Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.

Abstract: A photocurable composition for forming coating film having flattening properties on a substrate, with high fillability into patterns and capability of forming a coating film that is free from thermal shrinkage, which contains at least one compound that contains a photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure, a hydrocarbon structure, and a solvent. The compound may have the photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure and the hydrocarbon structure in one molecule, or may be a combination of compounds which contain the structures in separate molecules.

Abstract: A foldable display device includes a reflective display panel, a light guiding layer and at least one light source. The light guiding layer is located on the reflective display panel and includes a non-foldable area, a foldable area and a transition area. The light guiding layer satisfies the following formulas: D2<D1, W2?Rx ? and J1?(L?W2)/2?W1, in which D1 is a thickness of the non-foldable area, D2 is a thickness of the foldable area, W1 is a width of the non-foldable area, W2 is a width of the foldable area, R is a folding radius of the reflective display panel, J1 is a width of the transition area, L is a length of the light guiding layer. The light source is located on the reflective display panel and faces the sidewall of the light guiding layer.

Abstract: A diagnosis assisting apparatus according to an embodiment includes a processing circuit and a display circuit. The processing circuit is configured to obtain a first question represented by a question from a patient to a medical doctor. The processing circuit is configured to analyze content of the obtained first question. The processing circuit is configured to convert the first question into a second question having equivalent content and using a different expression, on the basis of a result of the analysis. The display circuit is configured to display the second question.

Abstract: A resist underlayer film-forming composition has high solubility in a solvent used at a lithography process for exhibiting good coating film forming properties and able to decrease a sublime generated during formation of a film. A resist underlayer film-forming composition having a novolac resin having a structure group (C) obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B). The aromatic vinyl compound (B) is represented by Formula (1), and is specifically styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene. The structure group (C) is represented by Formula (2). The aromatic ring-containing compound (A) is an aromatic amine compound or a phenolic hydroxy group-containing compound. The novolac resin is a resin produced by a reaction of the aromatic amine compound or the phenolic hydroxy group-containing compound with aldehyde or ketone.

Abstract: A resist underlayer film-forming composition formed into a flat film which can exhibit high etching resistance, a good dry etching velocity ratio and a good optical constant, has a good covering property even against a so-called step-structure substrate, and has a small film thickness difference after being embedded. Also, a method for producing a polymer suitable for the resist underlayer film-forming composition; a resist underlayer film using the resist underlayer film-forming composition; and a method for manufacturing a semiconductor device. A resist underlayer film-forming composition containing a reaction product of an aromatic compound having 6 to 60 carbon atoms with a carbonyl group in a cyclic carbonyl compound having 3 to 60 carbon atoms and a solvent, wherein the reaction product has such a structure that one of the carbon atoms in the cyclic carbonyl compound links two molecules of the aromatic compound to each other.

Abstract: A foldable assembly includes a main body, a left first guide slot, a right first guide slot, a left swing arm, a right swing arm, a left hinge plate, a right hinge plate, a left housing and a right housing. A left first through hole of the left swing arm is pivotally connected to a positioning holder of the main body by a first cylinder. A right first through hole of the right swing arm is pivotally connected to the positioning holder of the main body by a second cylinder. A left second guide slot of the left hinge plate and a left second through hole of the left swing arm are passed through by a fourth cylinder. A right second guide slot of the right hinge plate and a right second through hole of the right swing arm are passed through by a sixth cylinder.

Abstract: A resist underlayer film-forming composition including a novolac resin having a structural group (C) formed by reaction between an aromatic ring of an aromatic compound (A) having at least two amino groups and three C6-40 aromatic rings and a vinyl group of an aromatic vinyl compound (B). The structural group (C) may be a group of the following Formula (1): [wherein R1 is a divalent group containing at least two amino groups and at least three C6-40 aromatic rings]. R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of a compound of the following Formula (2): R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of N,N?-diphenyl-1,4-phenylenediamine.

Abstract: A foldable display device includes a reflective display panel, a light guiding layer and at least one light source. The light guiding layer is located on the reflective display panel and includes a non-foldable area, a foldable area and a transition area. The light guiding layer satisfies the following formulas: D2<D1, W2?Rx ? and J1?(L?W2)/2?W1, in which D1 is a thickness of the non-foldable area, D2 is a thickness of the foldable area, W1 is a width of the non-foldable area, W2 is a width of the foldable area, R is a folding radius of the reflective display panel, J1 is a width of the transition area, L is a length of the light guiding layer. The light source is located on the reflective display panel and faces the sidewall of the light guiding layer.

Abstract: A medical information processing apparatus is a medical information processing apparatus that stores medical information of a patient and includes a processing circuitry and a memory. The processing circuitry performs voice recognition processing on a voice of a user, inputs the medical information based on a result of the voice recognition processing, acquires a mental state of the user by analyzing the voice of the user, and stores an analysis result of a mental state analysis section in the memory.

Abstract: An electrophoretic display including a low-modulus adhesive foam. The electrophoretic display additionally includes a conductive integrated barrier layer including a light-transmissive electrode and a moisture barrier. In some embodiments, the resulting electrophoretic display may include touch sensing, a front light, color, and a digitizing layer to record interactions with a stylus. In some embodiments, the display includes a color filter array.

Abstract: A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent. In Formula (1), R1, R2, and R3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R1, R2, and R3 may be the same or different and may bond to each other to form a ring structure.

Abstract: A cap includes a cap body including a disk-shaped top plate portion and a cylindrical skirt portion provided at a peripheral edge portion of the top plate portion; and a disk-shaped sealing member including a sliding layer and a sealing layer, the sliding layer disposed on the top plate portion side and having a thin portion thinner than at least a center side provided on an outer peripheral edge side, and the sealing layer provided on a main surface opposite to the top plate portion side of the sliding layer and sealing a mouth portion of a can container.

Abstract: A mobile diagnosis system according to an embodiment includes a plurality of containers and a mobile body. The plurality of containers store medical equipment and can be combined with each other. The mobile body is configured such that a combination of the containers suitable for a person or a region requiring a medical service among the plurality of containers is loaded thereon, and transports the containers to the person or the region.

Abstract: A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent. In Formula (1), R1, R2, and R3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R1, R2, and R3 may be the same or different and may bond to each other to form a ring structure.

Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.

Abstract: A circuit device includes a bus, a plurality of master circuits that are coupled to the bus and are bus masters in the bus, and a plurality of slave circuits that are coupled to the plurality of master circuits via the bus and are bus slaves in the bus. Access authority to the bus slaves is set for the plurality of master circuits, and permission setting of read access or write access from the bus masters is performed for the plurality of slave circuits. The plurality of master circuits determine whether the plurality of slave circuits are accessible based on the access authority and the permission setting.

Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.

Abstract: A photocurable composition for forming coating film having flattening properties on a substrate, with high fillability into patterns and capability of forming a coating film that is free from thermal shrinkage, which contains at least one compound that contains a photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure, a hydrocarbon structure, and a solvent. The compound may have the photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure and the hydrocarbon structure in one molecule, or may be a combination of compounds which contain the structures in separate molecules.

Abstract: A supporting assembly comprises a first body having a first surface, a second body having a second surface, a third body having a third surface, a fourth body having a fourth surface, a first hinge member, and a second hinge member. The first hinge member is hinged to the first body and the second body. The second hinge member is hinged to the second body and the third body. The fourth body has hinged to and between the second body and the third body.