Patents by Inventor Manzur Gill

Manzur Gill has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5306658
    Abstract: A memory cell array for a nonvolatile memory device having single-transistor cells (10). Row lines (15) connect the control gates of each row of cells. Column lines (17) connect the drain regions (11) and source regions (12) of columns of cells, such that pairs of row-adjacent cells share a column line (17). Each shared column line (17) has two junctions for each pair of cells that share the column line. One junction is graded for source regions (12) and the other is abrupt for drain regions (11).
    Type: Grant
    Filed: May 27, 1993
    Date of Patent: April 26, 1994
    Assignee: Texas Instruments Incorporated
    Inventor: Manzur Gill
  • Patent number: 5284785
    Abstract: A diffusionless source/drain conductor, electrically-erasable, electrically-programmable read-only memory cell is formed at a face of a semiconductor layer (38) of a first conductivity type and includes a source conductor (10), a drain conductor (12), a channel region (18), and a tunnel region (22). Source conductor (10) and drain conductor (12) are disposed to create inversion regions, of a second conductivity type, opposite said first conductivity type, in the source inversion region (14) and drain inversion region (16) of semiconductor layer (38) of the layer semiconductor, upon application of voltage. Thin oxide tunneling window (22) is disposed adjacent source conductor (10). A floating gate (24) disposed adjacent tunneling window can be charged or discharged by Fowler-Nordheim tunneling when a voltage is applied between the inversion created in source inversion region (14) and a control gate (26) insulatively adjacent floating gate (24).
    Type: Grant
    Filed: February 27, 1992
    Date of Patent: February 8, 1994
    Assignee: Texas Instruments Incorporated
    Inventor: Manzur Gill
  • Patent number: 5283203
    Abstract: A method for making a NMOS self-aligned contact in CMOS circuits without an extra mask is described. The maskless contact technique makes use of the fact that the blanket N-type implant, self-aligned to exposed field-oxide edge, will not change the P+ diffusion to N-type. The net P+ concentration in the contact region is reduced slightly but does not degrade the PMOS device performance.
    Type: Grant
    Filed: February 28, 1992
    Date of Patent: February 1, 1994
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Danny Shum
  • Patent number: 5264718
    Abstract: An electrically-erasable, electrically-programmable, read-only-memory cell array is formed in pairs at a face of a semiconductor substrate (22). Each memory cell includes a source (11) and a drain (12), with a corresponding channel (Ch) between. A control gate (14) is disposed over the floating gate (13), insulated by an intervening inter-level dielectric (27). The floating gate (13) and the control gate (14) include a channel section (Ch). The channel section (Ch) is used as a self-alignment implant mask for the sources (11) and drains (12), such that the channel-junction edges are aligned with the corresponding edges of the channel section (Ch). Each memory cell is programmed by hot-carrier injection from the channel to the floating gate (13), and erased by Fowler-Nordheim tunneling from the floating gate (13) to the source (11).
    Type: Grant
    Filed: August 6, 1992
    Date of Patent: November 23, 1993
    Assignee: Texas Instruments Incorporated
    Inventor: Manzur Gill
  • Patent number: 5262846
    Abstract: A contact-free floating-gate non-volatile memory cell array and process with silicided NSAG bitlines and with source/drain regions buried beneath relatively thick silicon oxide. The bitlines have a relatively small resistance, eliminating the need for parallel metallic conductors with numerous bitline contacts. The array has relatively small bitline capacitance and may be constructed having relatively small dimensions. Isolation between bitlines is by thick field oxide. Wordlines may be formed from silicided polycrystalline or other material with low resistivity. Coupling of programming and erasing voltages to the floating gate is improved by extending the gates over the thick field oxide and perhaps by using an insulator with relatively high dielectric constant between the control gate and the floating gate. The sides of the floating gates are defined with a single patterning step. The resulting structure is a dense cross-point array of programmable memory cells.
    Type: Grant
    Filed: August 20, 1991
    Date of Patent: November 16, 1993
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Howard L. Tigelaar
  • Patent number: 5245212
    Abstract: The structure and method of this invention provide, for example, electrical isolation between active elements in adjacent rows and/or columns of an integrated circuit by use of a self-aligned field-plate conductor formed over and insulated from the substrate regions that are bounded by the channel regions of field-effect transistors in adjacent rows and that are bounded by the bitlines forming those transistors in a column. The field-plate conductor is formed, for example, in a strip that extends over the isolation areas and thermal insulator regions between row lines of the memory cell array. The field-plate conductor strip is connected to a voltage supply that has a potential with respect to the potential of the semiconductor substrate which causes the isolation areas to be nonconductive. Component density may be increased over that of prior-art structures and methods.
    Type: Grant
    Filed: November 4, 1991
    Date of Patent: September 14, 1993
    Assignee: Texas Instruments Incorporated
    Inventor: Manzur Gill
  • Patent number: 5238855
    Abstract: A contact-free floating-gate non-volatile memory cell array and process with silicided NSAG bitlines and with source/drain regions buried beneath relatively thick silicon oxide. The bitlines have a relatively small resistance, eliminating the need for parallel metallic conductors with numerous bitline contacts. The array has relatively small bitline capacitance and may be constructed having relatively small dimensions. Bitline isolation is by P/N junction or by oxide-filled trench, permitting relatively small spacing between transistors. Wordlines may be formed from silicided polycrystalline or other material with low resistivity. Coupling of programming and erasing voltages to the floating gate is improved by using an insulator with relatively high dielectric constant between the control gate and the floating gate. The resulting structure is a dense cross-point array of programmable memory cells.
    Type: Grant
    Filed: June 27, 1991
    Date of Patent: August 24, 1993
    Assignee: Texas Instruments Incorporated
    Inventor: Manzur Gill
  • Patent number: 5218568
    Abstract: An electrically-erasable, electrically-programmable read-only memory cell 10 is formed at a face of a layer of semiconductor 30 of a first conductivity type. A first source/drain region 16 and a second source/drain region 20 are formed in the face of layer of semiconductor 30 of a second conductivity type opposite the first conductivity type and spaced by a first channel area 50. A third source/drain region 18 is formed in the face of semiconductor layer 30 of the second conductivity type spaced from second source/drain region 20 by a second channel area 52. A thick insulator region 44 is formed adjacent at least a portion of second source/drain region 20 and includes a lateral margin of sloped thickness overlying a corresponding lateral margin of second source/drain region 20. The corresponding lateral margin of second source/drain region 20 has a graded dopant concentration directly proportionate with the sloped thickness of the overlying lateral margin of thick insulator region 44.
    Type: Grant
    Filed: December 17, 1991
    Date of Patent: June 8, 1993
    Assignee: Texas Instruments Incorporated
    Inventors: Sung-Wei Lin, Manzur Gill, Inn K. Lee
  • Patent number: 5200350
    Abstract: A contact-free floating-gate non-volatile memory cell array and process with silicided NSAG bitlines and with source/drain regions buried beneath relatively thick silicon oxide. The bitlines have a relatively small resistance, eliminating the need for parallel metallic conductors with numerous bitline contacts. The array has relatively small bitline capacitance and may be constructed having relatively small dimensions. Isolation between wordlines and between bitlines is by thick field oxide regions. A thick field oxide strip separates each ground conductor/bitline pair. Wordlines may be formed from silicided polycrystalline or other material with low resistivity. Coupling of programming and erasing voltages to the floating gate is improved by extending the gates over the thick field oxide and perhaps by using an insulator with relatively high dielectric constant between the control gate and the floating gate. The resulting structure is a dense cross-point array of programmable memory cells.
    Type: Grant
    Filed: July 26, 1991
    Date of Patent: April 6, 1993
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Howard L. Tigelaar
  • Patent number: 5187683
    Abstract: A method is described for programming a semiconductor array of EEPROM cells. A selected cell is connected, by definition, to a selected source-column line, a selected drain-column line and a selected wordline. Each deselected memory cell in the array is connected to a deselected source-column line, a deselected drain-column line and/or a deselected wordline. The method includes preselecting first, second, third, fourth and fifth programming voltages such that the second programming voltage is more positive than the first programming voltage and such that the third, fourth and fifth programming voltages are intermediate between the first and second programming voltages. The first programming voltage is applied at least to a selected column line and to each of the same-type deselected column lines. The third programming voltage is applied to the selected wordline and the fourth programming voltage is applied to each deselected wordline.
