Patents by Inventor Nobuhiro Ito

Nobuhiro Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7495122
    Abstract: A novel compound represented by a formula [1] wherein R1 and R2 respectively represent a light or heavy hydrogen atom, R3 represents a light or heavy hydrogen atom or a methyl group in which tree hydrogen atoms are respectively light or heavy hydrogen atoms, and R4 is a norbornyl group provided that four or more hydrogen atoms in the norbornyl group are heavy hydrogen atoms; and a novel polymer produced by polymerization of a composition comprising the compound are disclosed.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: February 24, 2009
    Assignees: Wako Pure Chemical Industries, Fujifilm Corporation
    Inventors: Hiroki Sasaki, Tsuneaki Maesawa, Nobuhiro Ito, Kazushige Muto
  • Publication number: 20090029622
    Abstract: An airtight container manufacturing method, comprises: exhausting the inside of a container via a through-hole provided on the container; arranging a plate member on the outer surface of the container the inside of which was exhausted, so as to close up the through-hole; and sealing the container by arranging a cover member so as to cover the plate member and by bonding the arranged cover member and the outer surface of the container to each other via a sealant positioned between the cover member and the outer surface of the container, wherein the sealing includes hardening the sealant after deforming the sealant as pressing the plate member.
    Type: Application
    Filed: July 23, 2008
    Publication date: January 29, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuo Koyanagi, Mitsutoshi Hasegawa, Nobuhiro Ito, Akihiro Kimura, Masahiro Tagawa
  • Publication number: 20090000731
    Abstract: A manufacturing method of a hermetically sealed container, comprises steps of placing, on a first member, a first bonding material and a second bonding material having a larger compressibility in relation to a pressing force than a compressibility of the first bonding material, such that the first and second bonding materials are arranged side-to-side relationship, and the first bonding material has a height lower than a height of the second bonding material; pressing a second member to the second bonding material; heating and melting sequentially part by part the first bonding material; and cooling the first bonding material to bond together the first and second members.
    Type: Application
    Filed: June 10, 2008
    Publication date: January 1, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Mitsutoshi Hasegawa, Kazuo Koyanagi, Masahiro Tagawa, Nobuhiro Ito, Yasuo Ohashi, Shigeto Kamata
  • Publication number: 20080290780
    Abstract: A carbon film is coated over the surface of a spacer. The carbon film has the following three features when the binding state of carbon is analyzed by X-ray photoelectron spectroscopy: (a) an integral area of a region of 284.5 eV or below is 27% or less of an integral area attributed to carbon, (b) an integral area of a region of 286.0 eV-287.0 eV is 18% or less thereof, and (c) an integral area of a region of 287.0 eV or above is 9% or more thereof.
    Type: Application
    Filed: May 1, 2008
    Publication date: November 27, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuo Kuroda, Nobuhiro Ito
  • Patent number: 7449827
    Abstract: In a spacer having concave/convex portions to prevent short-time charging in a flat type image forming apparatus in which an electron source substrate and an anode substrate are arranged so as to face each other through the spacer, the charging upon long-time driving due to the concave/convex portions is suppressed. In the spacer in which the surface of an insulating substrate having a rough surface is coated with a high resistance film, the high resistance film has double layers of a low resistance region locating on the substrate side and a high resistance region locating on the front surface side, and a thickness (t) of high resistance film on the slant surface of each of the concave/convex portions and a thickness (s) of high resistance region are set to (t?dp+??s) for the primary electron penetration length (dp) and the ionization electron diffusion length (?).
    Type: Grant
    Filed: November 29, 2005
    Date of Patent: November 11, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventor: Nobuhiro Ito
  • Publication number: 20080234488
    Abstract: The subject of the present invention is to provide a method for deuteration, which can obtain a compound having an aromatic ring and/or a heterocyclic ring at an improved deuteration ratio. The present invention relates to a method for deuteration of a compound having an aromatic ring and/or a heterocyclic ring, comprising reacting the compound having an aromatic ring and/or a heterocyclic ring with a heavy hydrogen source in the presence of an activated mixed catalyst of not less than two kinds of catalysts selected from among a palladium catalyst, a platinum catalyst, a rhodium catalyst, an iridium catalyst, a ruthenium catalyst, a nickel catalyst and a cobalt catalyst.
    Type: Application
    Filed: December 21, 2004
    Publication date: September 25, 2008
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Nobuhiro Ito, Tsuneaki Maesawa, Kazushige Muto, Kosaku Hirota, Hironao Sajiki
  • Publication number: 20080145303
    Abstract: [PROBLEMS] To provide a method for producing heavy hydrogen gas, which enables heavy hydrogen gas to be efficiently produced from a deuterated solvent as a reaction substrate. [MEANS FOR SOLVING PROBLEMS] (1) A method for producing heavy hydrogen gas, comprising bringing a deuterated solvent into contact with hydrogen gas under pressure in the coexistence with a catalyst selected from a palladium catalyst, a platinum catalyst, a nickel catalyst, a cobalt catalyst, an iridium catalyst, and a rhodium catalyst and a ruthenium catalyst which are not coordinated with a ligand, and (2) a catalytic deuteration method of a compound having a reducible functional group, comprising bringing the heavy hydrogen gas obtained by the above (1) into contact with the compound having a reducible functional group in the coexistence with a catalytic reduction catalyst.
