Patents by Inventor Naomasa Suzuki

Naomasa Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7359506
    Abstract: Inclined plane is provided at the tip of rotor cam. On the other hand, inclined planes are also provided in specific positions of stator cam. Because of this structure, in the specific positions, the inclined planes are in resilient contact with each other. Thus, the load is increased only in the specific positions without an increase in the load of spring. This structure can provide an opening and closing device capable of securely holding only desired positions without affecting the feel of opening and closing operation of the entire device, and electronic equipment using the device.
    Type: Grant
    Filed: February 10, 2004
    Date of Patent: April 15, 2008
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takehiko Konja, Yasuchika Kudo, Katsuichi Minami, Koji Sakai, Katsumasa Yamaguchi, Masayuki Miki, Naomasa Suzuki
  • Publication number: 20080048117
    Abstract: Disclosed is a scanning electron microscope capable of checking an abrupt change of probe current due to changes in intensities of the respective condenser lenses when the probe current is intended to be changed by changing the intensities of the respective condenser lenses. The scanning electron microscope includes: an electron source for generating a beam of electrons; a first and second condenser lenses each for condensing the beam of electrons; an object lens for narrowly focusing the beam of electrons on a sample; a deflecting system for two-dimensionally scanning over the sample; and a detecting system for detecting secondary electrons generated from the sample due to the irradiation of the beam of electrons on the sample. In the scanning electron microscope, a first and second aperture plates each for blocking parts of the beam of electrons unnecessary for the sample are sequentially arranged between the first and second condenser lenses.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 28, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventor: Naomasa SUZUKI
  • Patent number: 7294835
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Grant
    Filed: January 13, 2006
    Date of Patent: November 13, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Publication number: 20070221846
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Application
    Filed: May 24, 2007
    Publication date: September 27, 2007
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Publication number: 20070187598
    Abstract: A scanning electron microscope, by which an image of unevennesses on the surface of a sample may be obtained in a high-resolution manner and a high contrast one, is provided according to the present invention. A sample image is obtained by use of the scanning electron microscope with a configuration in which a positive voltage is applied in order to accelerate a primary electron beam, and an electric field shielding plate, a magnetic field shielding plate, or an electromagnetic field shielding plate is arranged on the upper side of an object lens.
    Type: Application
    Filed: January 19, 2007
    Publication date: August 16, 2007
    Inventors: Ichiro Tachibana, Mitsugu Sato, Atsuko Fukada, Naomasa Suzuki, Muneyuki Fukuda
  • Publication number: 20070004474
    Abstract: A problem of the present invention is to provide a foldable type portable communication terminal apparatus which can have a user carried out an operation for surely guiding the user to a talkable state at the time that there was an incoming call. A hinge mechanism which coupled an upper side housing and a lower side housing in such a manner that they can be opened and closed, a push button which opens the hinge mechanism when it was depressed, light emission means which has the push button lighted up at the time of light emission, and control means which turns on the light emission means (step S4) when the hinge mechanism is closed at the time that there was an incoming call (step S2) are disposed.
