Patents by Inventor Kenji Kameda

Kenji Kameda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090170328
    Abstract: The method according to the invention includes the steps of: purging an inside of the processing chamber with gas while applying a thermal impact onto the thin film deposited on the inside of the processing chamber by decreasing the temperature in the processing chamber, so as to forcibly generate a crack in the thin film and forcibly peel the adhered material with a weak adhesive force, in a state where the substrate is not present in the processing chamber; removing the thin film deposited on the inside of the processing chamber by supplying a fluorine-based gas to the inside of the processing chamber heated to a first temperature, in the state where the substrate is not present in the processing chamber; and removing an adhered material remaining on the inside of the processing chamber after removing the thin film by supplying a fluorine-based gas to the inside of the processing chamber heated to a second temperature, in the state where the substrate is not present in the processing chamber.
    Type: Application
    Filed: February 23, 2009
    Publication date: July 2, 2009
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Kenji Kameda, Jie Wang, Yuji Urano
  • Publication number: 20090149032
    Abstract: The present invention suppresses metallic contamination in a processing chamber and a breakage of a quartz member, while suppressing decrease in film formation rate in a thin film formation process immediately after dry cleaning of the inside of the processing chamber, and enhances the operation rate of a apparatus. The method according to the invention includes the steps of: removing the thin film on the inside of the processing chamber by supplying a fluorine gas solely or a fluorine gas diluted by an inert gas solely, as the cleaning gas, to the inside of the processing chamber heated to a first temperature; and removing an adhered material remaining on the inside of the processing chamber after removing the thin film by supplying a fluorine gas solely or a fluorine gas diluted by an inert gas solely, as the cleaning gas, to the inside of the processing chamber heated to a second temperature.
    Type: Application
    Filed: December 2, 2008
    Publication date: June 11, 2009
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Kenji Kameda, Jie Wang, Yuji Urano
  • Publication number: 20080268644
    Abstract: There are provided the steps of loading a substrate into a reaction vessel; forming a film on the substrate while supplying a film forming gas into the reaction vessel; unloading the substrate after film formation from the reaction vessel; supplying a cleaning gas into the reaction vessel while lowering a temperature in the reaction vessel and removing a deposit deposited on at least an inner wall of the reaction vessel in the film forming step.
    Type: Application
    Filed: February 5, 2008
    Publication date: October 30, 2008
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Kenji Kameda, Naonori Akae, Kenichi Suzaki, Yushin Takasawa, Sadao Nakashima
  • Patent number: 7177482
    Abstract: A boundary line detection apparatus and method and an image processing apparatus and method as well as a recording medium by which the jaggy in the proximity of a boundary line is removed without increasing the sampling rate to remove are disclosed. The differences between pixel values between a noticed pixel and pixels in the proximity of the noticed pixel are compared with each other to detect whether or not a boundary is present in the proximity of the noticed pixel. Then, a length, a direction, and a start point and an end portion of the boundary line are determined. Then, the distance between the noticed pixel and the boundary line is calculated, and the pixel value of the noticed pixel is weighted using the distance. Then, the pixel obtained by the weighting is outputted.
    Type: Grant
    Filed: December 11, 2000
    Date of Patent: February 13, 2007
    Assignee: Sony Corporation
    Inventors: Mitsuharu Ohki, Naosuke Asari, Kenji Kameda
  • Publication number: 20060284879
    Abstract: An animation generating apparatus for generating a three-dimensional animation tracking a moving object includes a camera parameter setting section setting a point of regard and a point of view based on a current position of the moving object using route data indicating a route of the moving object so that the point of regard is located on the route and the point of view is located behind the point of regard along the route, and a rendering processor generating an image by retrieving necessary rendering data from three-dimensional map data based on the point of regard and point of view set by the camera parameter setting section.
