Patents by Inventor Koichi Yoshida
Koichi Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210026699Abstract: An object is to provide an operation management apparatus, a method, and a program capable of automatically repairing a system. An operation management apparatus according to the present disclosure includes an acquisition unit configured to acquire an operation setting value S from a system and acquire an expected value E from a design information database storing design information of the system, the operation setting value S being a setting value for operating the system, the expected value E being a setting value that is obtained when the system is normally operated, and an updating unit configured to update, when the operation setting value S does not match the expected value E, the operation setting value S to the expected value E.Type: ApplicationFiled: September 6, 2018Publication date: January 28, 2021Applicant: NEC CORPORATIONInventor: Koichi YOSHIDA
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Patent number: 10870812Abstract: A surface protection composition which is hard to deform or flow even placed under environments of a large temperature change with an external physical load such as pressure, and which stably protects a metal surface. A terminal fitted electric wire coated with the composition. The surface protection composition contains a high-consistency material (A) containing a lubricant base oil and an amide compound, and a phosphorus composition (B). The phosphorus composition (B) contains a composition (b1) containing one or more compounds represented by the general formulae (1) and (2) and one or more metals and/or one or more amines. The phosphorus composition (B) also contains one or more compounds (b2) represented by the general formula (3).Type: GrantFiled: March 8, 2017Date of Patent: December 22, 2020Assignees: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, ENEOS CORPORATIONInventors: Naoyuki Oshiumi, Takehiro Hosokawa, Kohei Kobayashi, Tetsuya Nakamura, Tatsuya Hase, Yutaka Takata, Makoto Mizoguchi, Koichi Yoshida, Kenichi Komiya, Yuji Shitara, Kazuhiro Yagishita
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Publication number: 20200394123Abstract: An operation management server (20) includes: an associating unit (21) configured to associate an updated content of configuration information of a CMDB (30) with a test scenario corresponding to the updated content; a setting unit (22) configured to set a target system (40) according to the updated content of the configuration information of the CMDB (30); and a test executing unit (23) configured to execute a system test on the set target system (40) based on the test scenario associated with the updated content. This configuration provides an operation management server and a development operation support system capable of easily executing a system test, and a method and a program thereof.Type: ApplicationFiled: March 23, 2018Publication date: December 17, 2020Applicant: NEC CORPORATIONInventor: Koichi YOSHIDA
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Patent number: 10858609Abstract: An anticorrosive agent including: a high-consistency material having a lubricant base oil and an amide compound, a composition of a phosphorus compound comprising one or more compounds represented by the general formulae (1) and (2) and a metal, and at least one kind of resin selected from a rosin-based resin, a terpene resin, a terpene phenol resin, a phenol resin, a coumarone-indene resin, and a petroleum resin, wherein a mass ratio of the high-consistency material and the composition is within a range of 50:50 to 98:2, and a content of resin is 2 to 20 parts by mass with respect to 100 parts by mass of the total of the high-consistency material and the composition.Type: GrantFiled: December 21, 2016Date of Patent: December 8, 2020Assignees: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, ENEOS CORPORATIONInventors: Yutaka Takata, Takehiro Hosokawa, Tatsuya Hase, Naoyuki Oshiumi, Takuya Yamashita, Makoto Mizoguchi, Koichi Yoshida, Kenichi Komiya, Takashi Arai, Yuji Shitara, Kazuhiro Yagishita
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Publication number: 20200381371Abstract: A semiconductor device includes a base substrate, a detection device provided on the base substrate and including a detector, a first connector electrically connecting the base substrate and the detection device, and a resin package provided on the base substrate and embedded with the detection device and the first connector. The resin package includes an exposure hole exposing the detector of the detection device to the outside, and a concave-convex portion.Type: ApplicationFiled: August 20, 2020Publication date: December 3, 2020Inventors: Yoshihiro YOSHIDA, Koichi YOSHIDA
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Patent number: 10824775Abstract: Methods and apparatus provide for, at each of plural calculation timings, associating pieces of position information indicating the positions of objects in a virtual space at the calculation timing with leaves and creates a complete binary tree in which position information reflecting pieces of the position information of child nodes is associated with an internal node, and a node shuffling section that shuffles 2·2n (n?1) child nodes regarding each group of 2n nodes on the basis of the position information associated with each of the 2·2n child nodes belonging to the 2n nodes in each layer sequentially from the immediately-upper layer of the lowermost layer in the complete binary tree; and carrying out collision determination between objects by using the complete binary tree resulting from the shuffling by the node shuffling section.Type: GrantFiled: April 25, 2014Date of Patent: November 3, 2020Assignee: Sony Interactive Entertainment Inc.Inventors: Hitoshi Ishikawa, Hiroshi Matsuike, Koichi Yoshida
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Patent number: 10822524Abstract: The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions that comprise a mixture of (a) one or more alkoxylated diamines having a number average molecular weight (Mn) of from 1,000 to 20,000, or, preferably, from 1000-15000 and having four (poly)alkoxy ether groups each containing from 5 to 100 alkoxy repeat units; (b) from 0.01 to 2 wt. % or, preferably, from 0.1 to 1.5 wt. %, as solids, based on the total weight of the compositions, of one or more aqueous dispersions of elongated, bent or nodular colloidal silica particles, preferably, having a secondary particle size as determined by dynamic light scattering (DLS) of from 20 to 60 nm; and (c) ammonia or an amine base, wherein the compositions have a pH ranging from 9 to 11. The compositions are substantially free of metals, such as alkali or alkaline earth metals that can damage substrates in polishing.Type: GrantFiled: December 14, 2017Date of Patent: November 3, 2020Assignee: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, IInventors: Naresh Kumar Penta, Matthew Van Hanehem, Kwadwo E. Tettey, Koichi Yoshida, Kyohei Yoshida
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Publication number: 20200292422Abstract: A sensor device includes an element cover at the tip end of a housing, retaining a sensor element. An outer cover is provided with outer side holes, with the tip position of the outer side holes being farther toward the tip end than is the tip position of an inner cover, and a first flow passage having a gas flow direction that is at right angles to the axial direction is formed at the inner side of the outer cover. An inner side hole in the inner cover is open to a second flow passage provided between the side surfaces of the inner cover and the outer cover, and a detection surface of the sensor element is located on an extension line in an extension direction of a guide member which extends obliquely into the interior of the inner cover from the tip-position edge of the inner side hole.Type: ApplicationFiled: May 28, 2020Publication date: September 17, 2020Inventors: Yuto TAMEI, Takashi ARAKI, Hirofumi NODA, Takehito KIMATA, Koichi YOSHIDA
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Publication number: 20200014592Abstract: In a development operation support system, a development management server includes a recording unit configured to record configuration information and application time of applying the configuration information to a target system in a history-included CMDB, and a generating unit configured to generate configuration information corresponding to the application time as configuration information used for design at a subsequent design time. An operation management server includes a setting unit configured to set, at the recorded application time, configuration information corresponding to the application time in the target system, a collecting unit configured to collect setting information of a current target system from the set target system; and a confirming unit configured to confirm a match or a mismatch between the collected setting information and the configuration information corresponding to the recorded application time.Type: ApplicationFiled: March 22, 2018Publication date: January 9, 2020Applicant: NEC CORPORATIONInventor: Koichi YOSHIDA
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Patent number: 10422701Abstract: A temperature sensor includes a temperature detector, an element electrode wire, a lead wire, and an intermediate member. Each of the lead wire and the intermediate member is made of a Ni-based alloy or an Fe-based alloy. The element electrode wire and the intermediate member are welded together in such a manner that opposing surfaces, facing each other abut against each other to constitute an element-side weld. The intermediate member and the lead wire are welded together such that they overlap each other in a longitudinal direction Z to constitute a lead-side weld. The lead wire is extended closer to the temperature detector than the element-side weld is located. A gap between the element electrode wire and the lead wire at least in the longitudinal direction Z is filled with a filler. The element electrode wire, the element-side weld, and the lead wire are fixed to one another by the filler.Type: GrantFiled: April 1, 2016Date of Patent: September 24, 2019Assignee: DENSO CORPORATIONInventors: Toshiya Ozeki, Koichi Yoshida, Motoki Sato, Masaki Hironaka
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Publication number: 20190185714Abstract: The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions that comprise a mixture of (a) one or more alkoxylated diamines having a number average molecular weight (Mn) of from 1,000 to 20,000, or, preferably, from 1000-15000 and having four (poly)alkoxy ether groups each containing from 5 to 100 alkoxy repeat units; (b) from 0.01 to 2 wt. % or, preferably, from 0.1 to 1.5 wt. %, as solids, based on the total weight of the compositions, of one or more aqueous dispersions of elongated, bent or nodular colloidal silica particles, preferably, having a secondary particle size as determined by dynamic light scattering (DLS) of from 20 to 60 nm; and (c) ammonia or an amine base, wherein the compositions have a pH ranging from 9 to 11. The compositions are substantially free of metals, such as alkali or alkaline earth metals that can damage substrates in polishing.Type: ApplicationFiled: December 14, 2017Publication date: June 20, 2019Inventors: Naresh Kumar Penta, Matthew Van Hanehem, Kwadwo E. Tettey, Koichi Yoshida, Kyohei Yoshida
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Patent number: 10259099Abstract: The method forms a porous polyurethane polishing pad by coagulating thermoplastic polyurethane to create a porous matrix having large pores extending upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. Heating a press to temperature below or above the softening onset temperature of the thermoplastic polyurethane forms a series of pillows. Plastic deforming side walls of the pillow structures forms downwardly sloped side walls. The downwardly sloped side walls extend from all sides of the pillow structures. The large pores open to the downwardly sloped sidewalls are less vertical than the large pores open to the top polishing surface and are offset 10 to 60 degrees from the vertical direction.Type: GrantFiled: August 4, 2016Date of Patent: April 16, 2019Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang, George C. Jacob, Shuiyuan Luo
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Publication number: 20190106652Abstract: A surface protection composition stably protecting a metal surface even at a high temperature, and a terminal-fitted electric wire improved in anticorrosion property by using the composition. The surface protection composition contains a high-consistency material (A) containing a lubricant base oil and an amide compound, and a composition (B) containing a phosphorus compound containing one or more compounds represented by the general formulae (1) and (2) and a metal. The mass ratio (A):(B) of the high-consistency material (A) to the composition (B) is within a range of 50:50 to 98:2. The lubricant base oil has a kinematic viscosity of 10 mm2/s or higher at 100° C.Type: ApplicationFiled: March 8, 2017Publication date: April 11, 2019Applicants: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, JXTG NIPPON OIL & ENERGY CORPORATIONInventors: Yutaka TAKATA, Takehiro HOSOKAWA, Tatsuya HASE, Naoyuki OSHIUMI, Takuya YAMASHITA, Makoto MIZOGUCHI, Koichi YOSHIDA, Kenichi KOMIYA, Yuji SHITARA, Kazuhiro YAGISHITA
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Publication number: 20190093042Abstract: A surface protection composition which is hard to deform or flow even placed under environments of a large temperature change with an external physical load such as pressure, and which stably protects a metal surface. A terminal fitted electric wire coated with the composition. The surface protection composition contains a high-consistency material (A) containing a lubricant base oil and an amide compound, and a phosphorus composition (B). The phosphorus composition (B) contains a composition (b1) containing one or more compounds represented by the general formulae (1) and (2) and one or more metals and/or one or more amines. The phosphorus composition (B) also contains one or more compounds (b2) represented by the general formula (3).Type: ApplicationFiled: March 8, 2017Publication date: March 28, 2019Applicants: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, JXTG NIPPON OIL & ENERGY CORPORATIONInventors: Naoyuki OSHIUMI, Takehiro HOSOKAWA, Kohei KOBAYASHI, Tetsuya NAKAMURA, Tatsuya HASE, Yutaka TAKATA, Makoto MIZOGUCHI, Koichi YOSHIDA, Kenichi KOMIYA, Yuji SHITARA, Kazuhiro YAGISHITA
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Publication number: 20190048283Abstract: An anticorrosive agent stably protecting a metal surface with maintaining an anticorrosion property at a high temperature, and a terminal-fitted electric wire improved in anticorrosion property by using the agent. The anticorrosive agent contains a high-consistency material (A) containing a lubricant base oil and an amide compound, a composition (B) of a phosphorus compound containing one or more compounds represented by the general formulae (1) and (2) and a metal, and an azole (C). The mass ratio (A):(B) of the high-consistency material (A) and the composition (B) is within a range of 50:50 to 98:2. The content of the azole (C) is 0.5 to 20 parts by mass with respect to 100 parts by mass of the total of (A) and (B).Type: ApplicationFiled: September 14, 2016Publication date: February 14, 2019Inventors: Yutaka TAKATA, Takehiro HOSOKAWA, Tatsuya HASE, Naoyuki OSHIUMI, Makoto MIZOGUCHI, Koichi YOSHIDA, Kenichi KOMIYA, Takashi ARAI, Yuji SHITARA, Kazuhiro YAGISHITA
