Patents by Inventor Ki-Hwan Kim
Ki-Hwan Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12290158Abstract: The present application relates to a decorative member including a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on one surface of the color developing layer, wherein the light absorbing layer includes a copper oxide (CuaOx).Type: GrantFiled: April 10, 2019Date of Patent: May 6, 2025Assignee: LG CHEM, LTD.Inventors: Yong Chan Kim, Ki Hwan Kim, Nansra Heo, Jeong Woo Shon, Pilsung Jo
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Publication number: 20250124577Abstract: Provided are a computerized image interpretation method and a device for analyzing a medical image. The image interpretation method may include receiving, at a processor, a medical image, and receiving report information including a healthcare worker's judgement result of the medical image. The method may also include generating, at the processor, result information representing correspondence between first lesion information, which is related to a lesion in the medical image acquired on the basis of the medical image, and second lesion information, which is related to a lesion in the medical image acquired on the basis of the report information, by applying the first lesion information and the second lesion information to a third analysis model. The method may further include outputting, at the processor, the result information.Type: ApplicationFiled: December 19, 2024Publication date: April 17, 2025Inventors: Nayoung JEONG, Ki Hwan KIM, Minhong JANG
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Publication number: 20250126711Abstract: A printed circuit board includes a substrate with first through-portion; a magnetic layer disposed in at least a portion of the first through-portion and having a second through-portion; an electronic component having at least a portion disposed in the second through-portion; a first wiring pattern disposed on an upper surface of the magnetic layer; a second wiring pattern disposed on a lower surface of the magnetic layer; and a first through-via having at least a portion surrounded by the magnetic layer, and including a first via pattern connecting the first and second wiring patterns to each other.Type: ApplicationFiled: June 3, 2024Publication date: April 17, 2025Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Seung Eun LEE, Jung Chul GONG, Ki Hwan KIM
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Publication number: 20250095592Abstract: A display device including a light-emitting element, and a first transistor connected between a driving voltage line and the light-emitting element, the first transistor including a first gate electrode and a second gate electrode that face each other, and an active layer between the first gate electrode and the second gate electrode. The display device further includes a first data line connected to the first gate electrode of the first transistor, a second data line connected to the second gate electrode of the first transistor, and a data driver connected to the first data line and the second data line. The data driver applies a first data voltage to the first data line and applies a second data voltage having a different magnitude from the first data voltage to the second data line. The magnitude of the second data voltage varies depending on the magnitude of the first data voltage.Type: ApplicationFiled: April 5, 2024Publication date: March 20, 2025Applicant: Samsung Display Co., LTD.Inventors: Jong Woo JIN, Ki Hwan KIM, Tae Young CHOI
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Patent number: 12245440Abstract: A semiconductor includes an active pattern with a lower pattern and sheet patterns spaced apart from the lower pattern in a first direction, a source/drain pattern on the lower pattern, the source/drain pattern being in contact with the sheet patterns, and gate structures on opposite sides of the source/drain pattern, the gate structures being spaced apart from each other along a second direction and including gate electrodes that surround the sheet patterns, wherein the source/drain pattern includes a first epitaxial region having at least one of antimony and bismuth, the first epitaxial region having a bottom part in contact with the lower pattern, but not with the sheet patterns, and a thickness of the bottom part increasing and decreasing away from the gate structures in the second direction, and a second epitaxial region on the first epitaxial region, the second epitaxial region including phosphorus.Type: GrantFiled: March 11, 2022Date of Patent: March 4, 2025Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Ki Hwan Kim, Jeong Ho Yoo, Cho Eun Lee, Yong Uk Jeon, Young Dae Cho
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Publication number: 20250071902Abstract: The present disclosure relates to a printed circuit board including: a glass layer; a plurality of blind cavities respectively penetrating through a portion of the glass layer from an upper surface or a lower surface of the glass layer; a plurality of passive elements respectively disposed in the plurality of blind cavities; and an insulating layer covering at least a portion of each of the glass layer and the plurality of passive elements and disposed in at least a portion of each of the plurality of blind cavities. At least two of the plurality of blind cavities have different depths.Type: ApplicationFiled: April 3, 2024Publication date: February 27, 2025Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Seung Eun LEE, Ki Hwan KIM
