Abstract: An information processing device including a wireless communication section and a control section. The wireless communication section of the information processing device communicates wirelessly with another information processing device using one or multiple channels. The control section of the information processing device performs control to notify the other information processing device of channel information for identifying a channel for use in the wireless communication with the other information processing device using one or multiple channels. Thereby, channels for use in wireless communication can be set appropriately.

Abstract: To control temperature of a sample in plasma processing with high accuracy while securing an electrostatic chucking force without breakdown of an electrostatic chucking film. When radio-frequency power is time modulated, a high-voltage side Vpp detector detects a first voltage value which is a peak-to-peak voltage value of a radio-frequency voltage applied to a sample stage in a first period of the time modulation having a first amplitude. A low-voltage side Vpp detector detects a second voltage value which is a peak-to-peak voltage value of a radio-frequency voltage applied to the sample stage in a second period having a second amplitude smaller than the first amplitude. Then, an ESC power supply control unit controls output voltages from ESC power supplies based on the first voltage value, the second voltage value and a duty ratio of the time modulation.

Abstract: [Object] Provided a wireless communication device and method of wireless communication capable of improving utilization efficiency of radio resources by introducing orthogonal frequency-division multiple access to a wireless LAN system. [Solution] A wireless communication device including: a wireless communication unit configured to perform wireless communication with another wireless communication device in accordance with an IEEE 802.11 standard; and a control unit configured to control the wireless communication unit so that the wireless communication unit includes schedule information in a PLCP header defined in the IEEE 802.11 standard and transmits the schedule information to the other wireless communication device, the schedule information relating to orthogonal frequency-division multiple access.

Abstract: To control temperature of a sample in plasma processing with high accuracy while securing an electrostatic chucking force without breakdown of an electrostatic chucking film. When radio-frequency power is time modulated, a high-voltage side Vpp detector detects a first voltage value which is a peak-to-peak voltage value of a radio-frequency voltage applied to a sample stage in a first period of the time modulation having a first amplitude. A low-voltage side Vpp detector detects a second voltage value which is a peak-to-peak voltage value of a radio-frequency voltage applied to the sample stage in a second period having a second amplitude smaller than the first amplitude. Then, an ESC power supply control unit controls output voltages from ESC power supplies based on the first voltage value, the second voltage value and a duty ratio of the time modulation.

Abstract: In some embodiments, an information processing apparatus is configured to communicate with a first wireless communication apparatus via a first communication system, the information processing apparatus comprising control circuitry configured to: receive information relating to a second communication system discovered by the first wireless communication apparatus, the second communication system being different from the first communication system; and use the information relating to the second communication system to control grouping of a plurality of wireless communication apparatuses each configured to wirelessly communicate with the information processing apparatus using the first communication system, wherein the plurality of wireless communication apparatuses comprises the first wireless communication apparatus.

Abstract: Transmission frequency information in units of component, the component being a data element contained in one broadcast delivery service and allowed for independent delivery, is supplied to a user terminal to execute reception setting in units of component. A data transmission device transmits, to the user terminal, metadata recording transmission frequency information in units of component that is constituent data of a broadcast delivery service and corresponds to a data element allowed for independent delivery to the user terminal, such as units of component of image data having a particular resolution, audio data or subtitle data in a particular language, or other types of data. The user terminal corresponding to a receiving device executes a setting process for setting a reception frequency allowing reception of a component to be received based on transmission frequency information recorded in units of component in the metadata received from the data transmission device.

Abstract: The present technology relates to a transmission apparatus, a transmission method, a reception apparatus, and a reception method which can easily obtain a mosaic screen. Metadata of content is distributed, and the metadata is described using an attribute and an attribute value and includes signaling information indicating that a video is a thumbnail video suitable for constituting a mosaic screen, and the attribute indicating information to refer to a file including information to receive content supplied by a service. The present technology can be applied when, for example, content is to be distributed.

Abstract: This technology relates to a transmitting device, a transmitting method, a receiving device, and a receiving method capable of easily obtaining a mosaic screen. Metadata described by using an attribute and an attribute value, the metadata of content including signaling information indicating that video is thumbnail video suitable for forming the mosaic screen and the attribute indicating minimum buffer time required before replay of the content starts is delivered. This technology may be applied when the content is delivered, for example.

Abstract: The present disclosure relates to a content supply apparatus, a content supply method, a program, a terminal apparatus, and a content supply system that allow to provide a receiver with pieces of general required network quality information for respective delivery paths for a case of supplying pieces of content of the same content through a plurality of different delivery paths. A content supply apparatus of the present disclosure delivers streams of content through a plurality of different networks, respectively, according to an adaptive streaming technique, and includes: a generating unit that generates metadata describing QoS parameters for the respective plurality of different networks through which the streams are delivered, and condition values of the QoS parameters; and a delivering unit that delivers the generated metadata to a receiver. The present disclosure can be applied to a system that streams content.

Abstract: To control temperature of a sample in plasma processing with high accuracy while securing an electrostatic chucking force without breakdown of an electrostatic chucking film. When radio-frequency power is time modulated, a high-voltage side Vpp detector detects a first voltage value which is a peak-to-peak voltage value of a radio-frequency voltage applied to a sample stage in a first period of the time modulation having a first amplitude. A low-voltage side Vpp detector detects a second voltage value which is a peak-to-peak voltage value of a radio-frequency voltage applied to the sample stage in a second period having a second amplitude smaller than the first amplitude. Then, an ESC power supply control unit controls output voltages from ESC power supplies based on the first voltage value, the second voltage value and a duty ratio of the time modulation.

Abstract: There is provided dry etching apparatus including a stage on which a wafer is placed, an antenna electrode, a high frequency power supply, a shower plate, and an RF bias power supply. Further, a bias path controller is provided on the side of the antenna electrode. The bias path controller resonates in series with the static reactance formed by the shower plate with respect to the frequency of the RF bias. Then, the bias path controller changes and grounds the impedance by the variable inductive reactance. With this mechanism, highly uniform etching can be achieved even if a shower plate of quartz is used for corrosive gases.

Abstract: The present disclosure relates to a content supply device, a content supply method, a program, and a content supply system that make it possible to extend an adaptive streaming technique employing the DASH and supply content through a plurality of different delivery paths According to a first aspect of the present disclosure, there is provided a content supply device that supplies a plurality of pieces of streaming data that include content of a same subject and differ in an attribute according to an adaptive streaming technique, the content supply device including: a supply unit configured to supply the plurality of pieces of streaming data to a reception side via a plurality of different networks; and a metafile generating unit configured to generate a metafile including an acquisition destination of a manifest file in which a QoS parameter for selecting the plurality of pieces of streaming data to be supplied by the reception side and a condition value of the QoS parameter are described and supply the meta

Abstract: There is provided a method for controlling a plasma processing apparatus that eliminates a preliminary study on a resonance point while maintaining a low contamination and a high uniformity even in multi-step etching. In a method for controlling a plasma processing apparatus including the step of adjusting a radio frequency bias current carried to a counter antenna electrode, the method includes the steps of: setting a reactance of a variable element to an initial value; detecting a bias current carried to the counter antenna electrode; searching for a maximum value of the detected electric current; and adjusting a value of the reactance of the variable element from the maximum value to the set value and then fixing the value.

Abstract: The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor, a lower electrode placed within a processing chamber of the vacuum reactor and having a wafer to be etched mounted on the upper surface thereof, bias supplying units and for supplying high frequency power for forming a bias potential to the lower electrode, a gas supply means for feeding reactive gas into the processing chamber, an electric field supplying means through for supplying a magnetic field for generating plasma in the processing chamber, and a control unit for controlling the distribution of ion energy in the plasma being incident on the wafer via the high frequency power.

Abstract: To realize processing for switching a reproduction state from broadcast data to network data and resuming the reproduction of the original broadcast data. A browser (241) acquires, via a network, an XML-AIT having a content equivalent to a broadcast AIT defining a life cycle of a broadcast application while a VoD content is reproduced after being switched from the broadcast application. The browser (241) manages the broadcast application based on the XML-AIT and resumes the reception of the broadcast application after the reproduction of the VoD content is ended. With this structure, processing of separating two transport streams at the same time becomes unnecessary, and one demultiplexer (23) only needs to be provided.

Abstract: [Object] To realize processing for switching a reproduction state from broadcast data to network data and resuming the reproduction of the original broadcast data. [Solving Means] A browser (241) acquires, via a network, an XML-AIT having a content equivalent to a broadcast AIT defining a life cycle of a broadcast application while a VoD content is reproduced after being switched from the broadcast application. The browser (241) manages the broadcast application based on the XML-AIT and resumes the reception of the broadcast application after the reproduction of the VoD content is ended. With this structure, processing of separating two transport streams at the same time becomes unnecessary, and one demultiplexer (23) only needs to be provided.

Abstract: There is provided a method for controlling a plasma processing apparatus that eliminates a preliminary study on a resonance point while maintaining a low contamination and a high uniformity even in multi-step etching. In a method for controlling a plasma processing apparatus including the step of adjusting a radio frequency bias current carried to a counter antenna electrode, the method includes the steps of: setting a reactance of a variable element to an initial value; detecting a bias current carried to the counter antenna electrode; searching for a maximum value of the detected electric current; and adjusting a value of the reactance of the variable element from the maximum value to the set value and then fixing the value.

Abstract: In a plasma processing apparatus including an upper electrode arranged above a sample stage on which a sample to be processed in a processing chamber is mounted to supply an electric field, and a high frequency power supply to output first high frequency power to form the electric field to the upper electrode, an insulating layer has an impedance smaller than the impedance of the feeding path for bias or the feeding path for electrostatic chuck and a current of the first high frequency power flows through a circuit that passes through the conductive plate and a member constituting an inner sidewall surface of the processing chamber from the upper electrode via the top surface of the sample stage to return to the high frequency power supply.

Abstract: In the present invention, a dry etching method for plasma etching a second laminated film in which a first laminated film in which a silicon-containing film and a silicon dioxide film are laminated is laminated in plurality and an inorganic film arranged over the second laminated film, includes etching the inorganic film and the second laminated film by a mixed gas of an NF3 gas and a CH3F gas.

Abstract: The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor 107, a lower electrode 113 placed within a processing chamber of the vacuum reactor and having a wafer 112 to be etched mounted on the upper surface thereof, bias supplying units 118 and 120 for supplying high frequency power for forming a bias potential to the lower electrode 113, a gas supply means 111 for feeding reactive gas into the processing chamber, an electric field supplying means 101 through 103 for supplying a magnetic field for generating plasma in the processing chamber, and a control unit 127 for controlling the distribution of ion energy in the plasma being incident on the wafer 112 via the high frequency power.