Abstract: After rinsing, a liquid mixture (IPA+DIW) is supplied to a substrate surface while rotating a substrate at a first rotating velocity which is relatively high to thereby replace the rinsing liquid adhering to the substrate surface with the liquid mixture. In this way, the rinsing liquid adhering to the gaps between the patterns formed on the substrate surface is replaced with the liquid mixture. Subsequently, DIW is supplied to the substrate surface in a condition that the rotation of the substrate is stopped or that the substrate is rotated at a second rotating velocity which is relatively low to thereby form a puddle-like liquid layer with DIW. In this way, the liquid mixture of the surface layer part is removed from the substrate surface while leaving almost all the liquid mixture adhering to the gaps between the patterns. After that, the liquid layer is removed from the substrate surface to thereby dry the substrate surface.

Abstract: The substrate processing apparatus includes a first etching mode and a second etching mode. In the first etching mode, a first nozzle is positioned at a first processing position and a chemical solution is supplied from the first nozzle to a top rim portion of the rotating substrate. In the second etching mode, a second nozzle is positioned at a second processing position and DIW is supplied to the top rim portion to which the chemical solution adheres, while the chemical solution is supplied from the first nozzle positioned at the first processing position to the top rim portion of the rotating substrate. The etching mode is selectively switched between the two etching modes in accordance with a property of the thin film adhering to the substrate.

Abstract: The present invention aims at providing a novel polypeptide, a receptor, a DNA thereof, and the like. Specifically, the present invention provides a polypeptide having a binding ability to the protein represented by SEQ ID NO: 1 or SEQ ID NO: 3, or its amide, its ester or its salt, a polynucleotide encoding the polypeptide, an antisense polynucleotide or an antibody to the polypeptide, a screening of agent for prevention and/or treatment of cancer, obesity, etc., which comprises using the above, and the like. The polypeptide, receptor, polynucleotide, antisense polynucleotide, antibody and the like are useful for an agent of prevention and/or treatment of cancer, obesity and the like. Further, they are useful for a screening of an agent for prevention and/or treatment of cancer, obesity and the like.

Abstract: Above a wafer which is held by a spin chuck, a blocking member whose opposed surface to the wafer is approximately horizontal is disposed at a higher position than an organic solvent component supplying outlet which is able to move from a central position of the wafer toward the periphery of the wafer. An organic solvent component nozzle scans (moves) together with the blocking member, thereby efficiently supplying a gas containing an organic solvent component discharged from the organic solvent component supplying outlet onto a surface of the wafer without getting discharged from the vicinity of the surface of the wafer owing to the blocking member. Hence, when the organic solvent component nozzle scans (moves), the concentration of the organic solvent component is always high near the organic solvent component supplying outlet.

Abstract: [Problem] A coaxial cable grounding structure using no solder exhibits a secure grounding function and a secure cable holding function in keeping with the reduction in the diameter of the cable core wire and the reduced interval between adjacent cables. [Solving Means] A coaxial cable grounding structure (10) comprises a conductive first member (12) and a conductive second member (14). The first member includes first bulges (28) in contact with outer conductors (20) of the exposed length (24) of a first group of coaxial cables (16), and the second member includes second openings (32) for receiving the first bulges and the cable exposed length supported by the first bulges. Further, the second member includes second bulges (34) in contact with the outer conductors of the exposed length of a second group of coaxial cables. The first member includes second bulges and first openings for receiving the cable exposed length supported by the second bulges.

Abstract: After rinsing, while rotating a substrate, a front layer part of a rinsing liquid (DIW) adhering to a substrate surface is drained and removed from the substrate surface. This is followed by supply to the substrate surface of a liquid mixture which is obtained by mixing IPA and DIW together. Since a majority of the rinsing liquid on the substrate surface is removed off from the substrate surface, even when micro patterns are formed on the substrate surface, the liquid mixture replaces the liquid component adhering to the gaps between the patterns. Further, the IPA concentration in the liquid mixture supplied to the substrate surface is set to 50% or below.

