Sputtering chamber coil

- Applied Materials, Inc.
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Description

FIG. 1 is a front elevational view;

FIG. 2 is a top view;

FIG. 3 is a right side elevational view;

FIG. 4 is a bottom view; and,

FIG. 5 is a rear elevational view of our sputtering chamber coil.

The left side elevation view (not shown) is the same as the right side elevational view (FIG. 3) because of coil symmetry.

Claims

The ornamental design for sputtering chamber coil, as shown and described.

Referenced Cited
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Patent History
Patent number: D440582
Type: Grant
Filed: Jul 13, 1998
Date of Patent: Apr 17, 2001
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventors: Praburam Gopalraja (San Jose, CA), Zheng Xu (Foster City, CA), Michael Rosenstein (Sunnyvale, CA), John C. Forster (San Francisco, CA), Peijun Ding (San Jose, CA)
Primary Examiner: Antoine Duval Davis
Attorney, Agent or Law Firm: Konrad Raynes & Victor
Application Number: 29/090,631
Classifications
Current U.S. Class: Solid Material Melting, E.g., Solder, Etc. (D15/144.2)
International Classification: 1509;