Abstract: A wireless communication system comprising at least one base station in a communication cell, wherein the base station is equipped with at least one array antenna comprising at least two antenna ports which are connected to respective at least two corresponding antenna elements, wherein at least two of the at least two antenna elements have essentially the same polarization. The array antenna is arranged for communication via at least two antenna radiation lobes, each antenna radiation lobe communicating an information stream to at least one user equipment (UE) in the cell, wherein each antenna radiation lobe is individually controllable both in azimuth and elevation, whereby the communication of the information streams is optimized.

Abstract: A base station repeater station pair, comprising: a base station (1) having an input for a broadcast signal (s(t)) and being arranged to transmit, in use, a transfer signal over a link (3) using electromagnetic (EM) radiation; and a repeater station (2) arranged to receive, in use and through EM radiation, the transfer signal from the base station (1) and from the transfer signal broadcast the broadcast signal using EM radiation, in which the link (3) between the base station (1) and the repeater station (2) over which the transfer signal is passed in use comprises a dual polarised link, whereby the base station (1) is arranged to transmit the transfer signal over the link (3) with two different polarisations, and the repeater station (2) is arranged to receive the transfer signal from the link as two differently polarised versions. Also disclosed area base station and a method of using the above.

Abstract: The invention relates to a shell (1) intended for firing from a weapon (6), preferably a mortar weapon (6), the shell (1) being designed for securing the shell (1) in a mortar weapon (6) in order thereby to prevent movement of the shell (1) when adjusting the angle of elevation of the weapon (6). According to the invention this is achieved in that the shell (1) comprises a locking part (19, 28, 37), the locking part (19, 28, 37) forming an integral part of the shell (1) and being designed so that the shell (1) after ramming home is locked to a corresponding securing part (19) in the mortar (6). The invention also relates to a mortar (6) intended for firing said shell (1), the mortar (6) being characterized in that the mortar (6) comprises a corresponding securing part (19) for locking the shell (1).

Abstract: An apparatus for chemical mechanical polishing (CMP) of a wafer has a rotatable platen to hold a polishing pad, a polishing head for holding the wafer against the polishing pad, an optical monitoring system and a position sensor. The platen has a hole therein, the optical monitoring system includes a light source to direct a light beam through the aperture toward the wafer from a side of the wafer contacting the polishing pad and a detector to receive reflections of the light beam from the wafer, and the position sensor senses when the hole is adjacent the wafer such that the light beam generated by the light source can pass through the hole and impinge on the wafer.

Abstract: A movable part for an electronic device which comprises at least two parts that can be moved in relation to each other. The movable part comprises a display for the electronic device and a first conducting plane which is comprised in the display or located adjacent to the display. The first conducting plane comprises a waveguide. The waveguide may be a co-planar waveguide, i.e. a waveguide which comprises a central strip of conducting material surrounded by slots on both sides.

Abstract: The present invention relates to a method and a shell (1) for achieving variable firing range and effect when firing from a launcher, which shell (1) contains a firing charge (10), a rocket motor charge (6) with gas outlet (8), a rocket motor nozzle (9) and an active part (5). According to the invention, this is achieved by virtue of the fact that the shell (1) also contains a release mechanism (15) for releasing the rocket motor nozzle (9) from the rocket motor charge (6) after a time delay determined with regard to firing range and effect, and that the rocket motor charge (6) comprises a propellant which is detonable.

Abstract: An apparatus and method of chemical mechanical polishing (CMP) of a wafer employing a device for determining, in-situ, during the CMP process, an endpoint where the process is to be terminated. This device includes a laser interferometer capable of generating a laser beam directed towards the wafer and detecting light reflected from the wafer, and a window disposed adjacent to a hole formed through a platen. The window provides a pathway for the laser beam during at least part of the time the wafer overlies the window.

Abstract: A chemical mechanical polishing apparatus and method can use an eddy current monitoring system and an optical monitoring system. Signals from the monitoring systems can be combined on an output line and extracted by a computer. A thickness of a polishing pad can be calculated. The eddy current monitoring system and optical monitoring system can measure substantially the same location on the substrate.

Abstract: An antenna device for a telecommunications system, comprising a first antenna with a first radiation pattern and a second antenna with a second radiation pattern. The radiation patterns give the two antennas different coverage in the vertical plane of the antenna device, and the first and the second antennas are used for diversity purposes. The difference in vertical coverage between the first and the second antenna is such that at least the first null points in the vertical plane of the two radiation patterns do not coincide with each other.

Abstract: The present invention relates to an antenna arrangement (100) comprising an antenna section, said antenna section comprising a number of radiating elements which may be arranged in arrays or sub-arrays. It further comprises at least one further antenna section, said at least two antenna sections (101,102,103) being mounted substantially along a straight line, a non-straight line or irregularly at a mounting structure (40). It comprises a feeding network arrangement (20) for feeding said at least two antenna sections (101,102,103), with feeding network control means for controlling the feeding of the antenna sections (101r 102, 103) allowing for beam forming control.

