Patents by Inventor Naoya Inoue

Naoya Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250249375
    Abstract: The race start preparation judging unit judges that the racing vehicle is within a predetermined range from the race start position based on the race start position information indicating the race start position included in the course information, the vehicle position information of the racing vehicle obtained by the vehicle position acquiring unit, and the vehicle speed information obtained by the traveling data acquiring unit. When it is judged that the racing vehicle has stopped, the race start judging unit judges that the racing vehicle has stopped at the race start position. The race start judging unit identifies the point in time at which the racing vehicle has departed after the race start preparation judging unit judges that the racing vehicle has stopped at the race start position as the point in time at which the race in which the racing vehicle participates begins.
    Type: Application
    Filed: January 23, 2025
    Publication date: August 7, 2025
    Inventor: Naoya INOUE
  • Patent number: 12370781
    Abstract: The disclosure provides a vehicle window structure in which a light emitting device can be disposed outside the laminated glass. The disclosure also provides a vehicle window structure to be installed at an opening of a vehicle, which comprises a first glass plate and a light emitting device, wherein at least a part of the light emitting device is disposed in a space formed between the first glass plate, an adhesive bonding the first glass plate and a body flange of the vehicle, and an interior material of the vehicle.
    Type: Grant
    Filed: November 30, 2022
    Date of Patent: July 29, 2025
    Assignee: AGC INC.
    Inventors: Takayuki Kimura, Aki Takahashi, Kenichiro Shimo, Takafumi Inoue, Takashi Takada, Youta Oowa, Takashi Sasaki, Naoya Inoue
  • Patent number: 12319276
    Abstract: An evacuation running assistance system includes a peripheral environment recognizer to recognize at least a space of a road shoulder and a free space as a non-traffic portion, a time limit setter to set a time limit on the own vehicle for continuing evacuation running, and an evacuation place setter to determine at least one of the road shoulder space and the free space recognized by the peripheral environment recognizer as an evacuation place where the own vehicle is evacuated. A situation determiner determines a situation of an own vehicle as being in one of situations in which evacuation running is to be continued, running of an own vehicle is to be stopped on a lane, and road shoulder evacuation is to be performed based on the time limit. A controller controls the own vehicle based on the situation of the own vehicle determined by the situation determiner.
    Type: Grant
    Filed: June 27, 2022
    Date of Patent: June 3, 2025
    Assignee: DENSO CORPORATION
    Inventors: Syoya Ishida, Shunya Kumano, Tetsuya Takafuji, Ukyo Tanikawa, Naoya Inoue
  • Patent number: 12271112
    Abstract: A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.
    Type: Grant
    Filed: February 4, 2022
    Date of Patent: April 8, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Naoya Inoue, Kenji Funatsu
  • Patent number: 12142558
    Abstract: A semiconductor device includes a first lower line and a second lower line on a substrate, the first and second lower lines extending in a first direction, being adjacent to each other, and being spaced apart along a second direction, orthogonal the first direction, an airgap between the first and second lower lines and spaced therefrom along the second direction, a first insulating spacer on a side wall of the first lower line facing the second lower line, wherein a distance from the first airgap to the first lower line along the second direction is equal to or greater than an overlay specification of a design rule of the semiconductor device, and a second insulating spacer between the airgap and the second lower line.
    Type: Grant
    Filed: April 28, 2021
    Date of Patent: November 12, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Naoya Inoue, Dong Won Kim, Young Woo Cho, Ji Won Kang, Song Yi Han
  • Patent number: 12060317
    Abstract: An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(?O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
    Type: Grant
    Filed: May 27, 2021
    Date of Patent: August 13, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Ryosuke Taniguchi, Naoya Inoue
  • Patent number: 11773059
    Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
    Type: Grant
    Filed: May 27, 2021
    Date of Patent: October 3, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoya Inoue, Satoshi Watanabe, Ryosuke Taniguchi, Masahiro Fukushima
  • Patent number: 11614688
    Abstract: A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: March 28, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryosuke Taniguchi, Satoshi Watanabe, Takayuki Fujiwara, Naoya Inoue
  • Publication number: 20230086792
    Abstract: To provide a vehicle window structure in which a light emitting device can be disposed outside the laminated glass. A vehicle window structure to be installed at an opening of a vehicle, which comprises a first glass plate and a light emitting device, wherein at least a part of the light emitting device is disposed in a space formed between the first glass plate, an adhesive bonding the first glass plate and a body flange of the vehicle, and an interior material of the vehicle.
    Type: Application
    Filed: November 30, 2022
    Publication date: March 23, 2023
    Applicant: AGC Inc.
    Inventors: Takayuki KIMURA, Aki TAKAHASHI, Kenichiro SHIMO, Takafumi INOUE, Takashi TAKADA, Youta OOWA, Takashi SASAKI, Naoya INOUE
  • Patent number: 11579526
    Abstract: A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: February 14, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryosuke Taniguchi, Satoshi Watanabe, Masaki Ohashi, Naoya Inoue
  • Patent number: 11569611
    Abstract: A configuration ensuring a connector to be fixed to a connector housing with high water-tightness, free of damaging or breaking due to external force, and achieving high shielding performance and reliability is provided. The connector includes a terminal that is conductive, an intermediate insulating member that contains the terminal, and an outer conductor that is conductive and contains the intermediate insulating member. The connector housing includes an outer conductor holding part provided with an outer conductor insertion hole through which the outer conductor is inserted and a front outer conductor containing cavity that is formed on a front side of the outer conductor holding part and has a larger cross-sectional area than the outer conductor insertion hole.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: January 31, 2023
    Assignee: Molex, LLC
    Inventors: Naoya Inoue, Taichi Taniguchi, Masato Okano
  • Patent number: 11548844
    Abstract: A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: January 10, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Domon, Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe
  • Publication number: 20220410877
    Abstract: An evacuation running assistance system includes a peripheral environment recognizer to recognize at least a space of a road shoulder and a free space as a non-traffic portion, a time limit setter to set a time limit on the own vehicle for continuing evacuation running, and an evacuation place setter to determine at least one of the road shoulder space and the free space recognized by the peripheral environment recognizer as an evacuation place where the own vehicle is evacuated. A situation determiner determines a situation of an own vehicle as being in one of situations in which evacuation running is to be continued, running of an own vehicle is to be stopped on a lane, and road shoulder evacuation is to be performed based on the time limit. A controller controls the own vehicle based on the situation of the own vehicle determined by the situation determiner.
    Type: Application
    Filed: June 27, 2022
    Publication date: December 29, 2022
    Inventors: Syoya ISHIDA, Shunya KUMANO, Tetsuya TAKAFUJI, Ukyo TANIKAWA, Naoya INOUE
  • Publication number: 20220413486
    Abstract: An evacuation running assistance system includes a road shoulder evacuation possibility determiner to determine if an own vehicle can be evacuated to a road shoulder; an own vehicle situation determiner to determine a current situation of an own vehicle in accordance with a time limit and the road shoulder evacuation possibility, a controller to control an own vehicle in accordance with the situation of the own vehicle; and a road shoulder evacuation possibility road determiner to acquire evacuation space information from a past running history of the own vehicle. The own vehicle situation determiner determines that the own vehicle is in the situation to be controlled to perform the on-lane stopping when the road shoulder evacuation possibility road determiner does not determine within the provisional time that the evacuation of the own vehicle to the road shoulder is possible.
    Type: Application
    Filed: June 27, 2022
    Publication date: December 29, 2022
    Inventors: Syoya ISHIDA, Shunya KUMANO, Tetsuya TAKAFUJI, Masaya OKADA, Naoya INOUE
  • Publication number: 20220404701
    Abstract: A chemically amplified resist composition contains (A) a polymer compound containing one or two or more kinds of repeating units, at least one kind of the repeating units is polymerized from a polymerizable monomer with not more than 1000 ppm of a residual oligomer in a form of dimer to hexamer. An object of the present invention is to provide: a chemically amplified resist composition capable of achieving favorable resolution, pattern profile, and line edge roughness, and simultaneously suppressing development-residue defect, which would otherwise cause mask defect; and a method for forming a resist pattern by using this composition.
    Type: Application
    Filed: May 3, 2022
    Publication date: December 22, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keiichi MASUNAGA, Kenji FUNATSU, Masaaki KOTAKE, Naoya INOUE
  • Patent number: 11522316
    Abstract: A connector 10 includes: a first housing 11A, a first terminal 51A attached to the first housing 11A; a second housing 11B separate from the first housing 11A; a second terminal 51B attached to the second housing 11B; a flexible member 81 where the first terminal 51A and second terminal 51B are connected to two ends, and connecting the first housing 11A and second housing 11B; and an aligning member 41 having a flexible member insertion cavity 44 where the flexible member 81 is inserted, and that is movably arranged between the first housing 11A and second housing 11B in a condition where the flexible member 81 is inserted.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: December 6, 2022
    Assignee: Molex, LLC
    Inventors: Shuichi Sato, Koji Murakami, Mikiji Tanaka, Naoya Inoue
  • Publication number: 20220308451
    Abstract: A chemically amplified positive resist composition is provided comprising a base polymer which contains a polymer comprising an acid generating unit, a phenolic hydroxy group-containing unit, a unit containing a phenolic hydroxy group protected with an acid labile group, and a unit containing a carboxy group protected with an acid labile group. A resist pattern with a high resolution, reduced LER, improved rectangularity, and minimized influence of develop loading can be formed.
    Type: Application
    Filed: March 10, 2022
    Publication date: September 29, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Kenji Funatsu, Masaaki Kotake, Naoya Inoue
  • Patent number: 11429023
    Abstract: A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
    Type: Grant
    Filed: October 17, 2019
    Date of Patent: August 30, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Domon, Naoya Inoue, Masaki Ohashi, Keiichi Masunaga, Masaaki Kotake
  • Publication number: 20220260909
    Abstract: A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.
    Type: Application
    Filed: February 4, 2022
    Publication date: August 18, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Naoya Inoue, Kenji Funatsu
  • Publication number: 20220197140
    Abstract: A chemically amplified negative resist composition comprising an alcohol compound of specific structure as a crosslinker has a high sensitivity and dissolution contrast and forms a pattern of good profile with reduced values of LER and CDU.
    Type: Application
    Filed: December 8, 2021
    Publication date: June 23, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoya Inoue, Satoshi Watanabe, Masaaki Kotake