    Type: Grant
    Filed: August 31, 1990
    Date of Patent: February 16, 1993
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Sung-Wei Lin, Sebastiano D'Arrigo
  • Patent number: 5177705
    Abstract: A method is described for programming an array of EEPROM cells. Programming occurs through a Fowler-Nordheim tunnel window (34) between a source bitline (24) and a floating gate conductor (42) of a selected cell. The voltages applied to the control gate and to the source are selected to differ sufficiently to cause electrons to be drawn through the tunnel window (34) from the source region (24) to the floating gate conductor (42). The non-selected bitlines have a voltage impressed thereon that is of sufficient value to prevent inadvertent programming of cells in the selected row. The non-selected wordlines (48) have a voltage impressed thereon that is of sufficient value to prevent erasing of programmed non-selected cells.
    Type: Grant
    Filed: September 5, 1989
    Date of Patent: January 5, 1993
    Assignee: Texas Instruments Incorporated
    Inventors: David J. McElroy, Sebastiano D'Arrigo, Manzur Gill, Sung-Wei Lin
  • Patent number: 5173436
    Abstract: An electrically-erasable, electrically-programmable ROM or an EEPROM is constructed using a floating-gate transistor with or without a split gate. The floating-gate transistor may have a self-aligned tunnel window of sublithographic dimension positioned on the opposite side of the source from the channel and drain, in a contact-free cell layout, enhancing the ease of manufacture and reducing cell size. In this cell, the bitlines and source/drain regions are buried beneath relatively thick silicon oxide and the floating gate extends over the thick silicon oxide. Programming and erasing are accomplished by causing electrons to tunnel through the oxide in the tunnel window. The tunnel window has a thinner dielectric than the remainder of the oxides under the floating gate to allow Fowler-Nordheim tunneling. Trenches and ditches are used for electrical isolation between individual memory cells, allowing an increase in cell density.
    Type: Grant
    Filed: June 27, 1991
    Date of Patent: December 22, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Sebastiano D'Arrigo, David J. McElroy
  • Patent number: 5168335
    Abstract: A pair of electrically erasable, electrically programmable memory cells are formed at a face of a semiconductor layer (10) and include respective source regions (30a, 30b), a shared drain region (28) and respective channel regions (38a, 38b). Each cell has a floating gate conductor (46a, 46b) that controls the conductance of a respective subchannel region (74a, 74b) and may be programmed through Fowler-Nordheim electron tunneling through a respective tunnel oxide window (40a, 40b) from a respective source region (30a, 30b). A field plate conductor (40a) controls the conductance of respective subchannel regions (70a, 70b) within each channel region (38a, 38b). A word line or control gate conductor (62) is insulatively disposed adjacent respective third, remaining channel subregions (53a, 53b) and further is disposed insulatively adjacent the floating gates (46a, 46b) to program or erase them.
    Type: Grant
    Filed: August 6, 1991
    Date of Patent: December 1, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: Iano D'Arrigo, Manzur Gill, Sung-Wei Lin
  • Patent number: 5162879
    Abstract: A diffusionless field effect transistor is formed at a face of a semiconductor layer (12) of a first conductivity type and includes a source conductor (36), a drain conductor (38) and a channel region (44). Source conductor (36) and drain conductor (38) are disposed to create inversion regions, and a second conductivity type opposite said first conductivity type, in the underlying source inversion region (40) and drain inversion region (42) of semiconductor layer (12) upon application of voltage. The transistor has a gate (54) insulatively overlying the channel region (44) to control the conductivity thereof.
    Type: Grant
    Filed: November 1, 1991
    Date of Patent: November 10, 1992
    Assignee: Texas Instruments Incorporated
    Inventor: Manzur Gill
  • Patent number: 5156991
    Abstract: An electrically-erasable, programmable ROM cell, or an EEPROM cell, is constructed using an enhancement transistor merged with a floating-gate transistor, where the floating-gate transistor has a small tunnel window, in a contact-free cell layout, enhancing the ease of manufacture and reducing cell size. The bitlines and source/drain regions are buried beneath relatively thick silicon oxide, which allows a favorable ratio of control gate to floating gate capacitance. Programming and erasing are provided by the tunnel window are near or above the channel side of the source. The window has a thinner dielectric than the remainder of the floating gate, to allow Fowler-Nordheim tunneling. By using dedicated drain or ground lines, rather than a virtual-ground layout, and by using thick oxide for isolation between bitlines, the floating gate can extend onto adjacent bitlines and isolation area, resulting in a favorable coupling ratio.
    Type: Grant
    Filed: January 31, 1991
    Date of Patent: October 20, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Sebastiano D'Arrigo, Sung-Wei Lin
  • Patent number: 5155055
    Abstract: An electrically-erasable, electrically-programmable ROM or an EEPROM is constructed using an enhancement transistor merged with a floating-gate transistor, where the floating-gate transistor has a small self-aligned tunnel window positioned on the opposite side of the source from the channel and drain, in a contact-free cell layout, enhancing the ease of manufacture and reducing cell size. In this cell, the bitlines and source/drain regions are buried beneath relatively thick silicon oxide, which allows a favorable ratio of control gate to floating gate capacitance. Programming and erasing are provided by the tunnel window area on the outside of the source (spaced from the channel). The tunnel window has a thinner dielectric than the remainder of the floating gate to allow Fowler-Nordheim tunneling.
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: October 13, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Sung-Wei Lin, C. Rinn Cleavelin, David J. McElroy
  • Patent number: 5151760
    Abstract: According to the invention, an integrated circuit with improved capacitive coupling is provided, and includes a first conductor (20), a second conductor (16), and a third conductor (22). The second conductor (22) and third conductor (16) are disposed adjacent each other, separated by an insulator region (60). The first conductor (20) contacts the third conductor (16) and extends across a portion of the third conductor (22). The first and third conductors are separated by an insulator region (54). A voltage applied to first conductor (20) and the second conductor (16) is capacitively coupled to third conductor (22).
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: September 29, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, David J. McElroy
  • Patent number: 5150179
    Abstract: A diffusionless source/drain conductor, electrically-erasable, electrically-programmable read-only memory cell is formed at a face of a semiconductor layer (38) of a first conductivity type and includes a source conductor (10), a drain conductor (12), a channel region (18), and a tunnel region (22). Source conductor (10) and drain conductor (12) are disposed to create inversion regions, of a second conductivity type, opposite said first conductivity type, in the source inversion region (14) and drain inversion region (16) of semiconductor layer (38) of the layer semiconductor, upon application of voltage. Thin oxide tunneling window (22) is disposed adjacent source conductor (10). A floating gate (24) disposed adjacent tunneling window can be charged or discharged by Fowler-Nordheim tunneling when a voltage is applied between the inversion created in source inversion region (14) and a control gate (26) insulatively adjacent floating gate (24).
    Type: Grant
    Filed: July 5, 1990
    Date of Patent: September 22, 1992
    Assignee: Texas Instruments Incorporated
    Inventor: Manzur Gill
  • Patent number: 5147816
    Abstract: A nonvolatile memory cell having separate regions for programming and erasing. The cells are formed in an array at a face of a semiconductor body, each cell including a source that is part of a source-column line and including a drain that is part of a drain-column line. Each cell has first, second and third sub-channels between source and drain. The conductivity of the first sub-channel of each cell is controlled by a field-plate, which is part of a field-plate-column line, positioned over and insulated from the first sub-channel. The conductivity of each of the second sub-channels is controlled by a floating gate formed over and insulated from the second sub-channel. Each floating gate has a first tunnelling window positioned over the adjacent source-column line and has a second tunnelling window positioned over the adjacent drain-column line. Row lines, including control gates, are positioned over and insulated from the floating gates of the cells for reading, programming and erasing the cells.
    Type: Grant
    Filed: July 26, 1991
    Date of Patent: September 15, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Theodore D. Lindgren
  • Patent number: 5134449
    Abstract: An array of nonvolatile memory cells are formed at a face of a semiconductor body, the cells including source regions and including drain regions that are part of a common drain column conductor. Each cell has first and second sub-channel regions between source and drain. The conductivity of the first sub-channel regions of each cell is controlled by a field-plate conductor formed over and insulated from the first sub-channel region. The conductivity of each of the second sub-channel regions is controlled by a floating-gate conductor formed over and insulated from the second sub-channel region. A row line, including control gates, is located above and insulated from the floating gates of the cells for reading, programming and erasing the cells. The field-plate conductor switch provides isolation of the cells during programming.
    Type: Grant
    Filed: February 26, 1991
    Date of Patent: July 28, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: Manzur Gill, Sebastiano D'Arrigo