Abstract: Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.

Abstract: A mold frame and a bezel are disclosed. The mold frame includes a bottom portion having a first side, wherein the first side has a first end and a second end opposite to the first end, and there is only one stopper set disposed on the first side. The stopper set is composed of a plurality of stoppers sequentially arranged from the first end to the second end, wherein the first stopper of the stopper set is spaced a first distance apart from the first end; and/or the last stopper of the stopper set is spaced a second distance apart from the second end. The bezel is used for accommodating the aforementioned mold frame, and includes a first side structure having a first opening; and/or a second side structure having a second opening. A liquid crystal display is also disclosed, and includes the mold frame and bezel.

Abstract: Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.

Abstract: A backlight module is provided. The backlight module includes a frame, a fixed structure and at least one optical film. The fixed structure includes a fixed part and a connected part connects to the surface and the fixed part. The width of the fixed part is substantially greater than the width of the connected part. The at least one optical film includes an accommodated part comprising a first portion and a second portion adjoins to the first portion. The width of the first portion is substantially greater than or substantially equal to the fixed part, and the width of the second portion is substantially greater than or substantially equal to the width of the connected part.

Abstract: The invention relates to a catalyst component for olefin (co)polymerization, to preparation thereof, to a catalyst comprising the same, and to use thereof in olefin (co)polymerization. The catalyst component of the invention comprises magnesium, titanium, halogen, inner electron donor compound, and alkoxy group derived from a surface modifier, wherein the content of the alkoxy group derived from the surface modifier is in a range of from 0.01 to 3 percent by weight, based on the weight of the catalyst component.

Abstract: A dust collecting apparatus for separating particles from an airflow comprises at least a first cyclonic separator for removing larger particles from the airflow and a plurality of second cyclonic separators, arranged in parallel and in tandem with one another, for removing smaller particles.

Abstract: An optical film for use in a backlight module and the backlight module are disclosed. The backlight module comprises a light source, a light guide plate and a plurality of optical films, wherein the light source is used to provide incident light which will be received by the light guide plate. The light guide plate is used to guide the incident light to the optical films uniformly, and the optical films are disposed above the light guide plate to receive and treat the incident light from the light guide plate. The optical films have at least one substrate having a single-oriented axis, thereby when the optical films rotate 360 degrees along a normal axis thereof, the substrate is adapted to substantially present at least one repetitive distribution of polarization for every 180 degrees, with respect to the incident light emitted from the light source of the backlight module.

Abstract: A method of patterning an indium tin oxide film includes the steps of forming a cap layer over the indium tin oxide film and subjecting exposed areas of the indium tin oxide film to a water plasma.

Abstract: Disclosed are a backlight module and a liquid crystal display (LCD) including the same. The backlight module has a heat conductive structure so as to reduce the non-uniformity phenomenon of display. The backlight module comprises a frame, a reflective sheet, a heat-conductive plate, and a circuit board, wherein the frame has a bottom portion and at least one substantially step-typed through hole is formed therein. The reflective sheet is disposed on the inner surface of the bottom portion, and the heat-conductive plate is disposed in the step-typed through hole, and is spaced from the reflection sheet at a predetermined distance. The circuit board is disposed on the outer surface of the bottom portion of the frame, and has at least one electrical component that is received in the substantially step-typed through hole.

Abstract: A backlight module includes a light source, a light guide plate for guiding light from the light source, and a brightness enhancement film having a plurality of spherical surface microlenses for gathering light from the light guide plate. In contrast to traditional prism sheets, the brightness enhancement film having the plurality of spherical surface microlenses have better efficiency of light-gathering.

Abstract: Disclosed is a method and a system for wafer backside alignment. A zero mark patterning on front side of a substrate. A plurality of layers are deposited on the front side of the substrate. The wafer is flipped over with backside of the substrate facing up, and a through wafer etching is performed from the backside to an etch stop layer deposited over the front side of the substrate.

Abstract: Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.

Abstract: A backlight structure comprises a light-guide plate and a light source module. There is a light-entering surface, which is a burnished surface, on one side of the light-guide plate. Besides, there is an effective light-emitting area on the light source module, and there is a distance between the centerline of which area and that of the light-entering surface. Thereby, the luminance on the bottom-left corner of the backlight structure is made identical to the luminance on the bottom-right corner by increasing the propagation ranges of the light on the bottom-left and the bottom-right corners as a result of a burnish surface as well as of asymmetrically adapting the light source module.

Abstract: The invention relates to a catalyst component for olefin (co)polymerization, to preparation thereof, to a catalyst comprising the same, and to use thereof in olefin (co)polymerization. The catalyst component of the invention comprises magnesium, titanium, halogen, inner electron donor compound, and alkoxy group derived from a surface modifier, wherein the content of the alkoxy group derived from the surface modifier is in a range of from 0.01 to 3 percent by weight, based on the weight of the catalyst component.

Abstract: A flat display, a flat panel display and a backlight module are disclosed. The flat display module comprises the flat panel display and the backlight module. The flat panel display comprises an upper polarizer and a lower polarizer. The lower polarizer includes a first diffusion layer. The backlight module comprises a light emitting device, a prism sheet and a light guide plate. A light beam is provided by the light emitting device. The prism sheet is one-dimensional prism array structure. The light guide plate includes a second diffusion layer for diffusing the light beam. The first diffusion layer has an optical haze greater than the optical haze of the surface of the upper polarizer. Accordingly, thin thickness and high brightness are achieved for the flat display.

Abstract: A backlight module includes a light source, a light guide plate for guiding light from the light source, and a brightness enhancement film having a plurality of spherical surface microlenses for gathering light from the light guide plate. In contrast to traditional prism sheets, the brightness enhancement film having the plurality of spherical surface microlenses have better efficiency of light-gathering.

Abstract: A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.

Abstract: An in-situ performed method utilizing a pure H2O plasma to remove a layer of resist from a substrate or wafer without substantially accumulating charges thereon. Also, in-situ performed methods utilizing a pure H2O plasma or a pure H2O vapor to release or remove charges from a surface or surfaces of a substrate or wafer that have accumulated during one or more IC fabrication processes.

Abstract: The present invention provides a catalyst component used for homopolymerization or co-polymerization of ethylene, comprising at least one suitable electron donor compound supported on a composition containing magnesium and titanium, wherein the electron donor compound is selected from the group consisting of aliphatic ethers, alicyclic ethers, aromatic ethers, aliphatic ketones and alicyclic ketones, and wherein the composition containing magnesium and titanium is prepared by dissolving a magnesium compound into a solvent system to form a homogeneous solution and then contacting the solution with a titanium compound in the presence of a precipitation aid to precipitate the composition. The present invention also relates to a method for the preparation of said catalyst component and a catalyst comprising thereof, and to use of the catalyst in homopolymerization of ethylene or co-polymerization of ethylene with at least one C3–C8 ?-olefin.

Abstract: An pure H2O stripping process for etched metal wafers effectively solves the metal corrosion deficiencies induced by O2, N2 plasma charging. The pure H2O plasma stripping releases and neutralizes the storage of positive charge accumulated in the wafer, reduces chlorine concentration, and effectively strips the photoresist and etching residue. Thereby reducing metal corrosion and increases the anti-metal corrosion window. The pure H2O plasma stripping requires no additional equipment and or steps.