Abstract: A process for providing the surface of a film made from a weldable polymer material with projections. The projections are formed by particles which are applied, in particular sprayed, in the molten state onto the film surface. The welding factor is preferably significantly below 1.

Abstract: A film made from a weldable polymer material with projections. The projections are formed by particles which are applied, in particular sprayed, in the molten state onto the film surface. The welding factor is preferably significantly below 1.

Abstract: A semiconductor device particularly suitable for ICs with complementary field effect transistors and/or bipolar circuit elements comprises a semiconductor body having a first type substrate region on which is a second type epitaxial layer of which a part is bounded by an inset insulating pattern. A first type zone adjoins the inset pattern and extends down to the substrate region. Source and drain zones of an IGFET adjoin the pattern and are provided in the said epitaxial part, and a further circuit element is provided in the said first type zone.