Abstract: A medical information processing system according to an embodiment includes processing circuitry. The processing circuitry is configured to identify the position of a tissue from first medical image data represented by an image of a target site acquired before the tissue in the target site was collected and to obtain an image feature value of the tissue. The processing circuitry is configured to obtain an examination result of a pathological examination performed on the tissue. The processing circuitry is configured to bring the image feature value of the tissue into association with the examination result of the pathological examination.

Abstract: Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar1 and Ar2 each are C6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent.

Abstract: A device includes circuitry that determines a currently defined tone of a pixel, and that determines a voltage to be applied to the pixel to compensate for a change in tone of the pixel through elapsed time based on the currently defined tone of the pixel. The device then applies the voltage to the pixel.

Abstract: A method forms a resist underlayer film that has high resistance to dry etching using a gas containing a fluorocarbon. A method for forming a resist underlayer film includes the steps of: applying to a substrate a resist underlayer film-forming composition containing a fullerene derivative in which one to six molecules of malonic acid diester of the following Formula (1): wherein two Rs are each independently a C1-10 alkyl group, are added to one molecule of fullerene, a compound having at least two epoxy groups, and a solvent; and baking the substrate applied with the resist underlayer film-forming composition at least one time at a temperature of 240° C. or higher under an atmosphere of nitrogen, argon, or a mixture thereof.

Abstract: A flexible, wearable apparatus comprising a flexible display, a support member and a retainer. In some embodiments, the flexible, wearable apparatus can be used in a flat or rounded configuration. In some embodiments, the flexible support member is formed to provide a substantially planar viewing surface for the electrophoretic display when the flexible, wearable apparatus is in a rounded state.

Abstract: A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent, wherein each of R1 to R4 is independently hydrogen atom or methyl group, and X1 is divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein X1 in Formula (1) is organic group of Formula (2), wherein A1 is phenylene group or naphthylene group, A2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and wherein each of A3 and A4 is independently phenylene group or naphthylene group, and dotted line is bond.

Abstract: An image display apparatus having a flexible electronic display comprising a bendable portion that is flexible and configured to display an image, a support member comprising a substantially planar portion that resists bending and a bending-protection portion that bends and protects the bendable portion of the flexible display, and a retainer for retaining the flexible electronic display proximal to a surface of the support member.

Abstract: A method for producing a semiconductor device, which includes forming an underlayer film on a semiconductor substrate with a resist underlayer film forming composition that contains a solvent, and a polymer containing a unit structure of Formula (2): O—Ar2—O—Ar3-T-Ar4??Formula (2) where Ar2, Ar3, and Ar4 are individually a C6-50 arylene group or an organic group containing a heterocyclic group; at least one of Ar3 and Ar4 is a phenylene group; and T is a carbonyl group. The resist underlayer film forming composition has a solid content of 0.1 to 70 mass % of a total mass of the composition.

Abstract: A resist underlayer film for lithography has high solubility in a resist solvent (solvent used in lithography) for expressing good coating film forming property and a smaller selection ratio of dry etching rate as compared with a resist. A resist underlayer film-forming composition containing a novolac resin containing a structure (C) obtained by a reaction of an aromatic ring of an aromatic compound (A) with a hydroxy group-containing aromatic methylol compound (B). The aromatic compound (A) may be a component constituting the structure (C) in the novolac resin. The hydroxy group-containing aromatic methylol compound (B) may be a compound of Formula (1): The hydroxy group-containing aromatic methylol compound (B) may be 2-hydroxybenzyl alcohol, 4-hydroxybenzyl alcohol, or 2,6-di-tert-butyl-4-hydroxymethyl phenol.

Abstract: The present invention provides a novel resist underlayer film-forming composition capable of forming a resist underlayer film that has etching resistance and excellent embeddability in a surface having concave portions and/or convex portions. A resist underlayer film-forming composition comprising a polymer having a structural unit represented by formula (1) or formula (2): (wherein X is an arylene group, n is 1 or 2, and R1, R2, R3, and R4 are each independently a hydrogen atom, a hydroxy group, a C1-3 alkyl group, or a phenyl group), and a solvent.

Abstract: A resist underlayer film-forming composition has high solubility in a solvent used at a lithography process for exhibiting good coating film forming properties and able to decrease a sublime generated during formation of a film. A resist underlayer film-forming composition having a novolac resin having a structure group (C) obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B). The aromatic vinyl compound (B) is represented by Formula (1), and is specifically styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene. The structure group (C) is represented by Formula (2). The aromatic ring-containing compound (A) is an aromatic amine compound or a phenolic hydroxy group-containing compound. The novolac resin is a resin produced by a reaction of the aromatic amine compound or the phenolic hydroxy group-containing compound with aldehyde or ketone.

