Abstract: A storage unit of a single-conductor non-volatile memory cell is described, which includes an isolation layer in a substrate, a storage transistor and an erasing transistor. The storage transistor includes a first well of a first conductivity type in the substrate beside the isolation layer, a floating gate crossing over the isolation layer and including a first segment over the first well, and two source/drain regions of a second conductivity type in the first well beside the first segment of the floating gate. The erasing transistor includes a second well of the first conductivity type located in the substrate and separated from the first well by the isolation layer, a second segment of the floating gate over the second well, and a well pickup region of the first conductivity type in the second well beside the second segment of the floating gate.

Abstract: Embodiments for a slider mounting module suitable for mounting a KVM assembly to a server rack are provided. In one embodiment, the slider mounting module includes a front rack mount and a back rack mount which are configured to couple together and be secured to a server rack. The coupling of the front rack mount to the back rack mount is adjustable to accommodate different depth server racks. The slider mounting module includes a front move plate slidably coupled to the front rack mount and a back move plate slidably coupled to the back rack mount. The front and back rack mounts provide a mounting surface for KVM assembly.

Abstract: An illuminating efficiency-increasable and light-erasable memory including a substrate, a memory device, many dielectric layers, and many cap layers is provided. The substrate includes a memory region. The memory device includes a select gate and a floating gate, and the select gate and the floating gate are disposed adjacently on the substrate in the memory region. The dielectric layers are disposed on the substrate and cover the memory device. The dielectric layers have an opening located above the floating gate. Each of the cap layers is disposed on each of the dielectric layers, respectively.

Abstract: A rack-mounted, combined KVM switch with console is described. The combined KVM switch with console is attached to the rack by affixing the switch to two front posts of the rack. The monitor and input module of the console are hinged to the switch so that they can be independently swiveled. The user may easily position the monitor and the input module in various different positions for various purposes. A first locking mechanism releasably locks the input module to a horizontal position, and a second locking mechanism releasably locks the monitor to a vertical position.

Abstract: A method for reducing power consumption for a programmable logic device (PLD) is provided. In the method, configuration cells associated with used logic portions of the PLD are powered. A programmable power signal preventing source to drain leakage is provided to an inverter of a configuration random access memory (CRAM) cell associated with an unused logic portion of the PLD. The programmable power signal deactivates at least a portion of a configuration cell associated with the unused logic portion. That is, the programmable power signal eliminates the source to drain leakage as the power provided to the configuration cell is at ground. In one embodiment, the programmable power signal is provided to both inverters of a cross coupled pair of inverters rather than a single one of the cross-coupled pair of inverters. A programmable logic device capable of minimizing standby power consumption is also included.

Abstract: An illuminating efficiency-increasable and light-erasable embedded memory structure including a substrate, a memory device, many dielectric layers, many cap layers and at least three metal layers is described. The substrate includes a memory region and a core circuit region. The memory device includes a select gate and a floating gate, and the select gate and the floating gate are disposed adjacently on the substrate in the memory region. The dielectric layers are disposed on the substrate and cover the memory device. The dielectric layers have a first opening located above the floating gate. Each of the cap layers is disposed on each of the dielectric layers, respectively. The metal layers are disposed in the dielectric layers in the core circuit region.

Abstract: A method for manufacturing passive components is disclosed. First, a substrate is provided, and a connecting region, a capacitor region and an inductance region are defined in the substrate. The substrate includes a first metal layer and an insulating layer on the first metal layer. Subsequently, the insulating layer is etched, and then the first metal layer is etched. Thus, an outer connecting pad in the connecting region and a bottom electrode in the capacitor region are formed simultaneously, and a part of the insulating layer on the bottom electrode remains. Thereafter, a dielectric layer is deposited, and then a dual damascene copper process is performed to form an inductance structure and a top electrode of a capacitor in the dielectric layer simultaneously. Next, a passive layer is deposited and an etching process is thereafter performed to expose the outer connecting pad.

Abstract: An exposure method suitable for a photolithography process is described. First, a wafer with a group of alignment marks formed thereon is provided. A first alignment step is conducted by using the group of the alignment marks on the wafer to obtain a first calibration data. Next, a second alignment step is conducted by using a portion of the group of alignment marks on the wafer to obtain a second calibration data. The first calibration data is then compared with the second calibration data to obtain a comparison result. Next, a photoresist exposure step is conducted on the wafer according to the comparison result.

Abstract: A method for forming a SiGe epitaxial layer is described. A first SEG process is performed under a first condition, consuming about 1% to 20% of the total process time for forming the SiGe epitaxial layer. Then, a second SEG process is performed under a second condition, consuming about 99% to 80% of the total process time. The first condition and the second condition include different temperatures or pressures. The first and the second SEG processes each uses a reactant gas that includes at least a Si-containing gas and a Ge-containing gas.

Abstract: A method of forming a ring-type capacitor is provided. The method includes providing a substrate; forming a patterned mask layer on the substrate, the patterned mask layer defining a ring pattern; removing the substrate by using the patterned mask layer as a mask to form a ring-type trench in the substrate; the ring-type trench including an inner wall and an outer wall; and forming a capacitor structure on the inner wall and the outer wall of the ring-type trench.

