Abstract: The present disclosure provides an optical element driving mechanism, which includes a first movable part, a fixed assembly, a first driving assembly, a second movable part, a second driving assembly and a locking assembly. The first movable part is configured to connect an optical element. The first movable part is movable relative to the fixed assembly. The first driving assembly is configured to drive the first movable part to move relative to the fixed assembly, and the second driving assembly is configured to drive the second movable part to move relative to the first movable part and the fixed assembly. The locking assembly is configured to fix the first movable part at a first position relative to the fixed assembly.

Abstract: An information display method, an information display apparatus, and an electronic device are provided. The information display method includes: acquiring a first interactive message card forwarded by a first terminal device, where the first interactive message card displayed by the first terminal device includes a data submission control element used to collect user data in response to an user interaction operation and send the collected user data to another electronic device; generating a second interactive message card based on the first interactive message card, where a data submission control element in the second interactive message card does not have a data collection function; and displaying the second interactive message card.

Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a first and second gate electrode layers, and a dielectric feature disposed between the first and second gate electrode layers. The dielectric feature has a first surface. The structure further includes a first conductive layer disposed on the first gate electrode layer. The first conductive layer has a second surface. The structure further includes a second conductive layer disposed on the second gate electrode layer. The second conductive layer has a third surface, and the first, second, and third surfaces are coplanar. The structure further includes a third conductive layer disposed over the first conductive layer, a fourth conductive layer disposed over the second conductive layer, and a dielectric layer disposed on the first surface of the dielectric feature. The dielectric layer is disposed between the third conductive layer and the fourth conductive layer.

Abstract: Provided are a precursor compound of a tetracyclic hydrocarbon and a preparation method thereof, and a tetracyclic hydrocarbon and a preparation method and use thereof. The precursor compound of the tetracyclic hydrocarbon with a structure shown in formula I has a polycyclic structure. The precursor compound is subjected to hydrodeoxygenation so as to be prepared into the tetracyclic hydrocarbon with a structure shown in formula II that has a high density (0.986 g/cm3), a high calorific value (41.14 MJ/L), and a low freezing point (less than ?60° C.).

Abstract: A greenhouse gas verification system includes a local data verification device, an upstream data verification device, and a data weighting device. The local data verification device obtains multiple sensor data and multiple data coefficients associated with the sensor data, and calculates a total greenhouse gas quantity according to these sensor data and data coefficients. The upstream data verification device obtains a greenhouse gas value and upstream evidence associated with the greenhouse gas value, and generates a verification result according to the upstream evidence and the greenhouse gas value. When the verification result is passed, the upstream data verification device outputs the greenhouse gas values. The data weighting device receives the total greenhouse gas quantity and the greenhouse gas value, and performs weighted calculations according to the greenhouse gas value and total greenhouse gas quantity to output a greenhouse gas value vector.

Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a substrate, a source/drain contact disposed over the substrate, a first dielectric layer disposed on the source drain contact, an etch stop layer disposed on the first dielectric layer, and a source/drain conductive layer disposed in the etch stop layer and the first dielectric layer. The structure further includes a spacer structure disposed in the etch stop layer and the first dielectric layer. The spacer structure surrounds a sidewall of the source/drain conductive layer and includes a first spacer layer having a first portion and a second spacer layer adjacent the first portion of the first spacer layer. The first portion of the first spacer layer and the second spacer layer are separated by an air gap. The structure further includes a seal layer.

Abstract: An opening and closing device is provided, including a fixing device and a limiting device. The fixing device includes a fixing portion and a fixing member, and the limiting device includes a driving device, a limiting portion, and a limiting member. The fixing member may rotate to be engaged with the fixing portion. The driving device is disposed on a first shell. The limiting portion is disposed on an inner side of the first shell. The limiting member is disposed on an inner side of a second shell. When the first shell approaches the second shell, the limiting member end portion may be engaged with the limiting portion. The driving device may be subjected to an external force to release the engagement between the fixing member and the fixing portion and the engagement between the limiting member end portion and the limiting portion.

Abstract: A method of manufacturing a semiconductor structure with flush shallow trench isolation and gate oxide, including performing a first etching process to remove a pad oxide layer at one side of a STI and recess the substrate, the first etching process also forms a recess portion not covered by the first etching process and a protruding portion covered by the first etching process on the STI, forming a gate oxide layer on the recessed substrate, performing a second etching process to remove the protruding portion and the pad oxide layer and a first oxide layer on a drain region, performing a third etching process to remove a part of the STI and a second oxide layer, so that a top plane of the STI is flush with the gate oxide layer.

Abstract: The invention provides a system and a method thereof for establishing an extubation prediction using a machine learning model capable of obtaining an extubation prediction model and key features used by the extubation prediction model through training and/or verification of a machine learning model, and analyzing key feature data of a patient in real time through the extubation prediction model in order to obtain a possibility of extubation of the patient and its related explanation. Accordingly, the system and the method thereof for establishing the extubation prediction using the machine learning model disclosed in the invention are used as a tool for clinical caregivers to evaluate extubation in order to reduce a possibility of reintubation due to inability to breathe spontaneously after extubation.

Abstract: A semiconductor structure and a method of forming the same are provided. In an embodiment, a semiconductor structure includes an epitaxial source feature and an epitaxial drain feature, a vertical stack of channel members disposed over a backside dielectric layer, the vertical stack of channel members extending between the epitaxial source feature and the epitaxial drain feature along a direction, a gate structure wrapping around each of the vertical stack of channel members, and a backside source contact disposed in the backside dielectric layer. The backside source contact includes a top portion adjacent the epitaxial source feature and a bottom portion away from the epitaxial source feature. The top portion and the bottom portion includes a step width change along the direction.

