Patents by Inventor Naoyuki Tamura

Naoyuki Tamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5078851
    Abstract: The present invention relates to a plasma processor in which a sample such as semiconductor substrate is processed with a plasma under a cooled state. An electric insulator is interposed between a sample holder for arranging the sample thereon and a cooling container for cooling the sample holder, so as to electrically insulate them, whereby a bias voltage applied to the sample holder and a voltage for generating the plasma can be prevented from leaking, so as to stabilize the process. In addition, the insulator is held in close contact with the sample holder and the cooling container through members of a thermal conductor, whereby the occurrence of non-uniformity during the processing of the sample and the occurrence of a dispersion in the qualities of processed samples among sample lots or among processors can be suppressed.
    Type: Grant
    Filed: July 24, 1990
    Date of Patent: January 7, 1992
    Inventors: Kouji Nishihata, Shigekazu Kato, Atsushi Itou, Tsunehiko Tsubone, Naoyuki Tamura
  • Patent number: 5078935
    Abstract: The polyolefin spunbonded nonwoven fabric is defined as (A) being formed of continuous polyolefin fibers having a fineness of 0.5 to 3 denier, (B) having basic weight between 30 g/m.sup.2 and 15 g/m.sup.2, and (C) having .sqroot.S.sub.MD .times.S.sub.TD of 2.5 g or below, wherein S.sub.MD and S.sub.TD are respectively the softnesses in the machine and transverse directions as measured by a handle-O-meter. The method of producing a strip of very soft polyolefin nonwoven fabric by directing polyolefin continuous fibers in a fixed direction, comprises the steps of: orienting the axes of the continuous fibers in the direction in which the continuous fibers are fed so as to form a web having a warp orientation factor (the maximum tensile strength in the direction in which the continuous fibers are fed, i.e., in a machine direction/the maximum tensile strength in a transverse direction) of 3.0 or above; and then applying wave-like crepes propagated in the machine direction to the web by creping the web.
    Type: Grant
    Filed: August 9, 1990
    Date of Patent: January 7, 1992
    Assignee: Mitsui Petrochemical Industries, Ltd.
    Inventors: Yoshinori Kobayashi, Naoyuki Tamura, Takanobu Sakai, Yoshinori Yoshida
  • Patent number: 5036758
    Abstract: An emboss roll according to the present invention is capable of assuredly performing an embossing work without any risk of shaving a surface of nonwoven fabrics and forming pin holes when used to emboss nonwoven fabrics for the purpose of prevention of filament shavings to be adhered to products. This emboss roll having an outer surface thereof provided with embossing projections wherein all of the top end corners thereof are cut so as to be a surface. As a result of cutting the top end corners of the embossing projections, nonwoven fabrics can be protected from being cut by the corner portions or forming pin holes during the embossing work.
    Type: Grant
    Filed: February 6, 1989
    Date of Patent: August 6, 1991
    Assignee: Mitsui Petrochemical Industries, Ltd.
    Inventors: Yoshinori Kobayashi, Naoyuki Tamura
  • Patent number: 4932357
    Abstract: A vacuum apparatus comprising a substrate setting disc which is arranged in a conveyance chamber and on which substrates are placed, a drive system which drives and rotates the disc, a cam which is fixed to the disc, switching means to switch signal circuits through the cam, calculation means to receive digital signals generated by the switching operations of the switching means, signals from the drive system and signals from respective processing devices so as to execute calculations, a memory which registers calculated results, and a display unit which displays the registered contents on a screen, rotational positions of the disc being loaded so as to control the hysteretic aspects of the individual substrates within the conveyance chamber with the substrates at the respective positions and addresses held in correspondence.
    Type: Grant
    Filed: April 14, 1988
    Date of Patent: June 12, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Naoyuki Tamura, Norio Kanai
  • Patent number: 4810556
    Abstract: Disclosed are a very soft polyolefin spunbonded nonwoven fabric and its production method. The polyolefin spunbonded nonwoven fabric according to the present invention is defined as (A) being formed of continuous polyolefin fibers having a fineness of 0.5 to 3 denier, (B) having basic weight between 30 g/m.sup.2 and 15 g/m.sup.2, and (C) having .sqroot.S.sub.MD .times.S.sub.TD of 2.5 g or below, wherein S.sub.MD and S.sub.TD are respectively the softnesses in the machine and transverse directions as measured by a handle-O-meter. The method of producing a strip of very soft polyolefin nonwoven fabric by directing polyolefin continuous fibers in a fixed direction, comprises the steps of: orienting the axes of the continuous fibers in the direction in which the continuous fibers are fed so as to form a web having a warp orientation factor (the maximum tensile strength in the direction in which the continuous fibers are fed, i.e.
    Type: Grant
    Filed: September 29, 1987
    Date of Patent: March 7, 1989
    Assignee: Mitsui Petrochemical Industries, Ltd.
    Inventors: Yoshinori Kobayashi, Naoyuki Tamura, Takanobu Sakai, Yoshinori Yoshida
  • Patent number: 4810473
    Abstract: In a molecular beam epitaxy apparatus in accordance with the present invention, transfer means for transferring substrates, which have been transferred from an introduction chamber, to a growth chamber and for transferring the substrates after the growth of a film, which have been transferred from the growth chamber, to a discharge chamber consists of a rotary disc which supports thereon a plurality of substrates and transfers them to the growth chamber and then to the discharge chamber, and all of the introduction chamber, the growth chamber and the discharge chamber are disposed at predetermined positions, respectively, so that the molecular beam crystal growth can be effected in a clean room which is separated from a maintenance room.
    Type: Grant
    Filed: November 30, 1987
    Date of Patent: March 7, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Naoyuki Tamura, Hideaki Kamohara, Norio Kanai, Kazuaki Ichihashi
  • Patent number: 4768921
    Abstract: A turbomolecular vacuum pump having stator blades disposed in a multistage fashion within a casing in an axial direction thereof, and rotor blades which are located between respectively adjacent stator blades and are mounted on an outer periphery of a rotor situated centrally of the casing. A motor rotor is fixed to a rotating member which is formed of the rotor having the rotor blades fixed to the outer periphery, and a motor stator opposite to the motor rotor is arranged so as to construct a drive mechanism for the rotating member. The rotating member is supported at a lower portion thereof by a pivot-type plane bearing, and a magnetic bearing is arranged in such a manner so as to oppose a lower end of the rotor and a supporting member for the rotating member.
    Type: Grant
    Filed: April 23, 1987
    Date of Patent: September 6, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Ueda Shinjiro, Osami Matsushita, Naoyuki Tamura, Yoshiteru Miyatake
  • Patent number: 4748315
    Abstract: A molecular beam source suppresses a temperature fall at the opening of a crucible, to make a temperature distribution within the crucible uniform and to prevent the phenomenon of bumping of a source substance, whereby the quality of an evaporated film can be enhanced. The source includes a heater disposed around the crucible which is formed of straight parts and U-shaped end parts continuously repeated at equal intervals. The straight parts are arranged so as to extend in a vertical direction of the crucible and the U-shaped end parts are bent outwards at outer-peripheral positions of the opening of the crucible.
    Type: Grant
    Filed: January 21, 1987
    Date of Patent: May 31, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Kunihiro Takahashi, Kazumasa Fujioka, Naoyuki Tamura
  • Patent number: 4664829
    Abstract: An oil blend having resistance to ionizing radiation comprising the following components is herein disclosed:A. 25 to 75 wt % of 0-70 wt % of o-(m-phenoxyphenoxy)diphenyl and 100-30 wt % of m-(m-phenoxyphenoxy)diphenyl; andB. 75 to 25 wt % of a monoalkyldiphenyl ether or dialkyldiphenyl ether.This oil blend has a pour point of 0.degree. C. or below and has a G-value of 0.1 or lower for the evolution of decomposition gases under irradiation with ionizing radiation. Said ethers have 10 to 20 carbon atoms in the alkyl moiety.
    Type: Grant
    Filed: April 5, 1985
    Date of Patent: May 12, 1987
    Assignees: Japan Atomic Energy Research Institute, Matsumura Oil Research Corporation
    Inventors: Kazuo Arakawa, Naohiro Hayakawa, Kenzo Yoshida, Naoyuki Tamura, Hiroshi Nakanishi, Tetsuya Yagi, Shintaro Kuroiwa
  • Patent number: 4580522
    Abstract: A rotary substrate holder of a molecular beam epitaxy apparatus including leads-cum-posts serving both as leads for passing a current to a heater for heating a substrate and as posts for supporting the heater. By this arrangement, heat transferred from the heater to a bearing disposed in the vicinity of the heater is minimized in amount, thereby prolonging the service life of the holder and minimizing a heat loss thereof.
    Type: Grant
    Filed: February 27, 1985
    Date of Patent: April 8, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Kazumasa Fujioka, Sumio Okuno, Muneo Mizumoto, Hideaki Kamohara, Shinjiro Ueda, Takao Kuroda, Sumio Yamaguchi, Naoyuki Tamura
  • Patent number: 4542712
    Abstract: An apparatus for molecular beam epitaxy according to the present invention is so constructed that a substrate is introduced into a vacuum vessel with a substrate surface for epitaxial growth facing in the direction of gravity, and that the substrate is conveyed to and transferred into vacuum chambers for performing processes necessary for the epitaxial growth, with the substrate surface maintained in the direction of gravity and without directly touching the substrate surface.
    Type: Grant
    Filed: June 22, 1984
    Date of Patent: September 24, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Sato, Sumio Yamaguchi, Shigeo Kato, Yasuhide Matsumura, Muneo Mizumoto, Sumio Okuno, Naoyuki Tamura
  • Patent number: 4454421
    Abstract: An apparatus for measuring radiation dose using the change in light absorbance of a transparent material upon irradiation which comprises substantially a light source, a monochromatic light emitting unit, a unit for controlling the light amount, a sample mounting unit, a detection unit and an indication unit wherein said light source is a hollow cathode lamp is herein disclosed.
    Type: Grant
    Filed: September 18, 1981
    Date of Patent: June 12, 1984
    Assignee: Japan Atomic Energy Research Institute
    Inventors: Ryuichi Tanaka, Hiromi Sunaga, Naoyuki Tamura, Toshio Murakami
  • Patent number: 4380368
    Abstract: A projection screen comprises a metal plate member having substantially independent short raised ridges uniformly over the surface. In a process for treating the surface of a metal plate member, a metal plate member and a rough surface contacting the surface of the metal plate member are moved along respective axes intersecting at a certain angle to form raised ridges of typically 100 microns or less in length.
    Type: Grant
    Filed: August 20, 1980
    Date of Patent: April 19, 1983
    Inventors: Ken Ohmata, Hideya Aoki, Naoyuki Tamura