    Type: Application
    Filed: January 16, 2006
    Publication date: June 19, 2008
    Applicant: WAKO PURE CHEMICAL INDUSSRIES, LTD.
    Inventors: Kosaku Hirota, Hironao Sajiki, Nobuhiro Ito
  • Publication number: 20080071107
    Abstract: The object of the present invention is to provide a method for efficiently and industrially deuterating a haloacrylic acid or salt thereof.
    Type: Application
    Filed: June 20, 2005
    Publication date: March 20, 2008
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD
    Inventors: Tsuneaki Maesawa, Nobuhiro Ito, Kosaku Hirota, Hironao Sajiki
  • Publication number: 20080045724
    Abstract: The object of the present invention is to provide a polyimide compound useful as a raw material of a polymer for an optical waveguide that has excellent transparency and heat resistance, low moisture absorption, a small optical transmission loss, a high refractive index and good adhesion to a base material or a substrate.
    Type: Application
    Filed: May 17, 2005
    Publication date: February 21, 2008
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Kazushige Muto, Tsuneaki Maesawa, Nobuhiro Ito, Tsutomu Watahiki, Kosaku Hirota, Hironao Sajiki
  • Patent number: 7309270
    Abstract: A spacer on which static electricity is restricted and an electron beam apparatus in which the spacer is provided. In the electron beam apparatus comprising an electron source provided with electron emission devices, a face plate provided with anodes and spacers installed between the electron source and the face plate, unevenness is formed on the surface of the spacer substrate, and further a thin film which has a smaller thickness than a roughness. This makes possible the restriction of incident angle multiplication coefficient for the primary electrons whose energy is lower than the second cross-point energy of a resistive film. The electron beam apparatus provided with the above spacer is excellent in display definition and long-term reliability since the display of light emission points and the creeping discharge accompanying the static electricity can be restricted due to the spacer.
    Type: Grant
    Filed: October 18, 2005
    Date of Patent: December 18, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuhiro Ito, Hideaki Mitsutake
  • Publication number: 20070255076
    Abstract: The present invention relates to a method for deuteration of a compound having an aromatic ring, using an activated catalyst, and the method comprises reacting a compound having an aromatic ring with heavy hydrogen source in the presence of an activated catalyst selected from a platinum catalyst, a rhodium catalyst, a ruthenium catalyst, a nickel catalyst and a cobalt catalyst.
    Type: Application
    Filed: July 10, 2003
    Publication date: November 1, 2007
    Applicant: Wako Pure Chemical Industries, Ltd.
    Inventors: Nobuhiro Ito, Tsuneaki Maesawa, Kazushige Muto, Kosaku Hirota, Hironao Sajiki
  • Patent number: 7281964
    Abstract: An electron beam apparatus including a hermetic container provided with an electron source, in which, when a first member is arranged in the hermetic container, at least part of the first member is coated with a film, and the film is configured in such a manner that it includes two regions, a first region and a second region different in electron density from the first region and the second region forms a network in the first region. This three-dimensional network structure allows a member being charged to be preferably controlled. Thereby, it is possible to control the effects of a member being charged which is used in an electron beam apparatus.
    Type: Grant
    Filed: May 25, 2005
    Date of Patent: October 16, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuhiro Ito, Hideaki Mitsutake
  • Publication number: 20070236130
    Abstract: A spacer on which static electricity is restricted and an electron beam apparatus in which the spacer is provided. In the electron beam apparatus comprising an electron source provided with electron emission devices, a face plate provided with anodes and spacers installed between the electron source and the face plate, unevenness is formed on the surface of the spacer substrate, and further a thin film which has a smaller thickness than a roughness. This makes possible the restriction of incident angle multiplication coefficient for the primary electrons whose energy is lower than the second cross-point energy of a resistive film. The electron beam apparatus provided with the above spacer is excellent in display definition and long-term reliability since the display of light emission points and the creeping discharge accompanying the static electricity can be restricted due to the spacer.
