Abstract: A method of forming a pattern in at least one device layer in or on a substrate comprises: coating the device layer with a first photoresist layer; exposing the first photoresist using a first mask; developing the first photoresist layer to form a first pattern on the substrate; coating the substrate with a protection layer; treating the protection layer to cause a change therein where it is in contact with the first photoresist, to render the changed protection layer substantially immune to a subsequent exposure and/or developing step; coating the substrate with a second photoresist layer; exposing the second photoresist layer using a second mask; and developing the second photoresist layer to form a second pattern on the substrate without significantly affecting the first pattern in the first photoresist layer, wherein the first and second patterns together define interspersed features having a spatial frequency greater than that of the features defined in each of the first and second patterns separately.

Abstract: Apparatus for optical inspection of an object, comprising: an optical imaging system (5) for generating an actual image of the real object, a calculation unit (12) for calculating an estimated image of an object of desired shape in respect of a known aberration coefficient of the optical imaging system, an image analysis unit (13) for detecting differences between the actual image and the image calculated by the calculation unit (12).

Abstract: A CMUT transducer cell suitable for use in an ultrasonic CMUT transducer array has a membrane with a first electrode, a substrate with a second electrode, and a cavity between the membrane and the substrate. The CMUT is operated in a precollapsed state by biasing the membrane to a collapsed condition with the floor of the cavity, and a lens is cast over the collapsed membrane. When the lens material has polymerized or is of a sufficient stiffness, the bias voltage is removed and the lens material retains the membrane in the collapsed state.

Abstract: A sensor chip (1030) for gas has cells (200) for emitting and receiving ultrasound and is configured for a sufficiently large frequency range and for measuring concentration of at least one of the gas components based on at least two responses within the range. The frequency range can be achieved by varying the size of cell membranes (230), varying bias voltages, and/or varying air pressure for an array (205) of cMUTs or MEMS microphones. The sensor chip can be applied in, for example, capnography. A measurement air chamber (515) is implemented in the respiratory pathway (400), and it and/or the pathway may be designed to reduce turbulence in the exhaled breath (120) subject to ultrasound interrogation. The chip (1030) can be implemented as self-contained in the monitoring of parameters, obviating the need for off-chip sensors.

Abstract: A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.

Abstract: The patent application discloses a capacitive micromachined ultrasound transducer, comprising a silicon substrate; a cavity; a first electrode, which is arranged between the silicon substrate and the cavity; wherein the first electrode is arranged under the cavity; a membrane, wherein the membrane is arranged above the cavity and opposite to the first electrode; a second electrode, wherein the second electrode is arranged above the cavity and opposite to the first electrode; wherein the second electrode is arranged in or close to the membrane, wherein the first electrode and the second electrode are adapted to be supplied by a voltage; and a first isolation layer, which is arranged between the first electrode and the second electrode, wherein the first isolation layer comprises a dielectric. It is also described a system for generating or detecting ultrasound waves, wherein the system comprises a transducer according to the patent application.

Abstract: First apparatuses (10) such as tags and batches comprise receivers (11) for receiving ultrasonic signals (1) comprising first codes from sources (27, 30), analyzers (12) for analyzing first codes, transmitters (13) for transmitting electromagnetic signals (2) comprising second codes to second apparatuses (20), and controllers (14) for, in response to analyses of first codes, controlling at least parts of the first apparatuses (10), such as modes, transmissions, and supplies of second codes. Second apparatuses (20) such as parts of interfaces and parts of stations comprise receivers (21) for receiving the electromagnetic signals (2) comprising second codes from the first apparatuses (10), analyzers (22) for analyzing second codes, and generators (23) for, in response to analyses of second codes, generating parameter signals (5) defining issues like registration issues and authorization issues and environmental issues, and analysis results.

Abstract: A system and method is described for detecting a plurality of analytes in a sample. The characterization system (100) comprises an aperture array (108) and a lens array (110) for generating and focusing a plurality of excitation sub-beams on different sub-regions of a substrate. These sub-regions can be provided with different binding sites for binding different analytes in the sample. By detecting the different luminescent responses in a detector, the presence or amount of different analytes can be determined simultaneously. Alternatively or in addition thereto collection of the luminescence radiation can be performed using the lens array for directly collecting the luminescence response and for guiding the collected luminescence response to corresponding apertures.

Abstract: Proximity sensor, particularly for usage in an electronic mobile device, comprising at least one acoustic transducer adapted for receiving acoustic signals at least in parts of the frequency range of human audible sound and emitting and/or receiving ultrasonic signals for proximity estimation. The acoustic transducer preferably is a Micro-Electro-Mechanical-Systems (MEMS) microphone. Further, a method in an electronic device comprising an acoustic transducer is provided comprising the steps of generating at least one electric signal in the frequency range of ultrasonic sound, emitting at least one ultrasonic signal by means of the acoustic transducer; receiving at least one ultrasonic signal by means of the acoustic transducer; deducing from the at least one emitted ultrasonic signal and the at least one received ultrasonic signal at least the delay between emission of the emitted ultrasonic signal and reception of the corresponding ultrasonic signal.