Abstract: The present invention is directed to a method of treating pain comprising the administering the following 1-indansulfamide compounds: N-[(1S)-2,2,5,7-tetrafluoro-2,3-dihydro-1H-inden-1-yl]sulfamide, (?)-N-(7-chloro-2,2,5-trifluoro-2,3-dihydro-1H-inden-1-yl)sulfamide, N-[(1S)-2,2-difluoro-7-methyl-2,3-dihydro-1H-inden-1-yl]sulfamide, and N-[(1S)-2,2,5-trifluoro-7-methyl-2,3-dihydro-1H-inden-1-yl]sulfamide.

Abstract: The invention provides a timing apparatus that can generate timing information regarding a plurality of regions without performing a complex calculation that uses software and without causing a significant increase in electric current consumption. The timing apparatus includes: a lower counter that generates a count value that indicates a time in seconds; a first group of upper counters that generates a first group of count values that indicate a time in minutes, hours, days, months and years by performing a count operation in synchronization with the count operation performed by the lower counter; and a second group of upper counters that generates a second group of count values that indicate a time in minutes, hours, days, months and years by performing a count operation in synchronization with the count operation performed by the lower counter.

Abstract: A method for manufacturing a covered string-like object, the method comprising a placement step of placing a string-like object on a sheet-like flexible backing, a sewing step of sewing the string-like object to the backing with an embroidery material, and a separation step of separating the backing from the string-like object. According to the method for manufacturing a string-like object, a string-like object can be easily and reliably covered with an embroidery material.

Abstract: In an apex 34 of a tire 2, a reinforcing portion 48 is located inward of a main body 46 in an axial direction. When a position on an outer surface of the tire 2 at which position a height from a BBL is 14 mm is defined as a first point P1 and a position on the outer surface of the tire 2 at which position a height from the BBL is 20 mm is defined as a second point P2, the reinforcing portion 48 overlaps the first point P1 and the second point P2 in a radial direction. A loss tangent of the reinforcing portion 48 is equal to a loss tangent of the main body 46 or less than the loss tangent. A hardness of the reinforcing portion 48 is equal to a hardness of the main body 46 or greater than the hardness.

Abstract: Whereas, conventionally, ashing had been used at the time of removal, the present invention provides a material for forming an organic hard mask that can be removed by an alkaline aqueous solution, and thus can be expected to reduce damage to the substrate at the time of the removal. A composition for forming an organic hard mask layer comprising: a polymer (A) including a structural unit of Formula (1) and a structural unit of Formula (2); a crosslinkable compound (B) including at least two of blocked isocyanate groups, methylol groups, or C1-5 alkoxymethyl groups; and a solvent (C), wherein an organic hard mask layer obtained from the composition for forming an organic hard mask layer is used at the lowest layer in a lithography process using a multi-layer film, wherein R1 to R4 have the same definition as ones in the specification.

Abstract: A resist underlayer film which has an excellent hard mask function and can form an excellent pattern shape. A resist underlayer film-forming composition to be used for a lithography process, including a novolac polymer obtained by reaction of an aldehyde compound and an aromatic compound having a secondary amino group. The novolac polymer contains a unit structure of Formula (1): A method for producing a semiconductor device, including the steps of: forming a resist underlayer film from the resist underlayer film-forming composition on a semiconductor substrate; forming a hard mask on the resist underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or an electron beam and development; etching the hard mask by using the formed resist pattern; etching the resist underlayer film by using the patterned hard mask; and processing the semiconductor substrate by using the patterned underlayer film.

Abstract: A method for producing a semiconductor device, which includes forming an underlayer film on a semiconductor substrate with a resist underlayer film forming composition that contains a solvent, and a polymer containing a unit structure of Formula (2): ?O—Ar2—O—Ar3-T-Ar4???Formula (2) where Ar2, Ar3, and Ar4 are individually a C6-50 arylene group or an organic group containing a heterocyclic group; at least one of Ar3 and Ar4 is a phenylene group; and T is a carbonyl group. The resist underlayer film forming composition has a solid content of 0.1 to 70 mass % of a total mass of the composition.

Abstract: A display device may include a display portion to maintain a display state in accordance with a voltage applied thereto; and a plurality of light transmission regions adjacent to the display portion at positions corresponding to a plurality of light sources arranged over the display portion.

Abstract: A medicine comprising a 1-indansulfamides compound such as N-[(1S)-2,2,5,7-tetrafluoro-2,3-dihydro-1H-inden-1-yl]sulfamide, or N-[(1S)-2,2-difluoro-7-methyl-2,3-dihydro-1H-indene-1-yl]sulfamide or a pharmaceutically acceptable salt thereof, has an analgesic effects in the mouse hot-plate test and rat constriction nerve injury model and thus holds promise as a therapeutic agent for acute and chronic pain.