Patents by Inventor Masataka Watanabe

Masataka Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100276709
    Abstract: A method for manufacturing a compound semiconductor substrate includes at least the processes of epitaxially growing a quaternary light emitting layer composed of AlGaInP on a GaAs substrate; vapor-phase growing a p-type GaP window layer on a first main surface of the quaternary light emitting layer, the first main surface being opposite to the GaAs substrate; removing the GaAs substrate; and epitaxially growing an n-type GaP window layer on a second main surface of the light emitting layer, the second main surface being located at a side where the GaAs substrate is removed. The method includes the process of performing a heat treatment under a hydrogen atmosphere containing ammonia after the process of removing the GaAs substrate and before the process of epitaxially growing the n-type GaP window layer.
    Type: Application
    Filed: January 14, 2009
    Publication date: November 4, 2010
    Applicant: SHIN-ETSU HANDOTAI, CO. LTD.
    Inventors: Yukari Suzuki, Jun Ikeda, Masataka Watanabe
  • Publication number: 20100239602
    Abstract: This invention is intended to discover a fraction having strong anti-influenza virus activity via M? activation in the Grifola frondosa extract or an active substance distributed therein to develop a simple and effective production method and to use such fraction for food and beverage products, pharmaceutical products, feeds or feed additives, and the like. This is realized by treatment of maitake mushrooms with a molecular sieve apparatus, such as an ultrafiltration apparatus or gel filtration apparatus, to isolate glycoprotein-containing fractions or sugar-protein complex-containing fractions having molecular weights of 30,000 to 100,000, so as to minimize the influence on substances having strong anti-influenza virus activity and contaminants.
    Type: Application
    Filed: October 26, 2007
    Publication date: September 23, 2010
    Applicant: YUKIGUNI MAITAKE CO., LTD.
    Inventors: Masataka Watanabe, Masahide Takeyama
  • Patent number: 7648867
    Abstract: A method for fabricating a semiconductor device includes: forming a dummy gate that defines a region in which a gate electrode should be formed on a semiconductor substrate; forming a surface film on the semiconductor substrate by directional sputtering vertical to a surface of the semiconductor substrate, the directional sputtering being one of collimate sputtering, long throw sputtering and ion beam sputtering; removing the surface film formed along a sidewall of the dummy gate; removing the dummy gate; and forming the gate electrode in the region from which the dummy gate on the semiconductor substrate has been removed.
    Type: Grant
    Filed: February 7, 2008
    Date of Patent: January 19, 2010
    Assignee: Eudyna Devices Inc.
    Inventors: Masataka Watanabe, Hiroshi Yano
  • Publication number: 20100001376
    Abstract: The present invention provides a method for manufacturing a nitride semiconductor self-supporting substrate and a nitride semiconductor self-supporting substrate manufactured by this manufacturing method, the method including at least: a step of preparing a nitride semiconductor self-supporting substrate serving as a seed substrate; a step of epitaxially growing the same type of nitride semiconductor as the seed substrate on the seed substrate; and a step of slicing an epitaxially grown substrate subjected to the epitaxial growth into two pieces in parallel to an epitaxial growth surface. As a result, there is provided a method for manufacturing a large-diameter nitride semiconductor self-supporting substrate having an excellent crystal quality and small warp with good productivity at a low cost, etc.
    Type: Application
    Filed: December 5, 2007
    Publication date: January 7, 2010
    Applicant: SHIN-ETSU HANDOTAI CO., LTD
    Inventors: Shoichi Takamizawa, Masataka Watanabe
  • Publication number: 20080188066
    Abstract: A method for fabricating a semiconductor device includes: forming a dummy gate that defines a region in which a gate electrode should be formed on a semiconductor substrate; forming a surface film on the semiconductor substrate by directional sputtering vertical to a surface of the semiconductor substrate, the directional sputtering being one of collimate sputtering, long throw sputtering and ion beam sputtering; removing the surface film formed along a sidewall of the dummy gate; removing the dummy gate; and forming the gate electrode in the region from which the dummy gate on the semiconductor substrate has been removed.
