Abstract: An apparatus having a first portion including a first front wall, a first rear wall, and a bottom wall integrally coupled to the first front wall and the first rear wall, and pivotal pin structures integrally coupled to and extending from the first rear wall. The apparatus includes a second portion having a second front wall, a second rear wall, and a top wall integrally coupled to the second front wall and the second rear wall, and pin holders integrally coupled to and extending from the second rear wall and at an offset angle with reference to the top wall. The pivotal pin structure includes a base support connected to the first rear wall and a shaft connected to the base support, and the pin holder defines an opening sized and shaped to accept the shaft. The first and second portions are sized and shaped to be pivotally movable between open and closed configurations.

Abstract: Methods and systems for budgeted and simplified training of deep neural networks (DNNs) are disclosed. In one example, a trainer is to train a DNN using a plurality of training sub-images derived from a down-sampled training image. A tester is to test the trained DNN using a plurality of testing sub-images derived from a down-sampled testing image. In another example, in a recurrent deep Q-network (RDQN) having a local attention mechanism located between a convolutional neural network (CNN) and a long-short time memory (LSTM), a plurality of feature maps are generated by the CNN from an input image. Hard-attention is applied by the local attention mechanism to the generated plurality of feature maps by selecting a subset of the generated feature maps. Soft attention is applied by the local attention mechanism to the selected subset of generated feature maps by providing weights to the selected subset of generated feature maps in obtaining weighted feature maps.

Abstract: The present disclosure provides a semiconductor wafer. The semiconductor wafer includes: a scribe line between a first row of dies and a second row of dies; and a benchmark circuit disposed adjacent to the scribe line and electrically coupled to a first conductive contact and a second conductive contact. The benchmark circuit includes a first device-under-test (DUT); a second DUT; a first switching circuit configured to selectively couple the first DUT and the second DUT to the first conductive contact; and a second switching circuit configured to selectively couple the first DUT and the second DUT to the second conductive contact.

Abstract: A method includes forming a test pattern and a reference pattern in an absorption layer of a photomask structure. The test pattern has a first trench and a second trench, the reference pattern has a third trench and a fourth trench, the test pattern and the reference pattern have substantially the same dimension in a top view, and the second trench is deeper than the first trench, the third trench, and the fourth trench. The method further includes emitting a light beam to the test pattern to obtain a first interference pattern reflected from the test pattern, emitting the light beam to the reference pattern to obtain a second interference pattern reflected from the reference pattern; and comparing the first interference pattern with the second interference pattern to obtain a measured complex refractive index of the absorption layer.

Abstract: A single-barometer device, a method for fall detection and a system are provided. The single-barometer device worn on a user is used to measure multiple barometric values continuously by a barometer inside the device. The barometric values are stored in a memory of the single-barometer device. When a current barometric value is produced, the current barometric value is compared with a previous barometric value retrieved from the memory. A barometric difference can be obtained. The barometric difference is then compared with a threshold, and a comparison result is used to determine whether or not a fall event is present. The fall event is confirmed if the barometric difference is larger than the threshold. Further, an acceleration change obtained by an accelerometer inside the single-barometer device can be used to reconfirm the fall event.

Abstract: In a method of manufacturing an attenuated phase shift mask, a photo resist pattern is formed over a mask blank. The mask blank includes a transparent substrate, an etch stop layer on the transparent substrate, a phase shift material layer on the etch stop layer, a hard mask layer on the phase shift material layer and an intermediate layer on the hard mask layer. The intermediate layer is patterned by using the photo resist pattern as an etching mask, the hard mask layer is patterned by using the patterned intermediate layer as an etching mask, and the phase shift material layer is patterned by using the patterned hard mask layer as an etching mask. The intermediate layer includes at least one of a transition metal, a transition metal alloy, or a silicon containing material, and the hard mask layer is made of a different material than the intermediate layer.

Abstract: A seal monitoring system includes at least one sensor configured to couple to an outer surface of a housing and to output a sensor signal indicative of deformation of the housing. The housing is configured to receive an insert within an internal cavity of the housing, and an engageable seal is configured to selectively establish a seal between the insert and the housing. The seal monitoring system also includes a controller communicatively coupled to the at least one sensor. The controller includes a memory and a processor, the controller is configured to determine a degree of engagement of the engageable seal based on the deformation of the housing. Additionally or alternatively, the controller is configured to determine a fluid pressure within the housing based on the deformation of the housing.

