Abstract: An actuator adapted to actuate an element of an automobile, the actuator comprising at least one gear adapted to rotate eccentrically about a central axis during operation of the actuator.

Abstract: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

Abstract: According to one embodiment a broad-angle multilayer (ML) mirror system is disclosed. The ML mirror includes a multiple layer structure configured to provide uniform reflectivity over a wide range of angles with small phase shifts.

Abstract: A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.

Abstract: Methods of inhibiting a tyrosine kinase wherein said tyrosine kinase is BTK or SYK comprising administering to a patient in need thereof a therapeutically effective amount of a compound according to formula I are disclosed. The compounds are useful for treating auto-immune and inflammatory diseases.

Abstract: Compounds of the formula I: or pharmaceutically acceptable salts, solvates or prodrugs thereof, wherein m, k, B, R1, R2 and R3 are those defined herein, and compositions comprising the same. Also provided are methods for preparing compounds of formula I and using the same in treating p38 mediated disorders in a patient.

Abstract: Compounds having the formula (I), are useful as p38 kinase inhibitors, wherein R4 and R5 are hydrogen, halogen, cyano, haloalkyl, or haloalkoxy, but are not both hydrogen; R6 and R7 are optional substituents, and Q is a non-aromatic moiety as defined in the specification.

Abstract: Compounds of formula I are effective modulators of JNK: wherein X is CR11 or N; Y is —C(O)R3, 5-membered heteroaryl, or 5-membered heterocyclyl; Z is phenyl, cycloalkyl, heterocyclyl or heteroaryl, and is substituted with R1 and R2; R1 and R2 are each independently H, halo, CN, lower alkyl, or —Y1—Y2—Y3—R8, or R1 and R2 together form —O(CH2)nO—, where n is 1 or 2; Y1 is —O—, —C(O)—, —C(O)O—, —C(O)NR9—, —NR9C(O)—, —S—, —SO2—, or a bond; Y2 is cycloalkylene, heterocycloalkylene, lower alkylene or a bond; Y3 is —O—, —C(O)—, —C(O)O—, —C(O)NR9—, —NR9C(O)—, —SO2—, or a bond; R8 is H, lower alkyl, lower alkoxy, cycloalkyl, heterocycloalkyl, or —NR9R10, wherein R8 other than H is optionally substituted with lower alkyl, halo, —CF3, or —OH; R9 and R10 are each independently H or lower alkyl; R3 is OH, lower alkyl, lower alkoxy, (lower alkoxy)-lower alkoxy, or —NR9R10; R4 is lower alkyl, phenyl, heterocyclyl, cycloalkyl, heterocycloalkyl, or heteroaryl, and is optionally substituted with lower alkyl, hydroxy

Abstract: Compounds of the formula I: where A, B, X, Y, Z, k, R1, R2 and R3 are those defined herein, and compositions comprising the same. The present invention also provides methods for preparing compounds of formula I and using the same in treating p38 mediated disorders in a patient.

Abstract: The present invention provides compounds of the Formula I and II: wherein R1, R3, W, Z, X1, X2, Ar1, R8 and R9 are as defined herein, and methods and intermediates for their preparation and uses thereof.

Abstract: Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

Abstract: Compounds of the formula Ia or Ib: wherein A, B, X, Y, Z, W, k, R1, R2, R3, R4 and R5 are those defined herein, and compositions comprising the same. The present invention also provides methods for preparing compounds of formula I and using the same in treating p38 mediated disorders in a subject.

Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

Abstract: Embodiments of a pellicle, methods of fabrication and methods of use in extreme ultraviolet (EUV) photolithography are disclosed. The pellicle may include a wire mesh with a square or hexagonal geometric configuration. A thin film of a material with a high Young's modulus may be coated on at least one surface of the wire mesh. A method of fabrication may include forming at least one sacrificial layer on a surface of the wire mesh, forming a thin film on another surface of the wire mesh, and removing the sacrificial layer to form a pellicle. A method of use may include positioning a pellicle relative to a photomask to protect the photomask from particulate accumulation during an EUV photolithography process.

Abstract: Compounds of formula I modulate JNK: wherein the variables are as defined herein.

Abstract: A wafer comprising polycrystalline silicon is used in various applications, including as a handling wafer, a test wafer, a dummy wafer, or as a substrate in a bonded die. Use of polycrystalline material instead of single-crystal may lower expenses.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

Abstract: A reflective optical illumination collector is described. In one example, the collector has a ring to collect light from a light source within a range of incident angles and to reflect the light off an inner surface of the ring to a target image of the collector. A plurality of rings concentric to the first ring may also be used. Each ring collects light from the light source within a range of incident angles and reflects the light off an inner surface of the respective ring to the target image of the collector.

Abstract: Compounds of the Formula: where X1, Ar1, R1, and R2 are as defined herein, and compositions comprising the same. Also provided are methods for using compounds of Formula I in treating p38 mediated disorders in a patient.