Patents by Inventor Kunio Watanabe

Kunio Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluorinated adamantane derivatives
    Publication number: 20050277785
    Abstract: The present invention provides novel compounds which are useful for the production of fluorinated adamantane derivatives excellent in etching resistance and useful as photolithographic material and so on.
    Type: Application
    Filed: June 3, 2005
    Publication date: December 15, 2005
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Takashi Okazoe, Kunio Watanabe, Masahiro Ito, Eisuke Murotani
  • Process for producing fluorinated ketone
    Patent number: 6969776
    Abstract: The present invention provides a process whereby fluorinated ketones of various structures can be produced by short process steps and which is useful as an industrial production process.
    Type: Grant
    Filed: June 17, 2004
    Date of Patent: November 29, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Masahiro Ito, Daisuke Shirakawa, Shin Tatematsu, Hirokazu Takagi
  • PROCESS FOR PRODUCING A FLUORINATED ESTER, A FLUORINATED ACYL FLUORIDE AND A FLUORINATED VINYL ETHER
    Publication number: 20050261516
    Abstract: A process for producing a fluorinated ester through a small number of steps, is presented. The process for producing a fluorinated ester, comprises a transesterification step in which RAF—COOCF2—RAF and RA—CH2OH are subjected to a transesterification reaction to obtain RAF—COOCH2—RA, and a fluorination step in which the obtained compound is fluorinated to obtain a reaction product containing RAF—COOCF2—RAF. Here, in the formulae, RA is a monovalent organic group, and RAF is the same group as RA or a monovalent organic group obtained by fluorination of RA.
    Type: Application
    Filed: July 16, 2003
    Publication date: November 24, 2005
    Applicant: ASAHI GLASS COMPANY
    Inventors: Takashi Okazoe, Kunio Watanabe, Shin Tatematsu, Hidenobu Murofushi, Masakuni Sato, Masahiro Ito, Koichi Yanase, Yasuhiro Suzuki
  • Method for producing a fluorine-containing compound
    Patent number: 6956138
    Abstract: The present invention provides a method for obtaining a compound useful as a raw material for various fluororesins in high yield by a short process by using a starting material which is inexpensive and readily available.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: October 18, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Shin Tatematsu, Masahiro Ito, Daisuke Shirakawa, Masao Iwaya, Hidekazu Okamoto
  • Process for producing a fluorine-containing compound by liquid phase fluorination
    Patent number: 6951957
    Abstract: The invention provides a process for producing a fluorine-containing compound from an inexpensive material. Namely, Compound I such as RACH2OH is reacted with Compound II such as XCORB to form Compound III such as RACH2OCORB, followed by fluorination in a liquid phase to form Compound IV such as RAFCF2OCORBF, which is converted to Compound V such as RAFCOF and/or Compound VI such as RBFCOF. RA is an alkyl group or the like, RB is a perhalogenoalkyl group or the like, RAF and RBF are fluorinated RA and RB, and X is halogen.
    Type: Grant
    Filed: April 24, 2003
    Date of Patent: October 4, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Shin Tatematsu, Hidenobu Murofushi
  • Phase shift mask and method of manufacturing phase shift mask
    Publication number: 20050202323
    Abstract: A phase shift mask comprises a transparent substrate and a light shielding film. The transparent substrate has two regions that transmit exposure light. The exposure light transmitted through one region having a phase that is inverted in a recessed portion formed in the other region. The light shielding film shields the exposure light. The light shielding film is formed on the transparent substrate with a plurality of film thicknesses and has an edge that does not hang over the recessed portion.
    Type: Application
    Filed: December 28, 2004
    Publication date: September 15, 2005
    Applicant: Semiconductor Leading Edge Technologies, Inc.
    Inventor: Kunio Watanabe
  • Method for producing a fluorinated ester compound
    Publication number: 20050192456
    Abstract: The present invention provides a method for producing industrially useful fluorine-containing compounds such as a fluorinated ester compound and an acid fluoride compound. Namely, the present invention resides in a method for producing a fluorinated ester compound, which comprises fluorinating an ester compound which is an ester of a compound having hydroxyl group(s) with a compound having acyl fluoride group(s) and which has a structure which can be fluorinated, in a liquid phase to produce a fluorinated ester compound, wherein the fluorination is carried out in the form of a liquid mixture of the ester compound and the compound having acyl fluoride group(s).
