Patents by Inventor Keisuke Hashimoto
Keisuke Hashimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210124268Abstract: A resist underlayer film-forming composition formed into a flat film which can exhibit high etching resistance, a good dry etching velocity ratio and a good optical constant, has a good covering property even against a so-called step-structure substrate, and has a small film thickness difference after being embedded. Also, a method for producing a polymer suitable for the resist underlayer film-forming composition; a resist underlayer film using the resist underlayer film-forming composition; and a method for manufacturing a semiconductor device. A resist underlayer film-forming composition containing a reaction product of an aromatic compound having 6 to 60 carbon atoms with a carbonyl group in a cyclic carbonyl compound having 3 to 60 carbon atoms and a solvent, wherein the reaction product has such a structure that one of the carbon atoms in the cyclic carbonyl compound links two molecules of the aromatic compound to each other.Type: ApplicationFiled: May 21, 2019Publication date: April 29, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hikaru TOKUNAGA, Hiroto OGATA, Keisuke HASHIMOTO, Makoto NAKAJIMA
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Publication number: 20210116814Abstract: A resist lower layer film formation composition that exhibits a high etching resistance and a good dry-etching rate ratio and optical constant, exhibits good coating performance even on a so-called stepped substrate, produces a small film thickness difference after embedding, and enables a flat film to be formed. Also a method for manufacturing a polymer suitable for the resist lower layer film formation composition, a resist lower layer film in which the formation composition is used, and a method for manufacturing a semiconductor device. A resist lower layer film formation composition containing: a solvent; and a reaction product between an aromatic compound having 6-60 carbon atoms and a carbon-oxygen double bond of an oxygen-containing compound having 3-60 carbon atoms. The oxygen-containing compound has, in one molecule, one partial structure: —CON< or —COO—. In the reaction product, one carbon atom of the oxygen-containing compound links two of the aromatic compounds.Type: ApplicationFiled: May 21, 2019Publication date: April 22, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hikaru TOKUNAGA, Hiroto OGATA, Keisuke HASHIMOTO, Makoto NAKAJIMA
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Publication number: 20210098088Abstract: A diagnosis assisting apparatus according to an embodiment includes a processing circuit and a display circuit. The processing circuit is configured to obtain a first question represented by a question from a patient to a medical doctor. The processing circuit is configured to analyze content of the obtained first question. The processing circuit is configured to convert the first question into a second question having equivalent content and using a different expression, on the basis of a result of the analysis. The display circuit is configured to display the second question.Type: ApplicationFiled: September 21, 2020Publication date: April 1, 2021Applicant: CANON MEDICAL SYSTEMS CORPORATIONInventors: Keisuke HASHIMOTO, Shintaro NIWA, Mariko SHIBATA, Michitaka SUGAWARA
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Publication number: 20210054231Abstract: A photocurable silicon-containing coating film-forming composition including a hydrolyzable silane, a hydrolysate thereof, or a hydrolytic condensate thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of the following Formula (1): R1aR2bSi(R3)4-(a+b)??Formula (1) (wherein R1 is a functional group relating to photocrosslinking). The photocurable silicon-containing coating film-forming composition, wherein the composition may be for forming a silicon-containing coating film that may be cured by ultraviolet irradiation and may serve as an intermediate layer between a resist film and an organic underlayer film on a substrate in a lithographic process for producing a semiconductor device.Type: ApplicationFiled: December 20, 2018Publication date: February 25, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Wataru SHIBAYAMA, Hikaru TOKUNAGA, Ken ISHIBASHI, Keisuke HASHIMOTO, Makoto NAKAJIMA
