Patents by Inventor Muneyuki Fukuda
Muneyuki Fukuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180138010Abstract: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.Type: ApplicationFiled: January 12, 2018Publication date: May 17, 2018Inventors: Muneyuki FUKUDA, Yoshinori MOMONOI, Akihiro MIURA, Fumihiro SASAJIMA, Hiroaki MITO
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Patent number: 9892887Abstract: The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like.Type: GrantFiled: October 13, 2016Date of Patent: February 13, 2018Assignee: Hitachi High-Technologies CorporationInventors: Muneyuki Fukuda, Yoshinori Momonoi, Akihiro Miura, Fumihiro Sasajima, Hiroaki Mito
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Publication number: 20170343340Abstract: The objective of the present invention is to provide a height measurement device capable of highly accurate measurement in the depth direction of a structure on a sample. To achieve this objective, proposed are a charged particle beam device and a height measurement device that is provided with a calculation device for determining the size of a structure on a sample on the basis of a detection signal obtained by irradiating the sample with a charged particle beam, wherein the calculation device calculates the distance from a first charged particle beam irradiation mark formed at a first height on the sample and a second charged particle beam irradiation mark formed at a second height on the sample and on the basis of this distance and the charged particle beam irradiation angle when the first charged particle beam irradiation mark and second charged particle beam irradiation mark were formed, calculates the distance between the first height and the second height.Type: ApplicationFiled: December 10, 2014Publication date: November 30, 2017Applicant: Hitachi High-Tecnologies CorporationInventors: Hiroki KAWADA, Muneyuki FUKUDA, Yoshinori MOMONOI, Shou TAKAMI
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Patent number: 9644955Abstract: A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage.Type: GrantFiled: November 26, 2012Date of Patent: May 9, 2017Assignee: Hitachi High-Technologies CorporationInventors: Tasuku Yano, Yasunari Sohda, Muneyuki Fukuda, Katsunori Onuki, Hajime Kawano, Naomasa Suzuki
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Publication number: 20170110285Abstract: The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like.Type: ApplicationFiled: October 13, 2016Publication date: April 20, 2017Inventors: Muneyuki FUKUDA, Yoshinori MOMONOI, Akihiro MIURA, Fumihiro SASAJIMA, Hiroaki MITO
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Publication number: 20170025251Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.Type: ApplicationFiled: July 22, 2016Publication date: January 26, 2017Inventors: Momoyo ENYAMA, Muneyuki FUKUDA, Hideyuki KAZUMI, Koichi HAMADA, Sayaka TANIMOTO
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Patent number: 9384940Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).Type: GrantFiled: October 21, 2013Date of Patent: July 5, 2016Assignee: Hitachi High-Technologies CorporationInventors: Muneyuki Fukuda, Naomasa Suzuki, Akira Ikegami, Hideto Dohi, Momoyo Enyama, Tomoyasu Shojo
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Patent number: 9312091Abstract: In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.Type: GrantFiled: April 18, 2013Date of Patent: April 12, 2016Assignee: Hitachi High-Technologies CorporationInventors: Yasunari Sohda, Tasuku Yano, Muneyuki Fukuda, Noritsugu Takahashi, Hajime Kawano, Hiroyuki Ito
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Patent number: 9287082Abstract: A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.Type: GrantFiled: February 7, 2015Date of Patent: March 15, 2016Assignee: Hitachi High-Technologies CorporationInventors: Kenichi Morita, Sayaka Tanimoto, Makoto Sakakibara, Muneyuki Fukuda, Naomasa Suzuki, Kenji Obara
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Patent number: 9230775Abstract: A charged particle instrument including a controlling and operating unit for controlling a charged particle source, deflecting means, and focus changing means and making a data for an image by an electric signal detected by a detector, and a recording unit for preserving a correction coefficient registered at each image-acquisition, in which the controlling and operating unit acquires plural images while changing a focus, and controls an optical condition such that a landing angle of a charged particle beam becomes perpendicular when an image for measurement is acquired on the basis of a position shift amount of a mark in the image and a correction coefficient registered to the recording unit.Type: GrantFiled: April 20, 2012Date of Patent: January 5, 2016Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Takeyoshi Ohashi, Yasunari Sohda, Makoto Ezumi, Muneyuki Fukuda, Noritsugu Takahashi
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Publication number: 20150294833Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).Type: ApplicationFiled: October 21, 2013Publication date: October 15, 2015Applicant: Hitachi High-Technologies CorporationInventors: Muneyuki Fukuda, Naomasa Suzuki, Akira Ikegami, Hideto Dohi, Momoyo Enyama, Tomoyasu Shojo
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Patent number: 9159533Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.Type: GrantFiled: July 18, 2014Date of Patent: October 13, 2015Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Muneyuki Fukuda, Naomasa Suzuki, Tomoyasu Shojo, Noritsugu Takahashi
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Patent number: 9129775Abstract: The present invention has an object to perform specimen charge measurement or focusing at a high speed and with high precision also for a specimen in which fixed charge and induced charge may be mixedly present. As one mode to achieve the object, there are proposed a specimen potential measuring method and a device to implement the method characterized in that when specimen potential information obtained by a first specimen potential measuring device disposed outside a specimen chamber or specimen potential information beforehand obtained is equal to or more than a predetermined threshold value or is more than the threshold value, measurement of specimen potential is selectively conducted by use of a second specimen potential measuring device in the specimen chamber.Type: GrantFiled: July 2, 2010Date of Patent: September 8, 2015Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Tatsuaki Ishijima, Osamu Nasu, Muneyuki Fukuda, Takeyoshi Ohashi, Takuji Miyamoto, Kei Sakai
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Patent number: 9123501Abstract: A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.Type: GrantFiled: December 26, 2011Date of Patent: September 1, 2015Assignee: Hitachi High-Technologies CorporationInventors: Muneyuki Fukuda, Yoichi Ose, Mitsugu Sato, Hiroyuki Ito, Hiroshi Suzuki, Naomasa Suzuki
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Publication number: 20150228443Abstract: A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.Type: ApplicationFiled: February 7, 2015Publication date: August 13, 2015Inventors: Kenichi MORITA, Sayaka TANIMOTO, Makoto SAKAKIBARA, Muneyuki FUKUDA, Naomasa SUZUKI, Kenji OBARA
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Publication number: 20150076362Abstract: In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.Type: ApplicationFiled: April 18, 2013Publication date: March 19, 2015Inventors: Yasunari Sohda, Tasuku Yano, Muneyuki Fukuda, Noritsugu Takahashi, Hajime Kawano, Hiroyuki Ito
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Publication number: 20140339425Abstract: A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage.Type: ApplicationFiled: November 26, 2012Publication date: November 20, 2014Inventors: Tasuku Yano, Yasunari Sohda, Muneyuki Fukuda, Katsunori Onuki, Hajime Kawano, Naomasa Suzuki
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Publication number: 20140326879Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.Type: ApplicationFiled: July 18, 2014Publication date: November 6, 2014Inventors: Muneyuki FUKUDA, Naomasa SUZUKI, Tomoyasu SHOJO, Noritsugu TAKAHASHI
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Patent number: 8859962Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.Type: GrantFiled: March 17, 2014Date of Patent: October 14, 2014Assignee: Hitachi High-Technologies CorporationInventors: Noritsugu Takahashi, Muneyuki Fukuda, Manabu Yano, Hirohiko Kitsuki, Kazunari Asao, Tomoyasu Shojo
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Patent number: 8841612Abstract: This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.Type: GrantFiled: August 8, 2011Date of Patent: September 23, 2014Assignee: Hitachi High-Technologies CorporationInventors: Muneyuki Fukuda, Naomasa Suzuki, Tomoyasu Shojo, Noritsugu Takahashi, Hiroshi Suzuki, Hiroshi Makino