Abstract: The composition of the present invention contains a polymer to which there is attached a group represented by the following formula (1): (wherein each of Rx, Sy, and Sz represents a hydrogen atom or a monovalent organic group; each of Ry and Rz represents a single bond or a divalent organic group; each of ring Ary and ring Arz represents a C4 to C20 cyclic alkyl group or a C6 to C30 aryl group, and ring Ary and ring Arz may be linked together to form a new ring structure therebetween; ny is an integer of 0 to the maximum number corresponding to allowable substitution to ring Ary; nz is an integer of 0 to the maximum number corresponding to allowable substitution to ring Arz; and * is a polymer bonding site).

Abstract: A stepped substrate coating composition includes: a compound (E) containing partial structures (I) and (II) and a solvent (F). The partial structure (II) contains a hydroxy group generated by an epoxy group and a proton-generating compound reaction; the partial structure (I) is at least one partial structure selected from partial structures of Formula (1-1) to Formula (1-5) or a partial structure combining a partial structure of Formula (1-6) and Formula (1-7) or Formula (1-8); and the partial structure (II) is a partial structure of Formula (2-1) or Formula (2-2). The photocurable stepped substrate coating composition wherein in the compound (E), the epoxy group and the hydroxy group are contained in a molar ratio of 0?(Epoxy group)/(Hydroxy group)?0.5 and the partial structure (II) is contained in a molar ratio of 0.01?(Partial structure (II))/(Partial structure (I)+Partial structure (II))?0.8.

Abstract: Provided are a cancer therapeutic drug comprising a compound which inhibits GPX4 as an active ingredient, the cancer therapeutic drug treating cancer containing a cancer cell having a suppressed function of a SWI/SNF complex factor detected; and a method for predicting sensitivity of a cancer cell to a GPX4 inhibitor, the method comprising the step of predicting a cancer cell having a suppressed function of a SWI/SNF complex factor detected in the cancer cell, as having sensitivity to the GPX4 inhibitor.

Abstract: A medication use support system including a communication device provided to a medicine and a terminal that stores and manages medication information, wherein the terminal includes: a reading unit which reads first trigger information for acquiring information of the medicine; a communication unit which performs wireless communication with the communication device; a storage unit which stores management information of the medicine; a display unit which displays a medication use management screen including the management information of the medicine; and a control unit which determines a use status of the medicine by communication with the communication device, the communication device is in a communicable state with the terminal when not shielded by the electromagnetic wave shielding member and transmits second trigger information to the communication unit in the communicable state.

Abstract: A mobile diagnosis system according to an embodiment includes a plurality of containers and a mobile body. The plurality of containers store medical equipment and can be combined with each other. The mobile body is configured such that a combination of the containers suitable for a person or a region requiring a medical service among the plurality of containers is loaded thereon, and transports the containers to the person or the region.

Abstract: Provided are a cancer therapeutic drug comprising a compound which inhibits GPX4 as an active ingredient, the cancer therapeutic drug treating cancer containing a cancer cell having a suppressed function of a SWI/SNF complex factor detected; and a method for predicting sensitivity of a cancer cell to a GPX4 inhibitor, the method comprising the step of predicting a cancer cell having a suppressed function of a SWI/SNF complex factor detected in the cancer cell, as having sensitivity to the GPX4 inhibitor.

Abstract: A processing apparatus includes a head-related transfer function processing unit that applies a head-related transfer function corresponding to an angle of a virtual sound source with respect to a listening position to monaural sound source data to generate stereo first sound data, a volume panning processing unit that performs volume panning processing on the first sound data based on the angle of the virtual sound source to generate stereo second sound data, and a correction processing unit that corrects a delay amount and a volume of the second sound data based on arrangement information of a plurality of sound output devices to generate stereo third sound data to be output by two of the plurality of sound output devices.

Abstract: A resist underlayer film formation composition including a novolak resin that has a repeating unit structure represented by the following formula (1). (In formula (1), groups A and B are organic groups which each have an aromatic ring, a fused aromatic ring, or a fused aromatic heterocycle and have a structure in which two or more mono- or divalent chemical groups selected from the group consisting of chemical groups (a) that cause an increase in mass upon oxidation, groups (b) that form a crosslink upon heating, and groups (c) that induce phase separation during curing have replaced hydrogen atoms on the ring(s) contained in group A and/or B.) The composition further includes a crosslinking agent and an acid and/or acid generator. A production process is provided in which the resist underlayer film formation composition is applied to a semiconductor substrate and burned to obtain a resist underlayer film.

Abstract: A foldable assembly includes a main body, a left first guide slot, a right first guide slot, a left swing arm, a right swing arm, a left hinge plate, a right hinge plate, a left housing and a right housing. A left first through hole of the left swing arm is pivotally connected to a positioning holder of the main body by a first cylinder. A right first through hole of the right swing arm is pivotally connected to the positioning holder of the main body by a second cylinder. A left second guide slot of the left hinge plate and a left second through hole of the left swing arm are passed through by a fourth cylinder. A right second guide slot of the right hinge plate and a right second through hole of the right swing arm are passed through by a sixth cylinder.

