Patents by Inventor Min Ko

Min Ko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200111957
    Abstract: A method of manufacturing a variable resistance memory device includes: forming an array of memory cells on a substrate, each memory cell including a variable resistance structure and a switching element; and forming a sidewall insulating layer covering a sidewall of the switching element. The forming the sidewall insulating layer includes: a preliminary step of supplying a silicon source to an exposed sidewall of the switching element; and a main step of performing a process cycle a plurality of times, the process cycle comprising supplying the silicon source and supplying a reaction gas, A time duration of the supplying the silicon source in the preliminary step is longer than a time duration of the supplying the silicon gas in the process cycle in the main step.
    Type: Application
    Filed: May 17, 2019
    Publication date: April 9, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: BYONGJU KIM, YOUNG-MIN KO, JONGUK KIM, JAEHO JUNG, DONGSUNG CHOI
  • Publication number: 20200093897
    Abstract: A method for detecting whether glucose metabolism is abnormal comprises: detecting GPx2 gene expression, GPx2 protein expression or the activity of GPx2 protein in a test body, and making comparisons with GPx2 expression amount of a normal individual, when the GPx2 expression of the individual is significantly lower than that of the normal individual, indicating that the carbohydrate metabolism of the individual is in an abnormal state. Applications of GPx2 in the preparation of a medical composition for the treatment and prevention of type II diabetes.
    Type: Application
    Filed: November 14, 2016
    Publication date: March 26, 2020
    Applicant: KAOHSIUNG MEDICAL UNIVERSITY
    Inventors: Ming-Lung YU, Wan-Long CHUANG, Jee-Fu HUANG, Chia-Yen DAI, Yu-Min KO
  • Publication number: 20200080226
    Abstract: A silicon-based molten composition according to an exemplary embodiment of the present invention is used in a solution growing method for forming silicon carbide single crystal, and is expressed in Formula 1 including silicon (Si), chromium (Cr), vanadium (V), and aluminum (Al). SiaCrbVcAld ??[Formula 1] In Formula 1, a is equal to or greater than 0.4 and equal to or less than 0.9, b+c is equal to or greater than 0.1 and equal to or less than 0.6, c/(b+c) is equal to or greater than 0.05 and equal to or less than 0.95, and d is equal to or greater than 0.01 and equal to or less than 0.1.
    Type: Application
    Filed: November 1, 2018
    Publication date: March 12, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Junghwan Kim, Ho Rim Lee, Chan Yeup Chung, Jung Min Ko, Manshik Park
  • Publication number: 20200083319
    Abstract: A semiconductor device includes a plurality of electrode structures formed on a substrate; and an upper supporter group and a lower supporter between upper ends and lower ends of the plurality of electrode structures The upper supporter group includes a plurality of supporters, and at least some of the plurality of supporters each have an upper surface and a lower surface. One of the upper surface and the lower surface has a curved profile, and the other surface has a flat profile.
    Type: Application
    Filed: November 11, 2019
    Publication date: March 12, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ha-young YI, Youn-seok Choi, Young-min Ko, Mun-jun Kim, Hong-gun Kim, Seung-heon Lee
  • Patent number: 10586709
    Abstract: Methods for fabricating a semiconductor device are provided including sequentially forming a first hard mask layer, a second hard mask layer and a photoresist layer on a target layer, patterning the photoresist layer to form a photoresist pattern, sequentially patterning the second hard mask layer and the first hard mask layer using the photoresist pattern as an etching mask to form a first hard mask pattern and a second hard mask pattern on the first hard mask pattern, and etching the target layer using the first hard mask pattern and the second hard mask pattern as an etching mask, wherein the second hard mask layer includes impurity-doped amorphous silicon.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: March 10, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-Min Ko, Hyuk Woo Kwon, Jun-Won Lee
  • Publication number: 20200068809
    Abstract: A plant cultivation device includes a light source unit having a first light source emitting stimulation light in a UV region toward a plant and a second light source emitting background light toward the plant, the background light having a different peak wavelength than the stimulation light. The second light source emits the background light during a light period and stops emission of the background light during a dark period. In addition, the first light source emits the stimulation light for a certain period of time during the light period. Further, a cumulative amount of the stimulation light emitted from the first light source is 0.036 J or more per day.
    Type: Application
    Filed: August 27, 2019
    Publication date: March 5, 2020
    Applicant: SEOUL VIOSYS CO., LTD.
    Inventors: Sang Min KO, Jin Won KIM
  • Publication number: 20200060099
    Abstract: A plant cultivation light source is turned on, or turned off depending on a light period and a dark period of a plant. When a portion of the light period is referred to as a first period and the other portion of the light period is referred to as a second period, the first period and the second period are alternately provided with each other, and lights having different wavelengths from each other are provided to the plant in the first and second periods, thereby increasing a content of an active ingredient in the plant.