Abstract: A system method and apparatus to monitor a frictional coefficient of a substrate undergoing polishing is described. A polishing pad assembly includes a polishing layer including a polishing surface, and a substrate contacting member flexibly coupled to the polishing layer having a top surface to contact an exposed surface of a substrate. At least a portion of the top surface is substantially coplanar with the polishing surface. A sensor is provided to measure a lateral displacement of the substrate contacting member. Some embodiments may provide accurate endpoint detection during chemical mechanical polishing to indicate the exposure of an underlying layer.

Abstract: The invention discloses a wireless telecommunications device intended to communicate with an access point, such as a base station, in a wireless telecommunications system. The device comprises at least a first radio chain and at least a first and a second antenna, which antennas each have a certain radiation pattern, and which are used for receiving and transmitting information to and from the base station. The device includes a motion sensor for giving information on the spatial orientation of the device, and the device additionally includes means for utilizing said orientation information in order to control the total radiation pattern in the device's communication with the base station by controlling the phase and/or amplitude of signals associated with said first and second antennas.

Abstract: A system, method and apparatus to monitor a frictional coefficient of a substrate undergoing polishing is described. A polishing pad assembly includes a polishing layer including a polishing surface, and a substrate contacting member flexibly coupled to the polishing layer having a top surface to contact an exposed surface of a substrate. At least a portion of the top surface is substantially coplanar with the polishing surface. A sensor is provided to measure a lateral displacement of the substrate contacting member. Some embodiments may provide accurate endpoint detection during chemical mechanical polishing to indicate the exposure of an underlying layer.

Abstract: Methods and apparatus to implement techniques for monitoring polishing a substrate. Two or more data points are acquired, where each data point has a value affected by features inside a sensing region of a sensor and corresponds to a relative position of the substrate and the sensor as the sensing region traverses through the substrate. A set of reference points is used to modify the acquired data points. The modification compensates for distortions in the acquired data points caused by the sensing region traversing through the substrate. Based on the modified data points, a local property of the substrate is evaluated to monitor polishing.

Abstract: The present invention relates to a wireless communication system, comprising at least one base station in a communication cell. The base station is equipped with at least one array antenna comprising at least two antenna ports which are coupled to respective at least two corresponding antenna Q elements, where at leas two of the at least two antenna elements have essentially the same polarization. The array antenna is arranged for communication via at least two antenna radiation lobes, each antenna radiation lobe communicating an information stream to at least one UE (user equipment) in the cell. According to a certain aspect of the present invention, in a first mode 0 operation, the array antenna is arranged for communication via one antenna radiation lobe. The present invention also relates to a method for performing said communication.

Abstract: The invention discloses a wireless telecommunications system for stationary or semi-stationary equipment, Q and comprises a main node (C) and a first plurality (SI-S3) of terminals belonging to the same access subset and arranged to receive Q from and transmit to the main node (C). The main node transmits in at least one beam and receives in at least two beams, and the system comprises means (C) for indicating to terminals that they mayor may not transmit to the central node (C). Based upon certain criteria, two or more terminals (Si-SN) located in different receive beams of the main node (C) may be given permission to transmit to the central node simultaneously. Suitably, two or more terminals which are given permission to transmit simultaneously do so using the same frequency, or the same code or the same time slot.

Abstract: An ammunition unit, for combating targets (10) with or without using shaped charge effect, that incorporates an openable or removable and replaceable hull or outer casing (2). The explosive charge in the ammunition unit comprises a charge section (3) with shaped charge function arranged to be able to assume either of two freely selectable positions in the ammunition unit, the first of which enables the charge to exert its shaped charge function and the second of which disables the shaped charge function and enables a different effect to be triggered.

Abstract: The invention discloses an antenna (100, 100?, 400, 500) comprising walls in a conducting material: first (110, 410, 510) and second (120, 420, 520) main walls, a first end wall (130, 530) and a first and a second side wall. The first (110, 510) and second (120, 520) main walls extend in parallel to each other, and are joined by the first end wall (130, 530). The side walls also join the first and second main walls, so that a cavity with only one opening (105, 205, 505) is formed, a rectangular aperture which can be brought to radiate by a feed connection (207). Suitably, the antenna can also comprise a second end wall (140, 540) which extends from the second main wall (120) towards the first main wall (110), with the length of extension of the first main wall being such that the second end wall and the first main wall do not meet.

Abstract: The present invention relates to cell plans and cell plan changes in point to multipoint systems (PMP). A cell plan arrangement is provided comprising cells having four 90° sectors to which individual sector at least one of four orthogonal channels, such as channels distinguished by two frequencies and two polarisations, are allocated. A method is furthermore provided allowing gradual sector-by-sector migration into a 45° sector cell plan. The cell plan offers advantageous carrier to interference ration (C/I) improvements.

Abstract: A sensor for monitoring a conductive film in a substrate during chemical mechanical polishing generates an alternating magnetic field that impinges a substrate and induces eddy currents. The sensor can have a core, a first coil wound around a first portion of the core and a second coil wound around a second portion of the core. The sensor can be positioned on a side of the polishing surface opposite the substrate. The sensor can detect a phase difference between a drive signal and a measured signal.