Abstract: An illuminating efficiency-increasable and light-erasable embedded memory structure including a substrate, a memory device, many dielectric layers, many cap layers and at least three metal layers is described. The substrate includes a memory region and a core circuit region. The memory device includes a select gate and a floating gate, and the select gate and the floating gate are disposed adjacently on the substrate in the memory region. The dielectric layers are disposed on the substrate and cover the memory device. The dielectric layers have a first opening located above the floating gate. Each of the cap layers is disposed on each of the dielectric layers, respectively. The metal layers are disposed in the dielectric layers in the core circuit region.

Abstract: Integrated circuits are provided that have volatile memory elements. The memory elements produce output signals. The integrated circuits may be programmable logic device integrated circuits containing programmable core logic including transistors with gates. The core logic is powered using a core logic power supply level defined by a core logic positive power supply voltage and a core logic ground voltage. When loaded with configuration data, the memory elements produce output signals that are applied to the gates of the transistors in the core logic to customize the programmable logic device. The memory elements are powered with a memory element power supply level defined by a memory element positive power supply voltage and a memory element ground power supply voltage. The memory element power supply level is elevated with respect to the core logic power supply level.

Abstract: A metal interconnect structure includes a plurality of first plugs adjacent to each other, a first metal line extending in a first direction and contacting each first plug to form a first section with a tapered second section in between, and a second plug adjacent to the second section, both in a second direction normal to the first direction.

Abstract: Integrated circuits are provided that have memory elements. The memory elements produce output signals. The integrated circuits may be programmable logic device integrated circuits containing programmable logic including transistors with gates. When loaded with configuration data, the memory elements produce output signals that are applied to the gates of the transistors in the programmable logic device to customize the programmable logic. To ensure that the transistors in the programmable logic are turned on properly, the memory elements are powered with an elevated power supply level during normal device operation. During data loading operations, the power supply level for the memory elements is reduced. Reducing the memory element power supply level during loading increases the write margin for the memory elements.

Abstract: A small-size (w<0.5 micrometers) alignment mark in combination with a “k1 process” is proposed, which is particularly suited for the fabrication of trench-capacitor DRAM devices which requires highly accurate AA-DT alignment. The “k1 process” is utilized to etch away polysilicon studded in the alignment mark trenches and refresh the trench profile prior to AA pattern transferring, thereby improving wafer alignment accuracy and precision.

Abstract: A sliding flat panel display and keyboard module for monitoring and controlling server computers on a server rack is described. The sliding flat panel display and keyboard module has an L-shaped supporting frame, a vertical sliding rail, a horizontal sliding rail, a flat panel display, and a keyboard. The vertical sliding rail and the horizontal sliding rail are respectively disposed on a vertical surface and a horizontal surface of the L-shaped supporting frame. The flat panel display couples to the vertical sliding rail and the keyboard couples to the horizontal sliding rail, so that the flat panel display and the keyboard are able to slide on the L-shaped supporting frame horizontally.

Abstract: The present disclosure relates to a storage device. The storage device comprises a frame having a hole and a printed circuit board embedded in the frame, wherein the printed circuit board has an extended part for forming a connector. The connector may pass through the hole and is exposed out the frame for interfacing the storage device with a host device. At least one memory device is mounted to the printed circuit board and electrically connected to the printed circuit board.

Abstract: A method of manufacturing a metal-oxide-semiconductor transistor device is disclosed, in which, an insulation region is formed to define the insulation region and an active region, wherein the active region is adjacent to the insulation region and electrically insulated by the insulation region. A selective epitaxial process is performed to form an epitaxial layer on the active region; wherein the epitaxial layer laterally extends onto a surface of a peripheral portion of the insulation region. Thereafter, a doped well is formed in the semiconductor substrate of the active region. A gate structure is formed on the epitaxial layer. Finally, a drain/source region is formed in the semiconductor substrate and the epitaxial layer at a side of the gate structure.

Abstract: Integrated circuits are provided that have volatile memory elements. The memory elements produce output signals. The integrated circuits may be programmable logic device integrated circuits containing programmable core logic including transistors with gates. The core logic is powered using a core logic power supply level defined by a core logic positive power supply voltage and a core logic ground voltage. When loaded with configuration data, the memory elements produce output signals that are applied to the gates of the transistors in the core logic to customize the programmable logic device. The memory elements are powered with a memory element power supply level defined by a memory element positive power supply voltage and a memory element ground power supply voltage. The memory element power supply level is elevated with respect to the core logic power supply level.

Abstract: A sliding flat panel display and keyboard module for monitoring and controlling server computers on a server rack is described. The sliding flat panel display and keyboard module has an L-shaped supporting frame, a vertical sliding rail, a horizontal sliding rail, a flat panel display, and a keyboard. The vertical sliding rail and the horizontal sliding rail are respectively disposed on a vertical surface and a horizontal surface of the L-shaped supporting frame. The flat panel display couples to the vertical sliding rail and the keyboard couples to the horizontal sliding rail, so that the flat panel display and the keyboard are able to slide on the L-shaped supporting frame horizontally.