    Type: Application
    Filed: October 18, 2005
    Publication date: October 11, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Nobuhiro Ito, Hideaki Mitsutake
  • Patent number: 7262548
    Abstract: The invention is to provide a flat panel image forming apparatus capable of suppressing a fluctuation in an incident position of an electron beam resulting from a front-rear temperature difference generated in a panel, thereby capable of high-quality display not affected by such temperature difference. An image forming apparatus comprises a face plate and a rear plate supported by a spacer, wherein a heat resistance division ratio in a heat conduction, path from the face plate to the rear plate is suppressed to 0.5 or less, to reduce an electrical resistance distribution on the spacer surface which results from a temperature distribution in a direction of height of the spacer thereby suppressing a fluctuation in the incident position of the electron beam from an electron emitting device to an anode.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: August 28, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Nobuhiro Ito
  • Patent number: 7186938
    Abstract: A pressure detection switch includes a membrane switch and a key pad arranged on the membrane switch. The membrane switch includes first and second insulation sheets arranged to face each other. An electric circuit, which includes a first electrode and a voltage-dividing resistor, and a resist film, which protects the electric circuit, are formed on the lower surface of the first insulation sheet and above the second insulation sheet. The resist film has an opening through which the voltage-dividing resistor is exposed from the lower surface of the first insulation sheet.
    Type: Grant
    Filed: August 18, 2005
    Date of Patent: March 6, 2007
    Assignee: Polymatech Co., Ltd.
    Inventor: Nobuhiro Ito
  • Patent number: 7180233
    Abstract: An electron beam emitting apparatus has a first plate with an electron-emitting device 15, and an electrode 8 opposed to the first plate, and the electrode 8 is applied a potential to accelerate electrons emitted from the electron-emitting device 15. In the electron beam emitting apparatus, a potential defining region 9 is provided a surface of the first plate on the electrode 8 side and a first potential defining region forming the potential defining region 9 is provided in a projective area of the electrode 8 onto the potential defining region 9; and, where d represents a distance between the electrode 8 and the potential defining region 9, an additional potential defining region is defined in the range of 0.83d in all directions parallel to the first plate from the edge of the projective area of the electrode 8 onto the potential defining region 9. This stabilizes trajectories of electrons and permits an excellent image to be formed without deviation of light emission positions.
    Type: Grant
    Filed: November 13, 2003
    Date of Patent: February 20, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuhiro Ito, Hideaki Mitsutake
  • Publication number: 20070027279
    Abstract: A novel compound represented by a formula [1] wherein R1 and R2 respectively represent a light or heavy hydrogen atom, R3 represents a light or heavy hydrogen atom or a methyl group in which tree hydrogen atoms are respectively light or heavy hydrogen atoms, and R4 is a norbornyl group provided that four or more hydrogen atoms in the norbornyl group are heavy hydrogen atoms; and a novel polymer produced by polymerization of a composition comprising the compound are disclosed.
    Type: Application
    Filed: July 23, 2004
    Publication date: February 1, 2007
    Applicants: FUJI PHOTO FILM CO., LTD., WAKO PURE CHEMICAL INDUSTRIES
    Inventors: Hiroki Sasaki, Tsuneaki Maesawa, Nobuhiro Ito, Kazushige Muto
  • Publication number: 20060281884
    Abstract: A novel compound represented by a formula [1] wherein R1 and R2 respectively represent a heavy or light hydrogen atom, R3 represents a heavy or light hydrogen atom or a methyl group in which three hydrogen atoms are respectively heavy or light hydrogen atoms, R4 represents a condensed ring group composed of a norbornane ring and a C5-7 hydrocarbon ring provided that at least one hydrogen atom contained in the condensed ring group is a heavy hydrogen atom; and a novel polymer produced by polymerization of a composition comprising the compound are disclosed.
    Type: Application
    Filed: July 23, 2004
    Publication date: December 14, 2006
    Inventors: Hiroki Sasaki, Kohzaburoh Yamada, Tsuneaki Maesawa, Nobuhiro Ito, Kazuhige Muto
  • Publication number: 20060145581
    Abstract: The invention is to provide a flat panel image forming apparatus capable of suppressing a fluctuation in an incident position of an electron beam resulting from a front-rear temperature difference generated in a panel, thereby capable of high-quality display not affected by such temperature difference. In an image forming apparatus in which a face plate and a rear plate are supported by a spacer, a heat resistance division ratio in a heat conduction, path from the face plate to the rear plate is suppressed to 0.5 or less, to reduce an electrical resistance distribution on the spacer surface, resulting from a temperature distribution in a direction of height of the spacer thereby suppressing a fluctuation in the incident position of the electron beam from an electron emitting device to an anode.
    Type: Application
    Filed: November 30, 2005
    Publication date: July 6, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Nobuhiro Ito
  • Patent number: 7067171
    Abstract: A method of manufacturing an electron beam apparatus having an airtight container with electron-emitting devices contained therein and spacers provided in the airtight container comprising the coating step of providing a film on a spacer substrate to be the spacers, and characterized in that the coating step includes the applying step of applying liquid film material by emitting from an emitting portion in a predetermined direction to a part of a surface of the spacer substrate facing the emitting portion.
    Type: Grant
    Filed: February 16, 2000
    Date of Patent: June 27, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventor: Nobuhiro Ito