    Type: Application
    Filed: March 18, 2004
    Publication date: January 4, 2007
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yasuhiko Oota, Kazufumi Takeshita, Naomasa Suzuki, Seiji Miyashita
  • Publication number: 20060243906
    Abstract: In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
    Type: Application
    Filed: April 28, 2006
    Publication date: November 2, 2006
    Inventors: Atsuko Fukada, Mitsugu Sato, Naomasa Suzuki, Hidetoshi Nishiyama, Muneyuki Fukuda, Noritsugu Takahashi
  • Publication number: 20060186351
    Abstract: To establish a technique that enables sorting of the elevation and azimuth angle in the direction of emitting secondary electrons and obtaining images with emphasized contrast, in order to perform the review and analysis of shallow asperities and microscopic foreign particles in a wafer inspection during the manufacture of semiconductor devices, an electromagnetic overlapping objective lens is used to achieve high resolution, an electron beam is narrowly focused using the objective lens, an electric field for accelerating secondary electrons in the vicinity of a wafer in order to suppress the dependence on secondary electron energy of the rotation of secondary electrons generated by irradiation of the electron beam, a ring-shaped detector plate is disposed between an electron source and the objective lens, and the low angle components of the elevation angle of the secondary electrons, as viewed from the place of generation, and the high angle components are separated and also the azimuth components are separa
    Type: Application
    Filed: February 9, 2006
    Publication date: August 24, 2006
    Inventors: Hidetoshi Nishiyama, Muneyuki Fukuda, Noritsugu Takahashi, Mitsugu Sato, Atsuko Fukada, Naomasa Suzuki
  • Publication number: 20060113474
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Application
    Filed: January 13, 2006
    Publication date: June 1, 2006
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Patent number: 7049591
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: May 23, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Patent number: 6979821
    Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained. The reflected electrons 12a emitted in a direction at a small angle with the surface of the sample 8 are detected by the detectors 10a and 10b arranged on the side of the electron source 1 of the magnetic field leakage type object lens 7 and a sample image is formed. Irregularity information of the sample is obtained from the effects of light and shade appearing in the sample image.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: December 27, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose
  • Publication number: 20050133719
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Application
    Filed: December 21, 2004
    Publication date: June 23, 2005
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Patent number: 6847038
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: January 25, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Publication number: 20040184600
    Abstract: Inclined plane is provided at the tip of rotor cam. On the other hand, inclined planes are also provided in specific positions of stator cam. Because of this structure, in the specific positions, the inclined planes are in resilient contact with each other. Thus, the load is increased only in the specific positions without an increase in the load of spring. This structure can provide an opening and closing device capable of securely holding only desired positions without affecting the feel of opening and closing operation of the entire device, and electronic equipment using the device.
    Type: Application
    Filed: February 10, 2004
    Publication date: September 23, 2004
    Inventors: Takehiko Konja, Yasuchika Kudo, Katsuichi Minami, Koji Sakai, Katsumasa Yamaguchi, Masayuki Miki, Naomasa Suzuki
  • Patent number: 6765205
    Abstract: An electron microscope including an apparatus for x-ray analysis, is capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing, at high speed and with high precision and high space resolving power. The current quantity of the electron beam is automatically controlled such that an X-ray count rate falls within a range of 1000 to 2000 counts per second, a plurality of X-ray energy regions are set up when checking an X-ray spectrum against reference spectra stored in a database for analysis of the X-ray spectrum, matching is performed for each of the X-ray energy regions, and the distribution of the elements observed is analyzed on the basis of an intensity ratio between X-ray sample spectra obtained by electron beam irradiation at not less than two varied acceleration voltages.
    Type: Grant
    Filed: June 24, 2003
    Date of Patent: July 20, 2004
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Isao Ochiai, Toshiei Kurosaki, Toshiro Kubo, Naomasa Suzuki
  • Publication number: 20040113074
    Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained.
    Type: Application
    Filed: December 9, 2003
    Publication date: June 17, 2004
    Applicant: Hitachi, Ltd.
    Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose
  • Publication number: 20040099805
    Abstract: There are provided an electron microscope including an apparatus of x-ray analysis, capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing semiconductor devices and so forth, at high speed and with high precision and high space resolving power, and a method of analyzing specimens using the same.
    Type: Application
    Filed: June 24, 2003
    Publication date: May 27, 2004
    Inventors: Isao Ochiai, Toshiei Kurosaki, Toshiro Kubo, Naomasa Suzuki
  • Publication number: 20040051041
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Application
    Filed: August 20, 2003
    Publication date: March 18, 2004
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Patent number: 6646262
    Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
    Type: Grant
    Filed: July 15, 2002
    Date of Patent: November 11, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Todokoro, Makoto Ezumi, Yoichi Ose, Naomasa Suzuki
  • Publication number: 20030122074
    Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained.
    Type: Application
    Filed: February 20, 2003
    Publication date: July 3, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose