Abstract: A method for producing a coated substrate includes applying a photocurable silicon-containing coating film-forming composition to an uneven substrate; and exposing the photocurable silicon-containing coating film-forming composition to light, wherein the photocurable silicon-containing coating film-forming composition comprises a hydrolyzable silane, a hydrolysate thereof, or a hydrolytic condensate thereof, wherein the hydrolyzable silane is a hydrolyzable silane of the following Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) wherein R1 is a functional group relating to photocrosslinking; R2 is an alkyl group and is bonded to a silicon atom via an Si—C bond; R3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3.

Abstract: There is provided resist underlayer film for lithography process with high dry etching resistance, wiggling resistance, and heat resistance. Resist underlayer film-forming composition for lithography including polymer having unit structure of Formula (1): wherein A is hydroxy group-substituted C6-40 arylene group derived from polyhydroxy aromatic compound; B is C6-40 arylene group or C4-30 heterocyclic group containing nitrogen atom, oxygen atom, sulfur atom, or combination thereof; X+ is H+, NH4+, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, or quaternary ammonium ion, T is hydrogen atom, C1-10 alkyl group or C6-40 aryl group that may be substituted with halogen group, hydroxy group, nitro group, amino group, carboxylate ester group, nitrile group, or combination thereof as substituent, or C4-30 heterocyclic group containing nitrogen atom, oxygen atom, sulfur atom, or combination thereof, B and T may form C4-40 ring together with carbon atom to which they are bonded.

Abstract: An electrophoretic display including a low-modulus adhesive foam. The electrophoretic display additionally includes a conductive integrated barrier layer including a light-transmissive electrode and a moisture barrier. In some embodiments, the resulting electrophoretic display may include touch sensing, a front light, color, and a digitizing layer to record interactions with a stylus. In some embodiments, the display includes a color filter array.

Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B.

Abstract: A foldable electrophoretic display that is flexible and may be folded in a book-like fashion. Foldable electrophoretic display modules that can be separately manufactured and incorporated into a variety of foldable devices with differing functionality as needed by the consumer. In some embodiments, the resulting foldable electrophoretic display may include touch sensing, a front light, color, and a digitizing layer to record interactions with a stylus. In some embodiments, the display includes a color filter array.

Abstract: Provided are: a resist underlayer film formation composition combining high etching resistance, high heat resistance, and excellent coating properties; a resist underlayer film in which the resist underlayer film formation composition is used and a method for manufacturing the resist underlayer film; a method for forming a resist pattern; and a method for manufacturing a semiconductor device. The resist underlayer film formation composition is characterized by including the compound represented by Formula (1), or a polymer derived from the compound represented by Formula (1) (where: AA represents a single bond or a double bond; X1 represents —N(R1)—; X2 represents —N(R2)—; X3 represents —CH(R3)—; X4 represents —CH(R4)— etc.; R1, R2, R3, and R4 represent hydrogen atoms, C1-20 straight chain, branched, or cyclic alkyl groups, etc.; R5, R6, R9, and R10 represent hydrogen atoms, hydroxy groups, alkyl groups, etc.; R7 and R8 represent benzene rings or naphthalene rings; and n and o are 0 or 1).

Abstract: A circuit device includes a bus, a plurality of master circuits that are coupled to the bus and are bus masters in the bus, and a plurality of slave circuits that are coupled to the plurality of master circuits via the bus and are bus slaves in the bus. Access authority to the bus slaves is set for the plurality of master circuits, and permission setting of read access or write access from the bus masters is performed for the plurality of slave circuits. The plurality of master circuits determine whether the plurality of slave circuits are accessible based on the access authority and the permission setting.

Abstract: There are provided a plasma-curable multi-level substrate coating film-forming composition for forming a coating film having planarity on a substrate, wherein the composition can fill a pattern sufficiently.

Abstract: A method for manufacturing a semiconductor substrate having a patterned group-III nitride compound layer without collapsing a formed mask pattern due to reflow or decomposition even when an etching method at a high temperature of 300° C.-700° C. is used, including the steps: forming a patterned mask layer on the substrate's group-III nitride compound layer, and etching the group-III nitride compound layer by dry etching at 300° C. or higher and 700° C. or lower using the mask pattern, to form patterned group-III nitride compound layer, wherein the patterned mask layer contains a polymer containing a unit structure of the following Formula (1): a polymer containing a unit structure of the following Formula (2): O—Ar1??Formula (2) a polymer containing a structural unit of the following Formula (3): O—Ar2—O—Ar3-T-Ar4??Formula (3) a polymer containing a combination of unit structure of Formula (2) and unit structure of Formula (3), or a crosslinked structure of the polymers.

Abstract: A frequency measurement apparatus includes: a measurement period setting circuit that sets a measurement period based on a reference clock signal; a first counter circuit that counts the number of pulses of the reference clock signal in a period based on an input signal during the measurement period; a second counter circuit that counts the number of pulses of the input signal during the measurement period; a first frequency calculation circuit that calculates a first frequency; a second frequency calculation circuit that calculates a second frequency; and a frequency selection circuit that selects the first frequency or the second frequency as a frequency of the input signal.

Abstract: A material to form a resist underlayer film having properties achieving heat resistance, flattening properties, and etching resistance through lithography. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1): (wherein R1 is an organic group having at least two amines and at least three C6-40 aromatic rings, R2 and R3 are each a hydrogen atom, a C1-10 alkyl group, a C6-40 aryl group, a heterocyclic group, or a combination thereof, and the alkyl group, the aryl group, and the heterocyclic group are optionally substituted with a halogen group, a nitro group, an amino group, a formyl group, an alkoxy group, or a hydroxy group, or R2 and R3 optionally form a ring together). The above mentioned composition t, wherein R1 is a divalent organic group derived from N,N?-diphenyl-1,4-phenylenediamine.