Abstract: A method for forming a semiconductor device structure includes forming a plurality of fin structures from a substrate, each fin structure having first and second semiconductor layers alternatingly stacked, forming an isolation region around the fin structures, forming a first liner layer on exposed surfaces of the fin structures and the isolation region, forming a second liner layer on the first liner layer, selectively removing a portion of the second liner layer so that the second liner layer remains over sidewall of each fin structure, forming an insulating layer on the first and second liner layers, removing the second liner layer, forming a sacrificial gate structure over a portion of the fin structure and the insulating layer, removing a portion of the fin structure not covered by the sacrificial gate structure, forming a source/drain feature such that a gap is formed around and separate the source/drain feature from the insulating layer, and forming a sealing material on the source/drain feature and th

Abstract: A semiconductor device according to the present disclosure includes a fin structure over a substrate, a vertical stack of silicon nanostructures disposed over the fin structure, an isolation structure disposed around the fin structure, a germanium-containing interfacial layer wrapping around each of the vertical stack of silicon nanostructures, a gate dielectric layer wrapping around the germanium-containing interfacial layer, and a gate electrode layer wrapping around the gate dielectric layer.

Abstract: A semiconductor device is provided. The semiconductor device includes first channel nanostructures in a first device region, second channel nanostructures in a second device region, a dielectric fin at a boundary between the first device region and the second device region, a high-k dielectric layer surrounding each of the first channel nanostructures and each of the second channel nanostructures and over the dielectric fin, a first work function layer surrounding each of the first channel nanostructures and over the high-k dielectric layer and a second work function layer surrounding each of the second channel nanostructures and over the high-k dielectric layer and the first work function layer. The first work function layer fully fills spaces between the first channel nanostructures and has an edge located above the dielectric fin. The second work function layer fully fills spaces between the second channel nanostructures.

Abstract: Semiconductor structures and the manufacturing method thereof are disclosed. An exemplary semiconductor structure according to the present disclosure includes a substrate having a p-type well or an n-type well, a first base portion over the p-type well, a second base portion over the n-type well, a first plurality of channel members over the first base portion, a second plurality of channel members over the second base portion, an isolation feature disposed between the first base portion and the second base portion, and a deep isolation structure in the substrate disposed below the isolation feature.

Abstract: A semiconductor device is provided. The semiconductor device includes first channel nanostructures in a first device region and second channel nanostructures in a second device region. The first channel nanostructures are disposed between first and second dielectric fins. The second channel nanostructures are disposed between first and third dielectric fins. A gate dielectric layer is formed to surround each of the first and the second channel nanostructures and over the first, the second and the third dielectric fins. A first work function layer is formed to surround each of the first channel nanostructures. A second work function layer is formed to surround each of the second channel nanostructures. A first gap is present between every adjacent first channel nanostructures and a second gap present is between every adjacent second channel nanostructures.

Abstract: The present disclosure describes a semiconductor structure that includes a channel region, a source region adjacent to the channel region, a drain region, a drift region adjacent to the drain region, and a dual gate structure. The dual gate structure includes a first gate structure over portions of the channel region and portions of the drift region. The dual gate structure also includes a second gate structure over the drift region.

Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes first and second dielectric features and a first semiconductor layer disposed between the first and second dielectric features. The structure further includes an isolation layer disposed between the first and second dielectric features, and the isolation layer is in contact with the first and second dielectric features. The first semiconductor layer is disposed over the isolation layer. The structure further includes a gate dielectric layer disposed over the isolation layer and a gate electrode layer disposed over the gate dielectric layer. The gate electrode layer has an end extending to a level between a first plane defined by a first surface of the first semiconductor layer and a second plane defined by a second surface opposite the first surface.

Abstract: A semiconductor device and a method of forming the same are provided. A semiconductor device according to an embodiment includes a P-type field effect transistor (PFET) and an N-type field effect transistor (NFET). The PFET includes a first gate structure formed over a substrate, a first spacer disposed on a sidewall of the first gate structure, and an unstrained spacer disposed on a sidewall of the first spacer. The NET includes a second gate structure formed over the substrate, the first spacer disposed on a sidewall of the second gate structure, and a strained spacer disposed on a sidewall of the first spacer.

Abstract: A virtual machine (VM) operating system (OS) configuration system includes a processor, wherein the processor is arranged to execute a host VM, a hypervisor, a descriptor provider, and a guest VM. The host VM is arranged to generate a driving signal for driving a booting of the guest VM. The hypervisor is arranged to generate a first trigger signal according to the driving signal, for triggering installation of a descriptor. The descriptor provider includes the descriptor, and is arranged to install the descriptor into a protected memory according to the first trigger signal, wherein an OS of the guest VM is configured according to the descriptor.

Abstract: A device includes a substrate, a first semiconductor channel over the substrate, a second semiconductor channel over the substrate and laterally offset from the first semiconductor channel, and a third semiconductor channel over the substrate and laterally offset from the second semiconductor channel. A first gate structure, a second gate structure, and a third gate structure are over and lateral surround the first, second, and third semiconductor channels, respectively. A first inactive fin is between the first gate structure and the second gate structure, and a second inactive fin is between the second gate structure and the third gate structure. A bridge conductor layer is over the first, second, and third gate structures, and the first and second inactive fins. A dielectric plug extends from an upper surface of the second inactive fin, through the bridge conductor layer, to at least an upper surface of the bridge conductor layer.