one first protrusion is smaller than a substrate carrying surface area of at least one second protrusion and a smallest interval between the first protrusions is smaller than a smallest interval between the second protrusions. Also included are an exhaust system for exhausting a clearance between the chuck and the substrate, an electrode for electrostatic attraction, a power supplying system for supplying power to the electrode, a measuring system for measuring a pressure in the clearance, and a control system for controlling the power supply.

Abstract: A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

Abstract: An exhaust apparatus for a differential exhaust mechanism having a labyrinth seal and a plurality of vacuum pockets includes a differential exhaust system for evacuating the vacuum pockets and an exhaust system for evacuating a chamber of exhaust gas. The differential exhaust system and the exhaust system are connected by control valves that can be opened and closed, enabling communication between the vacuum pockets and the interior of the chamber to be opened and closed (or connected and disconnected) as well. The valves are opened when a vacuum is being formed inside the chamber or when a malfunction occurs in the exhaust system, thus connecting the vacuum pockets and the chamber and preventing excessive pressure from building up on the hydrostatic bearing.

Abstract: An exposure apparatus which aligns a substrate by a stage device for driving a movable element, mounted with a substrate thereon, by using a plane motor. The stage device includes (i) a stator unit having a coil group, and (ii) the movable element, which moves on the stator unit. The stator unit includes (a) an exposure region where the substrate is to be subjected to a process of exposing the substrate, and (b) a measurement region where the substrate is to be subjected to a process of measuring a position of the substrate. The coil group in the stator unit is temperature-controlled independently between the exposure region and the measurement region.

Abstract: In a linear motor, each arrayed coil unit (160) of a stator yoke (151) is divided into an upper coil (161) and lower coil (162). A cooling pipe (153) is interposed between the upper coil (161) and the lower coil (162).

Abstract: An exposure apparatus, which exposes a pattern on an original onto a substrate while a liquid fills a gap between a projection optical system and the substrate, includes a liquid holding plate which sets the substrate held on a substrate stage and the peripheral area around the peripheral portion of the substrate to form substantially the same surface to hold the liquid on the peripheral portion of the substrate. The liquid holding plate includes an inner member formed in the peripheral area of the peripheral portion of the substrate and holds the liquid on the peripheral portion of the substrate, an outer member formed on the peripheral portion of the inner member and attaching to the substrate stage, and a connection member which connects the inner member to the outer member.