Patents by Inventor Ming-Chih Tsai

Ming-Chih Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180209864
    Abstract: A pressure sensor and a manufacturing method thereof are provided. The pressure sensor includes a thin-film transistor (TFT) array and a pressure-sensitive layer covering the TFT array. The pressure-sensitive layer includes a plurality of insulating layers and one of one-dimensional materials arranged on the same plane and two-dimensional materials. The insulating layers and the one- or two-dimensional materials are alternately stacked so as to effectively enhance pressure resolution.
    Type: Application
    Filed: August 7, 2017
    Publication date: July 26, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Yu-Hsuan Ho, Ming-Chih Tsai, Ming-Hung Hsieh
  • Publication number: 20180209927
    Abstract: A reduction-oxidation sensor device and a manufacturing method thereof are provided. The reduction-oxidation sensor device includes a first electrode, at least one sensing structure and a second electrode. The first electrode is located on a substrate. The at least one sensing structure is located on the first electrode and the substrate. The at least one sensing structure includes a metal nanowire layer and a metal oxide layer. The metal nanowire layer is disposed on the first electrode and the substrate. The metal nanowire layer is wrapped by the metal oxide layer. The second electrode is located on the at least one sensing structure.
    Type: Application
    Filed: January 11, 2018
    Publication date: July 26, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Ming-Chih Tsai, Yu-Hsuan Ho, Yen-Jui Chu, Ming-Hung Hsieh
  • Publication number: 20180209775
    Abstract: A strain sensing device and a manufacturing method thereof are provided in the invention. The strain sensing device includes a substrate and at least one sensing electrode. The substrate has a plurality of pores. A material of the substrate includes nanocellulose, and the substrates is strained in response to changes in external conditions. The at least one sensing electrode is disposed on the substrate, wherein the sensing electrode contacting the substrate extends into the pores of the substrate. The at least one sensing electrode has a major axis parallel to a surface of the substrate. A resistance value of the at least one sensing electrode changes in response to a strain of the substrate.
    Type: Application
    Filed: January 11, 2018
    Publication date: July 26, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Ming-Chih Tsai, Yu-Hsuan Ho
  • Publication number: 20180209859
    Abstract: A transparent pressure sensor and a manufacturing method thereof are provided. The transparent pressure sensor includes several layers of transparent electrodes, at least one pressure-sensitive deformation layer between the transparent electrodes, and a metal oxide layer. Each layer of the transparent electrodes is composed of nanowires, and the metal oxide layer is disposed in a space among the nanowires.
    Type: Application
    Filed: August 17, 2017
    Publication date: July 26, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Yu-Hsuan Ho, Ming-Chih Tsai, Ming-Hung Hsieh
  • Publication number: 20180202956
    Abstract: A gas detecting device configured to be attached to a surface includes a substrate, a semiconductor layer, a light-emitting component, a first electrode and a second electrode. The substrate includes a plurality of stacking layers stacked onto one another, and a material of the substrate includes cellulose nanofibrils (CNF). The substrate is formed by 3-D printing, such that a contact surface of the substrate is tightly attached to the surface. The semiconductor layer is formed on the substrate by 3-D printing. The light-emitting component is disposed on the substrate. The first electrode is coupled to the semiconductor layer and the light-emitting component. The second electrode is coupled to the semiconductor layer and a ground electrode. The first electrode and the second electrode are both disposed on the semiconductor layer and maintain a gap therebetween. A resistance of the semiconductor layer is changed according to a concentration of a designated gas.
    Type: Application
    Filed: May 15, 2017
    Publication date: July 19, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Ming-Hung Hsieh, Yu-Hsuan Ho, Ming-Chih Tsai, Yen-Jui Chu
  • Publication number: 20180195992
    Abstract: A sensor, a composite material and a method of manufacturing the same are provided. The sensor includes a first electrode, a second electrode, and a sensing material layer. The first electrode and the second electrode are separated from each other. The sensing material layer is located between the first electrode and the second electrode and covers the first electrode and the second electrode. The sensing material layer includes the composite material including a conductive polymer and a metal oxide. The conductive polymer has a hydrophilic end. The metal oxide is connected to the hydrophilic end of the conductive polymer. The metal oxide includes a metal oxide precursor.