    Type: Application
    Filed: April 26, 2005
    Publication date: December 21, 2006
    Applicant: SONY CORPORATION
    Inventors: Hisanori Nagata, Kenji Kameda, Natsuo Koda
  • Publication number: 20060207630
    Abstract: An apparatus for cleaning a CVD apparatus that can efficiently remove a by-product such as SiO2 or Si3N4 stuck and deposited onto the surface of an internal wall, an electrode, or the like in a reaction chamber in a film forming process, and a method for cleaning a CVD apparatus. A control monitors luminous intensity data of an F radical in a reaction chamber by optical emission spectroscopy and compares the data with calibrated prestored luminous intensity data, and ends cleaning after a predetermined time passes from reaching a luminous intensity saturation point. Furthermore, concentration data of SiF4 in a gas discharged from the reaction chamber are monitored by a Fourier transform infrared spectrometry and compared with prestored concentration data of SiF4 to decide that the predetermined time has passed when a predetermined cleaning end point concentration is reached, thereby ending the cleaning.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 21, 2006
    Applicants: RESEARCH INST. OF INNOVATIVE TECH. FOR THE EARTH, National Inst. of Adv. Industrial Sci. and Tech
    Inventors: Katsuo Sakai, Kaoru Abe, Seiji Okura, Masaji Sakamura, Hitoshi Murata, Kenji Kameda, Etsuo Wani, Akira Sekiya
  • Publication number: 20060201533
    Abstract: There is provided a CVD apparatus capable of efficiently removing a by-product such as SiO2 or Si3N4 which is stuck and deposited onto the surface of an internal wall, an electrode or the like in a CVD chamber in a film forming process, and furthermore, executing cleaning having a small damage over an upper electrode and a counter electrode stage (a lower electrode) and manufacturing a thin film of high quality, and a CVD apparatus cleaning method using the same. In a CVD apparatus cleaning method of introducing a cleaning gas to carry out plasma cleaning over an inside of a CVD chamber after forming a deposited film on a surface of a substrate, a frequency of an RF to be applied to an RF electrode is switched into a first frequency to be applied for forming a film and a second frequency to be applied when executing the plasma cleaning.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 14, 2006
    Applicant: RESEARCH INST. OF INNOVATIVE TECH. FOR THE EARTH
    Inventors: Etsuo Wani, Katsuo Sakai, Seiji Okura, Masaji Sakamura, Kaoru Abe, Hitoshi Murata, Kenji Kameda
  • Publication number: 20060143266
    Abstract: A communication system adopts communication means having a small effective communication range for communication between mobile terminals and a server functioning as a cell station, so that each server is responsible for a small range only. In this manner, the communication system produces information about how servers are distributed on the network based on the geographic location of each server, thereby pre-delivering the information about such geographic locations and estimating how much and when data is to be delivered based on the positional relationship between servers and mobile terminals for load sharing.
    Type: Application
    Filed: February 2, 2006
    Publication date: June 29, 2006
    Applicant: Sony Corporation
    Inventors: Yasunori Ohto, Yuichi Ueda, Kenji Kameda
  • Patent number: 7047021
    Abstract: A communication system adopts communication means having a small effective communication range for communication between mobile terminals and a server functioning as a cell station, so that each server is responsible for a small range only. In this manner, the communication system produces information about how servers are distributed on the network based on the geographic location of each server, thereby pre-delivering the information about such geographic locations and estimating how much and when data is to be delivered based on the positional relationship between servers and mobile terminals for load sharing.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: May 16, 2006
    Assignee: Sony Corporation
    Inventors: Yasunori Ohto, Yuichi Ueda, Kenji Kameda
  • Publication number: 20050252451
    Abstract: It is an object to provide a cleaning method in a CVD apparatus capable of efficiently removing a by-product such as SiO2 or Si3N4 which is adhered to and deposited on the surfaces of an inner wall, an electrode and the like in a reaction chamber at a film forming step. Furthermore, it is an object to provide a cleaning method in which the amount of a cleaning gas to be discharged is very small, an influence on an environment such as global warming is also lessened and a cost can also be reduced. An energy is applied to a fluorine compound to react the fluorine compound, thereby generating a fluorine gas component and a component other than the fluorine gas component. Furthermore, the fluorine gas component and the component other than the fluorine gas component which are generated are separated from each other so that the fluorine gas component is separated and refined.
    Type: Application
    Filed: March 13, 2003
    Publication date: November 17, 2005
    Inventors: Tatsuro Beppu, Katsuo Sakai, Seiji Okura, Masaji Sakamura, Kaoru Abe, Hitoshi Murata, Etsuo Wani, Kenji Kameda, Yuki Mitsui, Yutaka Ohira, Taisuke Yonemura, Akira Sekiya
  • Publication number: 20050035883
    Abstract: Map display systems, map data processing apparatuses, map display apparatuses, and map display methods for general navigation systems are provided. A map data processing section categorizes original three-dimensional map data into scene graph data representing a data structure of a three-dimensional map using a tree structure and rendering data for rendering an object included in the three-dimensional map and processes the scene graph data and the rendering data. A map data display section specifies a display area by referring to the scene graph data and reads and displays the rendering data in accordance with the specified display area.
