Patents by Inventor Masahiro Yoshikawa
Masahiro Yoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12084774Abstract: A gas wiping nozzle manufactured from parts divided along the slit length direction and maintains a gap in the width direction over the length direction in high temperature atmospheres and a method for manufacturing a hot-dip metal strip. In a gas wiping nozzle, a first and a second nozzle member are each divided along the length direction X of a slit into a plurality of nozzle members. The dimension of a divided face of the first nozzle member is 1.5T1 or more in a section of the first nozzle member where T1 is the thickness of the first nozzle member in the width direction Z of the slit, and the dimension of a divided face of the second nozzle member is 1.5T2 or more in a section of the second nozzle member where T2 is the thickness of the second nozzle member in the width direction Z of the slit.Type: GrantFiled: April 21, 2021Date of Patent: September 10, 2024Assignee: JFE STEEL CORPORATIONInventors: Kenji Yamashiro, Hideyuki Takahashi, Takumi Koyama, Hidetoshi Inoue, Syuhei Nishinaka, Toshiki Fujii, Reona Aishima, Yutaka Yanagisawa, Masahiro Yoshikawa
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Patent number: 11929589Abstract: A light-emitting component includes: a substrate; plural light-emitting elements that are disposed on the substrate and that emit light in a direction intersecting with a surface of the substrate; and plural thyristors that are stacked on the plural light-emitting elements and that are turned ON to drive the corresponding light-emitting elements so that the light-emitting elements emit light or an amount of light emitted from the light-emitting elements is increased. Each of the plural light-emitting elements includes a current confinement region which is oxidized via a hole provided in a multilayer structure. The multilayer structure is constituted by a corresponding light-emitting element and a corresponding thyristor.Type: GrantFiled: December 20, 2020Date of Patent: March 12, 2024Assignee: FUJIFILM Business Innovation Corp.Inventors: Takashi Kondo, Michiaki Murata, Kenichi Ono, Masahiro Yoshikawa, Takehito Hikichi, Yuji Shirai
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Patent number: 11885049Abstract: A mesh belt used in a process for producing a water absorbing body which is formed by warps and wefts being woven with each other. One or more yarns which constitute(s) the warps or the wefts emerging on at least a transporting surface side of the mesh belt is made of an electrically conductive material.Type: GrantFiled: April 17, 2020Date of Patent: January 30, 2024Assignee: NIPPON FILCON CO., LTD.Inventors: Takehiko Tatsuno, Masahiro Yoshikawa, Teppei Hashiguchi, Shinsuke Ueno
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Publication number: 20230212728Abstract: A gas wiping nozzle manufactured from parts divided along the slit length direction and maintains a gap in the width direction over the length direction in high temperature atmospheres and a method for manufacturing a hot-dip metal strip. In a gas wiping nozzle, a first and a second nozzle member are each divided along the length direction X of a slit into a plurality of nozzle members. The dimension of a divided face of the first nozzle member is 1.5T1 or more in a section of the first nozzle member where T1 is the thickness of the first nozzle member in the width direction Z of the slit, and the dimension of a divided face of the second nozzle member is 1.5T2 or more in a section of the second nozzle member where T2 is the thickness of the second nozzle member in the width direction Z of the slit.Type: ApplicationFiled: April 21, 2021Publication date: July 6, 2023Applicant: JFE STEEL CORPORATIONInventors: Kenji YAMASHIRO, Hideyuki TAKAHASHI, Takumi KOYAMA, Hidetoshi INOUE, Syuhei NISHINAKA, Toshiki FUJII, Reona AISHIMA, Yutaka YANAGISAWA, Masahiro YOSHIKAWA
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Publication number: 20230112504Abstract: A rectification member 32 is a rectification member that rectifies air that cools molten resin filaments discharged from a nozzle, including: a multi-cylindrical part in which a plurality of cylindrical cells 34a are formed; and a wire net 36 arranged to cover an opening part of the multi-cylindrical part. The wire net 36 has a mesh opening that is smaller than the size of the cylindrical cells 34a.Type: ApplicationFiled: December 14, 2022Publication date: April 13, 2023Inventors: Takehiko Tatsuno, Masahiro Yoshikawa, Haruka Iida
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Patent number: 11598032Abstract: A web support with a high degree of patterning freedom and excellent durability, a production method therefor, and a patterning method. The web support is used when applying a pattern to a nonwoven substance by jetting a high-pressure water stream on a web. The web support production method comprises: a step of preparing a flat metal base material; a step for forming, by etching, a first water conduction hole and second water conduction hole that pass through the front surface of the base material to the back surface, and a recess on the front surface of the base material that includes the first water conduction hole and that corresponds to the pattern; and a step for forming the base material into a cylindrical main body section by welding the edges of the base material to each other.Type: GrantFiled: October 11, 2018Date of Patent: March 7, 2023Assignee: NIPPON FILCON CO., LTD.Inventors: Naoki Fujita, Megumi Taguchi, Takehiko Tatsuno, Masahiro Yoshikawa
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Publication number: 20210305771Abstract: A light-emitting component includes: a substrate; plural light-emitting elements that are disposed on the substrate and that emit light in a direction intersecting with a surface of the substrate; and plural thyristors that are stacked on the plural light-emitting elements and that are turned ON to drive the corresponding light-emitting elements so that the light-emitting elements emit light or an amount of light emitted from the light-emitting elements is increased. Each of the plural light-emitting elements includes a current confinement region which is oxidized via a hole provided in a multilayer structure. The multilayer structure is constituted by a corresponding light-emitting element and a corresponding thyristor.Type: ApplicationFiled: December 20, 2020Publication date: September 30, 2021Applicant: FUJIFILM Business Innovation Corp.Inventors: Takashi KONDO, Michiaki MURATA, Kenichi ONO, Masahiro YOSHIKAWA, Takehito HIKICHI, Yuji SHIRAI
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Publication number: 20210214869Abstract: A web support with a high degree of patterning freedom and excellent durability, a production method therefor, and a patterning method. The web support is used when applying a pattern to a nonwoven substance by jetting a high-pressure water stream on a web. The web support production method comprises: a step of preparing a flat metal base material; a step for forming, by etching, a first water conduction hole and second water conduction hole that pass through the front surface of the base material to the back surface, and a recess on the front surface of the base material that includes the first water conduction hole and that corresponds to the pattern; and a step for forming the base material into a cylindrical main body section by welding the edges of the base material to each other.Type: ApplicationFiled: October 11, 2018Publication date: July 15, 2021Inventors: Naoki FUJITA, Megumi TAGUCHI, Takehiko TATSUNO, Masahiro YOSHIKAWA
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Publication number: 20200263332Abstract: A mesh belt used in a process for producing a water absorbing body which is formed by warps and wefts being woven with each other. One or more yarns which constitute(s) the warps or the wefts emerging on at least a transporting surface side of the mesh belt is made of an electrically conductive material.Type: ApplicationFiled: April 17, 2020Publication date: August 20, 2020Inventors: Takehiko Tatsuno, Masahiro Yoshikawa, Teppei Hashiguchi, Shinsuke Ueno
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Patent number: 10717224Abstract: A method of manufacturing a product with skin includes: attaching a preformed base material to a vacuum forming die on a back surface of the base material, disposing a skin material as a material of the skin on a front surface of a base material, and sucking the skin material through the vacuum forming die and the base material to deform a main portion of skin material so as to be in close contact with the front surface of the base material; cutting a surplus portion of the skin material not being in close contact with the front surface of the base material with a trim blade so that a distal end portion remains around the main portion, thereby forming the skin having the distal end portion; and winding the distal end portion of the skin around the back surface of the base material by a winding mechanism.Type: GrantFiled: August 30, 2017Date of Patent: July 21, 2020Assignee: TOYODA GOSEI CO., LTD.Inventors: Yumi Hida, Masahiro Yoshikawa, Kenichi Furuta, Hideyuki Miura, Akira Maeda, Shingo Yokota, Takuya Ueno
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Publication number: 20180065291Abstract: A method of manufacturing a product with skin includes: attaching a preformed base material to a vacuum forming die on a back surface of the base material, disposing a skin material as a material of the skin on a front surface of a base material, and sucking the skin material through the vacuum forming die and the base material to deform a main portion of skin material so as to be in close contact with the front surface of the base material; cutting a surplus portion of the skin material not being in close contact with the front surface of the base material with a trim blade so that a distal end portion remains around the main portion, thereby forming the skin having the distal end portion; and winding the distal end portion of the skin around the back surface of the base material by a winding mechanism.Type: ApplicationFiled: August 30, 2017Publication date: March 8, 2018Inventors: Yumi HIDA, Masahiro YOSHIKAWA, Kenichi FURUTA, Hideyuki MIURA, Akira MAEDA, Shingo YOKOTA, Takuya UENO
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Publication number: 20170136498Abstract: Provided is a classifier capable of classifying smaller microparticles and obtaining a narrower particle size distribution.Type: ApplicationFiled: March 31, 2014Publication date: May 18, 2017Applicant: HOSOKAWA MICRON CORPORATIONInventors: MASAHIRO INOKI, MASAHIRO YOSHIKAWA, TOMOYUKI CHIBA
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Patent number: 9555416Abstract: Disposed is a jet mill that has a cylindrical pulverization chamber (10) and a classification chamber (6) that connects to the pulverization chamber (10). A fine-powder discharge port (4a) and a classification rotor (7) are provided in the classification chamber (6). A feedstock supply port (5) and at least one gas emission nozzle (11) are provided in the pulverization chamber (10). The shape of the classification chamber (6) is a cone that starts on the inner wall of the pulverization chamber (10), and is angled towards the classification rotor (7). This configuration gives the jet mill high efficiency of pulverization and reduces the amount of powders left in the chamber when the jet mill has finished running.Type: GrantFiled: July 28, 2011Date of Patent: January 31, 2017Assignee: HOSOKAWA MICRON CORPORATIONInventors: Masahiro Yoshikawa, Tomoyuki Chiba, Takashi Shibata
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Patent number: 8989644Abstract: An image forming apparatus includes an image forming device forming an image on a recording medium; and a light source that, after the image has been formed by the image forming device, irradiates the recording medium with light to fix the image on the recording medium, while the recording medium moves relatively in a predetermined movement direction. The light source includes a current supply section, a light emitting section, and a current output section. Current for light emission is supplied to the current supply section. The light emitting section includes light emitting elements that are disposed two-dimensionally. At least the light emitting elements provided side by side in the movement direction are electrically connected in parallel. The current output section outputs the current that has passed through the light emitting section. The current supply section and the light emitting section are provided side by side in the movement direction.Type: GrantFiled: May 29, 2013Date of Patent: March 24, 2015Assignee: Fuji Xerox Co., Ltd.Inventors: Osamu Ueno, Tomoaki Kojima, Masateru Yamamoto, Masahiro Yoshikawa, Kohei Yukawa
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Publication number: 20140126941Abstract: An image forming apparatus includes an image forming device forming an image on a recording medium; and a light source that, after the image has been formed by the image forming device, irradiates the recording medium with light to fix the image on the recording medium, while the recording medium moves relatively in a predetermined movement direction. The light source includes a current supply section, a light emitting section, and a current output section. Current for light emission is supplied to the current supply section. The light emitting section includes light emitting elements that are disposed two-dimensionally. At least the light emitting elements provided side by side in the movement direction are electrically connected in parallel. The current output section outputs the current that has passed through the light emitting section. The current supply section and the light emitting section are provided side by side in the movement direction.Type: ApplicationFiled: May 29, 2013Publication date: May 8, 2014Inventors: Osamu UENO, Tomoaki KOJIMA, Masateru YAMAMOTO, Masahiro YOSHIKAWA, Kohei YUKAWA
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Patent number: 8659020Abstract: It is an object to provide an epitaxial silicon wafer that is provided with an excellent gettering ability in which a polysilicon layer is formed on the rear face side of a silicon crystal substrate into which phosphorus (P) and germanium (Ge) have been doped. A silicon epitaxial layer is grown by a CVD method on the surface of a silicon crystal substrate into which phosphorus and germanium have been doped at a high concentration. After that, a PBS forming step for growing a polysilicon layer is executed on the rear face side of a silicon crystal substrate. By the above steps, the number of LPDs (caused by an SF) that occur on the surface of the epitaxial silicon wafer due to the SF can be greatly reduced.Type: GrantFiled: May 28, 2010Date of Patent: February 25, 2014Assignee: Sumco CorporationInventors: Tadashi Kawashima, Masahiro Yoshikawa, Akira Inoue, Yoshiya Yoshida
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Publication number: 20130186993Abstract: Disposed is a jet mill that has a cylindrical pulverization chamber (10) and a classification chamber (6) that connects to the pulverization chamber (10). A fine-powder discharge port (4a) and a classification rotor (7) are provided in the classification chamber (6). A feedstock supply port (5) and at least one gas emission nozzle (11) are provided in the pulverization chamber (10). The shape of the classification chamber (6) is a cone that starts on the inner wall of the pulverization chamber (10), and is angled towards the classification rotor (7). This configuration gives the jet mill high efficiency of pulverization and reduces the amount of powders left in the chamber when the jet mill has finished running.Type: ApplicationFiled: July 28, 2011Publication date: July 25, 2013Applicant: HOSOKAWA MICRON CORPORATIONInventors: Masahiro Yoshikawa, Tomoyuki Chiba, Takashi Shibata
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Patent number: 8477821Abstract: A vertical cavity surface emitting laser that includes: a substrate; a first reflector of a first conductive type formed on the substrate; an active region formed on the first reflector; a second reflector of a second conductive type formed on the active region; and a current confining layer formed between the first reflector and the second reflector; and a metallic electrode that is formed on the second reflector, and is electrically connected to the second reflector. A conductive region with an anisotropy where a length in a longitudinal direction is different from a length in a short direction is formed in the current confining layer, and an opening defining a beam aperture is formed in the metallic electrode, and a diameter of the opening in the longitudinal direction is smaller than the length of the conductive region in the longitudinal direction.Type: GrantFiled: August 23, 2010Date of Patent: July 2, 2013Assignee: Fuji Xerox Co., Ltd.Inventors: Masahiro Yoshikawa, Hideo Nakayama
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Patent number: 8465993Abstract: A vertical cavity surface emitting laser that includes: a substrate; a first semiconductor multilayer reflector; an active region; a second semiconductor multilayer reflector; a columnar structure formed from the second semiconductor multilayer reflector to the first semiconductor multilayer reflector; a current narrowing layer formed inside of the columnar structure and having a conductive region surrounded by an oxidization region; a first electrode formed at a top of the columnar structure, electrically connected to the second semiconductor multilayer reflector and defining a beam window; a first insulating film comprised of a material with a first refractive index and formed on the first electrode to cover the beam window; and a second insulating film comprised of a material with a second refractive index and formed on the first insulating film, of which a radius is smaller than a radius of the conductive region.Type: GrantFiled: October 12, 2012Date of Patent: June 18, 2013Assignee: Fuji Xerox Co., Ltd.Inventors: Kazutaka Takeda, Masahiro Yoshikawa, Kazuyuki Matsushita
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Patent number: D851251Type: GrantFiled: November 7, 2016Date of Patent: June 11, 2019Assignees: DAIYA HOLDINGS CO., LTD., MASAHIRO YOSHIKAWAInventors: Masahiro Yoshikawa, Masao Matsuo, Kazunori Ogawa