Abstract: A transducer (800) is provided where a membrane (830) is formed over a front substrate (615); and a piezoelectric layer (820) is formed over the membrane (830) at an active portion (821) and peripheral portions located adjacent the active portion (821). A patterned conductive layer including first and second electrodes (840, 845) is formed over the piezoelectric layer (820). Further, a back substrate structure is provided having supports (822, 824) located at the peripheral portions adjacent the active portion (821). The height (826) of the supports (822, 824) is greater than a combined height (828) of the patterned piezoelectric layer and the patterned conductive layer. Many transducers may be connected to form an array, where a controller may be provided for controlling the array, such as steering a beam of the array, and processing signals received by the array, for presence or motion detection and/or imaging, for example.

Abstract: In a method for evaluating the polarization state of an illumination system (52) in an optical system (50), a mask (56) is provided in the optical system (50) such that an illumination beam incident on the mask (56) is adapted such as to substantially differently diffract incident components of a light beam having different polarization states. An image of the mask (56) is then obtained, using an illumination beam of the illumination system (52) of the optical system (50). The obtained image, being either an intensity plot or a structure created in a resist layer by exposing the resist layer with the image of the mask (56), is then used to extract polarization related information about the illumination system (52). The image used for evaluating may be a diffraction image of the mask.

Abstract: Methods are provided for production of pre-collapsed capacitive micro-machined ultrasonic transducers (cMUTs). Methods disclosed generally include the steps of obtaining a nearly completed traditional cMUT structure prior to etching and sealing the membrane, defining holes through the membrane of the cMUT structure for each electrode ring fixed relative to the top face of the membrane, applying a bias voltage across the membrane and substrate of the cMUT structure so as to collapse the areas of the membrane proximate to the holes to or toward the substrate, fixing and sealing the collapsed areas of the membrane to the substrate by applying an encasing layer, and discontinuing or reducing the bias voltage. CMUT assemblies are provided, including packaged assemblies, integrated assemblies with an integrated circuit/chip (e.g., a beam-steering chip) and a cMUT/lens assembly. Advantageous cMUT-based applications utilizing the disclosed pre-collapsed cMUTs are also provided, e.g.

Abstract: For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.

Abstract: A method of forming a pattern in at least one device layer in or on a substrate comprises: coating the device layer with a first photoresist layer; exposing the first photoresist using a first mask; developing the first photoresist layer to form a first pattern on the substrate; coating the substrate with a protection layer; treating the protection layer to cause a change therein where it is in contact with the first photoresist, to render the changed protection layer substantially immune to a subsequent exposure and/or developing step; coating the substrate with a second photoresist layer; exposing the second photoresist layer using a second mask; and developing the second photoresist layer to form a second pattern on the substrate without significantly affecting the first pattern in the first photoresist layer, wherein the first and second patterns together define interspersed features having a spartial frequency greater than that of the features defined in each of the first and second patterns separately.

Abstract: A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.

Abstract: The invention relates to a device comprising a first material (10) and a second material. (20) whereby the first and the second material are so provided towards each other as to form at least one focusing microstructure with a focal point (30) located outside of the first material.

Abstract: The invention relates to a device for analyzing one or more samples for the presence, amount or identity of one or more analytes in the samples, whereby the device comprises a focal microstructure for improving the signal/background ratio of an optical detection of the analytes.

Abstract: The invention relates to a method of determining a parameter relating to image blur in an imaging system (IS) comprising the step of illuminating an object having a test pattern (MTP) by means of the imaging system (IS), thereby forming an image of the test pattern. The test pattern (MTP) has a size smaller than the resolution of the imaging system (IS), which makes the image of the test pattern independent of illuminator aberrations. The test pattern (MTP) is an isolated pattern, which causes the image to be free of optical proximity effects. The image is blurred due to stochastic fluctuations in the imaging system and/or in the detector detecting the blurred image. The parameter relating to the image blur is determined from a parameter relating to the shape of the blurred image. According to the invention, resist diffusion and/or focus noise may be characterized. In the method of designing a mask, the parameter relating to the image blur due to diffusion in the resist is taken into account.

Abstract: For determining aberrations of an optical imaging system (PL), a test object (12,14) comprising at least one delta test feature (10) is imaged either on an aerial scanning detector (110) or in a resist layer (71), which layer is scanned by a scanning device, for example a SEM. A new analytical method is used to retrieve from the data stream generated by the aerial detector or the scanning device different Zernike coefficients (Zn).

Abstract: An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.