Patents by Inventor Koji Miyata

Koji Miyata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7898137
    Abstract: A permanent magnet has a D-shaped cross section including an arcuate top surface (22), a flat bottom surface (24), and side surfaces (26, 28). Provided that a plurality of permanent magnets are circumferentially arranged so that a great circle (S) circumscribes the apexes (P) on the arcuate top surfaces (22), the top surface (22) includes a central region which delineates an arc of a small circle (T) off-centered from the great circle, and end regions (22a, 22b) which are positioned outside the small circle (T) and inside the great circle (S).
    Type: Grant
    Filed: August 29, 2007
    Date of Patent: March 1, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Koji Miyata
  • Publication number: 20100289350
    Abstract: A stator has a mechanism for effectively dissipating internally generated heat, and is for use in a high power axial gap type rotating machine. The stator comprises a coil holding member and a coil secured to the coil holding member, in which the coil holding member comprises a material having a thermal conductivity of not less than 5 W/mK that is measured compliant with the ASTM E1530 and having an electrical conductivity of not more than 1×105 S/m that is measured compliant with the ASTM E345. This stator preferably comprises a radiation fin, having a thermal conductivity of not less than 150 W/mK, and having a bumpy surface so as to increase the surface area thereof threefold or more, at the circumference of the coil holding member.
    Type: Application
    Filed: May 6, 2010
    Publication date: November 18, 2010
    Inventors: Naoki Watanabe, Koji Miyata, Minori Miyata, Atsushi Miyata
  • Publication number: 20100277025
    Abstract: A method for assembling rotors which is applicable to a large axial gap type permanent magnet rotating machine is provided. A permanent magnet rotating machine comprising: a rotating shaft; at least two rotors comprising a table-like structure and permanent magnets attached thereto, the table-like structures being connected to the rotating shaft and being disposed in an axial direction of the rotating shaft; and a stator comprising a table-like structure and stator coils around which a copper wire is wound, said stator being disposed in a gap formed by the rotors so that the stator being separated from the rotating shaft, is manufactured by the following steps of: assembling the two rotors such that a predetermined gap is formed therebetween; and mounting the magnets on the table-like structures by inserting the magnet from the radially outer side of the table-like structures towards the center of the rotation with the assembled state being maintained.
    Type: Application
    Filed: October 29, 2009
    Publication date: November 4, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuhito DOI, Hideki KOBAYASHI, Takehisa MINOWA, Koji MIYATA, Minori Miyata, Atsushi Miyata
  • Patent number: 7815815
    Abstract: A surface processing method includes supporting a wafer in a vacuum chamber and generating a plasma in a confined portion of the chamber over only a selected portion of the wafer to thereby perform a surface processing treatment (e.g., an ashing process) on the selected portion of the wafer. While the plasma is being generated, the wafer and the confined portion of the chamber are displaced with respect to one another to thereby perform the surface processing treatment on a second selected portion of the wafer.
    Type: Grant
    Filed: August 1, 2006
    Date of Patent: October 19, 2010
    Assignees: Sony Corporation, Sony Electronics Inc.
    Inventor: Koji Miyata
  • Publication number: 20100253085
    Abstract: There is provided a permanent magnet rotating machine applicable to a power generating facility such as a wind power generating facility, which facilitates the increase of the capacity in an axial gap rotating machine, and affords the high space efficiency. The permanent magnet rotating machine 1 includes a rotating shaft; two end rotors capable of rotating integrally with the rotating shaft, and being arranged with a space being provided therebetween in the axial direction of the rotating shaft. The rotating shift includes at least one inner rotor capable of rotating integrally with the rotating shaft, and being arranged in the space formed by the two end rotors so as to be separate from the two end rotors, and at least two stators isolated from the rotation of the rotating shaft, and being arranged in the spaces formed by the end rotors and the inner rotor.
    Type: Application
    Filed: September 10, 2008
    Publication date: October 7, 2010
    Inventors: Takehisa Minowa, Yuhito Doi, Koji Miyata, Minori Miyata, Atsushi Miyata, Hideki Kobayashi
  • Publication number: 20100253173
    Abstract: A high-output and highly efficient axial gap type rotating machine capable of reducing an eddy current generated in a winding wire and supplying a larger current is provided.
    Type: Application
    Filed: September 10, 2008
    Publication date: October 7, 2010
    Inventors: Koji Miyata, Minori Miyata, Atsushi Miyata, Hideki Kobayashi, Naoki Watanabe, Takehisa Minowa
  • Publication number: 20100223635
    Abstract: It is an object of the present invention to provide a slot-in type disk apparatus in which a moving position of a disk is precisely guided when the disk is inserted or discharged, thereby preventing the disk from coming into contact with an objective lens and further reducing the thickness of the disk apparatus.