Abstract: A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2): wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4): with an ether compound comprising a hydroxy group or a C2-10 alcohol.

Abstract: A resist lower layer film formation composition that exhibits a high etching resistance and a good dry-etching rate ratio and optical constant, exhibits good coating performance even on a so-called stepped substrate, produces a small film thickness difference after embedding, and enables a flat film to be formed. Also a method for manufacturing a polymer suitable for the resist lower layer film formation composition, a resist lower layer film in which the formation composition is used, and a method for manufacturing a semiconductor device. A resist lower layer film formation composition containing: a solvent; and a reaction product between an aromatic compound having 6-60 carbon atoms and a carbon-oxygen double bond of an oxygen-containing compound having 3-60 carbon atoms. The oxygen-containing compound has, in one molecule, one partial structure: —CON< or —COO—. In the reaction product, one carbon atom of the oxygen-containing compound links two of the aromatic compounds.

Abstract: A resist underlayer film-forming composition including: a resin having a repeating structural unit including at least one —C(?O)—O— group in a main chain and a repeating structural unit including at least one hydroxy group in a side chain, or including at least one —C(?O)—O— group in a main chain and at least one hydroxy group in a side chain, wherein none of these units have an organic group containing an epoxy or oxetane ring; an acid catalyst or salt thereof in an amount of 0.1 to 10 parts by mass relative to 100 parts by mass of the resin, when the catalyst is a monovalent acid, an acid dissociation constant pKa is ?0.5 or less in 25° C. water, or when a multivalent acid, an acid dissociation constant pKa1 is ?0.5 or less in 25° C. water; and a solvent, wherein the composition does not include a monomer crosslinking agent.

Abstract: A supporting assembly comprises a first body having a first surface, a second body having a second surface, a third body having a third surface, a fourth body having a fourth surface, a first hinge member, and a second hinge member. The first hinge member is hinged to the first body and the second body. The second hinge member is hinged to the second body and the third body. The fourth body has hinged to and between the second body and the third body.

Abstract: A resist underlayer film-forming composition including: a resin having a repeating structural unit including at least one —C(?O)—O— group in a main chain and a repeating structural unit including at least one hydroxy group in a side chain, or including at least one —C(?O)—O— group in a main chain and at least one hydroxy group in a side chain, wherein none of these units have an organic group containing an epoxy or oxetane ring; an acid catalyst or salt thereof in an amount of 0.1 to 10 parts by mass relative to 100 parts by mass of the resin, when the catalyst is a monovalent acid, an acid dissociation constant pKa is ?0.5 or less in 25° C. water, or when a multivalent acid, an acid dissociation constant pKa1 is ?0.5 or less in 25° C. water; and a solvent, wherein the composition does not include a monomer crosslinking agent.

Abstract: The patch includes a support body, a plaster provided on one main surface of the support body, a communication device provided on another main surface of the support body and wirelessly communicating with a communication terminal, and an electromagnetic wave shielding member provided on at least one of the plaster and the communication device and allowing the communication device to be in an uncommunicable state.

Abstract: A medication use support system including a communication device provided to a medicine and a terminal that stores and manages medication information, wherein the terminal includes: a reading unit which reads first trigger information for acquiring information of the medicine; a communication unit which performs wireless communication with the communication device; a storage unit which stores management information of the medicine; a display unit which displays a medication use management screen including the management information of the medicine; and a control unit which determines a use status of the medicine by communication with the communication device, the communication device is in a communicable state with the terminal when not shielded by the electromagnetic wave shielding member and transmits second trigger information to the communication unit in the communicable state.

Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.

Abstract: A photocurable composition for forming coating film having flattening properties on a substrate, with high fillability into patterns and capability of forming a coating film that is free from thermal shrinkage, which contains at least one compound that contains a photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure, a hydrocarbon structure, and a solvent. The compound may have the photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure and the hydrocarbon structure in one molecule, or may be a combination of compounds which contain the structures in separate molecules.

Abstract: A foldable display device includes a reflective display panel, a light guiding layer and at least one light source. The light guiding layer is located on the reflective display panel and includes a non-foldable area, a foldable area and a transition area. The light guiding layer satisfies the following formulas: D2<D1, W2?Rx ? and J1?(L?W2)/2?W1, in which D1 is a thickness of the non-foldable area, D2 is a thickness of the foldable area, W1 is a width of the non-foldable area, W2 is a width of the foldable area, R is a folding radius of the reflective display panel, J1 is a width of the transition area, L is a length of the light guiding layer. The light source is located on the reflective display panel and faces the sidewall of the light guiding layer.

Abstract: A diagnosis assisting apparatus according to an embodiment includes a processing circuit and a display circuit. The processing circuit is configured to obtain a first question represented by a question from a patient to a medical doctor. The processing circuit is configured to analyze content of the obtained first question. The processing circuit is configured to convert the first question into a second question having equivalent content and using a different expression, on the basis of a result of the analysis. The display circuit is configured to display the second question.