Patents by Inventor Kenichi Sasaki

Kenichi Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240188252
    Abstract: An electronic device includes a supply refrigerant pipe that is connected to an opening end. The supply refrigerant pipe has a connection opening end that is directly connected to the opening end, a refrigerant pipe-side reduced diameter flow path in which flow path area decreases with increasing distance from the connection opening end, and a small diameter flow path connected to an end portion of the refrigerant pipe-side reduced diameter flow path on a side opposite to the connection opening end A main body case has, as parts of the refrigerant flow path, a case-side reduced diameter flow path in which flow path area decreases with increasing distance from the opening end, and a flat flow path formed in a shape flatter than the small diameter flow path and connected to an end portion of the case-side reduced diameter flow path on a side opposite to the opening end.
    Type: Application
    Filed: November 30, 2023
    Publication date: June 6, 2024
    Inventors: Daiki KUDO, Yoshiharu TANABE, Kohei NAKANO, Hiroyuki NAKADE, Kenichi SASAKI, Takahiro UNEME, Ryuta WAKABAYASHI
  • Patent number: 12001134
    Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The phase shift film contains it as a main component. A ratio of a maximum value of an intensity of a peak of diffracted light from the phase shift film in a 2?range of 35° to 45° to an average value of an intensity of the diffracted light in a 28 range of 55° to 60° measured using an XRD method with a CuK? ray, upon being irradiated with the EUV light with an incident angle of ?, is 1.0 or more and 30 or less. A refractive index and an extinction coefficient of the phase shift film to the EUV light are 0.925 or less, and 0.030 or more, respectively.
    Type: Grant
    Filed: November 22, 2023
    Date of Patent: June 4, 2024
    Assignee: AGC Inc.
    Inventors: Yuya Nagata, Daijiro Akagi, Kenichi Sasaki, Hiroaki Iwaoka
  • Publication number: 20240176224
    Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light, the substrate, the multilayer reflective film, the protection film, and the phase shift film being arranged in this order. The phase shift film contains at least one first element X1 selected from the first group consisting of ruthenium (Ru), iridium (Ir), platinum (Pt), palladium (Pd), and gold (Au), and at least one second element X2 selected from the second group consisting of oxygen (O), boron (B), carbon (C), and nitrogen (N). In the phase shift film, a chemical shift of a peak of 3d5/2 or a peak of 4f7/2 of the first element X1 observed by X-ray electron spectroscopy is less than 0.3 eV.
    Type: Application
    Filed: December 22, 2023
    Publication date: May 30, 2024
    Applicant: AGC Inc.
    Inventors: Daijiro AKAGI, Shunya TAKI, Takuma KATO, Ichiro ISHIKAWA, Kenichi SASAKI
  • Publication number: 20240160096
    Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The substrate, the multilayer reflective film, the protection film, and the phase shift film are arranged in this order. The phase shift film is made of an Ir-based material containing Ir as a main component, and the protection film is made of a Rh-based material containing Rh as a main component.
    Type: Application
    Filed: January 24, 2024
    Publication date: May 16, 2024
    Applicant: AGC Inc.
    Inventors: Yuya NAGATA, Daijiro AKAGI, Kenichi SASAKI, Hiroaki IWAOKA
  • Publication number: 20240152044
    Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a phase shift film that shifts a phase of the EUV light, in this order. An opening pattern is to be formed in the phase shift film. The phase shift film has a refractive index of 0.920 or less with respect to the EUV light, an extinction coefficient of 0.024 or more with respect to the EUV light, a thickness of 50 nm or less, a normalized image log slope of 2.9 or more for a transferred image when a line-and-space pattern is formed on a target substrate, and a tolerance range of a focal depth of the transferred image is 60 nm or less.
    Type: Application
    Filed: January 12, 2024
    Publication date: May 9, 2024
    Applicant: AGC Inc.
