Abstract: A complementary metal-oxide-semiconductor (CMOS) device includes a substrate with a first active region and a second active region; a first gate structure and a second gate structure, respectively disposed on the first active region and the second active region; a first spacer structure and a second spacer structure respectively disposed on sidewalls of the first gate structure and the second gate structure; a first LDD and a second LDD respectively disposed in the substrate at both sides of the first gate structure and the second gate structure; an epitaxial material layer, disposed in the first active region and located on a side of the first LDD; and a passivation layer, disposed on the first gate structure, the first spacer structure, and the first LDD and covering the second active region, wherein the passivation layer comprises a carbon-containing oxynitride layer.

Abstract: A method for manufacturing passive components is disclosed. First, a substrate is provided, and a connecting region, a capacitor region and an inductance region are defined in the substrate. The substrate includes a first metal layer and an insulating layer on the first metal layer. Subsequently, the insulating layer is etched, and then the first metal layer is etched. Thus, an outer connecting pad in the connecting region and a bottom electrode in the capacitor region are formed simultaneously, and a part of the insulating layer on the bottom electrode remains. Thereafter, a dielectric layer is deposited, and then a dual damascene copper process is performed to form an inductance structure and a top electrode of a capacitor in the dielectric layer simultaneously. Next, a passive layer is deposited and an etching process is thereafter performed to expose the outer connecting pad.

Abstract: A low-power low-voltage buffer with a half-latch is provided. The half-latch buffer design may provide increased speed without dramatically increasing power consumption.

Abstract: A complementary metal-oxide-semiconductor (CMOS) device includes a substrate with a first active region and a second active region; a first gate structure and a second gate structure, respectively disposed on the first active region and the second active region; a first spacer structure and a second spacer structure respectively disposed on sidewalls of the first gate structure and the second gate structure; a first LDD and a second LDD respectively disposed in the substrate at both sides of the first gate structure and the second gate structure; an epitaxial material layer, disposed in the first active region and located on a side of the first LDD; and a passivation layer, disposed on the first gate structure, the first spacer structure, and the first LDD and covering the second active region, wherein the passivation layer comprises a carbon-containing oxynitride layer.

Abstract: An embodiment of the present invention embeds image data within a multimedia file including audio information in a manner providing storage capacity tailored to the size of the image. Thus, the resulting file structure for audio content is tailored to incorporate image data, where the image data is an integral part of the file structure. In addition, embedded image data is synchronized with audio information to enable display of the images at specific instances of an audio presentation. Synchronization data is further integrated in the multimedia file, where audio, image and synchronization data are bound together in the same file and format. This allows the file to have any sufficient size and to display and synchronize all desired images with an audio presentation.

Abstract: Integrated circuits such as programmable logic device integrated circuits have arrays of memory elements into which configuration data is loaded. The memory elements are formed form a pair of independently-powered cross-coupled inverters. Control circuitry generates a first inverter power supply signal and a second inverter power supply signal. The first and second inverter power supply signals are distributed to the inverters in the memory elements using pairs of inverter power distribution paths. When it is desired to reset the memory elements, the control circuitry takes the second power supply signal high before the first power supply signal. When it is desired to preset the memory elements, the control circuitry takes the second power supply high after the first power supply signal.

Abstract: A method of manufacturing a CMOS is disclosed. A substrate has a first gate and a second gate. A dielectric layer and a patterned photo-resist layer are formed sequentially on the substrate. After an etching process, the dielectric layer without the photo-resist layer forms a spacer around the first gate, and the dielectric layer with the photo-resist layer forms a block layer on the second gate. The recesses are formed in the substrate of two lateral sides of the first gate. The epitaxial silicon layers are formed in the recesses.

Abstract: A method for forming a SiGe epitaxial layer is described. A first SEG process is performed under a first condition, consuming about 1% to 20% of the total process time for forming the SiGe epitaxial layer. Then, a second SEG process is performed under a second condition, consuming about 99% to 80% of the total process time. The first condition and the second condition include different temperatures or pressures. The first and the second SEG processes each uses a reactant gas that includes at least a Si-containing gas and a Ge-containing gas.

Abstract: A complementary metal-oxide-semiconductor (CMOS) device includes a substrate with a first active region and a second active region; a first gate structure and a second gate structure, respectively disposed on the first active region and the second active region; a first spacer structure and a second spacer structure respectively disposed on sidewalls of the first gate structure and the second gate structure; a first LDD and a second LDD respectively disposed in the substrate at both sides of the first gate structure and the second gate structure; an epitaxial material layer, disposed in the first active region and located on a side of the first LDD; and a passivation layer, disposed on the first gate structure, the first spacer structure, and the first LDD and covering the second active region, wherein the passivation layer comprises a carbon-containing oxynitride layer.

Abstract: A portable disk has a hub device and a memory device. The hub device couples between a host and several downstream devices; the memory device is arranged to store and read the data. The hub device has a hub controller coupled to the host, and several hub ports coupled to the hub controller and respectively coupled to the downstream devices. The memory device has a memory controller coupled to the hub controller, and a memory coupled to the memory controller.

Abstract: A metal-oxide-semiconductor transistor device comprises a semiconductor substrate comprising an active region and an insulation region, a selective epitaxial layer between the active region and a gate structure, wherein a peripheral portion of the epitaxial layer is over a peripheral portion of the insulation region, such that the width of the channel is increased and a drain current is improved.

