Abstract: A light output device comprises a first and a second substrate arrangement (1,2), the first substrate arrangement (1) comprising a light output surface of the device. An electrode arrangement (3a,3b) is sandwiched between the substrate arrangements and at least one light source (4) is connected to the electrode arrangement. The first substrate (1) arrangement comprises a light diffuser for changing the level of uniformity of the light output from the light source and the second substrate (2) arrangement comprises a light scattering or reflecting layer. This arrangement uses a scattering substrate arrangement for the substrate from which illumination is provided. In order to enhance the level of uniformity, the opposite substrate arrangement is also either scattering or reflecting.

Abstract: A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

Abstract: A light output device comprises a substrate arrangement comprising first and second light transmissive substrates (1,2) and an electrode arrangement (3a,3b) sandwiched between the substrates. A plurality of light source devices (4) are integrated into the structure of the substrate arrangement and connected to the electrode arrangement. The electrode arrangement comprises an at least semi-transparent conductor arrangement of spaced non-transparent wires, the wires comprising a conductive ink.

Abstract: A radiation detection system (100) is described comprising a measurement region (104) in a measurement chamber adapted for receiving at least one sample (108) to be examined and adapted for receiving excitation radiation for impingement on the at least one sample (108) and for generating sample radiation. The radiation detection system (100) furthermore comprises at least one detector element (106) for detection of the generated sample radiation. The radiation detection system thereby is a front irradiation system, i.e. the excitation radiation is incident on a first side of the measurement region (104) in a measurement chamber and the at least one detector element (106) is positioned at a second side of the measurement region (104) in a measurement chamber, the second side being opposite to the first side with respect to the measurement region (104) in a measurement chamber, such that detection occurs at the side facing the first side.

Abstract: The present invention provides a luminescence sensor (20) comprising at least one chamber (22) and at least one optical filter formed by at least a first conductive grating (11), the at least first conductive grating (11) comprising a plurality of wires (12), wherein at least one of the wires (12) of the at least first conductive grating (11) is linked to a temperature control device for controlling the temperature of at least one chamber (22) in the sensor.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

Abstract: A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

Abstract: A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.

Abstract: The invention relates to a light emitting device comprising a light emitting element (100) and a light guide (101) arranged on a textile substrate (102). The light guide has a back surface (103) facing the textile substrate, a front surface (104) facing away from the substrate, and a light receiving surface (105). The light emitting element (100) is arranged such that at least part of the light emitted by the light emitting element (100) is coupled into the light guide (101) through the light receiving surface (105), and is subject to total internal reflection in the light guide (101). Furthermore, the light guide (101) is arranged such that at least part of the light coupled into the light guide (101) exits the light guide (101) through the front surface (104) and/or the back surface (103).

Abstract: A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation. The source includes a chamber in which a plasma is generated, and a mirror configured to reflect radiation emitted by the plasma. The mirror includes a multi-layer structure that includes alternating Mo/Si layers. A boundary Mo layer or a boundary Si layer or a boundary diffusion barrier layer of the alternating layers forms a top layer of the mirror, the top layer facing inwardly with respect to the chamber. A hydrogen radical generator is configured to generate hydrogen radicals in the chamber. The radicals are configured to remove debris generated by the plasma from the mirror. A support is constructed and arranged to support a patterning device configured to pattern the radiation to form a patterned beam of radiation. A projection system is constructed and arranged to project the patterned beam of radiation onto a substrate.

Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 ?m.

Abstract: Spectral purity of a radiation beam of a first wavelength may be improved by providing an optical element that includes a structure having at least first layer including a first material, which structure is configured to be substantially reflective for a radiation of the first wavelength and substantially transparent or absorptive for a radiation of a second wavelength, a second layer including a second material, the second layer being configured to be substantially reflective, absorptive or scattering for the radiation of the second wavelength, and vacuum between the first layer and the second layer, wherein the first layer is located upstream in the optical path of incoming radiation with respect to the second layer.

Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Abstract: A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract: A photo acoustic trace gas detector (100) is provided for detecting a concentration of a trace gas in a gas mixture. The detector (100) comprises a light source (101) for producing a light beam and a light modulator (103) for modulating the light beam into a series of light pulses for generating sound waves in the gas mixture. The light modulator (103) is arranged for modulating the light beam between a non-zero lower intensity level and a higher intensity level. An amplitude of the sound waves being a measure of the concentration. An optical cavity (104a, 104b) contains the gas mixture and amplifies a light intensity of the light pulses. A transducer (109) for converts the sound waves into electrical signals. A feed back loop (110, 111) with a photo detector (110) for measuring the light intensity of the light pulses regulates the amplification of the light intensity in the optical cavity (104a, 104b).

Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.

Abstract: An integrated biosensing device detects emissions from a sample when illuminated. A photo detector (20) is adjacent a site for retaining the sample (40) or receiving excitation radiation for impingement on the sample (40). A reflector (10) deflects the illumination onto the sample site and substantially guides the excitation radiation away from the photo detector. By providing a reflector, a ratio of desired detection of emissions to unwanted detection of the illumination light can be improved. This can be achieved by a reduction in an amount of the illumination reaching the photo detector, and/or by an increase in the amount of illumination of the sample and thus in the amount of emissions reaching the detector. This can be achieved more cost effectively than by using a filter. The illumination can be from above or below if the substrate is transparent.

Abstract: A device constructed to generate radiation includes a liquid bath, and a pair of electrodes. At least a part of one of the electrodes is formed by a cable part moveable with respect to the liquid bath. The device also includes an actuator arranged to move the cable part from a liquid-adhering position to an ignition position, and an ignition source configured to trigger a discharge produced radiating plasma from the liquid adherent to the cable part, when the cable part is in the ignition position, by a discharge between the electrodes. The liquid-adhering position is a position for adhering a liquid from the bath to the part of the electrode.