    Type: Application
    Filed: July 29, 2004
    Publication date: February 17, 2005
    Inventors: Kenji Kameda, Natsuo Koda, Junpei Ito, Hisanori Nagata
  • Publication number: 20040255854
    Abstract: It is an object to provide a cleaning method in a CVD apparatus capable of efficiently removing a by-product such as SiO2 or Si3N4 which is adhered to and deposited on the surfaces of an inner wall, an electrode and the like in a reaction chamber and the side wall of a piping of an exhaust path or the like at a film forming step, in which the amount of a cleaning gas to be discharged is very small, an influence on an environment such as global warming can also be lessened and a cost can also be reduced.
    Type: Application
    Filed: April 27, 2004
    Publication date: December 23, 2004
    Inventors: Katsuo Sakai, Seiji Okura, Masaji Sakamura, Kaoru Abe, Hitoshi Murata, Etsuo Wani, Kenji Kameda, Yuki Mitsui, Yutada Ohira, Taisuke Yonemura, Akira Sekiya
  • Publication number: 20040250775
    Abstract: It is an object to provide a cleaning method in a CVD apparatus capable of efficiently removing a by-product such as SiO2 or Si3N4 which is adhered to and deposited on the surfaces of an inner wall, an electrode and the like in a reaction chamber at a film forming step, in which the amount of a cleaning gas to be discharged is very small, an influence on an environment such as global warming is also lessened and a cost can also be reduced.
    Type: Application
    Filed: April 27, 2004
    Publication date: December 16, 2004
    Inventors: Katsuo Sakai, Seiji Okura, Masaji Sakamura, Kaoru Abe, Hitoshi Murata, Etsuo Wani, Kenji Kameda, Yuki Mitsui, Yutaka Ohira, Taisuke Yonemura, Akira Sekiya
  • Publication number: 20040137917
    Abstract: A communication system adopts communication means having a small effective communication range for communication between mobile terminals and a server functioning as a cell station, so that each server is responsible for a small range only. In this manner, the communication system produces information about how servers are distributed on the network based on the geographic location of each server, thereby pre-delivering the information about such geographic locations and estimating how much and when data is to be delivered based on the positional relationship between servers and mobile terminals for load sharing.
    Type: Application
    Filed: December 10, 2003
    Publication date: July 15, 2004
    Applicant: Sony Corporation
    Inventors: Yasunori Ohto, Yuichi Ueda, Kenji Kameda
  • Publication number: 20040116373
    Abstract: An object of the invention is to provide a substance that activates saccharide uptake in epidermal cells and is thus expected to be effective in promoting skin cell neogenesis and metabolism. The invention provides a promoter for saccharide uptake in epidermal keratinocytes which comprises a purine base or a salt thereof as an active ingredient. The present invention further provides a method of promoting saccharide uptake in epidermal keratinocytes, comprising applying a purine base or a salt thereof to the skin.
    Type: Application
    Filed: October 14, 2003
    Publication date: June 17, 2004
    Inventors: Hiromichi Okuda, Chie Morimoto, Kenji Kameda, Fumiki Harano
  • Publication number: 20010024519
    Abstract: A boundary line detection apparatus and method and an image processing apparatus and method as well as a recording medium by which the juggy in the proximity of a boundary line is removed without increasing the sampling rate to remove are disclosed. The differences between pixel values between a noticed pixel and pixels in the proximity of the noticed pixel are compared with each other to detect whether or not a boundary is present in the proximity of the noticed pixel. Then, a length, a direction, and a start point and an end portion of the boundary line are determined. Then, the distance between the noticed pixel and the boundary line is calculated, and the pixel value of the noticed pixel is weighted using the distance. Then, the pixel obtained by the weighting is outputted.
    Type: Application
    Filed: December 11, 2000
    Publication date: September 27, 2001
    Inventors: Mitsuharu Ohki, Naosuke Asari, Kenji Kameda