    Type: Application
    Filed: November 13, 2006
    Publication date: September 2, 2010
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Koji Miyata, Shinichi Wada
  • Publication number: 20100223636
    Abstract: It is an object of the present invention to provide a slot-in type disk apparatus which can be reduced in thickness without deteriorating strength of a lever and a rear base. In a slot-in type disk apparatus, a base body 10 and a lid 20 constitute a chassis sheath, a disk-insertion opening 11 into which a disk is directly inserted is formed in a front surface of the chassis sheath, a traverse base 30 is disposed on the side of a front surface of the base body 10, a rear base 13 is disposed on the side of a rear surface of the base body 10, a printed board 14 is provided between the rear base 13 and the base body 10, and a link arm 105 is disposed between the rear base 13 and the printed board 14.
    Type: Application
    Filed: November 13, 2006
    Publication date: September 2, 2010
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventor: Koji Miyata
  • Publication number: 20100148311
    Abstract: Patterns provided on a surface of a substrate include an adhesion area pattern and one or more non-adhesion area patterns. A chip electrode on a backside of a semiconductor chip is attached to the adhesion area pattern by a conductive adhesive. Consequently, an area of patterns subjected to gold plating that is stable in a steady state is smaller in a substrate of the present invention than in a conventional substrate, resulting in reduction in costs. Further, the chip electrode is attached to the adhesion area pattern by a conductive adhesive in a liquid form. Consequently, a semiconductor device of the present invention allows reducing use of an expensive conductive adhesive compared with a conventional semiconductor device, resulting in reduction in costs.
    Type: Application
    Filed: December 10, 2009
    Publication date: June 17, 2010
    Inventors: Koji MIYATA, Hiroyuki Nakanishi, Masahiro Okita, Kazuaki Tatsumi, Masato Yokobayashi
  • Publication number: 20100096699
    Abstract: A method of fabricating a semiconductor device begins by forming a lower interconnection dielectric on a substrate and forming at least one active or passive device in the lower interconnection dielectric. An etch stop layer is formed on the lower interconnection dielectric and an interconnect stack layer is formed on the etch stop layer. At least one interconnect trench structure and at least one crack stop trench are etched in the interconnect stack layer while maintaining electrical isolation between the interconnect structure and the crack stop trench.
    Type: Application
    Filed: December 22, 2009
    Publication date: April 22, 2010
    Applicants: SONY CORPORATION, SONY ELECTRONICS INC.
    Inventor: Koji Miyata
  • Publication number: 20100072850
    Abstract: An axial gap type rotating machine rigidly fixing the permanent magnets without reducing the magnetic flux and having a high output is provided.
    Type: Application
    Filed: June 27, 2008
    Publication date: March 25, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji Miyata, Naoki Watanabe, Masakatsu Honshima
  • Patent number: 7635650
    Abstract: A method of fabricating a semiconductor device begins by forming a lower interconnection dielectric on a substrate and forming at least one active or passive device in the lower interconnection dielectric. An etch stop layer is formed on the lower interconnection dielectric and an interconnect stack layer is formed on the etch stop layer. At least one interconnect trench structure and at least one crack stop trench are etched in the interconnect stack layer while maintaining electrical isolation between the interconnect structure and the crack stop trench.
    Type: Grant
    Filed: April 14, 2006
    Date of Patent: December 22, 2009
    Assignees: Sony Corporation, Sony Electronics Inc.
    Inventor: Koji Miyata
  • Publication number: 20090297114
    Abstract: The present invention is directed to provide a signal discriminating device realizing signal discrimination which enables a more appropriate signal process to be performed according to a signal source and a state of an input video signal. The signal discriminating device includes: a comparing section comparing a motion magnitude between two fields of an input video signal with one or more predetermined motion magnitude patterns which are provided in correspondence with one or more signal sources, so as to determine one or more degrees of match or mismatch between the motion magnitude and the motion magnitude patterns; and a discriminating section discriminating a signal source of the input video signal in consideration of the degree of certainty or uncertainty of discrimination, the degree of certainty or uncertainty being determined on the basis of the degrees of match or mismatch determined in the comparing section.
    Type: Application
    Filed: May 12, 2009
    Publication date: December 3, 2009
    Applicant: Sony Corporation
    Inventors: Koji Miyata, Nobuyuki Sudou
  • Publication number: 20090282427
    Abstract: It is an object of the present invention to provide a slot-in type disk apparatus which can be reduced in thickness by precisely guiding a moving position of a disk when the disk is inserted and discharged. The slot-in type disk apparatus in which a base body 10 and a lid constitute a chassis sheath, a disk-insertion opening 11 into which a disk is directly inserted is formed in a front surface of the chassis sheath, a traverse base 30 is disposed on the side of a front surface of the base body 10, a spindle motor held by the traverse base 30 is disposed at a central portion of the base body 10, the traverse base 30 is provided with a traverse base cover 30A, a discharge lever 100 can move in a portion on the traverse base cover 30A, and a movable-side end of the discharge lever 100 is provided with a guide which holds a disk, and a height of the discharge lever 100 with respect to the traverse base cover 30A is set by contact between the discharge lever 100 and the turntable 31B.
