Patents by Inventor Michael K. Gallagher

Michael K. Gallagher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coating compositions
    Patent number: 8889344
    Abstract: In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.
    Type: Grant
    Filed: May 4, 2006
    Date of Patent: November 18, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory P. Prokopowicz, Michael K. Gallagher
  • ADHESION PROMOTER
    Publication number: 20140120244
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.
    Type: Application
    Filed: October 24, 2013
    Publication date: May 1, 2014
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ
  • EPHEMERAL BONDING
    Publication number: 20140117503
    Abstract: Compositions suitable for temporarily bonding two surfaces, such as a wafer active side and a substrate, are disclosed. Methods of temporarily bonding two surfaces, such as the active side of a wafer and a substrate using the compositions disclosed herein are also provided.
    Type: Application
    Filed: October 25, 2012
    Publication date: May 1, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Mark S. OLIVER, Michael K. GALLAGHER
  • EPHEMERAL BONDING
    Publication number: 20140117504
    Abstract: Compositions containing an adhesive material and a release additive are suitable for temporarily bonding two surfaces, such as a wafer active side and a substrate. These compositions are useful in the manufacture of electronic devices where a component, such as an active wafer, is temporarily bonded to a substrate, followed by further processing of the active wafer.
    Type: Application
    Filed: October 22, 2013
    Publication date: May 1, 2014
    Inventors: Mark S. OLIVER, Michael K. GALLAGHER, Karen R. BRANTL
  • ADHESION PROMOTER
    Publication number: 20140120242
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, to a substrate are provided. Also provided are methods of improving the adhesion of coating compositions to a substrate.
    Type: Application
    Filed: October 30, 2012
    Publication date: May 1, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ
  • COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY
    Publication number: 20140030653
    Abstract: Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
    Type: Application
    Filed: June 3, 2013
    Publication date: January 30, 2014
    Inventors: Anthony ZAMPINI, Michael K. GALLAGHER, Vipul JAIN, Owendi ONGAYI
  • Coating compositions for photolithography
    Patent number: 8455178
    Abstract: Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: June 4, 2013
    Assignee: Rohm and Haas Electronic Materials LLP
    Inventors: Anthony Zampini, Michael K. Gallagher, Vipul Jain, Owendi Ongayi
  • Polyamine, carboxylic acid flux composition and method of soldering
    Patent number: 8434667
    Abstract: A flux composition is provided, comprising, as initial components: a carboxylic acid; and, a polyamine fluxing agent represented by formula I: with the proviso that when the polyamine fluxing agent represented by formula I is according to formula Ia: then zero to three of R1, R2, R3 and R4 is(are) a hydrogen. Also provided is a method of soldering an electrical contact using the flux composition.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: May 7, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Mark R. Winkle, Avin V. Dhoble, Kim S. Ho, Michael K. Gallagher, Xiang-Qian Liu, David Fleming
  • Flux composition and method of soldering
    Patent number: 8434666
    Abstract: A flux composition is provided, comprising, as an initial component: a carboxylic acid; and, a fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen, a substituted C1-80 alkyl group, an unsubstituted C1-80 alkyl group, a substituted C7-80 arylalkyl group and an unsubstituted C7-80 arylalkyl group; and wherein zero to three of R1, R2, R3 and R4 is(are) a hydrogen. Also provided is a method of soldering an electrical contact using the flux composition.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: May 7, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kim S. Ho, Michael K. Gallagher, Avin V. Dhoble, Mark R. Winkle, Xiang-Qian Liu, David Fleming
  • Curable amine, carboxylic acid flux composition and method of soldering
    Patent number: 8430293
    Abstract: A curable flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; a carboxylic acid; and, an amine fluxing agent represented by formula I: and, optionally, a curing agent. Also provided is a method of soldering an electrical contact using the curable flux composition.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: April 30, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Avin V. Dhoble, Mark R. Winkle, Michael K. Gallagher, Kim S. Ho, Xiang-Qian Liu, Asghar A. Peera, Glenn N. Robinson, Ian A. Tomlinson, David Fleming
  • Curable flux composition and method of soldering
    Patent number: 8430295
    Abstract: A curable flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; a carboxylic acid; a fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen, a substituted C1-80 alkyl group, an unsubstituted C1-80 alkyl group, a substituted C7-80 arylalkyl group and an unsubstituted C7-80 arylalkyl group; and wherein zero to three of R1, R2, R3 and R4 is(are) a hydrogen; and, optionally, a curing agent. Also provided is a method of soldering an electrical contact using the curable flux composition.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: April 30, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. Gallagher, Kim S. Ho, Avin V. Dhoble, Mark R. Winkle, Xiang-Qian Liu, David Fleming
  • Amine, carboxylic acid flux composition and method of soldering
    Patent number: 8430294
    Abstract: A flux composition is provided, comprising, as initial components: a carboxylic acid; and, an amine fluxing agent represented by formula I: Also provided is a method of soldering an electrical contact using the flux composition.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: April 30, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kim S. Ho, Mark R. Winkle, Avin V. Dhoble, Michael K. Gallagher, Xiang-Qian Liu, Asghar A. Peera, Glenn N. Robinson, Ian A. Tomlinson, David Fleming
  • POLYAMINE, CARBOXYLIC ACID FLUX COMPOSITION AND METHOD OF SOLDERING
    Publication number: 20130082094
    Abstract: A flux composition is provided, comprising, as initial components: a carboxylic acid; and, a polyamine fluxing agent represented by formula I: with the proviso that when the polyamine fluxing agent represented by formula I is according to formula Ia: then zero to three of R1, R2, R3 and R4 is(are) a hydrogen. Also provided is a method of soldering an electrical contact using the flux composition.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Mark R. Winkle, Avin V. Dhoble, Kim S. Ho, Michael K. Gallagher, Xiang-Qian Liu, David Fleming
  • CURABLE FLUX COMPOSITION AND METHOD OF SOLDERING
    Publication number: 20130082089
    Abstract: A curable flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; a carboxylic acid; a fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen, a substituted C1-80 alkyl group, an unsubstituted C1-80 alkyl group, a substituted C7-80 arylalkyl group and an unsubstituted C7-80 arylalkyl group; and wherein zero to three of R1, R2, R3 and R4 is(are) a hydrogen; and, optionally, a curing agent. Also provided is a method of soldering an electrical contact using the curable flux composition.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Michael K. Gallagher, Kim S. Ho, Avin V. Dhoble, Mark R. Winkle, Xiang-Qian Liu, David Fleming
  • Amine, Carboxylic Acid Flux Composition And Method Of Soldering
    Publication number: 20130082093
    Abstract: A flux composition is provided, comprising, as initial components: a carboxylic acid; and, an amine fluxing agent represented by formula I: Also provided is a method of soldering an electrical contact using the flux composition.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Kim S. Ho, Mark R. Winkle, Avin V. Dhoble, Michael K. Gallagher, Xiang-Qian Liu, Asghar A. Peera, Glenn N. Robinson, Ian A. Tomlinson, David Fleming
  • Flux Composition And Method Of Soldering
    Publication number: 20130082095
    Abstract: A flux composition is provided, comprising, as an initial component: a carboxylic acid; and, a fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen, a substituted C1-80 alkyl group, an unsubstituted C1-80 alkyl group, a substituted C7-80 arylalkyl group and an unsubstituted C7-80 arylalkyl group; and wherein zero to three of R1, R2, R3 and R4 is(are) a hydrogen. Also provided is a method of soldering an electrical contact using the flux composition.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Kim S. Ho, Michael K. Gallagher, Avin V. Dhoble, Mark R. Winkle, Xiang-Qian Liu, David Fleming
  • Curable Amine, Carboxylic Acid Flux Composition And Method Of Soldering
    Publication number: 20130082092
    Abstract: A curable flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; a carboxylic acid; and, an amine fluxing agent represented by formula I: and, optionally, a curing agent. Also provided is a method of soldering an electrical contact using the curable flux composition.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Avin V. Dhoble, Mark R. Winkle, Michael K. Gallagher, Kim S. Ho, Xiang-Qian Liu, Asghar A. Peera, Glenn N. Robinson, Ian A. Tomlinson, David Fleming
  • Antireflective hard mask compositions
    Patent number: 8373241
    Abstract: The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
    Type: Grant
    Filed: October 20, 2009
    Date of Patent: February 12, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Dana A. Gronbeck, Amy M. Kwok, Chi Q. Truong, Michael K. Gallagher, Anthony Zampini
  • Electronic device manufacture
    Patent number: 8263316
    Abstract: Electronic devices having a metal line-containing layer including an air gap region and a low-k dielectric material region where the air gap region includes a dense packing of metal lines is provided. Methods of forming such electronic devices are also provided.
    Type: Grant
    Filed: October 3, 2005
    Date of Patent: September 11, 2012
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Michael K. Gallagher
  • Compositions and processes for photolithography
    Patent number: 8012666
    Abstract: Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: September 6, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. Gallagher, Deyan Wang