Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.

Abstract: A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2 and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.

Abstract: A source module for use in a lithographic apparatus is constructed to generate extreme ultra violet (EUV) and secondary radiation, and includes a buffer gas configured to cooperate with a source of the EUV radiation. The buffer gas has at least 50% transmission for the EUV radiation and at least 70% absorption for the secondary radiation.

Abstract: The invention provides a light source carpet construction (1000) comprising a light source (40) and a tufted carpet (1). The tufted carpet (1) comprises a primary backing layer (100) having a primary backing layer top face (101) and a primary backing bottom face (102). The primary backing layer (100) further comprising yarns (11) integrated in the primary backing layer (100) with tufts (12) protruding from the primary backing layer (100) at the primary backing layer top face (101), the tufts (12) thereby forming a carpet top face (2). The light source (40) is arranged to illuminate the primary backing layer (100). The intensity (12) of the light (41) at the carpet top face (2) is smaller than the intensity (1101) of the light (41) at the primary backing layer top face (101). The light source (40) is arranged to generate light (41) having a wavelength selected from the range of 200-400 nm.

Abstract: The present invention relates to a catheter comprising a catheter body section (1) and at least one catheter tip section (2). The catheter body section (1) can extend in a longitudinal direction. The at least one catheter tip section (2) may be located on a distal side of the catheter body section (1). In a first operation mode of the catheter usable during insertion thereof, the catheter body section (1) and the at least one catheter tip section (2) can be commonly moved substantially in the longitudinal direction. In a second operation mode of the catheter usable when the catheter has reached a position where it should not be advanced any further, the catheter body section (1) and the at least one catheter tip section (2) may be moved relative to each other, so that the at least one catheter tip section (2) can be separated from the catheter body section (1).

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The apertures extend though the member in different directions in order to be substantially in alignment with radiation constituting a non-parallel beam of radiation.

Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength.

Abstract: The present invention relates to a luminous device (1), comprising a light source (2) for emitting source light of a source wavelength, wherein the intensity of the source light is controllable by a signal. The device further comprises a first phosphor material (3, 4) capable of converting at least part of the source light to light of at least a first wavelength, and a second phosphor material (3, 4) capable of converting at least part of the source light to light of at least a second wavelength. The first and second phosphor materials (3, 4) are arranged to have a first and second conversion efficiency, respectively, that are controllable by the signal. The ratio of intensities of light of the first and second wavelength, respectively, is dependent on the signal. Furthermore, the present invention relates to an LED bulb, an LED package and a lighting system comprising a luminous device according to embodiments of the present invention.

Abstract: A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.

Abstract: An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

Abstract: An EUV illumination system, for example, for use in a photolithographic apparatus is configured to condition a radiation beam. A hydrogen radical source configured to supply gas containing hydrogen or hydrogen radicals into the illumination system. The hydrogen gas is effective to remove carbonaceous contamination from the surface of a mirror in the illumination system or to form a buffer against unwanted gases. In order to prevent damage by hydrogen that penetrates the mirror, the mirror comprises a layer made of metal non-metal compound adjacent a reflection surface of the mirror. A transition metal carbide, nitride, boride or silicide compound or mixture thereof may be used for example.

Abstract: A lithographic apparatus includes a plasma source that includes a vessel configured to enclose a plasma formation site, an optical device configured to transfer optical radiation to or from the vessel, and a reflector arranged in an optical path between the optical device and the plasma formation site source. The reflector is configured to reflect the optical radiation between the optical device and the plasma formation site. The reflector is formed, in operation, as a molten metal mirror.

Abstract: A device is constructed and arranged to generate radiation by using an electrical discharge through a gaseous medium. The device includes a first electrode and a second electrode, and a liquid supply arranged to provide a liquid to a location in the device. The device is arranged to be electrically supplied with a voltage and to supply the voltage at least partially to the first electrode and the second electrode in order to allow the electrical discharge to be generated in an electrical field created by the voltage. The electrical discharge produces a radiating plasma. The device also includes a shield arranged between the discharge location and a conducting part connected to the first electrode and/or the second electrode.

Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in carrier material such as silicon by an anisotropic etching process and topped with a reflective layer such as Mo metal, Ru metal, TiN or RuO. A diffusion barrier layer such as silicon nitride Si3N4, or silicon dioxide SiO2 is provided between the metal and the semiconductor to prevent diffusion and silicidation of the metal at elevated temperatures. The diffusion barrier layer may also serve as a hydrogen-resistant layer on parts of the semiconductor which are not beneath the reflective layer, and/or enhance emissivity for removal of heat from the structure.

Abstract: An illumination detection system comprises an excitation radiation source and associated radiation processing arrangement, and a focusing arrangement for focusing the excitation radiation from the radiation processing arrangement onto an analysis region of a sample. A radiation collection arrangement collects radiation from the analysis region of the sample resulting from the excitation, and a detector detects the collected radiation. The focused excitation radiation comprises an excitation line which is evanescent in the sample. This combines the advantages of line scanning (reduced analysis time) and evanescent excitation (reduced background signal) and therewith enables increased measurement speed and precision for point of care application.

Abstract: The invention provides amongst others a light emitting tufted carpet with a primary backing layer permeable to light, an optional adhesive layer, a waveguide comprising a light outcoupling site, and an optional secondary backing layer. The primary backing layer is provided with tufts. The waveguide is arranged to couple light source light of a light source in as waveguide light, and arranged to couple waveguide light out at the waveguide light outcoupling site to provide carpet light. The waveguide light outcoupling site is below the primary backing layer.

Abstract: An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.

Abstract: The present invention relates to a tufted textile (100) comprising a primary backing layer (10) which is substantially permeable to light, yarns (40) forming tufts on a first side of the primary backing layer, an adhesive layer (30) provided on a second side of the primary backing layer opposite from the first side, and a light source (50; 80) and a conductor arrangement (60) for the light source arranged in a position facing the second side of the primary backing layer. The adhesive layer, the light source and the conductor arrangement, are arranged so as to allow light from the light source to reach the primary backing layer. The tufted textile (100) may be a carpet.