Patents by Inventor Masataka Kato
Masataka Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6722289Abstract: A table system with angular position control in which a table is moved accurately over a tiny angle in circular direction to any desired position. The table is supported on a bed for rotation through a crossed-roller bearing. Position control apparatus turns the table over a tiny angle through an arm plate fastened to the table. A nut and screw set cause a linear motion that is in line with a tangent of the table, and the linear motion is translated into a circular motion to turn the table by a first linear motion guide unit to control the linear motion in the tangential direction, and a second linear motion guide unit to control a linear motion in the direction facing the center of the table.Type: GrantFiled: May 10, 2002Date of Patent: April 20, 2004Assignee: Nippon Thompson Co., Ltd.Inventor: Masataka Kato
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Publication number: 20040070026Abstract: A multi-storage nonvolatile memory of high density, high speed and high reliability has a memory transistor and switch transistors disposed on both the sides of the memory transistor. The memory transistor includes a gate insulating film having discrete traps and a memory gate electrode, whereas the switch transistors include switch gate electrodes. The gate insulating film has the discrete traps for storing information charge, can locally inject carriers, and one memory cell constitutes a multi-storage cell for storing at least information of 2 bits. The switch transistors having the switch gate electrodes realize source side injection. The memory transistor is fommed together with the switch transistors in self-aligned diffusion. The memory gate electrode of the memory transistor is connected to a word line so as to perform word-line erase.Type: ApplicationFiled: September 17, 2003Publication date: April 15, 2004Applicant: Hitachi, Ltd.Inventors: Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Masataka Kato
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Patent number: 6680979Abstract: A transmission line is monitored while the communication is held in a steady state and moving a tone set if there are no tones securing a predetermined value of an S/N ratio. The tone set is not moving if there are at least two tones securing the S/N ratio. The tone set is moved by the predetermined method if there is one tone securing the S/N ratio and it is judged that communication quality can be maintained by moving the tone set in a same tone group. The tone group moved if it is judged that the communication quality cannot be maintained even by executing movement of the tone set in the same tone group.Type: GrantFiled: May 8, 2001Date of Patent: January 20, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Masataka Kato, Tsuyoshi Kobayashi, Yoshiaki Koizumi, Wataru Matsumoto
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Patent number: 6674122Abstract: A multi-storage nonvolatile memory of high density, high speed and high reliability has a memory transistor and switch transistors disposed on both the sides of the memory transistor. The memory transistor includes a gate insulating film having discrete traps and a memory gate electrode, whereas the switch transistors include switch gate electrodes. The gate insulating film has the discrete traps for storing information charge, can locally inject carriers, and one memory cell constitutes a multi-storage cell for storing at least information of 2 bits. The switch transistors having the switch gate electrodes realize source side injection. The memory transistor is fommed together with the switch transistors in self-aligned diffusion. The memory gate electrode of the memory transistor is connected to a word line so as to perform word-line erase.Type: GrantFiled: March 4, 2003Date of Patent: January 6, 2004Assignee: Hitachi, Ltd.Inventors: Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Masataka Kato
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Semiconductor device having groove isolation structure and gate oxide films with different thickness
Patent number: 6657248Abstract: There was a problem that sharpening of a substrate and localized increase in the thickness of a gate oxide film become more remarkable as the thickness of the gate oxide film is increased to degrade the gate withstand voltage at the surface edge of shallow groove isolation structure. In the present invention, a bird's beak is disposed at the surface edge of a shallow isolation structure GROX11 just below gate electrode POLY11 and in contact with the gate insulation film HOX1 to form the gate insulation film HOX1 previously. This can ensure normal gate withstand voltage of the MOS transistor and favorable device isolation withstand voltage and increased integration degree simultaneously.Type: GrantFiled: November 2, 1999Date of Patent: December 2, 2003Assignee: Hitachi, Ltd.Inventors: Nozomu Matsuzaki, Takashi Kobayashi, Hitoshi Kume, Toshiyuki Mine, Kikuo Kusukawa, Norio Suzuki, Kenji Takahashi, Toshiaki Nishimoto, Masataka Kato -
Patent number: 6626571Abstract: In sealing means for a slider unit in which sealing members of foam rubber are arranged to close sidewise clearances left open between a dustproof cover and side walls of a track rail, the improved sealing means is directed to making sure of effective sealing performance, prolonging a durable service life of the sealing member, and also making mounting of the sealing member to the clearances easier. Sealing members of flexible foam rubber rich in restoring force are arranged in the clearance between the dustproof cover and the side walls of the track rail. The sealing members, while fastened to the dustproof cover, are allowed to experience any deformation of expansion/collapse when sideward wings of the slider moves back and forward between the confronting sealing members and the side walls, with keeping close sliding engagement with the associated surfaces of the wings.Type: GrantFiled: October 25, 2001Date of Patent: September 30, 2003Assignee: Nippon Thompson Co., Ltd.Inventors: Masataka Kato, Ikuhisa Miwa
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Publication number: 20030155607Abstract: A multi-storage nonvolatile memory of high density, high speed and high reliability has a memory transistor and switch transistors disposed on both the sides of the memory transistor. The memory transistor includes a gate insulating film having discrete traps and a memory gate electrode, whereas the switch transistors include switch gate electrodes. The gate insulating film has the discrete traps for storing information charge, can locally inject carriers, and one memory cell constitutes a multi-storage cell for storing at least information of 2 bits. The switch transistors having the switch gate electrodes realize source side injection. The memory transistor is formed together with the switch transistors in self-aligned diffusion. The memory gate electrode of the memory transistor is connected to a word line so as to perform word-line erase.Type: ApplicationFiled: March 4, 2003Publication date: August 21, 2003Applicant: Hitachi, Ltd.Inventors: Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Masataka Kato
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Publication number: 20030148583Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: ApplicationFiled: February 27, 2003Publication date: August 7, 2003Inventors: Tetsuo Adachi, Masataka Kato, Toshiaki Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine
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Publication number: 20030133353Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: ApplicationFiled: January 27, 2003Publication date: July 17, 2003Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Publication number: 20030098551Abstract: With a sealing structure for the sliding unit disclosed here, a sealing member of foam rubber is disposed in a way closing a clearance left open between widthwise opposing covering shells installed on a track rail. A covering shell is composed of a covering side secured to a side wall of a track rail, and seal supporters integral with the covering side. A slider is provided with a projection extending through between inside fronts of the sealing members, which come into abutment against one another. Upon the back-and-forward linear movement of the slider relatively to the track rail, the projection moves in a way deforming the sealing members in expansion/collapse fashion, with keeping the close sliding engagement with the confronting fronts of the sealing members so that the sealing members keep constantly closing the clearance left open between the covering shells.Type: ApplicationFiled: October 30, 2002Publication date: May 29, 2003Applicant: NIPPON THOMPSON CO., LTD.Inventor: Masataka Kato
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Patent number: 6538926Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: GrantFiled: October 31, 2001Date of Patent: March 25, 2003Assignee: Hitachi, Ltd.Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Patent number: 6531735Abstract: A multi-storage nonvolatile memory of high density, high speed and high reliability has a memory transistor and switch transistors disposed on both the sides of the memory transistor. The memory transistor includes a gate insulating film having discrete traps and a memory gate electrode, whereas the switch transistors include switch gate electrodes. The gate insulating film has the discrete traps for storing information charge, can locally inject carriers, and one memory cell constitutes a multi-storage cell for storing at least information of 2 bits. The switch transistors having the switch gate electrodes realize source side injection. The memory transistor is fommed together with the switch transistors in self-aligned diffusion. The memory gate electrode of the memory transistor is connected to a word line so as to perform word-line erase.Type: GrantFiled: September 13, 2000Date of Patent: March 11, 2003Assignee: Hitachi, Ltd.Inventors: Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Masataka Kato
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Publication number: 20030018735Abstract: The communication system conducts communication among nodes N1 to N4 that form a communication network of bus type by using set communication parameters. The communication system includes one master node N1 selected from among the nodes N1 to N4; and one or more slave nodes N2 to N4 that are nodes N2 to N4 other than the master node N1, the one or more slave nodes logically star-connected to the master node N1, each of the one or more slave nodes conducting communication with another node N2 to N4 via the master node N1 by using communication parameters negotiated with the master node N1.Type: ApplicationFiled: January 22, 2002Publication date: January 23, 2003Inventors: Teruko Fujii, Yoshimasa Baba, Yasuyuki Nagashima, Masataka Kato
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Patent number: 6510086Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to store the data in the nonvolatile memory, and the nonvolatile memory is capable of performing at least a program operation and an erase operation. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the erase operation. Also, the buffer memory is capable of receiving a unit of data, in the program operation, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: GrantFiled: October 31, 2001Date of Patent: January 21, 2003Assignee: Hitachi, Ltd.Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Publication number: 20030003644Abstract: To suppress oxidation of inner walls of element isolation grooves otherwise occurring during thermal oxidation processes. A nitrogen introducing layer less in diffusion coefficient relative to an oxidizing agent is formed at the surface portion of a silicon oxide film as buried within an element isolation groove. This nitrogen introduce layer functions as a barrier layer for precluding the oxidizer (such as oxygen, water or else) in vapor phase from diffusing into the silicon oxide film at thermal processing steps. The nitrogen introduce layer is formed by performing nitrogen ion implantation into an entire surface of a substrate and subsequently applying thermal processing to the substrate to thereby activate the nitrogen doped.Type: ApplicationFiled: June 14, 2002Publication date: January 2, 2003Inventors: Toshiya Uenishi, Satoshi Meguro, Masaharu Kubo, Masataka Kato, Hideo Miura, Norio Suzuki
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Publication number: 20020191540Abstract: Nodes (N1 to N3) include MTU length calculation sections (31 to 33) which multiply baud rates (D21 to D23) of communication parameters (D11 to D13) set based on results of negotiation with other nodes (N1 to N3) by a communication regulated time used in timer control for transmission/reception, and which calculate MTU lengths as maximum packet lengths of the packets based on the multiplication results so that transmission times of the packets for the destination nodes are equal to each other, and also include communication control sections (21 to 23) which divide data to be transmitted to destination nodes into packets having the calculated MTU length to transmit the packets.Type: ApplicationFiled: June 24, 2002Publication date: December 19, 2002Inventors: Teruko Fujii, Yoshimasa Baba, Yasuyuki Nagashima, Masataka Kato
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Publication number: 20020192887Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: ApplicationFiled: June 18, 2002Publication date: December 19, 2002Inventors: Tetsuo Adachi, Masataka Kato, Toshiakl Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine
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Publication number: 20020170188Abstract: A table system with angular position control means is disclosed in which an object supported on a table can be moved accurately over a tiny angle in circular direction to any desired position. The table is supported on a bed for rotation through a crossed-roller bearing. Position control means gets the table to turn over a tiny angle through an arm plate fastened to the table. A nut and screw set, when driven by a motor, causes a linear motion that is in line with a tangent of the table, and the linear motion is translated into a circular motion to turn the table in any circular direction by virtue of a combination of a first linear motion guide unit interposed between the bed and a carriage to control the linear motion in the tangential direction, a second bearing means interposed between the carriage and a turret means, and a second linear motion guide unit to control a linear motion in the direction that looks towards the center of the table.Type: ApplicationFiled: May 10, 2002Publication date: November 21, 2002Applicant: NIPPON THOMPSON CO., LTD.Inventor: Masataka Kato
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Patent number: 6461916Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: GrantFiled: February 7, 2000Date of Patent: October 8, 2002Assignee: Hitachi, Ltd.Inventors: Tetsuo Adachi, Masataka Kato, Toshiakl Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine
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Patent number: 6444554Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: GrantFiled: December 11, 2001Date of Patent: September 3, 2002Assignee: Hitachi, Ltd.Inventors: Tetsuo Adachi, Masataka Kato, Toshiakl Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine