Patents by Inventor Michael Rosenstein
Michael Rosenstein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6730174Abstract: An apparatus for replacing consumables of a vacuum chamber. A unitary removable shield assembly is provided to quickly replace consumables such as a shield. The shield assembly can include an upper adapter assembly, at least one shield member, a cover ring and an insulator member. The shield assembly is designed so that the consumables can be replaced in one step and allows the chamber to continue with its maintenance cycle.Type: GrantFiled: March 6, 2002Date of Patent: May 4, 2004Assignee: Applied Materials, Inc.Inventors: Alan B. Liu, Ilya Lavitsky, Michael Rosenstein
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Patent number: 6688838Abstract: A cleanroom lift for maneuvering large objects such as turbomolecular pumps utilized in semiconductor processing applications is provided. In one embodiment, the lift includes a vertically movable carriage coupled to a linkage assembly. The linkage assembly has a first link and a second link. Each link has one piece construction to minimize deflection under load. The first link is coupled to the carriage by a carriage shaft assembly and to the second link by a linkage shaft assembly. The second link is coupled to the linkage shaft assembly and a gripper assembly. Optionally, a third link and second shaft assembly may be disposed between the gripper assembly and the second link to minimize the weight of the links to facilitate assembly in cleanroom environments.Type: GrantFiled: March 4, 2002Date of Patent: February 10, 2004Assignee: Applied Materials, Inc.Inventors: Ilya Lavitsky, Michael Rosenstein
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Patent number: 6669829Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.Type: GrantFiled: February 20, 2002Date of Patent: December 30, 2003Assignee: Applied Materials, Inc.Inventors: Michael Feltsman, Allen Lau, Michael Rosenstein, Marc O. Schweitzer
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Patent number: 6660134Abstract: A coil for inductively coupling RF energy to a plasma in a substrate processing chamber has adjacent spaced and circumferentially overlapping RF feedthroughs adjacent to overlapping ends to improve uniformity of processing of the substrate.Type: GrantFiled: July 10, 1998Date of Patent: December 9, 2003Assignee: Applied Materials, Inc.Inventors: Praburam Gopalraja, Zheng Xu, Michael Rosenstein, John C. Forster
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Publication number: 20030168168Abstract: An apparatus for replacing consumables of a vacuum chamber. A unitary removable shield assembly is provided to quickly replace consumables such as a shield. The shield assembly can include an upper adapter assembly, at least one shield member, a cover ring and an insulator member. The shield assembly is designed so that the consumables can be replaced in one step and allows the chamber to continue with its maintenance cycle.Type: ApplicationFiled: March 6, 2002Publication date: September 11, 2003Applicant: Applied Materials, Inc.Inventors: Alan B. Liu, Ilya Lavitsky, Michael Rosenstein
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Publication number: 20030165378Abstract: A cleanroom lift for maneuvering large objects such as turbomolecular pumps utilized in semiconductor processing applications is provided. In one embodiment, the lift includes a vertically movable carriage coupled to a linkage assembly. The linkage assembly has a first link and a second link. Each link has one piece construction to minimize deflection under load. The first link is coupled to the carriage by a carriage shaft assembly and to the second link by a linkage shaft assembly. The second link is coupled to the linkage shaft assembly and a gripper assembly. Optionally, a third link and second shaft assembly may be disposed between the gripper assembly and the second link to minimize the weight of the links to facilitate assembly in cleanroom environments.Type: ApplicationFiled: March 4, 2002Publication date: September 4, 2003Applicant: Applied Materials, Inc.Inventors: Ilya Lavitsky, Michael Rosenstein
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Publication number: 20030155234Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.Type: ApplicationFiled: February 20, 2002Publication date: August 21, 2003Applicant: Applied Materials, Inc.Inventors: Michael Feltsman, Allen Lau, Michael Rosenstein, Marc O. Schweitzer
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Publication number: 20030131794Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: ApplicationFiled: January 17, 2002Publication date: July 17, 2003Applicant: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman
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Patent number: 6589407Abstract: An aluminum deposition shield substantially improves transfer of radiated heat from within the vacuum chamber, in comparison to a stainless steel deposition shield. The aluminum deposition shield remains cooler during wafer processing and assists in cooling the chamber components.Type: GrantFiled: May 23, 1997Date of Patent: July 8, 2003Assignee: Applied Materials, Inc.Inventors: Anantha Subramani, Ashok K. Das, Leif E. DeLaurentis, Michael Rosenstein