    Inventors: Daijiro AKAGI, Hiroaki IWAOKA, Shunya TAKI, Kenichi SASAKI, Ichiro ISHIKAWA, Toshiyuki UNO
  • Publication number: 20240094622
    Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The phase shift film contains Ir as a main component. A ratio of a maximum value of an intensity of a peak of diffracted light from the phase shift film in a 2? range of 35° to 45° to an average value of an intensity of the diffracted light in a 2? range of 55° to 60° measured using an XRD method with a CuK? ray, upon being irradiated with the EUV light with an incident angle of ?, is 1.0 or more and 30 or less. A refractive index and an extinction coefficient of the phase shift film to the EUV light are 0.925 or less, and 0.030 or more, respectively.
    Type: Application
    Filed: November 22, 2023
    Publication date: March 21, 2024
    Applicant: AGC Inc.
    Inventors: YUYA NAGATA, Daijiro Akagi, Kenichi Sasaki, Hiroaki Iwaoka
  • Patent number: 11914284
    Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light, the substrate, the multilayer reflective film, the protection film, and the phase shift film being arranged in this order. The phase shift film contains at least one first element X1 selected from the first group consisting of ruthenium (Ru), iridium (Ir), platinum (Pt), palladium (Pd), and gold (Au), and at least one second element X2 selected from the second group consisting of oxygen (O), boron (B), carbon (C), and nitrogen (N). In the phase shift film, a chemical shift of a peak of 3d5/2 or a peak of 4f7/2 of the first element X1 observed by X-ray electron spectroscopy is less than 0.3 eV.
    Type: Grant
    Filed: July 3, 2023
    Date of Patent: February 27, 2024
    Assignee: AGC Inc.
    Inventors: Daijiro Akagi, Shunya Taki, Takuma Kato, Ichiro Ishikawa, Kenichi Sasaki
  • Patent number: 11822229
    Abstract: A reflective mask blank for EUV lithography includes: a substrate; a multilayer reflective film for reflecting EUV light; and a phase shift film for shifting a phase of EUV light, the multilayer reflective film and the phase shift film formed on or above the substrate in this order. The phase shift film includes a layer 1 including ruthenium (Ru) and at least one selected from the group consisting of oxygen (O) and nitrogen (N). Among diffraction peaks derived from the phase shift film observed at 2?: from 20° to 50° by out-of-plane XRD method, a peak having the highest intensity has a half value width FWHM of 1.0° or more.
    Type: Grant
    Filed: July 22, 2021
    Date of Patent: November 21, 2023
    Assignee: AGC Inc.
    Inventors: Daijiro Akagi, Hirotomo Kawahara, Toshiyuki Uno, Ichiro Ishikawa, Kenichi Sasaki
  • Publication number: 20230350285
    Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light, the substrate, the multilayer reflective film, the protection film, and the phase shift film being arranged in this order. The phase shift film contains at least one first element X1 selected from the first group consisting of ruthenium (Ru), iridium (Ir), platinum (Pt), palladium (Pd), and gold (Au), and at least one second element X2 selected from the second group consisting of oxygen (O), boron (B), carbon (C), and nitrogen (N). In the phase shift film, a chemical shift of a peak of 3d5/2 or a peak of 4f7/2 of the first element X1 observed by X-ray electron spectroscopy is less than 0.3 eV.
    Type: Application
    Filed: July 3, 2023
    Publication date: November 2, 2023
    Applicant: AGC Inc.
    Inventors: Daijiro AKAGI, Shunya TAKI, Takuma KATO, Ichiro ISHIKAWA, Kenichi SASAKI
  • Patent number: 11760650
    Abstract: A compound includes indium element (In), gallium element (Ga), aluminum element (Al) and oxygen element (O), the compound having a triclinic crystal system with lattice constants being a=10.07±0.15 ?, b=10.45±0.15 ?, c=11.01±0.15 ?, ?=111.70±0.50°, ?=107.70±0.50° and ?=90.00±0.50°.
    Type: Grant
    Filed: August 1, 2019
    Date of Patent: September 19, 2023
    Assignee: IDEMITSU KOSAN CO.,LTD.