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Publication number: 20250071898Abstract: The present disclosure relates to a printed circuit board including: a first insulating layer; a first wiring layer disposed on the first insulating layer; a second wiring layer disposed on the first insulating layer; a second insulating layer disposed on the first insulating layer; a third wiring layer disposed on the second insulating layer; a first cavity penetrating through at least a portion of the first insulating layer; and a second cavity penetrating through at least a portion of the second insulating layer and connected to the first cavity. The first and second cavities have different wall surface inclinations, and a depth of the first cavity is smaller than a thickness of the first insulating layer and is greater than a thickness of each of the first and second wiring layers.Type: ApplicationFiled: March 18, 2024Publication date: February 27, 2025Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Seung Eun LEE, Ki Hwan KIM
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Publication number: 20250054966Abstract: A positive electrode includes a positive electrode active material, wherein the present invention relates to a positive electrode, in which adhesion between a positive electrode active material layer and a collector is excellent by controlling distribution of a binder in the positive electrode active material layer, and a lithium secondary battery including the same.Type: ApplicationFiled: January 20, 2023Publication date: February 13, 2025Inventors: Geun Sung Lee, Eun Jeong Lee, Sung Eun Park, Ki Hwan Kim, Eui Tae Kim
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Publication number: 20250048699Abstract: A semiconductor device includes a substrate including an active pattern, a channel pattern and a source/drain pattern on the active pattern wherein the channel pattern includes semiconductor patterns vertically stacked and spaced apart from each other, the plurality of semiconductor patterns including a first semiconductor pattern and a neighboring second semiconductor pattern, and a gate electrode on the semiconductor patterns. The gate electrode includes an inner electrode between the first and second semiconductor patterns. The source/drain pattern includes a buffer layer and a main layer on the buffer layer. An indent region is defined in a vertical cross section of the device by the main layer, the first and second semiconductor patterns, and the inner electrode. The buffer layer is in the indent region. The buffer layer does not extend onto sidewalls of the first and second semiconductor patterns.Type: ApplicationFiled: March 18, 2024Publication date: February 6, 2025Inventors: Ki Hwan KIM, Unki KIM, Chanyoung KIM, Jeongho YOO, Ingyu JANG, Sujin JUNG
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Publication number: 20250048696Abstract: A semiconductor device includes a substrate including an active pattern, a channel pattern on the active pattern, the channel pattern including a first semiconductor pattern, a second semiconductor pattern, and a third semiconductor pattern sequentially stacked and vertically spaced apart, a source/drain pattern on the active pattern, and a gate electrode on the first semiconductor pattern, the second semiconductor pattern, and the third semiconductor pattern, where the source/drain pattern includes a buffer layer and a main layer on the buffer layer, the main layer includes silicon that is doped with an impurity, an impurity concentration of the main layer is a first atomic fraction at a first level corresponding to the first semiconductor pattern, and the impurity concentration of the main layer is a second atomic fraction at a second level corresponding to the second semiconductor pattern.Type: ApplicationFiled: March 19, 2024Publication date: February 6, 2025Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: KI HWAN KIM, Unki Kim, Chanyoung Kim, Jeongho Yoo, Ingyu Jang, Sujin Jung
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Publication number: 20250022959Abstract: A semiconductor device includes an active region extending in a first direction on a substrate, channel layers on the active region and spaced apart vertically, a gate structure intersecting the active region and the channel layers, the gate structure extending in a second direction and surrounding the channel layers, and a source/drain region on the active region at a side of the gate structure, the source/drain region contacting the channel layers, the source/drain region including first epitaxial layers having a first composition and including first layers on side surfaces of the channel layers and a second layer on the active region at a lower end of the source/drain region, and a second epitaxial layer having a second composition different from the first composition, the second epitaxial layer being between the first epitaxial layers in the first direction and being between the first epitaxial layers vertically in a third direction.Type: ApplicationFiled: September 30, 2024Publication date: January 16, 2025Inventors: Sung Uk JANG, Young Dae CHO, Ki Hwan KIM, Su Jin JUNG
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Publication number: 20240413313Abstract: A positive electrode active material, a method of preparing the same, and a positive electrode and a lithium secondary battery including the same are provided. The positive electrode active material includes a particulate positive electrode active material and a coating layer formed on a surface of the particulate positive electrode active material, the coating layer including a phosphorus (P)-doped aluminum oxide, and the coating layer having a thickness of 0.1 nm to 2.0 nm.Type: ApplicationFiled: December 7, 2022Publication date: December 12, 2024Inventors: Eun Jeong LEE, Eui Tae KIM, Ki Hwan KIM