Abstract: The present invention provides a colored photosensitive resin composition which causes a small change in exposure when a pattern is subjected to projection exposure. Disclosed is a colored photosensitive resin composition comprising a dye, a photo acid generator, a curing agent, an alkali-soluble resin, a solvent, and a compound represented by the formula (I): in the formula (I), R1 to R3 each independently represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, a branched alkyl group having 3 to 12 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, and a hydrogen atom on the linear alkyl group having 1 to 6 carbon atoms, a hydrogen atom on the branched alkyl group having 3 to 12 carbon atoms, a hydrogen atom on the cycloalkyl group and a hydrogen atom on the aryl group may be substituted with a hydroxyl group, provided that at least one of R1 to R3 represents a group other than a hydrogen atom.

Abstract: A light shielding structure in an optical apparatus includes first and second relatively-movable members, each having an engaging portion engaged with each other and relatively movable to each other so as to change an amount of mutually overlapping area therebetween; and a light shielding member provided between the engaging portions. The light shielding member is elastically deformed into a light shielding shape in which the light shielding member inwardly bends toward an optical axis of the optical apparatus to protrude from the engaging portions due to the mutually overlapping area between the engaging portions decreasing, and the light shielding member is elastically deformed into a retracted shape in which the light shielding member is housed between opposing surfaces of the engaging portions due to the mutually overlapping area between the engaging portions increasing, in accordance with a relative movement between the engaging portions.

Abstract: A base station apparatus (radio transmission apparatus) transmits a radio signal of data to a mobile terminal apparatus (communication apparatus of a transmission destination). The mobile terminal apparatus receiving the radio signal determines (ST1010) information (CQI) on a downlink transmission rate enabling reception in the mobile terminal apparatus based on reception quality such as CIR to transmit to the base station apparatus. The base station apparatus extracts a CQI value from the received radio signal, while obtaining likelihood of received data (ST1020), and corrects the CQI value based on the likelihood (ST1030). Then, based on the corrected CQI value, the base station apparatus determines a downlink transmission rate (ST1040).

Abstract: A substrate on the surface of which the liquid film is formed in a cleaning unit is transported to a freezing unit by a substrate transporting mechanism. The liquid film is frozen in the freezing unit and the volume of the liquid film increases. Accordingly, adhesive forces between the substrate and the particles are reduced and the particles even come to separate from the substrate surface. Then the substrate which has been processed freezing is transported from the freezing unit to the cleaning unit again by the substrate transporting mechanism. In the cleaning unit, a physical and/or chemical cleaning is executed to the substrate, and the frozen film is removed from the substrate surface. Thus, the liquid film formation and the freezing of the liquid film is performed as a preprocessing of the physical and/or chemical cleaning in this way, whereby the particles are removed from the substrate surface efficiently.

Abstract: A rinsing liquid adheres in a piled up state to the entire front surface of the substrate which is rinsed with the rinsing liquid discharged from a rinse nozzle, thereby forming a so-called puddle-like rinse layer. An opposed surface of a proximity block is positioned in the vicinity of a front surface of a substrate and a liquid-tight layer is formed in a gap space between the opposed surface and the front surface of the substrate. In a condition that the liquid-tight layer is formed, the proximity block moves in the moving direction, and a solvent gas containing a solvent component, which dissolves in the liquid to reduce a surface tension, is supplied toward an upstream-side edge of the liquid-tight layer.

Abstract: In a condition that an opposed surface 31 of a proximity block 3 is positioned in the vicinity of a front surface Wf of a substrate and a liquid-tight layer 23 is formed in a space SP between the opposed surface 31 and the front surface Wf of the substrate, the proximity block 3 moves in the moving direction (?X), a solvent gas containing a solvent component, which is dissolved in the liquid and reduces the surface tension, is supplied toward an upstream-side edge 231 of the liquid-tight layer 23. Further, the liquid is supplied to the front surface Wf of the substrate at an upstream-side interface 231a or on the downstream side (?X) in the moving direction relative to the upstream-side interface 231a, thereby replacing a rinsing liquid (the liquid) contacting the front surface Wf of the substrate with thus supplied fresh liquid.

Abstract: Substrates having liquid films with preprocessing liquid on surfaces thereof in a preprocessing unit are transported to a freezing unit arranged separately from the preprocessing unit by a substrate transporting robot. In the freezing unit, the substrates are accommodated in a processing space in a processing chamber and the liquid films are frozen by decreasing the temperature of the processing space to a temperature below the freezing point of the preprocessing unit. Subsequently, the substrates subjected to the freezing process are transported from the freezing unit to a post-processing unit arranged separately from the freezing unit. In the post-processing unit, cleaning liquid is supplied to frozen films, whereby contaminants having adhesive forces to the substrate reduced by the freezing process can be easily removed together with the frozen film.

Abstract: In performing plasma etching with the aim to form a gate electrode on a large-diameter substrate, it is difficult according to prior art methods to ensure the in-plane uniformity of CD shift of the gate electrode. The present invention solves the problem by supplying processing gases having different flow rates and compositions respectively through openings formed at positions opposing to the substrate and at the upper corner or side wall of the processing chamber.

Abstract: Error detection section 109 carries out error detection using demodulated data and outputs an error rate to SIR versus error rate estimation section 110. SIR versus error rate estimation section 110 estimates an SIR versus error rate and outputs the result of decision as to whether the correction of the target SIR value is necessary or not to target SIR correction section 111. Target SIR correction section 111 corrects the target SIR value based on the decision result. The information on the demodulation capability of a BTS is output to G parameter control section 112 and G parameter control section 112 determines an optimal gain factor. A G parameter indicating the determined gain factor is output to multiplexing section 107 of the BTS. The G parameter is output to SIR versus error rate estimation section 110.

Abstract: A plasma etching method for a plasma etching apparatus including: a processing chamber for performing plasma etching on an object to be processed; a first gas supply source; a second gas supply source; a first gas inlet for introducing a processing gas into the processing chamber; a second gas inlet for introducing a processing gas into the processing chamber; a flow rate regulator for regulating the flow rate of the processing gas; and a gas shunt for dividing the first processing gas into a plurality of portions, wherein the second processing gas is merged with at least one part between the gas shunt and the first gas inlet and between the gas shunt and the second gas inlet.

Abstract: Provided are a hydraulic pump 7, an electromagnetic flow rate control valve 2 that controls the flow rate of hydraulic oil supplied from the hydraulic pump 7 to a power steering device PS, and a pressure compensating valve 4 that maintains a fixed pressure difference between upstream and downstream sides of the electromagnetic flow rate control valve 2 and bypasses an excess flow rate. The electromagnetic flow rate control valve 2 maintains a predetermined initial opening when a control current is zero, while an opening of the electromagnetic flow rate control valve decreases to become a minimum opening when the control current increases from zero, and the opening gradually becomes larger toward a maximum opening when a predetermined control current is exceeded.

Abstract: [PROBLEMS] To provide a rotating frame of an upper rotating body such that total productivity can be improved, the cost can be reduced, and model change can be facilitated. [MEANS FOR SOLVING PROBLEMS] Many models having different lifting capacities are divided into a plurality of classes each including a plurality of models. A rotating frame 17 is determined on the basis of the model having the largest lifting capacity in each class. An upper rotating body is constructed using the rotating frame 17 as the base. In addition, each of winches 5 to 7 is mounted on the rotating frame by using a mounting structure standardized in the same class. On the other hand, left and right deck frames 18 and 19 are divided into sections on which different pieces of equipment are mounted, and the sections are separately attached to the rotating frame 17.

Abstract: A resolver unit having a structure in which the axial length is shortened to prevent the magnetic coupling characteristic between the rotary and stationary sides from being impaired, a winding generates more magnetic fluxes, and multiplexing is easily conducted, and also a resolver using such a resolver unit are provided.

Abstract: A holding mode is selectively switched, in accordance with the content of processing of a substrate, among three holding modes: (a) a first holding mode in which while first support pins F1 through F12 abut on the back surface of a substrate W and support the substrate W, the substrate W is held because of nitrogen gas which is supplied to the front surface of the substrate W; (b) a second holding mode in which while second support pins S1 through S12 abut on the edge surface of the substrate W as the substrate W moves along the horizontal direction, thereby restricting horizontal movement of the substrate W, and abut on the back surface of the substrate W, thereby supporting the substrate W, the substrate W is held because of nitrogen gas which is supplied to the back surface of the substrate W; and (c) a third holding mode in which while the first and the second support pins F1 through F12 and support pins S1 through S12 abut on the back surface of the substrate W, the substrate W is held because of nitroge