Patents by Inventor Michael Friedmann
Michael Friedmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7876440Abstract: Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb.Type: GrantFiled: July 17, 2009Date of Patent: January 25, 2011Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant
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Publication number: 20100323756Abstract: There is disclosed a method and device for operating an image database shared by a plurality of users. In an embodiment, each image captured by a user and stored in a shared image database is associating with the geographic coordinates of the location at which the image was captured. A search engine for the image database is configured to accept geographic coordinates as a search criterion for locating at least one captured image stored in the shared image database. The images having location coordinates within a predefined range of geographic coordinates is displayed to the user.Type: ApplicationFiled: August 27, 2010Publication date: December 23, 2010Applicant: Research In Motion LimitedInventor: Michael FRIEDMANN
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Patent number: 7797019Abstract: There is disclosed a system and method for operating an image database shared by a plurality of users. In an embodiment, each image captured by a user and stored in a shared image database is associating with the geographic coordinates of the location at which the image was captured. A search engine for the image database is configured to accept geographic coordinates as a search criterion for locating at least one captured image stored in the shared image database. The search engine may be configured to accept as a search criterion user specified numeric geographic coordinates, or geographic coordinates generated by user navigation and selection of a desired point on a map. The search engine may also be configured to accept a range of geographic coordinates to locate a plurality of user-captured images within a certain range of a geographic location.Type: GrantFiled: March 29, 2006Date of Patent: September 14, 2010Assignee: Research in Motion LimitedInventor: Michael Friedmann
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Publication number: 20100091284Abstract: Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a ?1st diffraction order and a +1st diffraction order.Type: ApplicationFiled: December 18, 2009Publication date: April 15, 2010Applicant: KLA-TENCOR TECHNOLOGIES CORPORATIONInventors: Walter D. Mieher, Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher F. Bevis, John Fielden, Noah Bareket, Kenneth P. Gross, Piotr Zalicki, Dan Wack, Paola Dececco, Thaddeus G. Dziura, Mark Ghinovker
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Publication number: 20100073688Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.Type: ApplicationFiled: November 30, 2009Publication date: March 25, 2010Applicant: KLA-Tencor Technologies CorporationInventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
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Patent number: 7663753Abstract: Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb; target C is designed to have an offset Xc; and target D is designed to have an offset Xd. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.Type: GrantFiled: December 21, 2007Date of Patent: February 16, 2010Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher F. Bevis, John Fielden, Noah Bareket, Ken Gross, Piotr Zalicki, Dan Wack, Paola Dececco, Thaddeus G. Dziura, Mark Ghinovker
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Patent number: 7656528Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.Type: GrantFiled: February 9, 2007Date of Patent: February 2, 2010Assignee: KLA-Tencor CorporationInventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
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Publication number: 20090284744Abstract: Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb. Offset Xc is an opposite sign and differs from Xd. The offsets Xa, Xb, Xc and Xd are selected so that an overlay error, including the respective offset, is within a linear region of overlay values.Type: ApplicationFiled: July 17, 2009Publication date: November 19, 2009Applicant: KLA-TENCOR TECHNOLOGIES CORPORATIONInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant
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Publication number: 20090231584Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.Type: ApplicationFiled: April 22, 2009Publication date: September 17, 2009Applicant: KLA-Tencor Technology CorporationInventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
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Patent number: 7564557Abstract: Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.Type: GrantFiled: October 29, 2007Date of Patent: July 21, 2009Assignee: KLA-Tencor Technologies Corp.Inventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant
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Patent number: 7433040Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.Type: GrantFiled: July 30, 2007Date of Patent: October 7, 2008Assignee: KLA-Tencor Technologies Corp.Inventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant, Christopher F. Bevis, Mark Ghinovker
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Patent number: 7385699Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.Type: GrantFiled: February 23, 2004Date of Patent: June 10, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant, Christopher F. Bevis, Mark Ghinovker
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Patent number: 7379183Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: GrantFiled: February 23, 2004Date of Patent: May 27, 2008Assignee: KLA-Tencor Technologies Corp.Inventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Christopher F. Bevis, Paola Dececco, John Fielden, Noah Bareket, Kenneth P. Gross, Mark Ghinovker
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Publication number: 20080094630Abstract: Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample is disclosed. Targets A, B, C and D that each include a portion of the first and second structures are provided. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb between its first and second structures portions; target C is designed to have an offset Xc between its first and second structures portions; and target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd.Type: ApplicationFiled: December 21, 2007Publication date: April 24, 2008Applicant: KLA-Tencor Technologies CorporationInventors: Walter Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher Bevis, John Fielden, Noah Bareket, Kenneth Gross, Piotr Zalicki, Dan Wack, Paola Dececco, Thaddeus Dziura, Mark Ghinovker
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Publication number: 20080049226Abstract: Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.Type: ApplicationFiled: October 29, 2007Publication date: February 28, 2008Applicant: KLA-TENCOR TECHNOLOGIES CORPORATIONInventors: Walter Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant
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Publication number: 20080024766Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.Type: ApplicationFiled: July 30, 2007Publication date: January 31, 2008Inventors: Walter Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher Bevis, Mark Ghinovker
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Patent number: 7317531Abstract: Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample is disclosed. Targets A, B, C and D that each include a portion of the first and second structures are provided. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb between its first and second structures portions; target C is designed to have an offset Xc between its first and second structures portions; and target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd.Type: GrantFiled: December 5, 2003Date of Patent: January 8, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher F. Bevis, John Fielden, Noah Bareket, Kenneth P. Gross, Piotr Zalicki, Dan Wack, Paola Dececco, Thaddeus G. Dziura, Mark Ghinovker
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Patent number: 7301634Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: GrantFiled: February 23, 2004Date of Patent: November 27, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Christopher F. Bevis, John Fielden, Noah Bareket, Anatoly Fabrikant, Mark Ghinovker, Piotr Zalicki, Dan Wack
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Patent number: 7298481Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a plurality of optical signals are measured at a plurality of incident angles, wherein there are predefined offsets between the first and second structures. An overlay error is then determined between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.Type: GrantFiled: February 23, 2004Date of Patent: November 20, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant, Mark Ghinovker, John Fielden, Noah Bareket
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Patent number: 7289213Abstract: Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.Type: GrantFiled: February 23, 2004Date of Patent: October 30, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant