Abstract: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

Abstract: Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

Abstract: According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.

Abstract: Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

Abstract: A corner-fitting escape-proof repeating animal trap having a housing and two inclined plane trap assemblies arranged generally at right angles to one another within the housing. The housing includes a cover and a base defining an enclosure having five upstanding peripheral walls and a floor. Two ledged mounting wells are provided in the floor for securing the two trap assemblies in the enclosure, with two rectangular openings being formed in two of the walls to provide access to the trap assemblies. Formed in the inner surface of the molded cover is a pair of protrusions positioned so as to respectively engage with the tops of the trap assemblies when the cover is closed. The outer surface of the floor includes raised portions which, in conjunction with a ridge on the outer edge of the floor, define adjacent recesses that cooperate with protuberances on the outer top surface of the cover of another housing for non-sliding engagement therewith when two trap units are placed in a stacked relationship.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: The present invention relates to certain pyrazole derivatives of Formula (I): that are p-38 MAP kinase inhibitors, pharmaceutical compositions containing them, methods for their use, and methods for preparing these compounds.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: The present invention provides compounds of the Formula I: wherein R1 is alkyl, cycloalkyl, cycloalkylalkyl, or —CH2-alkenyl, X1 is O, NH, N(alkyl), S or —C(?O), Z is N or CH; and R2 and R3 are as defined herein, pharmaceutical compositions comprising same, and methods for their use.

Abstract: According to one embodiment a broad-angle multilayer (ML) mirror system is disclosed. The ML mirror includes a multiple layer structure configured to provide uniform reflectivity over a wide range of angles with small phase shifts.

Abstract: The present invention discloses compounds corresponding to formula I: wherein A, Z, Z1, Y, R1 and R2 are as defined in the specification, as well as pharmaceutical formulations, methods of making and uses thereof.

Abstract: An electronic form routing system that includes a front-end server accessible to the users over a network via an encrypted link and a secure back-end database for storing the electronic forms and the data input by users into the form.

Abstract: The invention provides a reeling device for a hoisting system, including a flexible member having a lower end and an upper end, a rotatable drum on which the flexible member is windable, disk means rotatably mounted on said drum, to which disk means the upper end of the flexible member is anchored, and a stop mechanism activated by the disk means once the flexible member has completely unreeled from the drum.

Abstract: Systems and techniques to generate extreme ultraviolet (EUV) illumination. An EUV system includes first layers, and second layers interleaved with the first layers, where the first layers and the second layers have a thickness selected to produce coherent transition radiation in an extreme ultraviolet wavelength region when an electron beam passes through the first layers and the second layers. The first and second layers may be built using thin film deposition techniques and etching techniques. The first layers may include metal, such as molybdenum. The second layers may include a dielectric material and may define regions of vacuum between the first layers, including possibly multiple regions of vacuum per layer.

Abstract: A method for making a substrate for a mirror used in photolithography is described. That method comprises forming a crystalline layer on a first layer, which has a low coefficient of thermal expansion. Part of the crystalline layer is then removed to form on the first layer a second layer that has a high quality surface finish.

Abstract: A dose transfer standard detector measures radiation intensity and dose in a lithography tool. The lithography tool may be an Extreme Ultraviolet lithography (EUVL) tool. The dose transfer standard detector may transmit intensity and dose data to a computer, which analyzes the data. Based on the analyzed data, the lithography tool may be calibrated.

Abstract: Spraying a surface of a reticle with carbon dioxide snow cleans the surface and removes particles. Further spraying the surface of the reticle with carbon dioxide snow at a temperature below a carbon dioxide sublimation temperature forms a solid carbon dioxide layer on the surface. The solid carbon dioxide layer prevents particles from contacting the surface of the reticle. The solid carbon dioxide layer may be removed, and the reticle may be used in a extreme ultraviolet lithography tool.

Abstract: Disorders mediated by p38 kinase inhibitors are treated with compounds of the formula: or salts thereof, wherein: R1 is hydrogen or alkyl; R2 is substituted cycloalkyl, heterosubstituted cycloalkyl, helcroalkylsubstituted cycloalkyl, heterosubstituted cycloalkyl-alkly, heterocyclyl, heterocyclyl spiro cycloalkyl, aralkoxy, alkoxy, -alkylene-S(O)n-alkyl (where is 1 or 2) or —SO2Ar2; R3 is hydrogen, amino, monoalkylamino, dialkylamino, acylamino, —NR8—C(?O)—Rb (where Ra is hydrogen or alkyl and Rh is heterocyclyl or heteroalkyl), alkyl, cycloalkyl, phthalimidoalkyl, aryl, aralkyl, haloalkyl, heteroalkyl, cyanoalkyl, -alkylene-C(O) R (where R is hydrogen, alkyl, hydroxy, alkoxy, amino, monoalkylamino or dialkylamino) or acyl; and each of Ar1 and Ar2 is independently aryl.