Abstract: A frequency measurement apparatus includes: a measurement period setting circuit that sets a measurement period based on a reference clock signal; a first counter circuit that counts the number of pulses of the reference clock signal in a period based on an input signal during the measurement period; a second counter circuit that counts the number of pulses of the input signal during the measurement period; a first frequency calculation circuit that calculates a first frequency; a second frequency calculation circuit that calculates a second frequency; and a frequency selection circuit that selects the first frequency or the second frequency as a frequency of the input signal.

Abstract: A resist underlayer film which has an excellent hard mask function and can form an excellent pattern shape. A resist underlayer film-forming composition to be used for a lithography process, including a novolac polymer obtained by reaction of an aldehyde compound and an aromatic compound having a secondary amino group. The novolac polymer contains a unit structure of Formula (1): A method for producing a semiconductor device, including the steps of: forming a resist underlayer film from the resist underlayer film-forming composition on a semiconductor substrate; forming a hard mask on the resist underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or an electron beam and development; etching the hard mask by using the formed resist pattern; etching the resist underlayer film by using the patterned hard mask; and processing the semiconductor substrate by using the patterned underlayer film.

Abstract: A resist underlayer film not undergoing intermixing with a resist layer, having high dry etching and heat resistance, exhibiting high temperature low mass loss, and exhibiting even stepped substrate coatability, includes a polymer containing a unit structure of the formula (1): The unit structure of formula (1) is a unit structure of the formula (2): A method for producing a semiconductor device, includes forming, on a semiconductor substrate, a resist underlayer film using a resist underlayer film-forming composition, forming a hard mask on the resist underlayer film, a resist film on the hard mask, a resist pattern by irradiation with light or an electron beam and development of the resist film, a pattern by etching the hard mask using the resist pattern, a pattern by etching the underlayer film using the patterned hard mask, and processing the substrate using the patterned resist underlayer film.

Abstract: A foldable electrophoretic display that is flexible and may be folded in a book-like fashion. Foldable electrophoretic display modules that can be separately manufactured and incorporated into a variety of foldable devices with differing functionality as needed by the consumer. In some embodiments, the resulting foldable electrophoretic display may include touch sensing, a front light, color, and a digitizing layer to record interactions with a stylus. In some embodiments, the display includes a color filter array.

Abstract: A resist underlayer film forming composition characterized by containing (A) a compound represented by formula (1) (in formula (1), independently, R1 represents a C1 to C30 divalent group; each of R2 to R7 represents a C1 to C10 linear, branched, or cyclic alkyl group, a C6 to C10 aryl group, a C2 to C10 alkenyl group, a thiol group, or a hydroxyl group; at least one R5 is a hydroxyl group or a thiol group; each of m2, m3, and m6 is an integer of 0 to 9; each of m4 and m7 is an integer of 0 to 8; m5 is an integer of 1 to 9; n is an integer of 0 to 4; and each of p2 to p7 is an integer of 0 to 2) and a cross-linkable compound represented by formula (2-1) or (2-2) (in formula (2), Q1 represents a single bond or an m12-valent organic group; each of R12 and R15 independently represents a C2 to C10 alkyl group or a C2 to C10 alkyl group having a C1 to C10 alkoxy group; each of R13 and R16 represents a hydrogen atom or a methyl group; each of R14 and R17 represents a C1 to C10 alkyl group or a C6 to C40 aryl group;

Abstract: A resist underlayer film-forming composition including: a resin having a repeating structural unit including at least one —C(?O)—O— group in a main chain and a repeating structural unit including at least one hydroxy group in a side chain, or including at least one —C(?O)—O— group in a main chain and at least one hydroxy group in a side chain, wherein none of these units have an organic group containing an epoxy or oxetane ring; an acid catalyst or salt thereof in an amount of 0.1 to 10 parts by mass relative to 100 parts by mass of the resin, when the catalyst is a monovalent acid, an acid dissociation constant pKa is ?0.5 or less in 25° C. water, or when a multivalent acid, an acid dissociation constant pKa1 is ?0.5 or less in 25° C. water; and a solvent, wherein the composition does not include a monomer crosslinking agent.

Abstract: A polymer to which there is attached a group represented by the following formula (1): (wherein each of Rx, Sy, and Sz represents a hydrogen atom or a monovalent organic group; each of Ry and Rz represents a single bond or a divalent organic group; each of ring Ary and ring Arz represents a C4 to C20 cyclic alkyl group or a C6 to C30 aryl group, and ring Ary and ring Arz may be linked together to form a new ring structure therebetween; ny is an integer of 0 to the maximum number corresponding to allowable substitution to ring Ary; nz is an integer of 0 to the maximum number corresponding to allowable substitution to ring Arz; and * is a polymer bonding site).

Abstract: A cap includes a cap body including a disk-shaped top plate portion and a cylindrical skirt portion provided at a peripheral edge portion of the top plate portion; and a disk-shaped sealing member including a sliding layer and a seal in layer, the sliding layer disposed on the top plate portion side and having a thin portion thinner than at least a center side provided on an outer peripheral edge side, and the sealing layer provided on a main surface opposite to the top plate portion side of the sliding layer and sealing a mouth portion of a can container.

Abstract: A cap includes a cap includes a cap body including a disk-shaped top plate portion and a cylindrical skirt portion provided at a peripheral edge portion of the top plate portion; a sealing member provided separately from the cap body in the cap body so as to face the top plate portion, the sealing member having an outer diameter smaller than an inner diameter of the skirt portion; a bead portion provided in the skirt portion, restricting movement of the sealing member in a direction away from the top plate portion, supporting the sealing member, and protruding annularly inward in a radial direction of the skirt portion; and a slit portion provided in the bead portion.