    Type: Application
    Filed: February 7, 2008
    Publication date: August 7, 2008
    Applicant: EUDYNA DEVICES INC.
    Inventors: Masataka WATANABE, Hiroshi YANO
  • Publication number: 20070061620
    Abstract: When key interruption is notified to an application in a embedded system like a portable information terminal, sometimes notification of a key event to CPU is not carried out appropriately. A key controller includes a key table containing key information which specifies key type and operation style valid to execution of application by the CPU and notification information which specifies notification style to the interruption controller for each key. A key control unit of the key controller sets key information and notification information corresponding to the application which the CPU executes, in a register of the key controller and notifies the interruption controller of generation of key interruption corresponding to key operation based on the set information.
    Type: Application
    Filed: September 7, 2006
    Publication date: March 15, 2007
    Applicant: NEC SOFT. LTD.
    Inventor: Masataka Watanabe
  • Patent number: 7122280
    Abstract: A square substrate has a pair of opposed major surfaces and peripheral end faces therebetween, wherein a tapered edge portion is disposed between the peripheral end face and each major surface to define an inner boundary with the major surface, and has a width of 0.2–1 mm from the peripheral end face. Both or either one of the major surfaces of the substrate has a flatness of up to 0.5 ?m in an outside region of the substrate that extends between a position spaced 3 mm inward from the peripheral end face and the inner boundary of the tapered edge portion.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: October 17, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jiro Moriya, Masataka Watanabe, Satoshi Okazaki
  • Patent number: 7055345
    Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: June 6, 2006
    Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
  • Publication number: 20050132753
    Abstract: A method for manufacturing an optical fiber comprises setting a heating condition for heating a glass rod, which is a parent material of the optical-fiber, and an elongating speed of the glass rod based on a prescribed numerical value which changes with a progress of elongation of the glass rod; heating and elongating the glass rod to generate a preform based on the heating condition and the elongating speed which are set by the setting; and drawing the preform to a filament-like form by further heating the preform to generate the optical fiber.
    Type: Application
    Filed: February 1, 2005
    Publication date: June 23, 2005
    Inventors: Yoshiaki Shimizu, Takaaki Nagano, Tadakatsu Shimada, Hideo Hirasawa, Masataka Watanabe, Kazuhisa Hatayama, Mitsukuni Sakashita, Minoru Taya, Waichi Yamamura, Shinji Suzuki, Jiro Moriya
  • Patent number: 6848276
    Abstract: A method for manufacturing an optical fiber comprises setting a heating condition for heating a glass rod, which is a parent material of the optical fiber, and an elongating speed of the glass rod based on a prescribed numerical value which changes with a progress of elongation of the glass rod; heating and elongating the glass rod to generate a preform based on the heating condition and the elongating speed which are set by the setting; and drawing the preform to a filament-like form by further heating the preform to generate the optical fiber.
    Type: Grant
    Filed: June 3, 2002
    Date of Patent: February 1, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiaki Shimizu, Takaaki Nagano, Tadakatsu Shimada, Hideo Hirasawa, Masataka Watanabe, Kazuhisa Hatayama, Mitsukuni Sakashita, Minoru Taya, Waichi Yamamura, Shinji Suzuki, Jiro Moriya
  • Patent number: 6790129
    Abstract: An angular substrate polishing method includes the steps of holding an angular substrate having a surface to be polished within a guide ring of a substrate holding head; pressing the substrate surface to be polished, and also one surface of the guide ring, against a polishing pad; and independently rotating the polishing pad and the substrate-holding head together with the substrate it holds while pressing the polishing pad-contacting surface of the guide ring against the polishing pad, to thereby polish the substrate surface. During the polishing step, a pressing force is applied to the guide ring which is separate from the pressing force applied to the substrate, enhancing the flatness of the polished substrate.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: September 14, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd
    Inventors: Jiro Moriya, Masataka Watanabe, Satoshi Okazaki, Hidekazu Ozawa, You Ishii, Shunichiro Kojima
  • Patent number: 6779362
    Abstract: A method for manufacturing an optical fiber comprises setting a heating condition for heating a glass rod, which is a parent material of the optical fiber, and an elongating speed of the glass rod based on a prescribed numerical value which changes with a progress of elongation of the glass rod; heating and elongating the glass rod to generate a preform based on the heating condition and the elongating speed which are set by the setting; and drawing the preform to a filament-like form by further heating the preform to generate the optical fiber.
    Type: Grant
    Filed: June 3, 2002
    Date of Patent: August 24, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiaki Shimizu, Takaaki Nagano, Tadakatsu Shimada, Hideo Hirasawa, Masataka Watanabe, Kazuhisa Hatayama, Mitsukuni Sakashita, Minoru Taya, Waichi Yamamura, Shinji Suzuki, Jiro Moriya
  • Patent number: 6672112
    Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.
    Type: Grant
    Filed: February 26, 2003
    Date of Patent: January 6, 2004
    Assignee: Shin-Etsu Chemical Co.
    Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
  • Patent number: 6666957
    Abstract: The present invention provides a magnetron sputtering system, which ensures a formation of a desired thin film, using a thick target. In the sputtering process, a portion of the target does not have erosion free portions. The present invention provides a magnetron sputtering system comprising a chamber for sputtering, a target electrode 5 installed inside said chamber, a substrate electrode 6 installed in the chamber opposite to the target electrode, a ring-shaped magnet 2 installed so as to enclose the side surface of the target electrode, and a semi-circular disk shaped magnet installed opposite to the target-mounted surface of the target electrode, wherein the semi-circular disk shaped magnet is rotated in the circumferential direction of the target electrode and is magnetized in the direction perpendicular to the target electrode. This ensures a specific magnetic field component to be generated over the thick planar target surface 3.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: December 23, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masataka Watanabe, Satoshi Okazaki, Hideo Kaneko, Ken Ohashi, Hideki Kobayashi
  • Patent number: 6641958
    Abstract: A phase shift mask blank includes a transparent substrate and a phase shift film composed primarily of a metal and silicon. The substrate has an etch rate A and the phase shift film has an etch rate B when the blank is patterned by reactive ion etching, such that the etch selectivity B/A is at least 5.0. When a phase shift mask is manufactured from the blank, the substrate is less prone to overetching, providing good controllability and in-plane uniformity of the phase shift in patterned areas. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: November 4, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yukio Inazuki, Tamotsu Maruyama, Mikio Kojima, Hideo Kaneko, Masataka Watanabe, Satoshi Okazaki
  • Publication number: 20030202984
    Abstract: The present invention relates to an active oxygen scavenging agent and a cancer chemopreventing agent both comprising a dried Grifola, a dry Grifola powder and/or a Grifola extract, and to a food or animal feed comprising the active oxygen scavenging agent or the cancer chemopreventing agent.
    Type: Application
    Filed: April 11, 2003
    Publication date: October 30, 2003
    Inventors: Kenji Tazawa, Yasuo Odaira, Masataka Watanabe
  • Patent number: 6616928
    Abstract: The present invention relates to an active oxygen scavenging agent and a cancer chemopreventing agent both comprising a dried Grifola, a dry Grifola powder and/or a Grifola extract, and to a food or animal feed comprising the active oxygen scavenging agent or the cancer chemopreventing agent.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: September 9, 2003
    Assignee: Yukiguni Maitake Co., Ltd.
    Inventors: Kenji Tazawa, Yasuo Odaira, Masataka Watanabe
  • Publication number: 20030126893
    Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.
    Type: Application
    Filed: February 26, 2003
    Publication date: July 10, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
  • Publication number: 20030121290
    Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.
    Type: Application
    Filed: February 24, 2003
    Publication date: July 3, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
  • Patent number: 6546759
    Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.
    Type: Grant
    Filed: July 3, 2000
    Date of Patent: April 15, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa