Abstract: A system for compensating for heating effects in a mirror. Different areas of the mirror are associated with buried temperature sensors. Each temperature sensor is monitored, and used to create a map of current temperatures. The map of current temperatures may be corrected according to baseline values, and then is used to compensate for temperature differences.

Abstract: Integrated semiconductor waveguide gratings, methods of manufacture thereof and methods of apodizing thereof are described. A semiconductor waveguide grating includes a substrate, a cladding layer disposed on the substrate, a guide structure that includes a plurality of discrete transverse sections implanted with ions disposed between adjacent transverse sections substantially free of implanted ions.

Abstract: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

Abstract: Compounds having the formula (I) or (II), 1

Abstract: Compounds having the formula (I), 1

Abstract: A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.

Abstract: The present invention provides compounds of the formula: 1

Abstract: Systems and techniques to generate extreme ultraviolet (EUV) illumination. An EUV system includes first layers, and second layers interleaved with the first layers, where the first layers and the second layers have a thickness selected to produce coherent transition radiation in an extreme ultraviolet wavelength region when an electron beam passes through the first layers and the second layers. The first and second layers may be built using thin film deposition techniques and etching techniques. The first layers may include metal, such as molybdenum. The second layers may include a dielectric material and may define regions of vacuum between the first layers, including possibly multiple regions of vacuum per layer.

Abstract: A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.

Abstract: A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.

Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

Abstract: Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: The present invention provides compounds of the formula: a prodrug or a pharmaceutically acceptable salt thereof, wherein R1, R2, R3 and Ar1 are those defined herein, and methods for preparation and uses thereof.

Abstract: The present invention provides compounds of the Formula I and II: 1

Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

Abstract: The invention provides a reeling device for a hoisting system, including a flexible member having a lower end and an upper end, a rotatable drum on which the flexible member is windable, disk means rotatably mounted on said drum, to which disk means the upper end of the flexible member is anchored, and a stop mechanism activated by the disk means once the flexible member has completely unreeled from the drum.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: The present invention provides compounds of the Formula I: 1