    Type: Application
    Filed: August 22, 2019
    Publication date: February 27, 2020
    Applicant: SEOUL VIOSYS CO., LTD.
    Inventors: Se Ryung KIM, Sang Min KO, Jin Won KIM, Hyun Su SONG
  • Publication number: 20200060098
    Abstract: A light source of a plant cultivation is turned on or turned off depending on a light period and a dark period of a plant, and the light source of the plant cultivation is turned on in the light period and emits a light having a spectrum with a plurality of peaks to the plant to increase a content of a predetermined substance in the plant.
    Type: Application
    Filed: August 22, 2019
    Publication date: February 27, 2020
    Applicant: SEOUL VIOSYS CO., LTD.
    Inventors: Se Ryung KIM, Sang Min KO, Jin Won KIM, Hyun Su SONG
  • Publication number: 20200063931
    Abstract: A plant cultivation light source includes a first light source emitting a first light in a first wavelength band and a second light source emitting a first light in a second wavelength band different from the first wavelength band. The second wavelength band includes an ultraviolet light wavelength band, and the second light source is driven independently of the first light source to determine whether to emit the second light while the first light source emits the first light.
    Type: Application
    Filed: August 8, 2019
    Publication date: February 27, 2020
    Applicant: SEOUL VIOSYS CO., LTD.
    Inventors: Hyun Su SONG, Sang Min KO, Jong Hyeon KOO, Se Ryung KIM, Jin Won KIM
  • Publication number: 20200066800
    Abstract: A variable resistanvce memory device may include a plurality of first conductive lines extending in a first direction, a plurality of second conductive lines extending in a second direction, a plurality of memory cells, each memory cell at a respective intersection, with respect to a top down view, between a corresponding one of the first conductive lines and a corresponding one of the second conductive lines, each memory cell comprising a variable resistance structure and a switching element sandwiched between a top electrode and a bottom electrode, and a first dielectric layer filling a space between the switching elements of the memory cells. A top surface of the first dielectric layer is disposed between bottom and top surfaces of the top electrodes of the memory cells.
    Type: Application
    Filed: April 27, 2019
    Publication date: February 27, 2020
    Inventors: BYONGJU KIM, YOUNG-MIN KO, JONGUK KIM, KWANGMIN PARK, JEONGHEE PARK, DONGSUNG CHOI
  • Publication number: 20200066981
    Abstract: A variable resistance memory device may include a memory unit including a first electrode disposed on a substrate, a variable resistance pattern disposed on the first electrode and a second electrode disposed on the variable resistance pattern, a selection pattern disposed on the memory unit, and a capping structure covering a sidewall of the selection pattern. The capping structure may include a first capping pattern and a second capping pattern sequentially stacked on at least one sidewall of the selection pattern. The first capping pattern may be silicon pattern, and the second capping pattern may include a nitride.
    Type: Application
    Filed: March 27, 2019
    Publication date: February 27, 2020
    Inventors: JONG-UK KIM, Young-Min KO, Byong-Ju KIM, Kwang-Min PARK, Jeong-Hee PARK, Dong-Sung CHOI
  • Patent number: 10570220
    Abstract: The present invention relates to a composition for a display sealing material having a photopolymerization initiator and a photocurable monomer, the photocurable monomer comprising: a monomer not having the aromatic hydrocarbon group; and a monomer having two or more substituted or unsubstituted phenyl groups of chemical formula 1, wherein about 5 wt % to about 45 wt % of the monomer having two or more substituted or unsubstituted phenyl groups is comprised on the basis of the photocurable monomer and about 55 wt % to about 95 wt % of the monomer not having the aromatic hydrocarbon group is comprised on the basis of the photocurable monomer.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: February 25, 2020
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Hye Jin Kim, Mi Sun Kim, Seong Ryong Nam, Sung Min Ko, Ji Yeon Lee
  • Publication number: 20200058727
    Abstract: An manufacturing method of a display device may include the following steps: forming a transistor on a substrate; forming an insulating layer on the transistor; forming a conductive layer including silver on the insulating layer; forming a photosensitive member on the conductive layer; forming an electrode of a light-emitting element by etching the conductive layer; performing plasma treatment on a structure that comprises the electrode, the plasma treatment using a gas including a halogen; and removing a product that is resulted from the plasma treatment.
    Type: Application
    Filed: July 24, 2019
    Publication date: February 20, 2020
    Inventors: Sang Gab KIM, Hyun Min CHO, Tae Sung KIM, Yu-Gwang JEONG, Su Bin BAE, Jin Seock KIM, Sang Gyun KIM, Hyo Min KO, Kil Won CHO, Han Sol LEE
  • Publication number: 20200052038
    Abstract: There is provided a variable resistance memory device including a first electrode line layer including first electrode lines extending in a first direction and spaced apart from each other on a substrate, a second electrode line layer that is above the first electrode line layer and including second electrode lines extending in a second direction orthogonal to the first direction and spaced apart from each other, and a memory cell layer including memory cells between the first electrode line layer and the second electrode line layer. Each of the memory cells includes a selection device layer, an intermediate electrode layer, and a variable resistance layer. A first insulating layer is between the first electrode lines, a second insulating layer is between the memory cells, and a third insulating layer is between the second electrode lines. The second insulating layer includes air gaps on side surfaces of the memory cells.