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Patent number: 12132113Abstract: A semiconductor device and a method for making a semiconductor device. The semiconductor device includes an active region on a substrate, channel layers on the active region and spaced apart vertically, a gate structure intersecting the active region and the channel layers, the gate structure surrounding the channel layers, and a source/drain region on the active region at a side of the gate structure, the source/drain region contacting the channel layers and including first epitaxial layers having a first composition and including first layers on side surfaces of the channel layers and a second layer on the active region at a lower end of the source/drain region, and a second epitaxial layer having a second composition different from the first composition, the second epitaxial layer being between the first epitaxial layers in the first direction and being between the first epitaxial layers vertically.Type: GrantFiled: June 1, 2023Date of Patent: October 29, 2024Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Sung Uk Jang, Young Dae Cho, Ki Hwan Kim, Su Jin Jung
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Publication number: 20240304817Abstract: The present application relates to an electrode comprising a current collector and an active material layer, which can provide an electrode capable of ensuring adhesion force between particles, and adhesion force between the active material layer and the current collector in high levels compared with a binder content in the active material layer. The present application can also provide a use of the electrode.Type: ApplicationFiled: January 28, 2022Publication date: September 12, 2024Inventors: Geun Sung LEE, Jin Woo PARK, Il Ha LEE, In Taek SONG, Ki Hwan KIM
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Publication number: 20240304816Abstract: The present application relates to an electrode comprising a current collector and an active material layer, which can provide an electrode capable of securing high levels of inter-particle adhesion force and adhesion force between the active material layer and the current collector relative to the binder content in the active material layer. Through this, it is also possible to provide a secondary battery having excellent performance, and the like, while having a high capacity.Type: ApplicationFiled: January 28, 2022Publication date: September 12, 2024Inventors: Geun Sung LEE, Il Ha LEE, In Taek SONG, Jin Woo PARK, Ki Hwan KIM, Ho Chan LEE, Yun Hye HAHM
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Patent number: 12075898Abstract: The present application relates to a decorative member including a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on one surface of the color developing layer, wherein the light absorbing layer includes a copper oxide (CuaOx).Type: GrantFiled: April 10, 2019Date of Patent: September 3, 2024Assignee: LG CHEM, LTD.Inventors: Yong Chan Kim, Ki Hwan Kim, Nansra Heo, Jeong Woo Shon, Pilsung Jo
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Publication number: 20240286117Abstract: The present invention relates to a method for preparing a carbon nanotube-producing catalyst using chemical vapor deposition method. Using the above preparation method, a uniform and thin coating layer can be formed even on the surface of a support having a high-specific-surface-area having a 3D structure, and high-quality and low-diameter carbon nanotubes can be produced using the catalyst prepared through this method.Type: ApplicationFiled: January 12, 2023Publication date: August 29, 2024Inventors: Eui Tae KIM, Eun Jeong LEE, Ki Hwan KIM, Eu Gene OH, Sung Eun PARK, Geun Sung LEE
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Publication number: 20240286116Abstract: The present invention relates to a catalyst for producing carbon nanotubes, a method for preparing the catalyst, and a method for producing carbon nanotubes using the catalyst which includes a support, and an active layer formed on a surface of the support, wherein the active layer contains CoO and Co3O4, and has, through XRD pattern measurement, one peak at 2?=35° to 38°, and one peak at 2?=41° to 44°, and a proportion of CoO among the CoO and Co3O4 is 55 at % or more. The catalyst according to the present invention can efficiently synthesize low-diameter carbon nanotubes.Type: ApplicationFiled: January 12, 2023Publication date: August 29, 2024Inventors: Eui Tae Kim, Eun Jeong Lee, Ki Hwan Kim, Eu Gene Oh, Sung Eun Park, Geun Sung Lee
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Publication number: 20240279066Abstract: The present invention relates to bundle-type carbon nanotubes having an average bundle thickness of 10 ?m or more, and a D50 of 10 ?m or more. The carbon nanotubes have excellent electrical conductivity and dispersibility and are particularly suitable for use as a conductive material.Type: ApplicationFiled: January 12, 2023Publication date: August 22, 2024Inventors: Geun Sung LEE, Eui Tae KIM, Eun Jeong LEE, Eu Gene OH, Sung Eun PARK, Ki Hwan KIM
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Patent number: 12053073Abstract: The present application relates to a decoration member including a pattern layer provided on one surface of the substrate and including a convex structure or a concave structure arranged two-dimensionally, and a method for preparing the decoration member.Type: GrantFiled: April 9, 2019Date of Patent: August 6, 2024Assignee: LG CHEM, LTD.Inventors: Pilsung Jo, Jin Suk Song, Sangcholl Han, Ki Hwan Kim, Yong Chan Kim, Nansra Heo, Jeong Woo Shon