Abstract: Positioning apparatus arranged in a vacuum atmosphere comprises: a supporting means including a combination of a magnet arranged on a bottom plate and an electromagnet arranged on a top plate so that the spring element can virtually be disregarded; and a linear motor enabling driving for performing positioning of a substrate subjected to positioning without a contact and including a magnet on a movable member side and a coil on a stationary member side. The positioning apparatus employs a non-contact heat controller to externally control the temperature of the substrate without a contact, through a radiation plate, Peltier element and cooling plate supported by a supporting member of the bottom plate, and a black body arranged on the top plate opposed to the radiation plate.

Abstract: Pure water (3) with a resistivity of 1 M&OHgr;·cm or more is externally supplied in an exposure apparatus in which a master and substrate are relatively moved and aligned by a stage driven by a linear motor (1) and a pattern on the master is transferred onto the substrate. While being adjusted to a predetermined temperature, the pure water (3) undergoes deoxidation processing and UV sterilization processing and is circulated to cool the linear motor (1).

Abstract: In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.

Abstract: Outflow of heat generated by a linear motor to the outside is suppressed. A linear motor according to the present invention is a linear motor used in a vacuum atmosphere, including a stator, a movable element movable relative to the stator, and a metal film formed on the surface of at least one of the stator and the movable element. This decreases the emissivity and reduces the outflow of heat by radiation from the linear motor.

Abstract: Some of linear motors which constitute an exposure apparatus have coils each obtained by winding a copper foil wire as a foil-like conductor having an insulating layer around a core member in a multilayered structure. The coil is fixed to a positioning portion serving as the coil fixing portion of the linear motor by using the core member. The core member is formed from the same insulating material with low thermal conductivity as that of the positioning portion of a linear motor housing or a material with almost the same linear expansion coefficient.

Abstract: A linear motor increases the space factor of a copper wire with respect to a coil section, increases the current density of a driving current supplied to a coil, and realizes higher speed and lower power consumption of a stage apparatus. In an exposure apparatus for exposing a substrate to a pattern drawn on a master surface, a linear motor with a coil formed by winding a foil-like conductor in a multilayered structure is used for driving a stage which supports a master or substrate, and for damping of the main body structure by cutting off transmission of a reaction force from the stage.

Abstract: A pipe connected to a stage serving as a movable member arranged in a vacuum chamber has a double pipe structure constituted by a resin inner pipe and a resin outer pipe which covers the inner pipe including its surrounding space. The space between the inner pipe and the outer pipe is connected to a vacuum pump serving as an exhaust means. The space in the pipe is kept in vacuum by the vacuum pump.

Abstract: A stationary element (7) having coils (8) serving as heating elements of a linear motor for vertically driving a wafer stage is attached to a base member (9) via a Peltier element (20), and a coolant (19) temperature-managed by a cooling unit (17) is supplied. A cooling amount control unit (13) predicts the heat generation amount and temperature of each coil (8) on the basis of a control signal for exposure operation or the like from a controller (11), and sends the result to the cooling unit (17) and Peltier element (20). The Peltier element (20) moves heat generated by the coil (8) from the stationary element (7) to the base member (9). The cooling unit (17) controls the temperature and flow rate of the coolant (19) so as to minimize temperature changes of a movable element (5) and stage, and supplies the coolant (19) to the stationary element (7). The coolant 19 absorbs heat generated by the coil (8) to achieve high-precision temperature control.

Abstract: A driving system includes a driving mechanism for producing a driving force, a drive controlling device for controlling the driving mechanism, and a temperature adjusting mechanism collecting heat from the driving mechanism, wherein cooling amount of the temperature adjusting mechanism is controlled on the basis of a signal applied from the drive controlling device to the driving mechanism. The cooling amount required for the driving mechanism or the amount of heat generation in the driving mechanism is predicted, on the basis of a signal applied to the driving mechanism, and the cooling amount is then controlled.

Abstract: A driving system has a driving mechanism for producing a driving force, a drive controlling device for controlling the driving mechanism, and a temperature adjusting mechanism for collecting heat from the driving mechanism, wherein a cooling amount of the temperature adjusting mechanism is controlled on the basis of a signal applied from the drive controlling device to the driving mechanism. The cooling amount required for the driving mechanism or the amount of heat generation in the driving mechanism is predicted, on the basis of a signal applied to the driving mechanism, and the cooling amount is then controlled.