Abstract: There is disclosed an QoS-oriented burstification method supporting various grades of burstification delay guarantee. For the arrival packets, the packets are sequentially inserted in a sequence of windows on weight basis, thereby forming a queue. The window size together with the weight of each flow determines a maximum number of packets of each flow in a window. For the departure packets, there is generated a burst consisting of a plurality of packets from the head of the queue when either a total number of packets reaches a maximum burst size or a burst assembly timer expires.

Abstract: A metal-oxide-semiconductor (MOS) transistor device is provided. The MOS transistor device includes a substrate, a gate structure, a spacer, a source/drain region and a barrier layer. The gate structure is disposed on the substrate. The gate structure includes a gate and a gate dielectric layer disposed between the gate and the substrate. The spacer is disposed on the sidewall of the gate structure. The source/drain region is disposed in the substrate on two sides of the spacer. The barrier layer is disposed around the source/drain region. The source/drain region and the barrier layer are fabricated using an identical material. However, the doping concentration of the source/drain region is larger than the doping concentration of the barrier layer.

Abstract: Programmable logic device integrated circuits are provided. The programmable logic device integrated circuits contain programmable core logic powered at a programmable core logic power supply voltage. Programmable logic device configuration data is loaded into the memory elements to configure the programmable core logic to perform a custom logic function. During normal operation the memory elements may be powered with a power supply voltage that is larger than the programmable core logic power supply voltage. During data loading operations, the memory elements may be powered with a power supply voltage equal to the programmable core logic power supply voltage. Data loading and reading circuitry loads data into the memory elements and reads data from the memory elements. Address signals are generated by the data loading and reading circuitry. The address signals may have larger voltage levels during data writing operations than during read operations.

Abstract: A rack-mounted KVM module is configured for a server rack. An L-shaped supporting frame, which has a vertical plane and a horizontal plane, is coupled to the sever rack. A flat panel display is coupled to the vertical sliding rail to move along the L-shaped supporting frame horizontally. A keyboard module is coupled to the horizontal sliding rail to move along the L-shaped supporting frame horizontally. A positioning mechanism is disposed in the horizontal sliding rail. The positioning mechanism consists mainly of an outer rail, an inner rail, a link bracket, a latch and a positioning switch. The latch is swiveled to engage a notch of the latch in a block portion of the outer rail or to remove the notch thereof from the block portion to respectively lock or unlock a fixed position when the link bracket is slid along the inner rail by moving the positioning switch.

Abstract: A sliding module positioning device for locking a sliding module at a predetermined position on a rack is described. The sliding module positioning device includes a base, a positioning pin, an elastic device, an internal pushing member, and an external control member. The positioning pin is moveable on the base and coupled to the elastic device for pushing the positioning pin into a positioning hole on a positioning bracket. The internal pushing member can push the positioning pin away from the positioning hole. The external control member connects with the internal pushing member, and the positioning pin couples to an inner surface of the internal pushing member to prevent the positioning pin protruding from the external control member after the positioning pin is moved away from the positioning hole. The positioning device further utilizes an elastic piece for coupling the positioning pin to the positioning hole.

Abstract: A small-size (w<0.5 micrometers) alignment mark in combination with a “k1 process” is proposed, which is particularly suited for the fabrication of trench-capacitor DRAM devices which requires highly accurate AA-DT and GC-DT overlay alignment. The “k1 process” is utilized to etch away polysilicon studded in the alignment mark trenches and to refresh the trench profile, thereby improving overlay alignment accuracy and precision.

Abstract: A method of forming a three-dimensional lithographic pattern is provided. The method includes providing a substrate. A first photoresist layer is formed on the substrate. The first photoresist layer corresponds to a first exposure removal dose. A second photoresist layer is formed on the first photoresist layer. The second photoresist layer corresponds to a second exposure removal dose, which is different from the first exposure removal dose. A reticle with multiple regions of different light transmittances is provided. Through the reticle, the first and second photoresist layers are exposed to form a first removable region in the first photoresist layer and a second removable region in the second photoresist layer. The second removable region is different from the first removable region. The first and second photoresist layers are then developed to remove the first and second removable regions.

Abstract: Integrated circuits are provided that have volatile memory elements. The memory elements produce output signals. The integrated circuits may be programmable logic device integrated circuits containing programmable core logic including transistors with gates. The core logic is powered using a core logic power supply level defined by a core logic positive power supply voltage and a core logic ground voltage. When loaded with configuration data, the memory elements produce output signals that are applied to the gates of the transistors in the core logic to customize the programmable logic device. The memory elements are powered with a memory element power supply level defined by a memory element positive power supply voltage and a memory element ground power supply voltage. The memory element power supply level is elevated with respect to the core logic power supply level.

Abstract: Integrated circuits are provided that have memory elements. The memory elements produce output signals. The integrated circuits may be programmable logic device integrated circuits containing programmable logic including transistors with gates. When loaded with configuration data, the memory elements produce output signals that are applied to the gates of the transistors in the programmable logic device to customize the programmable logic. To ensure that the transistors in the programmable logic are turned on properly, the memory elements are powered with an elevated power supply level during normal device operation. During data loading operations, the power supply level for the memory elements is reduced. Reducing the memory element power supply level during loading increases the write margin for the memory elements.