    Inventors: Kenichi Sasaki, Emi Kawashima, Kazuyoshi Inoue, Masatoshi Shibata, Atsushi Yao
  • Publication number: 20230288794
    Abstract: A reflective mask blank for EUV lithography, includes, in the following order, a substrate, a multilayer reflective film reflecting EUV light, a protective film for the multilayer reflective film, and an absorption layer absorbing EUV light, in which the protective film includes rhodium (Rh) or a rhodium material including Rh and at least one element selected from the group consisting of nitrogen (N), oxygen (O), carbon (C), boron (B), ruthenium (Ru), niobium (Nb), molybdenum (Mo), tantalum (Ta), iridium (Ir), palladium (Pd), zirconium (Zr), and titanium (Ti).
    Type: Application
    Filed: May 23, 2023
    Publication date: September 14, 2023
    Applicant: AGC Inc.
    Inventors: Daijiro AKAGI, Hirotomo KAWAHARA, Kenichi SASAKI, Ichiro ISHIKAWA, Toshiyuki UNO
  • Publication number: 20220396387
    Abstract: A collecting tool (1) includes a frame body (11) that is disposed so as to surround an opening end portion of a bag (100) storing waste (D1) inside, and on which a folded portion (100a) of the opening end portion of the bag (100) is hooked in a state where the opening end portion of the bag (100) is folded back outward, three wires (13), a clip (12) that is provided at one end portion of each of the three wires (13) in a longitudinal direction and clamps the frame body (11) and the opening end portion of the bag (100) together in a state where the folded portion (100a) of the bag (100) is hooked on the frame body (11), and a fixing portion (14) that supports the other end portions of each of the three wires (13) together and is fixed to a construction material.
    Type: Application
    Filed: November 7, 2020
    Publication date: December 15, 2022
    Applicant: GENBE CO., LTD.
    Inventor: Kenichi SASAKI
  • Publication number: 20220356118
    Abstract: An oxide sintered body may include zinc, magnesium, a positive trivalent or positive tetravalent metal element X, and oxygen as constituent elements. The atomic ratio of the metal element X to the sum of the zinc, the magnesium, and the metal element X [X/(Zn+Mg+X)] may be 0.0001 or more and 0.6 or less. The atomic ratio of the magnesium to the sum of the zinc and the magnesium [Mg/(Zn+Mg)] may be 0.25 or more and 0.8 or less.
    Type: Application
    Filed: June 24, 2020
    Publication date: November 10, 2022
    Applicant: IDEMITSU KOSAN CO.,LTD.
    Inventors: Shigekazu TOMAI, Yoshihiro UEOKA, Satoshi KATSUMATA, Kenichi SASAKI
  • Patent number: 11434172
    Abstract: A sintered body, containing zinc, magnesium and oxygen as constituent elements, wherein the atomic ratio of zinc to the sum of zinc and magnesium [Zn/(Zn+Mg)] is 0.20 to 0.75, the atomic ratio of magnesium to the sum of zinc and magnesium [Mg/(Zn+Mg)] is 0.25 to 0.80, and the sintered body consists of a single crystal structure as measured by X-ray diffraction.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: September 6, 2022
    Assignee: IDEMITSU KOSAN CO., LTD.
    Inventors: Shigekazu Tomai, Yoshihiro Ueoka, Satoshi Katsumata, Kenichi Sasaki, Masashi Oyama
  • Patent number: 11324147
    Abstract: A power conversion device includes a cooling structure capable of cooling down, by a coolant that flows through a first flow channel formed by a first wall portion and a second wall portion facing with each other, a first electronic component and a second electronic component mounted on an external surface of the first wall portion. The first wall portion is formed in a stepwise shape, and includes a first mount portion on which the first electronic component is mounted, a second mount portion which has a different height from the first mount portion, and on which the second electronic component is mounted, and a first connection portion that is extended between the first mount portion and the second mount portion.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: May 3, 2022
    Assignee: HITACHI ASTEMO, LTD.