    Type: Application
    Filed: February 15, 2019
    Publication date: February 13, 2020
    Inventors: Byongju Kim, Young-min Ko, Jong-uk Kim, Kwangmin Park, Jeong-hee Park
  • Publication number: 20200010973
    Abstract: The present disclosure relates to a silicon-based fusion composition used for a solution growth method for forming a silicon carbide single crystal, and represented by the following Formula 1, including silicon, a first metal (M1), scandium (Sc) and aluminum (Al): SiaM1bSccAld??(Formula 1) wherein a is more than 0.4 and less than 0.8, b is more than 0.2 and less than 0.6, c is more than 0.01 and less than 0.1, and d is more than 0.01 and less than 0.1.
    Type: Application
    Filed: May 30, 2018
    Publication date: January 9, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Ho Rim Lee, Chan Yeup Chung, Manshik Park, Jung Min Ko
  • Patent number: 10523249
    Abstract: A wireless electronic device is provided. The wireless electronic device includes a first antenna and a first transceiver operatively coupled to the first antenna. The first transceiver is configured to receive and transmit data signals of a wireless communications network in a first frequency band. The first antenna is positioned to receive and transmit in a first direction. The wireless electronic device further includes a second antenna and a second transceiver operatively coupled to the second antenna and the first transceiver. The second transceiver is configured to receive and transmit data signals of the wireless communications network in a second frequency band. The second antenna is positioned to receive and transmit in a second direction being opposite to the first direction.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: December 31, 2019
    Assignee: Frontiir PTE Ltd
    Inventors: Maung Tun Tun Lynn, Tian-Sheng Chen, Godfrey Tan, Allen Ka Lun Miu, Tin Htun Aung, La Min Ko
  • Publication number: 20190375753
    Abstract: Disclosed herein are pyrozolo-pyrimidin-amino-cycloalkyl compounds, analogs thereof, pharmaceutical compositions comprising thereof and therapeutic uses therefor.
    Type: Application
    Filed: June 4, 2019
    Publication date: December 12, 2019
    Inventors: Minna H. T. Bui, Adrian O. Dukes, Xinping Han, Dennis X. Hu, Jeffrey J. Jackson, Yoo Min Ko, Paul R. Leger, Anqi Ma, Jack Maung, Andrew A. Ng, Akinori Okano, Omar Robles, Grant Shibuya, Hunter P. Shunatona, Jacob B. Schwarz, Anton A. Shakhmin, David J. Wustrow, Mikhail Zibinsky
  • Patent number: 10497976
    Abstract: A lithium air battery may include an electrolyte with a donor number of 10 to 40; and a quinone-based liquid catalyst which added to the electrolyte to induce a discharge in the solution.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: December 3, 2019
    Assignees: Hyundai Motor Company, Kia Motors Corporation, Seoul National University R&DB Foundation
    Inventors: Won Keun Kim, Jin Soo Kim, Kyoung Han Ryu, Ho Taek Lee, Byung Ju Lee, Ki Suk Kang, Young Min Ko
  • Patent number: 10490709
    Abstract: The invention discloses a backlight apparatus including a wavelength-converting device and a light source. The wavelength-converting device includes a transparent upper barrier film, a transparent lower barrier film, a spacer layer, a filling material and a plurality of quantum dots. The spacer layer is bonded between the transparent upper barrier film and the transparent lower barrier film, and has a plurality of hollowed regions. The filling material covers the plurality of hollowed regions. The plurality of quantum dots are uniformly distributed in the filling material covering each hollowed region. The light source includes a circuit board and a plurality of semiconductor light-emitting device. The circuit board is disposed beneath the transparent lower barrier film. Each hollowed region corresponds to at least one semiconductor light-emitting device. Each semiconductor light-emitting device is electrically bonded on the circuit board, and locates beneath the corresponding hollowed region.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: November 26, 2019
    Assignee: REAL OPTRONICS CORPORATION
    Inventor: Chun-Min Ko
  • Patent number: 10490623
    Abstract: A semiconductor device includes a plurality of electrode structures formed on a substrate; and an upper supporter group and a lower supporter between upper ends and lower ends of the plurality of electrode structures The upper supporter group includes a plurality of supporters, and at least some of the plurality of supporters each have an upper surface and a lower surface. One of the upper surface and the lower surface has a curved profile, and the other surface has a flat profile.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: November 26, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ha-young Yi, Youn-seok Choi, Young-min Ko, Mun-jun Kim, Hong-gun Kim, Seung-heon Lee