Abstract: The present invention relates to a compartment provided a tufted textile (100) comprising: a backing (10), and yarns (40) forming tufts extending from a first side of the backing, the compartment further comprising a light source (50; 80) and a conductor arrangement (60) for the light source, wherein the light source, the conductor arrangement and the backing are arranged so as to radiate light from the light source at least partly through the backing, the backing being substantially permeable to light. The tufted textile (100) may be a carpet.

Abstract: A light output device comprises at least one light source having a light source output comprising at least a light output, and a switchable member through which the light output is provided, and which is switchable between at least two optical states. These at least two opticalstates provide different levels of uniformity of the light output. The switching of the switchable member is induced by the light source output.

Abstract: A lithographic spectral filter including a first filter element including a slit having an in plane length dimension arranged in a first direction; and a second filter element arranged at a subsequent position along an optical path of radiation of first and second wavelengths to the first filter element, the second filter element including a slit having an in plane length dimension arranged in a second direction transverse to the first direction, wherein the spectral filter is configured to reflect radiation of a first wavelength and allow transmission of radiation of a second wavelength, the first wavelength being larger than the second wavelength.

Abstract: A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.

Abstract: The invention provides a light emitting tufted carpet (1). The carpet (1) comprises a primary backing layer (100), an optional secondary backing layer (200), an optional adhesive layer (300), a plurality of carpet integrated LEDs (40) arranged to generate carpet light (41), and a first electric conductor (10) and a second electric conductor (20). The first electric conductor (10) and the second electric conductor (20) are arranged to provide power from a power source (50) to the LEDs (40). The primary backing layer (100) comprises a first felt layer (30?), or the optional secondary backing layer (200) comprises second felt layer (30?), or both the primary backing layer (100) and the optional secondary backing layer (200) comprise felt layers (30?,30?). One or more of the first electric conductor (10) and the second electric conductor (20) are at least partially integrated in one or more of the first felt layer (30?) and the second felt layer (30?).

Abstract: A light output device comprises a substrate arrangement and a plurality of light source devices (4) integrated into the structure of the substrate arrangement. A respective control circuit (7) is provided for one or more light source devices (4) and also integrated into the structure of the substrate arrangement. Control circuits are embedded with the light source devices into the structure of the substrate. This enables a shared control line or lines (18) to be used to control a group of light source devices.

Abstract: A light output device comprises a power supply and a plurality of light source device arrangements arranged in a line extending from a power connection, with adjacent light source device arrangements in the line connected together with an electrical connector arrangement. Each light source device arrangement is associated with a control circuit from the plurality of control circuits for providing independent control of the light source device arrangement output based on the control signal. The device can be reduced in length by disconnecting the connector arrangement between an adjacent pair of light source device arrangements and the remaining light source device arrangements extending from the power source are independently controlled by the control signal.

Abstract: A patterning device for a photolithographic apparatus is used to form a patterned radiation beam, by imparting a cross-sectional pattern to the radiation beam during reflection from the patterning device. The patterning device comprises a layer of phase-change material that is capable of locally undergoing an induced structural phase change into respective ones of a plurality of stable and/or metastable states. Furthermore, the patterning device comprises a radiation reflective structure with periodically arranged layers adjacent to the layer of phase-change material. The radiation reflective structures do not partake in the phase changes. By locally changing the phase of the phase-change material, the reflectivity of the whole structure is modified, for example due to thickness changes in the layer of phase-change material that lead to destructive interference of different components of the reflected light or due to changes in surface roughness of the radiation reflective structure.

Abstract: A light output device comprises a substrate arrangement comprising a plurality of light source circuits integrated into the structure of the substrate arrangement. Each light source circuit comprises a light source device arrangement (4) having two terminals and a transistor circuit (7). Each light source circuit is supplied with power from an associated pair the power connections (10,11,14,15,20), and at least two light source circuits (4,7) share the same pair of power connections. A set of control connections (18) are provided for receiving external control signals for controlling the transistor circuits (7). A set of non-overlapping electrodes (10,11,14,15,18,20) provide the internal connections between the power connections, the light source device terminals and the transistor circuits, and each light source device is individually independently controllable.

Abstract: A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.

Abstract: A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.

Abstract: A light output device comprises a substrate arrangement with a light source device integrated into the structure of the substrate arrangement. The substrate arrangement comprises first and second optically transmissive substrates, an insulating layer in which the light source device is embedded and provided between the substrates, and a thermally conductive layer provided on at least on of the substrates.

Abstract: A light output device comprises a substrate arrangement with a plurality of light source device arrangements integrated into the structure of the substrate arrangement. The plurality of light source device arrangements comprise at least first and second light source devices (4a,4b) which are arranged in anti-parallel.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

Abstract: The invention relates to a self-cleaning system (10) and window glass. The self-cleaning system comprises a translucent substrate (20), a light-emitting device (30) and a photo-catalytic layer (40) applied to a surface (22) of the translucent substrate for generating a self-cleaning surface. The photo-catalytic layer produces the self-cleaning effect when illuminated with light of a predefined wavelength range. The translucent substrate is translucent for at least a sub-range of the predefined wavelength range. The light-emitting device is arranged for illuminating the photo-catalytic layer via the translucent substrate, an emission spectrum emitted by the light-emitting device comprising light within the sub-range.

Abstract: A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

Abstract: A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.

Abstract: An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.