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Patent number: 6228236Abstract: A magnetron for use in a DC magnetron sputtering reactor that can rotate at a smaller diameter during a deposition phase and at a larger diameter during a cleaning phase, whereby sputter material redeposited outside of the deposition sputtering track is removed during the cleaning phase. An embodiment for a two-diameter magnetron includes a swing arm fixed on one end to the magnetron rotation motor shaft and on the other end to a pivot shaft, pivotably coupled to the magnetron. When the magnetron is rotated in different directions, hydrodynamic forces between the magnetron and the chilling water bath cause magnetron to pivot about the pivot shaft. Two mechanical detents fix the limits of the pivoting and hence establish the two diameters of rotation.Type: GrantFiled: October 22, 1999Date of Patent: May 8, 2001Assignee: Applied Materials, Inc.Inventors: Michael Rosenstein, Jianming Fu, Leif Eric Delaurentis, James van Gogh, Alan Liu
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Patent number: 6221221Abstract: Apparatus providing a low impedance RF return current path between a shield member and a pedestal in a semiconductor wafer processing chamber. The return path reduces RF voltage drop between the shield member and the pedestal during processing. The return path comprises a conductive strap connected to the pedestal and a conductive bar attached to the strap. A toroidal spring makes multiple parallel electrical connections between the conductive bar and the shield member. A support assembly, attached to a collar on the chamber wall, supports the conductive bar.Type: GrantFiled: November 16, 1998Date of Patent: April 24, 2001Assignee: Applied Materials, Inc.Inventors: Ayad Al-Shaikh, Michael Rosenstein, Bradley O. Stimson, Jianming Fu, Praburam Gopalraja
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Patent number: 5860640Abstract: A semiconductor processing chamber includes a substrate support member on which a substrate and a clamp ring are aligned during processing in the chamber. To align the substrate on the support member, a frustoconical substrate alignment member extends about the perimeter of the substrate receiving surface of the support member to capture a substrate received in the chamber and center the substrate on the upper surface of the support member. The alignment member includes an alignment face thereon, which urges a substrate into alignment with the substrate receiving face of the support member as the substrate is deposited on the support member. To clamp the substrate in proper alignment on the support member and flatten any warpage in the substrate, a clamp ring alignment member is provided which aligns and supports a clamp ring on a substrate without causing significant shadowing of the substrate. The clamp ring is vertically and laterally aligned relative to the support member and substrate centered thereon.Type: GrantFiled: November 29, 1995Date of Patent: January 19, 1999Assignee: Applied Materials, Inc.Inventors: Dan A. Marohl, Michael Rosenstein
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Patent number: 5690795Abstract: A structure and method is described for securing an overspray shield in processing chambers in the wall sandwich of the chamber or using a dimensionally compliant floating spacer ring to elastically clamp the overspray shield in position in a vacuum substrate processing chamber without the use of removable fasteners. The configuration uses the differential pressures between the inside and outside of the chamber to clamp the overspray shield along with its shield clamping assembly components at a spacer position in the chamber. The spacer position is generally interior to vacuum sealing limits of the chamber. The arrangement is such that if misalignment occurs a good vacuum-type seal cannot be achieved unless the parts are moved to correct alignment. When correctly aligned the overspray shield is tightly held to the processing chamber wall and electrical continuity between the processing chamber wall and the overspray shield is assured throughout expected process conditions.Type: GrantFiled: June 5, 1995Date of Patent: November 25, 1997Assignees: Applied Materials, Inc., International Business Machines CorporationInventors: Michael Rosenstein, Howard Grunes, Stephen Bruce Brodsky
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Patent number: D440582Type: GrantFiled: July 13, 1998Date of Patent: April 17, 2001Assignee: Applied Materials, Inc.Inventors: Praburam Gopalraja, Zheng Xu, Michael Rosenstein, John C. Forster, Peijun Ding
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Patent number: D442852Type: GrantFiled: August 24, 1999Date of Patent: May 29, 2001Assignee: Applied Materials, Inc.Inventors: Praburam Gopalraja, John C. Forster, Michael Rosenstein
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Patent number: D442853Type: GrantFiled: August 24, 1999Date of Patent: May 29, 2001Assignee: Applied Materials, Inc.Inventors: Praburam Gopalraja, John C. Forster, Michael Rosenstein
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Patent number: D450070Type: GrantFiled: July 13, 1998Date of Patent: November 6, 2001Assignee: Applied Materials, Inc.Inventors: Praburam Gopalraja, Zheng Xu, Michael Rosenstein, John C. Forster