    Type: Application
    Filed: January 5, 2018
    Publication date: July 12, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Ming-Chih Tsai, Yu-Hsuan Ho
  • Publication number: 20180160952
    Abstract: A sensing device for sensing ion concentration of a solution, including a first substrate, a second substrate, a sensing layer, and two electrodes. The material of the first substrate includes cellulose. The second substrate is located on the first substrate. The sensing layer is located on the second substrate. The two electrodes are separately disposed on the sensing layer to expose the sensing layer and bring a solution in contact with the sensing layer so as to measure the resistance value of the solution and convert the resistance value into the ion concentration of the solution.
    Type: Application
    Filed: September 11, 2017
    Publication date: June 14, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Ming-Hung Hsieh, Yu-Hsuan Ho, Ming-Chih Tsai, Yen-Jui Chu
  • Publication number: 20180162742
    Abstract: A metal bronze compound is provided. The metal bronze compound is a compound represented by formula (1) below. In formula (1), “A” represents at least one type of cation. “M” represents at least two types of ions selected from a transition metal and a metalloid. “x” represents the sum of the number of the at least one type of cation used as “A”. “y” represents the sum of the number of the at least two types of ions selected from the transition metal and the metalloid used as “M”. “z” represents the number of oxygen ion. The values of “x”, “y” and “z” balance the charge number of formula (1).
    Type: Application
    Filed: November 1, 2017
    Publication date: June 14, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Ming-Chih Tsai, Yu-Hsuan Ho
  • Publication number: 20180151374
    Abstract: The present invention provides a patterned structure for an electronic device and a manufacturing method thereof. The patterned structure includes a patterned layer, a blocking structure, a cantilever structure, and a connection structure. The patterned layer is disposed on a substrate. The blocking structure is disposed on the substrate at one side of the patterned layer, wherein a thickness of the blocking structure is smaller than a thickness of the patterned layer. The cantilever structure is disposed on the substrate and located between the patterned layer and the blocking structure. The cantilever structure is connected with the patterned layer and the blocking structure. The connection structure is connected between the patterned layer and the substrate at one side of the patterned layer, and located on the cantilever structure and the blocking structure.
    Type: Application
    Filed: August 21, 2017
    Publication date: May 31, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Yen-Jui Chu, Hsin-Hung Chou, Ming-Chih Tsai
  • Publication number: 20180136266
    Abstract: A resistive environmental sensor including an electrode stack and a sensing layer is provided. The electrode stack includes a first electrode layer, a second electrode layer, and a dielectric layer disposed between the first and second electrode layers, wherein the electrode stack includes a side surface, and the first and second electrode layers are exposed on the side surface of the electrode stack. The sensing layer is disposed on the side surface of the electrode stack, and the sensing layer s in contact with the first and second electrode layers. An environmental variation is inspected by sensing a resistance variation of the sensing layer that is between the first and second electrode layers. The above-mentioned sensor is capable of sensing gases, light, humidity, temperature, and so on. The above-mentioned sensor has advantages of low resistivity and good sensitivity.
    Type: Application
    Filed: October 18, 2017
    Publication date: May 17, 2018
    Applicant: Winbond Electronics Corp.
    Inventors: Yu-Hsuan Ho, Ming-Chih Tsai
  • Patent number: 9574265
    Abstract: In some embodiments, the present disclosure relates to a plasma processing system having a magnetron that provides a symmetric magnetic track through a combination of vibrational and rotational motion. The disclosed magnetron has a magnetic element that generates a magnetic field. The magnetic element is attached to an elastic element connected between the magnetic element and a rotational shaft that rotates the magnetic element about a center of the sputtering target. The elastic element may vary its length during rotation of the magnetic element to change the radial distance between the rotational shaft and the magnetic element. The resulting magnetic track enables concurrent motion of the magnetic element in both an angular direction and a radial direction. Such motion enables a symmetric magnetic track that provides good wafer uniformity and a short deposition time.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: February 21, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Bo-Hung Lin, Ming-Chih Tsai, You-Hua Chou, Chung-En Kao
  • Patent number: 9474682
    Abstract: A light guide type pain reliever includes a handle including a barrel accommodating a battery, a rear end cap and a front end cap respectively capped on two opposite ends of the barrel, a pushbutton mounted in the rear end cap and a switching connector mounted in the rear end cap and electrically connected to the battery and drivable by the pushbutton to switching on/off the battery, a holder shell connected to the front end cap and electrically coupled to the battery and having electrically connected thereto a vibrator and a light-emitting device, an adapter connected to the holder shell, and a light guide plate connected to the adapter guiding out light rays emitted by the light-emitting device.
    Type: Grant
    Filed: April 17, 2013
    Date of Patent: October 25, 2016
    Assignee: Star Generation Limited Taiwan Branch
    Inventors: Roger Chen, Ming-Chih Tsai
  • Publication number: 20150307985
    Abstract: In some embodiments, the present disclosure relates to a plasma processing system having a magnetron that provides a symmetric magnetic track through a combination of vibrational and rotational motion. The disclosed magnetron has a magnetic element that generates a magnetic field. The magnetic element is attached to an elastic element connected between the magnetic element and a rotational shaft that rotates the magnetic element about a center of the sputtering target. The elastic element may vary its length during rotation of the magnetic element to change the radial distance between the rotational shaft and the magnetic element. The resulting magnetic track enables concurrent motion of the magnetic element in both an angular direction and a radial direction. Such motion enables a symmetric magnetic track that provides good wafer uniformity and a short deposition time.
    Type: Application
    Filed: July 6, 2015
    Publication date: October 29, 2015
    Inventors: Bo-Hung Lin, Ming-Chih Tsai, You-Hua Chou, Chung-En Kao
  • Patent number: 9093252
    Abstract: In some embodiments, the present disclosure relates to a plasma processing system comprising a magnetron configured to provide a symmetric magnetic track through a combination of vibrational and rotational motion. The disclosed magnetron comprises a magnetic element configured to generate a magnetic field. The magnetic element is attached to an elastic element connected between the magnetic element and a rotational shaft configured to rotate magnetic element about a center of the sputtering target. The elastic element is configured to vary its length during rotation of the magnetic element to change the radial distance between the rotational shaft and the magnetic element. The resulting magnetic track enables concurrent motion of the magnetic element in both an angular direction and a radial direction. Such motion enables a symmetric magnetic track that provides good wafer uniformity and a short deposition time.
    Type: Grant
    Filed: February 16, 2012
    Date of Patent: July 28, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Bo-Hung Lin, Ming-Chih Tsai, You-Hua Chou, Chung-En Kao
  • Patent number: 9039563
    Abstract: A speed changing apparatus includes a planet gear set having a sun gear, planet pinions, a planet pinion carrier and a ring gear mounted inside a rotary sleeve. The sun gear is driven by a D.C. motor to rotate in either of two opposed rotary directions. Clutch arrangements are operative to lock one of either the carrier arm or the ring gear to a rotationally fixed component and to drivingly couple the other of the carrier arm and the ring gear to the sleeve ring depending on the direction of rotation of the motor. Different gear ratios are selected by reversing the direction of rotation of the motor whilst the sleeve ring is always driven in same direction. The speed change apparatus may be part of a hub of an electric vehicle in which the sleeve ring is a hub shell and the apparatus is mounted about an axle.
    Type: Grant
    Filed: October 20, 2011
    Date of Patent: May 26, 2015
    Assignee: SUN RACE STURMEY-ARCHER, INC.
    Inventors: Shih-Liang Lin, Hsin-Yang Su, Ming-Chih Tsai
  • Patent number: 9026241
    Abstract: The present disclosure relates to semiconductor tool monitoring system having multiple sensors configured to concurrently and independently monitor processing conditions of a semiconductor manufacturing tool. In some embodiments, the disclosed tool monitoring system comprises a first sensor system configured to monitor one or more processing conditions of a semiconductor manufacturing tool and to generate a first monitoring response based thereupon. A redundant, second sensor system is configured to concurrently monitor the one or more processing conditions of the manufacturing tool and to generate a second monitoring response based thereupon. A comparison element is configured to compare the first and second monitoring responses, and if the responses deviate from one another (e.g., have a deviation greater than a threshold value) to generate a warning signal. By comparing the first and second monitoring responses, errors in the sensor systems can be detected in real time, thereby preventing yield loss.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: May 5, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wen-Cheng Yang, Chung-En Kao, You-Hua Chou, Ming-Chih Tsai, Chen-Chia Chiang, Bo-Hung Lin, Chin-Hsiang Lin
  • Patent number: 9004446
    Abstract: A sliding valve device includes a fixing portion, a sliding component and a driving member. The fixing portion has an inlet port and an outlet port. The sliding component is connected with the fixing portion, and includes a fluid channel. The driving member is used for driving movement of the sliding component, wherein the driving member is not in contact with the fluid channel, the inlet port and the outlet port.
    Type: Grant
    Filed: November 23, 2011
    Date of Patent: April 14, 2015
    Assignee: Delta Electronics, Inc.
    Inventor: Ming-Chih Tsai
  • Patent number: 8889507
    Abstract: A capacitor and methods for forming the same are provided. The method includes forming a bottom electrode; treating the bottom electrode in an oxygen-containing environment to convert a top layer of the bottom electrode into a buffer layer; forming an insulating layer on the buffer layer; and forming a top electrode over the insulating layer.
    Type: Grant
    Filed: June 20, 2007
    Date of Patent: November 18, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Ta Wu, Jason Lee, Chung Chien Wang, Hsing-Lien Lin, Yu-Jen Wang, Yeur-Luen Tu, Chern-Yow Hsu, Yuan-Hung Liu, Chi-Hsin Lo, Chia-Shiung Tsai, Lucy Chang, Chia-Lin Chen, Ming-Chih Tsai
  • Patent number: 8884526
    Abstract: In some embodiments, the present disclosure relates to a plasma processing system that generates a magnetic field having a maximum strength that is independent of workpiece size. The plasma processing system has a plurality of side electromagnets that have a size which is independent of the workpiece size. The side electromagnets are located around a perimeter of a processing chamber configured to house a semiconductor workpiece. When a current is provided to the side electromagnets, separate magnetic fields emanate from separate positions around the workpiece. The separate magnetic fields contribute to the formation of an overall magnetic field that controls the distribution of plasma within the processing chamber. Because the size of the plurality of separate side magnets is independent of the workpiece size, the plurality of side magnets can generate a magnetic field having a maximum field strength that is independent of workpiece size.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: November 11, 2014
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Bo-Hung Lin, Ming-Chih Tsai, Chia-Ho Chen, Chung-En Kao
  • Patent number: 8763644
    Abstract: A flow stabilizer includes a base, a noise reduction structure, and a plurality of protrusion structures. The noise reduction structure is disposed on the base. The protrusion structures are disposed between the base and the noise reduction structure. The protrusion structures define a plurality of intervals, and at least two intervals are not equal.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: July 1, 2014
    Assignee: Delta Electronics, Inc.
    Inventors: Ming-Chih Tsai, Guan-Hsien Li, Yu-Lin Hsueh