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Publication number: 20210024773Abstract: A stepped substrate coating composition for forming a coating film having planarity on a substrate, including: a main agent and a solvent, the main agent containing a compound (A), a compound (B), or a mixture thereof, the compound (A) having a partial structure Formula (A-1) or (A-2): and the compound (B) having at least one partial structure selected from Formulae (B-1)-(B-5), or having a partial structure including a combination of a partial structure of Formula (B-6) and a partial structure of Formula (B-7) or (B-8): where the composition is cured by photoirradiation or by heating at 30° C.-300° C.; and the amount of the main agent in the solid content of the composition is 95%-100% by mass.Type: ApplicationFiled: September 12, 2018Publication date: January 28, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hikaru TOKUNAGA, Takafumi ENDO, Hiroto OGATA, Keisuke HASHIMOTO, Makoto NAKAJIMA
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Patent number: 10894887Abstract: A composition for forming protective film against aqueous hydrogen peroxide solution, composition including resin; compound of following Formula (1a), (1b), or (1c): (wherein X is carbonyl group or methylene group; 1 and m are each independently integer of 0-5 to satisfy relation: 3?1+m?10; n is integer of 2-5; u and v are each independently integer of 0-4 to satisfy relation: 3?u+v?8; R1-R4 are each independently hydrogen atom, hydroxy group, C1-10 hydrocarbon group, or C6-20 aryl group; when R1-R4 are each the C1-10 hydrocarbon group; and j and k are each independently 0 or 1); crosslinking agent and catalyst; and solvent, wherein amount of compound of Formula (1a), (1b), or (1c) is at most 80% by mass relative to amount of resin, and amount of crosslinking agent is 5%-40% by mass relative to amount of resin.Type: GrantFiled: April 10, 2018Date of Patent: January 19, 2021Assignee: NISSAN CHEMICAL CORPORATIONInventors: Hikaru Tokunaga, Yuto Hashimoto, Keisuke Hashimoto, Rikimaru Sakamoto
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Patent number: 10871712Abstract: A stepped substrate-coating composition having high properties of filling a pattern and capable of forming on a substrate a coating film that can be formed by photocuring, has flattening properties, and has high heat resistance after irradiation with light. A photocurable composition for coating a stepped substrate, the photocurable composition containing a polymer containing a unit structure of Formula (1): wherein A1, A2, and A3 are each independently an aromatic C6-100 ring optionally containing a heteroatom or a hydrocarbon group containing an aromatic C6-100 ring optionally containing a heteroatom, B1, B2, and B3 are each independently Formula (2): wherein R1 is a C1-10 alkylene group, a C1-10 alkenylene group, a C1-10 alkynylene group, a C6-40 arylene group, an oxygen atom, a carbonyl group, a sulfur atom, —C(O)—O—, —C(O)—NRa—, —NRb—, or a group including a combination thereof, R2 is a hydrogen atom or a C1-10 alkyl group.Type: GrantFiled: March 30, 2018Date of Patent: December 22, 2020Assignee: NISSAN CHEMICAL CORPORATIONInventors: Hikaru Tokunaga, Takafumi Endo, Keisuke Hashimoto, Rikimaru Sakamoto
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Publication number: 20200387072Abstract: A resist underlayer film-forming composition including a novolac resin having a structural group (C) formed by reaction between an aromatic ring of an aromatic compound (A) having at least two amino groups and three C6-40 aromatic rings and a vinyl group of an aromatic vinyl compound (B). The structural group (C) may be a group of the following Formula (1): [wherein R1 is a divalent group containing at least two amino groups and at least three C6-40 aromatic rings]. R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of a compound of the following Formula (2): R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of N,N?-diphenyl-1,4-phenylenediamine.Type: ApplicationFiled: February 20, 2019Publication date: December 10, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hirokazu NISHIMAKI, Daigo SAITO, Ryo KARASAWA, Keisuke HASHIMOTO
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Publication number: 20200379350Abstract: A resist underlayer film formation composition combining high etching resistance, high heat resistance, and excellent coating properties; a resist underlayer film wherein the resist underlayer film formation composition is used and a method for manufacturing the resist underlayer film; a method for forming a resist pattern; and a method for manufacturing a semiconductor device. The resist underlayer film formation composition is characterized by including the compound represented by Formula (1), or a polymer derived from the compound represented by Formula (1).Type: ApplicationFiled: April 20, 2018Publication date: December 3, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hikaru TOKUNAGA, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Publication number: 20200379352Abstract: A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2): wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4): with an ether compound comprising a hydroxy group or a C2-10 alcohol.Type: ApplicationFiled: August 6, 2020Publication date: December 3, 2020Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Keisuke HASHIMOTO, Kenji TAKASE, Tetsuya SHINJO, Rikimaru SAKAMOTO, Takafumi ENDO, Hirokazu NISHIMAKI
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Publication number: 20200380581Abstract: A medical institution selection support apparatus according to an embodiment includes a processing circuitry. The processing circuitry receives a search request for a medical institution. The processing circuitry outputs a search result in accordance with an overall evaluation value based on an evaluation value in accordance with personal information of a user for an evaluation item for evaluating each of a plurality of the medical institutions and an importance degree of the evaluation item on which the personal information is reflected.Type: ApplicationFiled: May 19, 2020Publication date: December 3, 2020Applicant: CANON MEDICAL SYSTEMS CORPORATIONInventors: Mariko SHIBATA, Narumi Sasayama, Keisuke Hashimoto, Michitaka Sugawara, Katsuhiko Fujimoto, Satoshi Ikeda, Shintaro Niwa
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Publication number: 20200357520Abstract: A diagnosis support apparatus according to an embodiment includes a memory and processing circuitry. The memory stores therein a plurality of types of living body information including gene expression and mutation information, epigenetic environment influence information, protein expression information, signal transmission information, immune function information, endocrine function information, pathological information, image diagnosis information, physiological information, and body findings and symptom information of a subject. The processing circuitry determines a living body state of the subject on the basis of a plurality of analysis results obtained by analysis of the types of living body information.Type: ApplicationFiled: May 8, 2020Publication date: November 12, 2020Applicant: CANON MEDICAL SYSTEMS CORPORATIONInventors: Katsuhiko FUJIMOTO, Satoshi IKEDA, Keisuke HASHIMOTO, Mariko SHIBATA, Narumi SASAYAMA
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Patent number: 10809619Abstract: A resist underlayer film for use in lithography process which generates less sublimate, has excellent embeddability at the time of applying onto a substrate having a hole pattern, and has high dry etching resistance, wiggling resistance and heat resistance, etc. A resist underlayer film-forming composition including a resin and a crosslinkable compound of Formula (1) or Formula (2): in which Q1 is a single bond or an m1-valent organic group, R1 and R4 are each a C2-10 alkyl group or a C2-10 alkyl group having a C1-10 alkoxy group, R2 and R5 are each a hydrogen atom or a methyl group, R3 and R6 are each a C1-10 alkyl group or a C6-40 aryl group.Type: GrantFiled: June 24, 2014Date of Patent: October 20, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Rikimaru Sakamoto, Takafumi Endo, Hirokazu Nishimaki
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Patent number: 10809670Abstract: The invention provides a timing apparatus that can generate timing information regarding a plurality of regions without performing a complex calculation that uses software and without causing a significant increase in electric current consumption. The timing apparatus includes: a lower counter that generates a count value that indicates a time in seconds; a first group of upper counters that generates a first group of count values that indicate a time in minutes, hours, days, months and years by performing a count operation in synchronization with the count operation performed by the lower counter; and a second group of upper counters that generates a second group of count values that indicate a time in minutes, hours, days, months and years by performing a count operation in synchronization with the count operation performed by the lower counter.Type: GrantFiled: September 2, 2016Date of Patent: October 20, 2020Assignee: SEIKO EPSON CORPORATIONInventor: Keisuke Hashimoto
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Patent number: 10804111Abstract: A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin.Type: GrantFiled: September 15, 2016Date of Patent: October 13, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Keisuke Hashimoto, Yasunobu Someya, Takahiro Kishioka, Rikimaru Sakamoto
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Publication number: 20200301278Abstract: A stepped substrate-coating composition having high properties of filling a pattern and capable of forming on a substrate a coating film that can be formed by photocuring, has flattening properties, and has high heat resistance after irradiation with light. A photocurable composition for coating a stepped substrate, the photocurable composition containing a polymer containing a unit structure of Formula (1): wherein A1, A2, and A3 are each independently an aromatic C6-100 ring optionally containing a heteroatom or a hydrocarbon group containing an aromatic C6-100 ring optionally containing a heteroatom, B1, B2, and B3 are each independently Formula (2): wherein R1 is a C1-10 alkylene group, a C1-10 alkenylene group, a C1-10 alkynylene group, a C6-40 arylene group, an oxygen atom, a carbonyl group, a sulfur atom, —C(O)—O—, —C(O)—NRa—, —NRb—, or a group including a combination thereof, R2 is a hydrogen atom or a C1-10 alkyl group.Type: ApplicationFiled: March 30, 2018Publication date: September 24, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hikaru TOKUNAGA, Takafumi ENDO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Patent number: 10755408Abstract: A medical information processing system according to an embodiment includes processing circuitry. The processing circuitry is configured to identify the position of a tissue from first medical image data represented by an image of a target site acquired before the tissue in the target site was collected and to obtain an image feature value of the tissue. The processing circuitry is configured to obtain an examination result of a pathological examination performed on the tissue. The processing circuitry is configured to bring the image feature value of the tissue into association with the examination result of the pathological examination.Type: GrantFiled: May 7, 2018Date of Patent: August 25, 2020Assignee: Canon Medical Systems CorporationInventors: Yasuo Sakurai, Masahiro Ozaki, Atsuko Sugiyama, Seiko Yoshimura, Keisuke Hashimoto
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Patent number: 10670892Abstract: An image display apparatus having a flexible electronic display comprising a bendable portion that is flexible and configured to display an image, a support member comprising a substantially planar portion that resists bending and a bending-protection portion that bends and protects the bendable portion of the flexible display, and a retainer for retaining the flexible electronic display proximal to a surface of the support member.Type: GrantFiled: April 20, 2017Date of Patent: June 2, 2020Assignee: E Ink CorporationInventors: Kenji Nakazawa, Keisuke Hashimoto
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Publication number: 20200142310Abstract: A resist underlayer film forming composition characterized by containing (A) a compound represented by formula (1) (in formula (1), independently, R1 represents a C1 to C30 divalent group; each of R2 to R7 represents a C1 to C10 linear, branched, or cyclic alkyl group, a C6 to C10 aryl group, a C2 to C10 alkenyl group, a thiol group, or a hydroxyl group; at least one R5 is a hydroxyl group or a thiol group; each of m2, m3, and m6 is an integer of 0 to 9; each of m4 and m7 is an integer of 0 to 8; m5 is an integer of 1 to 9; n is an integer of 0 to 4; and each of p2 to p7 is an integer of 0 to 2) and a cross-linkable compound represented by formula (2-1) or (2-2) (in formula (2), Q1 represents a single bond or an m12-valent organic group; each of R12 and R15 independently represents a C2 to C10 alkyl group or a C2 to C10 alkyl group having a C1 to C10 alkoxy group; each of R13 and R16 represents a hydrogen atom or a methyl group; each of R14 and R17 represents a C1 to C10 alkyl group or a C6 to C40 aryl group;Type: ApplicationFiled: July 12, 2018Publication date: May 7, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Daigo SAITO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Publication number: 20200131376Abstract: There is provided a composition for forming a protective film against an aqueous hydrogen peroxide solution, the composition comprising a resin; a compound of the following Formula (1a), (1b), or (1c): (wherein X is a carbonyl group or a methylene group; 1 and m are each independently an integer of 0 to 5 so as to satisfy the relation: 3?1+m?10; n is an integer of 2 to 5; u and v are each independently an integer of 0 to 4 so as to satisfy the relation: 3?u+v?8; R1, R2, R3, and R4 are each independently a hydrogen atom, a hydroxy group, a C1-10 hydrocarbon group optionally having at least one hydroxy group as a substituent and optionally having at least one double bond in a main chain, or a C6-20 aryl group optionally having at least one hydroxy group as a substituent; when R1, R2, R3, and R4 are each the C1-10 hydrocarbon group, R1 and R2 optionally form a benzene ring together with a ring carbon atom to which R1 and R2 are bonded, R3 and R4 optionally form a benzene ring together with a ring carbonType: ApplicationFiled: April 10, 2018Publication date: April 30, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hikaru TOKUNAGA, Yuto HASHIMOTO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO