Abstract: Provided is a method for producing hydrogen aimed at storage and transportation, by which hydrogen for storage and transportation that is necessary for smoothly performing an organic chemical hydride method can be industrially produced efficiently at low cost. The method is a method for producing hydrogen aimed at storage and transportation in an organic chemical hydride method, in which: the hydrogenation process of an aromatic compound uses, as a hydrogen source for the reaction of the aromatic compound, a reaction gas is produced by a reforming reaction and adjusted a hydrogen concentration from 30 to 70 vol % by a shift reaction; and a hydrogenated aromatic compound is separated from a reaction mixture obtained in the hydrogenation process, which is followed by purification.

Abstract: An image processing device comprising: first A/D converters that receive output signals of respective columns of a plurality of pixels arranged in a matrix form, convert the output signals into first digital signals, and output the first digital signals; a second A/D converter that receives a correction signal, converts the correction signal into a second digital signal, and outputs the second digital signal; a first correction calculation unit that produces a first correction formula; a second correction calculation unit that produces a second correction formula based on the second digital signal; a determination unit that compares a coefficient of the second correction formula and a coefficient of a second correction formula produced before the second correction formula, and determines whether or not to produce the first correction formula based on the comparison result; and a signal output unit that outputs an update signal when it is determined to produce the first correction formula.

Abstract: A plasma processing apparatus includes a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit provided in the processing chamber; a processing gas supply unit; an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the processing chamber, the RF power having an appropriate frequency for RF discharge of the processing gas; a correction coil, provided at a position outside the processing chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution on the substrate in the processing chamber; a switching device provided in a loop of the correction coil; and a switching control unit for on-off controlling the switching device at a desired duty ratio by pulse width modulation.

Abstract: A plasma processing apparatus includes a first and second electrodes disposed on upper and lower sides and opposite each other within a process container, a first RF power application unit and a DC power supply both connected to the first electrode, and second and third radio frequency power application units both connected to the second electrode. A conductive member is disposed within the process container and grounded to release through plasma a current caused by a DC voltage applied from the DC power supply. The conductive member is supported by a first shield part around the second electrode and laterally protruding therefrom at a position between the mount face of the second electrode and an exhaust plate for the conductive member to be exposed to the plasma. The conductive member is grounded through a conductive internal body of the first shield part.

Abstract: The disclosed is an arteriosclerosis evaluating apparatus capable of easily separating pulse wave data detected at one measurement site into an incident wave and a reflected wave and capable of easily determining and evaluating the degree of arteriosclerosis. The pulse wave transmitted through an artery is detected at one site of a living body by a pulse wave detection device, and the detected pulse wave is fitted with a fitting function by a breakdown device so that the detected pulse wave can be broken down into an incident wave and a reflected wave. The degree of arteriosclerosis is evaluated from the amplitude intensities (i.e., peak intensities) of the incident wave and the reflected wave broken down from the pulse wave.

Abstract: The present invention aims to improve shape precision of a molded body when a plurality of molded bodies, which are projections or recesses made of a curable resin, are formed on both sides of a glass substrate. Disclosed is a method for producing a molded body, which comprises a step of preparing a first mold having a plurality of negative molding surfaces having shapes corresponding to a plurality of molding parts; a step of applying a curable resin onto a surface of the first mold on which the molding surfaces are formed; and a curing step of curing the applied curable resin. The curing step includes a photocuring step wherein curing of the curable resin is carried out by irradiating the resin with light, and a heat curing step wherein the curable resin partly cured by the photocuring step is further cured by being subjected to a heat treatment.

Abstract: A cleaning substrate that can prevent a decrease in the operating rate of a substrate processing apparatus. The cleaning substrate that cleans the interior of a chamber in the substrate processing apparatus has a removal mechanism that removes foreign matter in the chamber.

Abstract: A plasma processing apparatus includes: a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit, provided in the chamber, for mounting thereon a target substrate; a processing gas supply unit for supplying a processing gas to the chamber; and an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the chamber. The apparatus further includes a correction coil, provided at a position outside the chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution in the chamber; and an antenna-coil distance control unit for controlling a distance between the RF antenna and the correction coil while supporting the correction coil substantially in parallel with the RF antenna.

Abstract: A plasma processing apparatus includes a processing container, an exhaust unit, an exhaust plate, an RF power application unit connected to a second electrode but not connected to the first electrode and configured to apply an RF power with a single frequency, the second electrode being connected to no power supply that applies an RF power other than the RF power with the single frequency, a DC power supply connected to the first electrode but not connected to the second electrode, the first electrode being connected to no power supply that applies an RF power, and a conductive member within the process container grounded to release through plasma a current caused by the DC voltage, the conductive member supported by the first shield part and laterally protruding therefrom only at a position that is located, in a height-wise direction, between a mount face and the exhaust plate and below a bottom of a focus ring.

Abstract: An input device includes a flexible base, a sensor member that is provided on the surface of the flexible base and can detect the operation position of a finger, connection portions that are provided on a back of the flexible base, a printed circuit board of which an area is smaller than the area of the flexible base and which includes terminal portions on the surface thereof facing the back, and an electronic component that is mounted on a surface of the printed circuit board opposite to the surface of the printed circuit board on which the terminal portions are provided and is electrically connected to the terminal portions. The flexible base and the printed circuit board are bonded to each other with an adhesion layer interposed therebetween so that the connection portions come into contact with the terminal portions.

Abstract: There are provided a method of heating a focus ring and a plasma etching apparatus, capable of simplifying a structure of a heating mechanism without a dummy substrate. The plasma etching apparatus includes a vacuum processing chamber; a lower electrode serving as a mounting table for mounting a substrate thereon; an upper electrode provided to face the lower electrode; a gas supply unit for supplying a processing gas; a high frequency power supply for supplying a high frequency power to the lower electrode to generate a plasma of the processing gas; and a focus ring provided on the lower electrode to surround a periphery of the substrate. In the plasma etching apparatus, the focus ring is heated by irradiating a heating light thereto from a light source provided outside the vacuum processing chamber.

Abstract: An imaging device includes a plurality of first pixels, each of which outputs a first pixel signal, a plurality of second pixels, each of which outputs a second pixel signal, a ramp wave generator that outputs a ramp signal that monotonously increases or monotonously decreases over time, a phase shift pulse generator that outputs first to n-th phase shift pulse signals, a first pixel latch group that latches the first to n-th phase shift pulse signals when the first pixel signal and the ramp signal have a predetermined relationship, a second pixel latch group that latches the first to n-th phase shift pulse signals when the second pixel signal and the ramp signal have the predetermined relationship, first to n-th power source lines to supply a power source and first to n-th phase shift pulse supply lines to supply the phase shift pulses.

Abstract: An image forming apparatus has an outline surrounded by a casing. The casing has an opening. The image forming apparatus includes a fixing unit configured to fix an image formed on a recording medium, and a control unit. The fixing unit includes a heating fixing member. The control unit is configured to control an opening degree of the opening based on temperature of a surface of or in the vicinity of the heating fixing member, so as to prevent emission of a substance by an air current to outside of the casing through the opening, during an image forming operation.

Abstract: There are provided a method of heating a focus ring and a plasma etching apparatus, capable of simplifying a structure of a heating mechanism without a dummy substrate. The plasma etching apparatus includes a vacuum processing chamber; a lower electrode serving as a mounting table for mounting a substrate thereon; an upper electrode provided to face the lower electrode; a gas supply unit for supplying a processing gas; a high frequency power supply for supplying a high frequency power to the lower electrode to generate a plasma of the processing gas; and a focus ring provided on the lower electrode to surround a periphery of the substrate. In the plasma etching apparatus, the focus ring is heated by irradiating a heating light thereto from a light source provided outside the vacuum processing chamber.

Abstract: There is provided a method for producing a wafer lens assembly capable of adhering a wafer lens and a spacer surely. The wafer lens assembly includes a first substrate including plural optical members formed of a curable resin on at least one surface, a second substrate joined to the first substrate, and a stop member arranged between the first and second substrates. The first and second substrates are adhered with an adhesive made of a photo-curable resin. The method includes an adhesive applying step of applying the adhesive made of a photo-curable resin on a joining area, a stop-member forming step, and a photo-curing step of irradiating and hardening the adhesive applied in the adhesive applying step with light after the stop-member forming step. The stop member is formed so as not to prevent the light irradiated in the photo-curing step from reaching the adhesive.

Abstract: An arteriosclerosis diagnostic device according to various embodiments is a simple device, resistant to an external factor, such as an error resulting from a skin surface, and capable of measuring the degree of hardness of an artery. The arteriosclerosis diagnostic device detects a heart sound and a pulse wave at least one location of a living body, the pulse wave propagating through an artery in relation to the heart sound, converts detected signals thereof into respective frequency signals, specifies the peak frequency of each of the frequency signals, and determines the degree of arteriosclerosis on the basis of the difference between the peak frequency of the heart sound and the peak frequency of the pulse wave. Accordingly, the degree of arteriosclerosis can be determined by comparison between the frequency signals.

Abstract: A method of manufacturing a lens array includes the steps of feeding a first curable resin between a first array mold and a plate member and curing the first resin; separating the plate member from the first array mold; feeding a second curable resin between the first array mold and a second array mold while leaving the cured first resin on the first array mold, and curing the second resin; and removing the first array mold and the second array mold.

Abstract: If a power supply is provided to a circuit necessary to control a switch for switching a path after wakeup, or if a buckle switch is switched while a microcomputer is asleep, an electrical current necessary for reliable operation of the buckle switch cannot be supplied during sleep, so that the buckle switch will not operate normally. This creates the possibility that wakeup cannot be performed. To permit the electrical current necessary for reliable operation of the buckle switch to be secured if the buckle switch is switched while the microcomputer is asleep, an FET capable of being kept ON or OFF by a power supply acting during sleep, a resistor connected with the FET, and a resistor of large resistance for blocking excessive dark current if the buckle switch is connected are arranged in parallel. The combined resistance of the parallel combination of these elements is used as a pull-up resistance at the input of a control unit.

Abstract: Provided is a method for producing hydrogen aimed at storage and transportation, by which hydrogen for storage and transportation that is necessary for smoothly performing an organic chemical hydride method can be industrially produced efficiently at low cost. The method is a method for producing hydrogen aimed at storage and transportation in an organic chemical hydride method, in which: the hydrogenation process of an aromatic compound uses, as a hydrogen source for the reaction of the aromatic compound, a reaction gas is produced by a reforming reaction and adjusted a hydrogen concentration from 30 to 70 vol % by a shift reaction; and a hydrogenated aromatic compound is separated from a reaction mixture obtained in the hydrogenation process, which is followed by purification.

Abstract: There is provided a method for producing a wafer lens assembly capable of adhering a wafer lens and a spacer surely. The wafer lens assembly includes a first substrate including plural optical members formed of a curable resin on at least one surface, a second substrate joined to the first substrate, and a stop member arranged between the first and second substrates. The first and second substrates are adhered with an adhesive made of a photo-curable resin. The method includes an adhesive applying step of applying the adhesive made of a photo-curable resin on a joining area, a stop-member forming step, and a photo-curing step of irradiating and hardening the adhesive applied in the adhesive applying step with light after the stop-member forming step. The stop member is formed so as not to prevent the light irradiated in the photo-curing step from reaching the adhesive.