    Inventors: Takeshi Kobayashi, Daiki Kudo, Masahiro Shimada, Kenichi Sasaki
  • Publication number: 20220035234
    Abstract: A reflective mask blank for EUV lithography includes: a substrate; a multilayer reflective film for reflecting EUV light; and a phase shift film for shifting a phase of EUV light, the multilayer reflective film and the phase shift film formed on or above the substrate in this order. The phase shift film includes a layer 1 including ruthenium (Ru) and at least one selected from the group consisting of oxygen (O) and nitrogen (N). Among diffraction peaks derived from the phase shift film observed at 2?: from 20° to 50° by out-of-plane XRD method, a peak having the highest intensity has a half value width FWHM of 1.0° or more.
    Type: Application
    Filed: July 22, 2021
    Publication date: February 3, 2022
    Applicant: AGC Inc.
    Inventors: Daijiro AKAGI, Hirotomo KAWAHARA, Toshiyuki UNO, Ichiro ISHIKAWA, Kenichi SASAKI
  • Publication number: 20220002205
    Abstract: A sintered body, containing zinc, magnesium and oxygen as constituent elements, wherein the atomic ratio of zinc to the sum of zinc and magnesium [Zn/(Zn+Mg)] is 0.20 to 0.75, the atomic ratio of magnesium to the sum of zinc and magnesium [Mg/(Zn+Mg)] is 0.25 to 0.80, and the sintered body consists of a single crystal structure as measured by X-ray diffraction.
    Type: Application
    Filed: October 30, 2019
    Publication date: January 6, 2022
    Applicant: IDEMITSU KOSAN CO.,LTD.
    Inventors: Shigekazu TOMAI, Yoshihiro UEOKA, Satoshi KATSUMATA, Kenichi SASAKI, Masashi OYAMA
  • Publication number: 20210343876
    Abstract: A crystalline structure compound A is represented by a composition formula (2) and has having diffraction peaks respectively in below-defined ranges (A) to (K) of an incidence angle observed by X-ray diffraction measurement. (InxGayAlz)2O3??(2) In the formula (2), 0.47?x?0.53, 0.17?y?0.43, 0.07?z?0.33, and x+y+z=1. 31° to 34° (A), 36° to 39° (B), 30° to 32° (C), 51° to 53° (D), 53° to 56° (E), 62° to 66° (F), 9° to 11° (G), 19° to 21° (H), 42° to 45° (I), 8° to 10° (J), and 17° to 19° (K).
    Type: Application
    Filed: August 1, 2019
    Publication date: November 4, 2021
    Applicant: IDEMITSU KOSAN CO.,LTD.
    Inventors: Kazuyoshi INOUE, Masatoshi SHIBATA, Emi KAWASHIMA, Kenichi SASAKI, Atsushi YAO
  • Publication number: 20210309535
    Abstract: A compound includes indium element (In), gallium element (Ga), aluminum element (Al) and oxygen element (O), the compound having a triclinic crystal system with lattice constants being a=10.07±0.15 ?, b=10.45±0.15 ?, c=11.01±0.15 ?, ?=111.70±0.50°, ?=107.70±0.50° and ?=90.00±0.50°.
    Type: Application
    Filed: August 1, 2019
    Publication date: October 7, 2021
    Applicant: IDEMITSU KOSAN CO.,LTD.
    Inventors: Kenichi SASAKI, Emi KAWASHIMA, Kazuyoshi INOUE, Masatoshi SHIBATA, Atsushi YAO
  • Patent number: 10991513
    Abstract: A composite electronic component includes: a first electronic component including a ceramic body having a main surface caused to face a circuit board at a time of mounting and first and second end surfaces orthogonal to the main surface, and a first external electrode and a second external electrode respectively provided to the first end surface and the second end surface and respectively extending from the first end surface and the second end surface to the main surface; and a second electronic component including a functional film provided to the main surface, and a first electrode film and a second electrode film provided to both end portions of the functional film separately from the first external electrode and the second external electrode, the second electronic component being configured to fit within a thickness of each of the first external electrode and the second external electrode from the main surface.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: April 27, 2021
    Assignee: Taiyo Yuden Co., Ltd.
    Inventors: Shin Aida, Kenichi Sasaki