Patents by Inventor Paul D. Hurwitz
Paul D. Hurwitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160343813Abstract: A semiconductor device includes a source finger electrode coupled to a source region in a semiconductor die, a drain finger electrode coupled to a drain region in the semiconductor die, where the source finger electrode includes at least one isolated segment and a main segment having a first portion and a second portion narrower than the first portion, whereby the source finger electrode reduces a drain-to-source capacitance of the semiconductor device. A common source rail is electrically coupled to the at least one isolated segment and the main segment of the source finger electrode. The drain fmger electrode includes at least one isolated segment and a main segment having a first portion and a second portion narrower than the first portion. A common drain rail is electrically coupled to the at least one isolated segment and the main segment of the drain finger electrode.Type: ApplicationFiled: January 7, 2016Publication date: November 24, 2016Inventors: Paul D. Hurwitz, Roda Kanawati
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Patent number: 9362160Abstract: Disclosed is a structure for improved electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure comprises a first portion of a trench extending through the top semiconductor layer and through a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a second portion of the trench, having sloped sidewalls, extends into the handle wafer. The sloped sidewalls are amorphized by an implant, for example, Xenon or Argon, to reduce carrier mobility in the handle wafer and improve electrical signal isolation between the adjacent devices situated in the top semiconductor layer.Type: GrantFiled: October 8, 2012Date of Patent: June 7, 2016Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Robert L. Zwingman
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Patent number: 9343353Abstract: Disclosed is a structure for improved electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure comprises a first portion of a trench extending through the top semiconductor layer and through a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a second portion of the trench, having sloped sidewalls, extends into the handle wafer. The sloped sidewalls are amorphized by an implant, for example, Xenon or Argon, to reduce carrier mobility in the handle wafer and improve electrical signal isolation between the adjacent devices situated in the top semiconductor layer.Type: GrantFiled: September 2, 2014Date of Patent: May 17, 2016Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Robert L. Zwingman
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Publication number: 20160071927Abstract: A structure having improved electrical signal isolation and linearity is disclosed. The structure includes a buried oxide (“BOX”) layer over a bulk semiconductor layer, a device layer over the buried oxide layer, a compensation implant region near an interface of the buried oxide layer and the bulk semiconductor layer, wherein the compensation implant region is configured to substantially eliminate a parasitic conduction layer near the buried oxide layer. The compensation implant region has a doping concentration of at least one order of magnitude higher than a doping concentration of the bulk semiconductor layer. The structure includes a deep trench extending through the device layer and the buried oxide layer, and a damaged implant region in the bulk semiconductor layer near the deep trench. The structure also includes at least one transistor in the device layer.Type: ApplicationFiled: August 14, 2015Publication date: March 10, 2016Inventor: Paul D. Hurwitz
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Patent number: 9190994Abstract: Disclosed is a radio frequency (RF) switch branch having a reduced nonlinearity and an associated method for reducing nonlinearity in a RF switch branch. The RF switch branch includes a primary transistor, a first transistor having power terminals electrically connected between a drain node and a body node of the primary transistor, and a second transistor having power terminals electrically connected between the body node and a source node of the primary transistor. The RF switch may further include a body resistor electrically connected between the body node of the primary transistor and ground, and a gate resistor electrically connected between a gate of the primary transistor and a gate voltage source. A gate of each of the first transistor and the second transistor is electrically connected to the gate voltage source such that the first transistor and the second transistor are ON only when the primary transistor is ON.Type: GrantFiled: July 26, 2013Date of Patent: November 17, 2015Assignee: Newport Fab, LLCInventor: Paul D. Hurwitz
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Patent number: 8963247Abstract: Provided is a structure for improved electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and a method for the structure's fabrication. The structure comprises a gate situated on the top semiconductor layer, the top semiconductor layer situated over a base oxide layer, and the base oxide layer situated over a handle wafer. The top surface of the handle wafer is amorphized by an inert implant of Xenon or Argon to reduce carrier mobility in the handle wafer and improve electrical signal isolation between the adjacent devices situated in the top semiconductor layer.Type: GrantFiled: November 7, 2012Date of Patent: February 24, 2015Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Robert L. Zwingman
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Patent number: 8956949Abstract: Disclosed are a structure for electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure includes a trench extending through the top semiconductor layer and into a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a void is disposed in the handle wafer below the trench. A bottom opening of the trench connects the main body of the trench with the void forming a continuous cavity including the main body, the bottom opening of the trench, and the void such that the void improves electrical signal isolation between the adjacent devices situated in the top semiconductor layer. Unetched portions of the handle wafer are then available to provide mechanical support to the top semiconductor layer.Type: GrantFiled: August 21, 2014Date of Patent: February 17, 2015Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Robert L. Zwingman
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Publication number: 20140377935Abstract: Provided is a structure for improved electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and a method for the structure's fabrication. The structure comprises a gate situated on the top semiconductor layer, the top semiconductor layer situated over a base oxide layer, and the base oxide layer situated over a handle wafer. The top surface of the handle wafer is amorphized by an inert implant of Xenon or Argon to reduce carrier mobility in the handle wafer and improve electrical signal isolation between the adjacent devices situated in the top semiconductor layer.Type: ApplicationFiled: September 5, 2014Publication date: December 25, 2014Inventors: Paul D. Hurwitz, Robert L. Zwingman
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Publication number: 20140370686Abstract: Disclosed is a structure for improved electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure comprises a first portion of a trench extending through the top semiconductor layer and through a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a second portion of the trench, having sloped sidewalls, extends into the handle wafer. The sloped sidewalls are amorphized by an implant, for example, Xenon or Argon, to reduce carrier mobility in the handle wafer and improve electrical signal isolation between the adjacent devices situated in the top semiconductor layer.Type: ApplicationFiled: September 2, 2014Publication date: December 18, 2014Inventors: Paul D. Hurwitz, Robert L. Zwingman
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Publication number: 20140363949Abstract: Disclosed are a structure for electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure includes a trench extending through the top semiconductor layer and into a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a void is disposed in the handle wafer below the trench. A bottom opening of the trench connects the main body of the trench with the void forming a continuous cavity including the main body, the bottom opening of the trench, and the void such that the void improves electrical signal isolation between the adjacent devices situated in the top semiconductor layer. Unetched portions of the handle wafer are then available to provide mechanical support to the top semiconductor layer.Type: ApplicationFiled: August 21, 2014Publication date: December 11, 2014Inventors: Paul D. Hurwitz, Robert L. Zwingman
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Publication number: 20140252535Abstract: Disclosed is a structure for improved electrical signal isolation in a semiconductor substrate between integrated passive devices (IPDs) and an associated method for the structure's fabrication. The structure includes an amorphized region in the semiconductor substrate, a dielectric layer formed over the amorphized region, and IPDs formed over the dielectric layer. The amorphized region is not recrystallized and may be formed by utilizing an inert implant that does not charge-dope the amorphized region, while forming a plurality of charge carrier traps at an interface between the amorphized region and the dielectric layer to prevent a parasitic conduction layer from forming at the interface. The inert implant may include one of Argon, Xenon and Germanium. In many implementations, the structure does not include an active device.Type: ApplicationFiled: January 28, 2014Publication date: September 11, 2014Applicant: Newport Fab, LLC dba Jazz SemiconductorInventor: Paul D. Hurwitz
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Patent number: 8816471Abstract: Disclosed are a structure for electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure includes a trench extending through the top semiconductor layer and into a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a void is disposed in the handle wafer below the trench. A bottom opening of the trench connects the main body of the trench with the void forming a continuous cavity including the main body, the bottom opening of the trench, and the void such that the void improves electrical signal isolation between the adjacent devices situated in the top semiconductor layer. Unetched portions of the handle wafer are then available to provide mechanical support to the top semiconductor layer.Type: GrantFiled: August 8, 2012Date of Patent: August 26, 2014Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Robert L. Zwingman
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Publication number: 20140062575Abstract: Disclosed is a radio frequency (RF) switch branch having a reduced nonlinearity and an associated method for reducing nonlinearity in a RF switch branch. The RF switch branch includes a primary transistor, a first transistor having power terminals electrically connected between a drain node and a body node of the primary transistor, and a second transistor having power terminals electrically connected between the body node and a source node of the primary transistor. The RF switch may further include a body resistor electrically connected between the body node of the primary transistor and ground, and a gate resistor electrically connected between a gate of the primary transistor and a gate voltage source. A gate of each of the first transistor and the second transistor is electrically connected to the gate voltage source such that the first transistor and the second transistor are ON only when the primary transistor is ON.Type: ApplicationFiled: July 26, 2013Publication date: March 6, 2014Applicant: Newport Fab, LLC dba Jazz SemiconductorInventor: Paul D. Hurwitz
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Publication number: 20140054743Abstract: Disclosed are a structure for providing electrical isolation in a semiconductor substrate and an associated method for the structure's fabrication. The structure includes a deep trench isolation loop having a first depth disposed in the semiconductor substrate. A dielectric material is disposed in the deep trench isolation loop and one or more through silicon vias (TSVs), having a second depth, are disposed in the semiconductor substrate and within a perimeter of the deep trench isolation loop. A portion of the semiconductor substrate surrounding the deep trench isolation loop may be doped. A metallic filler may be disposed within the one or more TSVs and the metallic filler may be in direct electrical contact with the semiconductor substrate.Type: ApplicationFiled: July 24, 2013Publication date: February 27, 2014Applicant: Newport Fab, LLC dba Jazz SemiconductorInventors: Paul D. Hurwitz, Edward Preisler, Hadi Jebory