    Type: Application
    Filed: April 14, 2005
    Publication date: September 1, 2005
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Takashi Okazoe, Kunio Watanabe, Shin Tatematsu, Koichi Yanase, Yasuhiro Suzuki, Daisuke Shirakawa
  • Fluorinated diene compound and fluoropolymer, and methods for their production
    Publication number: 20050182217
    Abstract: A novel fluoropolymer which can be an optical resin material having a low refractive index and excellent heat resistance, and a novel fluorinated diene compound having two unsaturated bonds, capable of presenting such a fluoropolymer, are presented. Further, by virtue of the low refractive index and excellent heat resistance, the polymer presents a high performance optical transmitter and a plastic optical fiber. A fluorinated diene compound represented by CF2?CFCF(ORf)CF2OCF?CF2 (wherein Rf is a perfluoroalkyl group such as a trifluoromethyl group), and a fluoropolymer thereof. Further, an optical transmitter made by using such a fluoropolymer, and a plastic optical fiber having a core comprising such a fluoropolymer and a fluorinated low molecular compound contained therein as a refractive index-increasing agent.
    Type: Application
    Filed: March 15, 2005
    Publication date: August 18, 2005
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Kimiaki Kashiwagi, Gen Ogawa, Takashi Okazoe, Kunio Watanabe, Eisuke Murotani, Kazuya Oharu
  • Processes for the preparation of fluorinated acyl fluorides and fluorinated vinyl ethers
    Patent number: 6919480
    Abstract: The present invention provides novel processes for preparing a fluorinated acyl fluoride and a fluorinated vinyl ether.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: July 19, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Masahiro Ito, Daisuke Shirakawa, Shin Tatematsu
  • Fluorinated diene compound and fluoropolymer, and methods for their production
    Patent number: 6911513
    Abstract: A novel fluoropolymer which can be an optical resin material having a low refractive index and excellent heat resistance, and a novel fluorinated diene compound having two unsaturated bonds, capable of presenting such a fluoropolymer, are presented. Further, by virtue of the low refractive index and excellent heat resistance, the polymer presents a high performance optical transmitter and a plastic optical fiber. A fluorinated diene compound represented by CF2?CFCF(ORf)CF2OCF?CF2 (wherein Rf is a perfluoroalkyl group such as a trifluoromethyl group), and a fluoropolymer thereof. Further, an optical transmitter made by using such a fluoropolymer, and a plastic optical fiber having a core comprising such a fluoropolymer and a fluorinated low molecular weight compound contained therein as a refractive index-increasing agent.
    Type: Grant
    Filed: April 29, 2004
    Date of Patent: June 28, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Kimiaki Kashiwagi, Gen Ogawa, Takashi Okazoe, Kunio Watanabe, Eisuke Murotani, Kazuya Oharu
  • Pattern transfer method using a mask and half tone mask
    Patent number: 6902852
    Abstract: A half tone mask of the present invention is provided with a half tone film in which a thickness of the half tone film in a dense pattern area where optical proximity effect occurs differs from that in an isolated pattern area where the optical proximity effect does not occur, the thickness of the half tone film in the isolated pattern area being adjusted so that difference in size of a resist does not occur between the dense pattern area and the isolated pattern area due to the optical proximity effect, thus preventing the difference in size of the resist between the dense pattern area and the isolated pattern area, even when providing high definition patterns which causes the optical proximity effect.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: June 7, 2005
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Kunio Watanabe
  • Method for producing a fluorine-containing compound
    Patent number: 6894187
    Abstract: The present invention provides a method for obtaining a compound useful as a raw material for various fluororesins in high yield by a short process by using a starting material which is inexpensive and readily available.
    Type: Grant
    Filed: January 13, 2003
    Date of Patent: May 17, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Shin Tatematsu, Masahiro Ito, Daisuke Shirakawa, Masao Iwaya, Hidekazu Okamoto
  • Semiconductor devices including fuses and dummy fuses
    Patent number: 6876057
    Abstract: A semiconductor device may include a fuse section 100 having a layer in which a plurality of fuses 26 that are fusible by irradiation of an energy beam are formed, and a circuit wiring layer 200 formed in the fuse section 100. The circuit wiring layer 200 is disposed in a layer below the layer in which the fuses 26 are formed, and is not connected to the fuses 26.
    Type: Grant
    Filed: September 13, 2002
    Date of Patent: April 5, 2005
    Assignee: Seiko Epson Corporation
    Inventor: Kunio Watanabe
  • Semiconductor device having a protruded active region, memory system having the same, and electronic apparatus having the same
    Patent number: 6864541
    Abstract: A semiconductor device is provided with an SRAM memory cell. The semiconductor device includes a first gate-gate electrode layer, a second gate-gate electrode layer, a first drain-drain wiring layer, a second drain-drain wiring layer, a first drain-gate wiring layer and second drain-gate wiring layers. The first drain-gate wiring layer and an upper layer and a lower layer of the second drain-gate wiring layer are located in different layers, respectively. A first protruded active region is provided in a manner to protrude from an end portion of the first active region.
    Type: Grant
    Filed: February 8, 2002
    Date of Patent: March 8, 2005
    Assignee: Seiko Epson Corporation
    Inventors: Junichi Karasawa, Kunio Watanabe
  • Process for producing fluorinated polyvalent carbonyl compound
    Patent number: 6858752
    Abstract: A fluorinated polyvalent carbonyl compound is produced by an economically advantageous method from inexpensive materials without requiring a complicated synthetic process step. Namely, the present invention comprises reacting a polyvalent alcohol having at least two kinds of alcohol skeletons selected among a primary alcohol, a secondary alcohol and a tertiary alcohol, with an acid halide to obtain a polyvalent ester compound, fluorinating it in a liquid phase to obtain a perfluorinated polyvalent ester compound, and cleaving the ester bonds derived from primary and secondary alcohols in the perfluoropolyvalent ester compound to obtain a fluorinated polyvalent carbonyl compound.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: February 22, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Daisuke Shirakawa, Masahiro Ito, Shin Tatematsu
  • Process for producing a fluorine-containing compound by liquid phase fluorination
    Publication number: 20050020855
    Abstract: The invention provides a process for producing a fluorine-containing compound from an inexpensive material. Namely, Compound I such as RACH2OH is reacted with Compound II such as XCORB to form Compound III such as RACH2OCORB, followed by fluorination in a liquid phase to form Compound IV such as RAFCF2OCORBF, which is converted to Compound V such as RAFCOF and/or Compound VI such as RBFCOF. RA is an alkyl group or the like, RB is a perhalogenoalkyl group or the like, RAF and RBF are fluorinated RA and RB, and X is halogen.
    Type: Application
    Filed: August 11, 2004
    Publication date: January 27, 2005
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Takashi Okazoe, Kunio Watanabe, Shin Tatematsu, Hidenobu Murofushi
  • Process for producing fluorinated ketone
    Publication number: 20040267053
    Abstract: The present invention provides a process whereby fluorinated ketones of various structures can be produced by short process steps and which is useful as an industrial production process.
    Type: Application
    Filed: June 17, 2004
    Publication date: December 30, 2004
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Takashi Okazoe, Kunio Watanabe, Masahiro Ito, Daisuke Shirakawa, Shin Tatematsu, Hirokazu Takagi
  • Process for producing a vic-dichloro acid fluoride
    Patent number: 6833477
    Abstract: The process for producing a vic-dichloro acid fluoride compound in a short process and in good yield from the starting material which is inexpensive and readily available is provided. (RH1—EH1—)CRH2RH3CH2—OCORHB (I) is fluorinated in a liquid phase to form (CF2ClCFCl—EFF1—) CRF2RF3CF2—OCORFB (II), and then, an ester bond of the compound (II) is decomposed to form (CF2ClCFCl—EF1—)CRF2RF3COF(III) or the compound (III) and FCORFB (IV).
    Type: Grant
    Filed: February 28, 2002
    Date of Patent: December 21, 2004
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Masahiro Ito, Daisuke Shirakawa, Shin Tatematsu
  • Process for producing fluorinated polyvalent carbonyl compound
    Publication number: 20040254396
    Abstract: A fluorinated polyvalent carbonyl compound is produced by an economically advantageous method from inexpensive materials without requiring a complicated synthetic process step. Namely, the present invention comprises reacting a polyvalent alcohol having at least two kinds of alcohol skeletons selected among a primary alcohol, a secondary alcohol and a tertiary alcohol, with an acid halide to obtain a polyvalent ester compound, fluorinating it in a liquid phase to obtain a perfluorinated polyvalent ester compound, and cleaving the ester bonds derived from primary and secondary alcohols in the perfluoropolyvalent ester compound to obtain a fluorinated polyvalent carbonyl compound.
    Type: Application
    Filed: July 15, 2004
    Publication date: December 16, 2004
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Takashi Okazoe, Kunio Watanabe, Daisuke Shirakawa, Masahiro Ito, Shin Tatematsu
  • Processes for producing a fluorosulfonyl group-containing compound and a compound led from the fluorosulfonyl group-containing compound
    Publication number: 20040230018
    Abstract: A fluorosulfonyl group-containing compound having a high polymerization reactivity, a process for its production, a sulfonyl group-containing polymerizable monomer led from the sulfonyl group-containing compound, and a polymer obtainable by polymerizing the sulfonyl group-containing polymerizable monomer, are provided.
    Type: Application
    Filed: April 23, 2004
    Publication date: November 18, 2004
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Takashi Okazoe, Atsushi Watakabe, Masahiro Ito, Kunio Watanabe, Takeshi Eriguchi, Kimiaki Kashiwagi, Shu-zhong Wang