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Patent number: 10196529Abstract: A metal surface coating composition including a high-consistency material containing a lubricant base oil and an amide compound, and a composition of a phosphorus compound containing one or more compounds represented by the below formulae and a metal, wherein the ratio (a/b) of the number of amide groups (a) and the number of acidic groups (b) is within a range of 1.1 to 6.0: where X1 to X7 represent an oxygen atom or a sulfur atom, R11 to R13 represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms, wherein at least one of them is a hydrocarbon group having 1 to 30 carbon atoms, and R14 to R16 represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms wherein at least one of them is a hydrocarbon group having 1 to 30 carbon atoms.Type: GrantFiled: May 23, 2016Date of Patent: February 5, 2019Assignees: AutoNetworks Technologies, Ltd., Sumitomo Wiring Systems, Ltd., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, JXTG Nippon Oil & Energy CorporationInventors: Kazuo Nakashima, Takehiro Hosokawa, Tatsuya Hase, Hiroki Hirai, Junichi Ono, Takuji Ootsuka, Hideki Nomura, Kazuhiro Goto, Makoto Mizoguchi, Koichi Yoshida, Kenichi Komiya, Takashi Arai, Yuji Shitara, Kazuhiro Yagishita
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Patent number: 10174207Abstract: A metal surface coating composition and a terminal-fitted electric wire which is anti-corrosion treated with the composition are provided. The composition includes a high-consistency material containing a lubricant base oil and an amide compound, a composition of a phosphorus compound containing one or more compounds represented by the below formulae and a metal, and a nucleating agent: where X1 to X7 each represent an oxygen atom or a sulfur atom, R11 to R13 each represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms, among which at least one is a hydrocarbon group having 1 to 30 carbon atoms, and R14 to R16 each represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms among which at least one is a hydrocarbon group having 1 to 30 carbon atoms.Type: GrantFiled: May 23, 2016Date of Patent: January 8, 2019Assignees: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, JXTG NIPPON OIL & ENERGY CORPORATIONInventors: Kazuo Nakashima, Takehiro Hosokawa, Tatsuya Hase, Hiroki Hirai, Junichi Ono, Takuji Ootsuka, Hideki Nomura, Kazuhiro Goto, Makoto Mizoguchi, Koichi Yoshida, Kenichi Komiya, Takashi Arai, Yuji Shitara, Kazuhiro Yagishita
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Publication number: 20180362876Abstract: An anticorrosive agent including: a high-consistency material having a lubricant base oil and an amide compound, a composition of a phosphorus compound comprising one or more compounds represented by the general formulae (1) and (2) and a metal, and at least one kind of resin selected from a rosin-based resin, a terpene resin, a terpene phenol resin, a phenol resin, a coumarone-indene resin, and a petroleum resin, wherein a mass ratio of the high-consistency material and the composition is within a range of 50:50 to 98:2, and a content of resin is 2 to 20 parts by mass with respect to 100 parts by mass of the total of the high-consistency material and the composition.Type: ApplicationFiled: December 21, 2016Publication date: December 20, 2018Applicants: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, JXTG NIPPON OIL & ENERGY CORPORATIONInventors: Yutaka TAKATA, Takehiro HOSOKAWA, Tatsuya HASE, Naoyuki OSHIUMI, Takuya YAMASHITA, Makoto MIZOGUCHI, Koichi YOSHIDA, Kenichi KOMIYA, Takashi ARAI, Yuji SHITARA, Kazuhiro YAGISHITA
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Patent number: 10106662Abstract: The porous polyurethane polishing pad includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. The porous matrix is a blend of two thermoplastic polymers. The first thermoplastic polyurethane has by molecular percent, 45 to 60 adipic acid, 10 to 30 MDI-ethylene glycol and 15 to 35 MDI and an Mn of 40,000 to 60,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 2.5 to 4 The second thermoplastic polyurethane has by molecular percent, 40 to 50 adipic acid, 20 to 40 adipic acid butane diol, 5 to 20 MDI-ethylene glycol and 5 to 25 MDI and an Mn of 60,000 to 80,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 1.5 to 3.Type: GrantFiled: August 4, 2016Date of Patent: October 23, 2018Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Shuiyuan Luo, George C. Jacob, Henry Sanford-Crane, Koichi Yoshida, Katsumasa Kawabata, Shusuke Kitawaki, Shogo Takahashi, Yosuke Takei
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Patent number: 10089420Abstract: A simulation apparatus which simulates a position of each of plural objects, which move in a virtual space together with time, at each of plural time points of calculation. The apparatus includes: an object pair information acquisition unit acquiring plural pieces of information of object pairs each including, as components thereof, two objects which contact with each other at each of the plural time points of calculation; an allocation unit allocating, at each of the plural time points of calculation, each of the plural object pairs to one of plural groups such that two or more object pairs which include a common object do not belong to the same group; and a calculation unit calculating, at each of the plural time points of calculation, an influence of contact of two objects included in each of the plural object pairs upon positions of the two objects.Type: GrantFiled: December 9, 2014Date of Patent: October 2, 2018Assignee: Sony Interactive Entertainment Inc.Inventors: Hitoshi Ishikawa, Hiroshi Matsuike, Koichi Yoshida