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Publication number: 20130181321Abstract: Disclosed is a structure for improved electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure comprises a first portion of a trench extending through the top semiconductor layer and through a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a second portion of the trench, having sloped sidewalls, extends into the handle wafer. The sloped sidewalls are amorphized by an implant, for example, Xenon or Argon, to reduce carrier mobility in the handle wafer and improve electrical signal isolation between the adjacent devices situated in the top semiconductor layer.Type: ApplicationFiled: October 8, 2012Publication date: July 18, 2013Applicant: NEWPORT FAB, LLC DBA JAZZ SEMICONDUCTORInventors: Paul D. Hurwitz, Robert L. Zwingman
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Publication number: 20130181322Abstract: Disclosed are a structure for electrical signal isolation between adjacent devices situated in a top semiconductor layer of the structure and an associated method for the structure's fabrication. The structure includes a trench extending through the top semiconductor layer and into a base oxide layer below the top semiconductor layer. A handle wafer is situated below the base oxide layer and a void is disposed in the handle wafer below the trench. A bottom opening of the trench connects the main body of the trench with the void forming a continuous cavity including the main body, the bottom opening of the trench, and the void such that the void improves electrical signal isolation between the adjacent devices situated in the top semiconductor layer. Unetched portions of the handle wafer are then available to provide mechanical support to the top semiconductor layer.Type: ApplicationFiled: August 8, 2012Publication date: July 18, 2013Applicant: NEWPORT FAB, LLC DBA JAZZ SEMICONDUCTORInventors: Paul D. Hurwitz, Robert L. Zwingman
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Patent number: 7863148Abstract: According to one exemplary embodiment, a method for forming an NPN and a vertical PNP device on a substrate comprises forming an insulating layer over an NPN region and a PNP region of the substrate. The method further comprises forming a buffer layer on the insulating layer and forming an opening in the buffer layer and the insulating layer in the NPN region, where the opening exposes the substrate. The method further comprises forming a semiconductor layer on the buffer layer and in the opening in the NPN region, where the semiconductor layer has a first portion situated in the opening and a second portion situated on the buffer layer in the PNP region. The first portion of the semiconductor layer forms a single crystal base of the NPN device and the second portion of the semiconductor layer forms a polycrystalline emitter of the vertical PNP device.Type: GrantFiled: April 10, 2009Date of Patent: January 4, 2011Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Kenneth M. Ring, Chun Hu, Amol M Kalburge
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Publication number: 20090203183Abstract: According to one exemplary embodiment, a method for forming an NPN and a vertical PNP device on a substrate comprises forming an insulating layer over an NPN region and a PNP region of the substrate. The method further comprises forming a buffer layer on the insulating layer and forming an opening in the buffer layer and the insulating layer in the NPN region, where the opening exposes the substrate. The method further comprises forming a semiconductor layer on the buffer layer and in the opening in the NPN region, where the semiconductor layer has a first portion situated in the opening and a second portion situated on the buffer layer in the PNP region. The first portion of the semiconductor layer forms a single crystal base of the NPN device and the second portion of the semiconductor layer forms a polycrystalline emitter of the vertical PNP device.Type: ApplicationFiled: April 10, 2009Publication date: August 13, 2009Inventors: Paul D. Hurwitz, Kenneth M. Ring, Chun Hu, Amol M. Kalburge
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Patent number: 7541231Abstract: According to one exemplary embodiment, a method for forming an NPN and a vertical PNP device on a substrate comprises forming an insulating layer over an NPN region and a PNP region of the substrate. The method further comprises forming a buffer layer on the insulating layer and forming an opening in the buffer layer and the insulating layer in the NPN region, where the opening exposes the substrate. The method further comprises forming a semiconductor layer on the buffer layer and in the opening in the NPN region, where the semiconductor layer has a first portion situated in the opening and a second portion situated on the buffer layer in the PNP region. The first portion of the semiconductor layer forms a single crystal base of the NPN device and the second portion of the semiconductor layer forms a polycrystalline emitter of the vertical PNP device.Type: GrantFiled: March 17, 2005Date of Patent: June 2, 2009Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Kenneth M. Ring, Chun Hu, Amol Kalburge
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Patent number: 6933202Abstract: According to one exemplary embodiment, a method for forming an NPN and a vertical PNP device on a substrate comprises forming an insulating layer over an NPN region and a PNP region of the substrate. The method further comprises forming a buffer layer on the insulating layer and forming an opening in the buffer layer and the insulating layer in the NPN region, where the opening exposes the substrate. The method further comprises forming a semiconductor layer on the buffer layer and in the opening in the NPN region, where the semiconductor layer has a first portion situated in the opening and a second portion situated on the buffer layer in the PNP region. The first portion of the semiconductor layer forms a single crystal base of the NPN device and the second portion of the semiconductor layer forms a polycrystalline emitter of the vertical PNP device.Type: GrantFiled: April 9, 2004Date of Patent: August 23, 2005Assignee: Newport Fab, LLCInventors: Paul D. Hurwitz, Kenneth M. Ring, Chun Hu, Amol Kalburge