Abstract: An image sensor includes: photoelectric conversion elements configured to receive light and accumulate a charge corresponding to an amount of received light; an imaging signal generating unit that converts the charge accumulated in each photoelectric conversion element into a voltage to generate an imaging signal; and a reference signal generating unit that generates a reference signal having a fluctuation component with a same phase as the imaging signal. The imaging signal generating unit includes: a conversion circuit that converts the charge accumulated in each photoelectric conversion element into the imaging signal; a noise eliminating circuit that eliminates a noise component included in the imaging signal; and an output circuit that outputs the imaging signal from the conversion circuit. The reference signal generating unit includes a circuit having a same structure as that of at least one of the conversion circuit, the noise eliminating circuit, and the output circuit.

Abstract: An image formation apparatus includes: a fixer that fixes a toner image onto a sheet by heat and pressure, and includes: a heat source; a first rotary member that is heated by the heat source; a temperature sensing unit that senses a temperature of the first rotary member; and a second rotary member that forms a nip with the first rotary member for applying heat and pressure to the sheet; and a controller that calculates a nip width of the nip in a passing direction of the sheet with use of a rotation period and a rest period of the first rotary member during which the heat source operates, and changes a target temperature of the first rotary member in accordance with the calculated nip width.

Abstract: An imaging element includes: a plurality of pixels configured to receive light from outside and generate and output an imaging signal depending on an amount of the light received; a first transfer line connected to the pixel; a second transfer line; a column selection switch configured to select one pixel column and output the imaging signal to the second transfer line; a column source follower including a gate to which the imaging signal transferred by the first transfer line is input, a drain end being connected to a power supply voltage, and a source end being connected to the column selection switch; a constant current source configured to drive the column source follower and read out the imaging signal to the second transfer line; and a current generating unit configured to flow a predetermined current to the source end side of the column source follower.

Abstract: A fixing device includes: a fixing side member; a fixing belt; a back side supporting member configured to form a fixing nip for conveying the recording medium in a tightly sandwiching manner; a heating roller configured to heat the fixing belt from inside; a first movement section configured to move the fixing side member between a first pressure contact position where the fixing side member is brought into pressure contact with the back side supporting member with the fixing belt therebetween, and a second pressure contact position where the fixing side member is brought into pressure contact with the heating roller; and a control section configured to control the first movement section to move the fixing side member to the first pressure contact position in a printing operation, and move the fixing side member to the second pressure contact position when the printing operation is not performed.

Abstract: A solid-state imaging apparatus includes an imaging section in which a plurality of pixels, each of which has a photoelectric conversion element, are disposed in a matrix; a clock generation section; a reference signal generation section configured to generate a reference signal whose amplitude increases or decreases with the passage of time; a comparison section disposed corresponding to a column in an array of the plurality of pixels; a latch section disposed corresponding to the comparison section and configured to latch logic states of the plurality of phase signals; and a latch control section disposed corresponding to the comparison section, wherein the comparison section includes a differential amplifier, a current output element, and a third transistor, and wherein the comparison section outputs a second comparison signal based on the current output from the current output element after the second timing.

Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.

Abstract: An image forming apparatus has an operating state and a non-operating state with power consumption smaller than in the operating state. The image forming apparatus includes: a fixing device for thermally fixing a toner image on a print material; an execution unit for executing warm-up to heat the fixing device up to a printable temperature for fixing the toner image on the print material, upon power-on or in shifting from the non-operating state to the operating state; and a temperature control unit for maintaining a waiting state to keep the fixing device at the printable temperature or higher, after completion of warm-up or printing. The temperature control unit increases the temperature of the fixing device higher in a waiting state after printing a predetermined number of times since power-on or in a waiting state after the non-operating state for a predetermined time or longer, than in any other waiting state.

Abstract: An image forming apparatus has an operating state and a non-operating state with power consumption smaller than in the operating state. The image forming apparatus includes a fixing device for fixing a toner image on a print material by heat, a fan for discharging heat from the image forming apparatus, and a control unit for controlling operation of the fan. When a non-operating time from shifting to the non-operating state to shifting to the operating state is shorter than a predetermined time, the control unit allows the fan to operate with predetermined power in the operating state. When the non-operating time is equal to or longer than the predetermined time, the control unit stops the fan or allows the fan to operate with power smaller than the predetermined power in the operating state.

Abstract: A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.

Abstract: An image formation apparatus includes: a fixer that fixes a toner image onto a sheet by heat and pressure, and includes: a heat source; a first rotary member that is heated by the heat source; a temperature sensing unit that senses a temperature of the first rotary member; and a second rotary member that forms a nip with the first rotary member for applying heat and pressure to the sheet; and a controller that calculates a nip width of the nip in a passing direction of the sheet with use of a rotation period and a rest period of the first rotary member during which the heat source operates, and changes a target temperature of the first rotary member in accordance with the calculated nip width.

Abstract: An image sensor includes: photoelectric conversion elements configured to receive light and accumulate a charge corresponding to an amount of received light; an imaging signal generating unit that converts the charge accumulated in each photoelectric conversion element into a voltage to generate an imaging signal; and a reference signal generating unit that generates a reference signal having a fluctuation component with a same phase as the imaging signal. The imaging signal generating unit includes: a conversion circuit that converts the charge accumulated in each photoelectric conversion element into the imaging signal; a noise eliminating circuit that eliminates a noise component included in the imaging signal; and an output circuit that outputs the imaging signal from the conversion circuit. The reference signal generating unit includes a circuit having a same structure as that of at least one of the conversion circuit, the noise eliminating circuit, and the output circuit.

Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching.

Abstract: A plasma processing apparatus includes a first and second electrodes disposed on upper and lower sides and opposite each other within a process container, a first RF power application unit and a DC power supply both connected to the first electrode, and second and third radio frequency power application units both connected to the second electrode. A conductive member is disposed within the process container and grounded to release through plasma a current caused by a DC voltage applied from the DC power supply. The conductive member is supported by a first shield part around the second electrode and laterally protruding therefrom at a position between the mount face of the second electrode and an exhaust plate for the conductive member to be exposed to the plasma. The conductive member is grounded through a conductive internal body of the first shield part.

Abstract: A plasma processing apparatus includes a processing chamber including a dielectric window; a coil shaped RF antenna provided outside the dielectric window; a substrate supporting unit, provided in the processing chamber, for mounting thereon a target substrate to be processed; a processing gas supply unit for supplying a desired processing gas to the processing chamber to perform a desired plasma process on the target substrate; and an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the processing chamber. The apparatus further includes a floating coil electrically floated and arranged at a position outside the processing chamber where the floating coil is to be coupled with the RF antenna by an electromagnetic induction; and a capacitor provided in a loop of the floating coil.

Abstract: An image capturing device includes a first substrate and a second substrate that are stacked in stages; a pixel section in the first substrate in which a plurality of pixels outputting signals according to incident physical quantities are disposed in a matrix form; a first AD conversion circuit in the first substrate for every column or every plurality of columns of pixels performing AD conversion on signals output by pixels; a connector that electrically connects the first substrate and the second substrate; a second AD conversion circuit in the second substrate for every column or every plurality of columns of pixels and performing AD conversion on signals output by pixels and inputting through the connector; and a controller in the first substrate or the second substrate and supplying a control signal to the first AD conversion circuit and the second AD conversion circuit.

Abstract: A plasma processing apparatus includes: an evacuable processing chamber including a dielectric window; a substrate supporting unit, provided in the processing chamber, for mounting thereon a target substrate; a processing gas supply unit for supplying a desired processing gas to the processing chamber to perform a plasma process on the target substrate; a first RF antenna, provided on the dielectric window, for generating a plasma by an inductive coupling in the processing chamber; and a first RF power supply unit for supplying an RF power to the first RF antenna. The first RF antenna includes a primary coil provided on or above the dielectric window and electrically connected to the first RF power supply unit; and a secondary coil provided such that the coils are coupled with each other by an electromagnetic induction therebetween while being arranged closer to a bottom surface of the dielectric window than the primary coil.

Abstract: An air intake system for a saddle-ride vehicle for facilitating the intake of fresh air and for enabling a discharge of excess pressure in an air cleaner box. The system includes an air cleaner box with an air cleaner element housed in an air cleaner case and an intake duct connected to the air cleaner box with an intake port open toward a vehicle front side, in which the intake duct has a duct opening oriented outward of the duct between the intake port and the air cleaner box. The air cleaner box includes parts for connecting the intake duct, a connecting tube and also case openings oriented outward of the case.

Abstract: A plasma processing apparatus includes a processing chamber including a dielectric window; a coil shaped RF antenna provided outside the dielectric window; a substrate supporting unit, provided in the processing chamber, for mounting thereon a target substrate to be processed; a processing gas supply unit for supplying a desired processing gas to the processing chamber to perform a desired plasma process on the target substrate; and an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the processing chamber. The apparatus further includes a floating coil electrically floated and arranged at a position outside the processing chamber where the floating coil is to be coupled with the RF antenna by an electromagnetic induction; and a capacitor provided in a loop of the floating coil.

Abstract: An image forming apparatus has a fusing unit including a first rotor provided with a heat-generating unit and an elastic layer, as well as a second rotor provided in direct contact with the first rotor, the fusing unit fixing a toner image on a sheet, and a duct for allowing an inlet and an exhaust outlet to communicate with each other, the inlet being adapted to allow a current of air derived from the fusing unit to flow in, the exhaust outlet facing toward the outside of the apparatus. The duct includes an introduction channel for guiding and jetting out air taken in from the inlet, a main channel for guiding the air jetted out of the introduction channel to the exhaust outlet, and a cul-de-sac provided in communication with the main channel at one end and closed at the other end.

Abstract: Provided are: a uniformly, highly dispersed metal catalyst including a catalyst carrier and a catalyst metal being loaded thereon dispersed throughout the carrier, the uniformly, highly dispersed metal catalyst having excellent performances with respect to catalytic activity, selectivity, life, etc.; and a method of producing the same. The uniformly, highly dispersed metal catalyst includes a catalyst carrier made of a metal oxide and a catalyst metal having catalytic activity, the catalyst metal being loaded on the catalyst carrier, in which the catalyst carrier is a sulfur-containing catalyst carrier having sulfur or a sulfur compound almost evenly distributed throughout the carrier and the catalyst metal is loaded on the sulfur-containing catalyst carrier in a substantially evenly dispersed manner over the entire carrier substantially according to the distribution of the sulfur or the sulfur compound.