    Type: Application
    Filed: November 13, 2006
    Publication date: November 12, 2009
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventor: Koji Miyata
  • Publication number: 20090243015
    Abstract: A method for manufacturing a semiconductor device, includes the steps of: forming a resin layer on an upper surface of a substrate including a photodiode such that the resin layer does not cover a light receiving region of the photodiode; forming at least one groove in the resin layer so as to surround the light receiving region; and subsequently mold-sealing the photodiode by loading the substrate into a mold and filling the mold with a molding resin.
    Type: Application
    Filed: March 5, 2009
    Publication date: October 1, 2009
    Applicant: Sony Corporation
    Inventors: Shuji Yoneda, Masato Oishi, Tamotsu Shinohara, Shinji Watanabe, Koji Miyata, Seiji Fukae, Kenji Yamauchi, Yoichi Goto, Masakazu Baba
  • Patent number: 7559996
    Abstract: A rare earth permanent magnet is prepared from a sintered magnet body of a R1—Fe—B composition wherein R1 is a rare earth element inclusive of Y and Sc, by forming a plurality of slits in a surface of the magnet body, disposing a powder on the magnet body surface, the powder comprising an oxide of R2, a fluoride of R3, or an oxyfluoride of R4 wherein each of R2, R3, and R4 is a rare earth element, and heat treating the magnet body and the powder below the sintering temperature in vacuum or in an inert gas.
    Type: Grant
    Filed: July 20, 2006
    Date of Patent: July 14, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Miyata, Koichi Hirota, Hajime Nakamura, Takehisa Minowa
  • Patent number: 7531933
    Abstract: In a rotating machine comprising a rotor including a rotor core and a plurality of permanent magnet segments, and a stator including a stator core and windings, the permanent magnet segment is obtained by disposing a powder comprising an R2 oxide, R3 fluoride or R4 oxyfluoride on a sintered magnet body of R1—Fe—B composition, wherein R1 to R4 are rare earth elements, and heat treating the powder-covered magnet body. The permanent magnet segment of a cross-sectional shape which is tapered from the center toward opposed ends has a higher coercive force at the ends than at the center.
    Type: Grant
    Filed: August 29, 2007
    Date of Patent: May 12, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Miyata, Hajime Nakamura, Koichi Hirota, Takehisa Minowa
  • Patent number: 7438783
    Abstract: Disclosed is a plasma processing apparatus and a plasma processing method. A substrate to be processed is accommodated in a vacuum chamber within which a plasma generator is provided so as to generate plasma for use in performing plasma processing on the substrate. Outside the vacuum chamber provided is a magnetic field generator for generating a multi-pole magnetic field at the periphery of the substrate. The magnetic field generator comprises an inner ring-shaped magnetic field generating portion and an outer ring-shaped magnetic field generating portion, both of which are provided outside the vacuum chamber in a concentric relationship with the vacuum chamber and are independently rotatable with each other.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: October 21, 2008
    Assignees: Shin-Etsu Chemical Co., Ltd., Tokyo Electron Limited
    Inventors: Koji Miyata, Tetsuji Sato
  • Patent number: RE40748
    Abstract: A process for producing a semiconductor device for forming a highly reliable wiring structure is provided that solves the problem occurring on using a xerogel or a fluorine resin in an inter level dielectric between the wirings to decrease a wiring capacitance, and the problem occurring on misalignment. A process for producing a semiconductor device comprising an inter level dielectric containing a xerogel film or a fluorine resin film comprises a step of forming, on the inter level dielectric comprising a lower layer of the inter level dielectric formed with an organic film and an upper layer of the inter level dielectric formed with a xerogel film or a fluorine resin film, a first mask to be an etching mask for forming a via contact hole by etching the inter level dielectric, and a step of forming, on the first mask, a second mask, which comprises a different material from the first mask, to be an etching mask for forming a wiring groove by etching the inter level dielectric.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: June 16, 2009
    Assignee: Sony Corporation
    Inventors: Toshiaki Hasegawa, Mitsuru Taguchi, Koji Miyata
  • Patent number: D598450
    Type: Grant
    Filed: February 4, 2009
    Date of Patent: August 18, 2009
    Assignee: Panasonic Corporation
    Inventors: Akira Onoda, Koji Miyata, Koya Kurokawa