Patents by Inventor Keiko Chiba

Keiko Chiba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method
    Patent number: 5553110
    Abstract: An X-ray mask structure for X-ray lithography comprises a pattern, an X-ray transmissive film for holding the pattern, and a frame for supporting the X-ray transmissive film, wherein a light-scattering prevention film is formed on at least a part of the surface of the X-ray transmissive film and/or of the pattern, and the light scattering prevention film may be a flat coating film formed on at least one of the top face and the back face of the X-ray transmissive film and having a refractive index substantially equal to the refractive index of the X-ray transmissive film. A process for producing the X-ray mask structure comprises steps of forming a flat coating film having a refractive index substantially the same as that of the X-ray transmissive film on at least one of the top face and the back face of the X-ray transmissive film, and forming a pattern at least on the top face of the X-ray transmissive film.
    Type: Grant
    Filed: November 18, 1994
    Date of Patent: September 3, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koichi Sentoku, Kenji Saito, Keiko Chiba, Hiroshi Maehara
  • X-ray mask structure and manufacturing methods including forming a metal oxide film on a portion of an X-ray permeable film having no X-ray absorber thereon
    Patent number: 5422921
    Abstract: An X-ray mask structure includes an X-ray absorber having a masking pattern, an X-ray permeable film for supporting the X-ray absorber on a surface of the X-ray permeable film, and a supporting frame for supporting the X-ray permeable film. The X-ray mask structure has a metal oxide film formed on a portion of the surface of the X-ray permeable film having no X-ray absorber thereon. Also disclosed is a method for manufacturing such an X-ray mask structure.
    Type: Grant
    Filed: November 12, 1992
    Date of Patent: June 6, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiko Chiba
  • 2,4-pentadienoic acid derivatives and platelet aggregation inhibitors containing the same
    Patent number: 4764528
    Abstract: Novel 2,4-pentadienoic acid derivatives are disclosed. As the examples are mentioned 3-(4-carboxy-trans, trans-1,3-butadienyl)-6-exo-(3.alpha.-hydroxy-trans-1-octenyl)-7-endo-hydr oxybicyclo[3.3.0]oct-2-ene, 3-(5-carboxy-trans, trans-2,4-pentadienyl)-6-exo-(3.alpha.-hydroxy-trans-1-octenyl)-7-endo-hyd roxybicyclo[3.3.0]oct-2-ene and the like. These compounds are useful as a platelet aggregation inhibitor, especially as a thrombosis-prophylactic agent.
    Type: Grant
    Filed: March 10, 1987
    Date of Patent: August 16, 1988
    Assignee: Teruo Kabushiki Kaisha
    Inventors: Keiko Chiba, Makoto Takai, Toshio Wakabayashi
  • Lithographic mask structure and lithographic process
    Patent number: 4735877
    Abstract: There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise.
    Type: Grant
    Filed: October 6, 1986
    Date of Patent: April 5, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideo Kato, Yoshie Izawa, Keiko Chiba