Abstract: An apparatus having a first portion including a first front wall, a first rear wall, and a bottom wall integrally coupled to the first front wall and the first rear wall, and pivotal pin structures integrally coupled to and extending from the first rear wall. The apparatus includes a second portion having a second front wall, a second rear wall, and a top wall integrally coupled to the second front wall and the second rear wall, and pin holders integrally coupled to and extending from the second rear wall and at an offset angle with reference to the top wall. The pivotal pin structure includes a base support connected to the first rear wall and a shaft connected to the base support, and the pin holder defines an opening sized and shaped to accept the shaft. The first and second portions are sized and shaped to be pivotally movable between open and closed configurations.

Abstract: A silica aerogel-containing polyester masterbatch includes a polyethylene terephthalate resin, a silica aerogel powder, and a dispersing agent. The silica aerogel powder is dispersed in the polyethylene terephthalate resin, and is present in an amount ranging from 5 wt % to 30 wt % based on 100 wt % of the silica aerogel-containing polyester masterbatch. The dispersing agent is dispersed in the polyethylene terephthalate resin, is selected from the group consisting of a paraffin oil, a silane compound, a wax including C28-C32 straight chain monoacids, and combinations thereof, and is present in an amount ranging from 0.1 wt % to 4.0 wt % based on 100 wt % of the silica aerogel-containing polyester masterbatch. A method for preparing the silica aerogel-containing polyester masterbatch, and a silica aerogel-containing polyester fiber made from the same are also disclosed.

Abstract: Various embodiments of the present application are directed towards a control gate layout to improve an etch process window for word lines. In some embodiments, an integrated chip comprises a memory array, an erase gate, a word line, and a control gate. The memory array comprises a plurality of cells in a plurality of rows and a plurality of columns. The erase gate and the word line are elongated in parallel along a row of the memory array. The control gate is elongated along the row and is between and borders the erase gate and the word line. Further, the control gate has a pad region protruding towards the erase gate and the word line. Because the pad region protrudes towards the erase gate and the word line, a width of the pad region is spread between word-line and erase-gate sides of the control gate.

Abstract: In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.

Abstract: Semiconductor processing apparatuses and methods are provided in which an electrostatic discharge (ESD) prevention layer is utilized to prevent or reduce ESD events from occurring between a semiconductor wafer and one or more components of the apparatuses. In some embodiments, a semiconductor processing apparatus includes a wafer handling structure that is configured to support a semiconductor wafer during processing of the semiconductor wafer. The apparatus further includes an ESD prevention layer on the wafer handling structure. The ESD prevention layer includes a first material and a second material, and the second material has an electrical conductivity that is greater than an electrical conductivity of the first material.

Abstract: A technique facilitates utilization of a running tool system for use with a tubing hanger deployed at a wellhead. The running tool system may comprise a running tool which may be coupled to a hanger. The running tool may include a first sleeve which may be coupled to the hanger for moving the hanger in an axial direction. According to an embodiment, the running tool also may include a second sleeve which may be coupled to an adjustable landing ring disposed about the hanger. The second sleeve may be used to rotate the adjustable landing ring so as to lock the hanger in position.

Abstract: A virtual reality network performer system includes a scene setup module, a recording module and a processing module. The scene setup module receives a scene setup instruction inputted by a performer in order to set a plurality of environmental parameters. The recording module receives a voice data, a body motion data and a face data of the performer. The processing module performs a voice changing for the voice data to generate a voice changing result, and analyzes the body motion data and the face data to generate a body motion and a face expression. Then, the processing module saves the environmental parameters, the voice changing result, the body motion and the face expression in a cloud storage module in order to form a cloud data.

Abstract: A method for fabricating a mask is provided. The method includes depositing a target layer over a dielectric substrate; forming a patterned photoresist layer over the target layer according to an integrated circuit (IC) layout; determining a plurality of dry etch control parameters according a material of the target layer and an information of the IC layout; and using a dry etcher set up with the dry etch control parameters, etching the target layer through the patterned photoresist layer.

Abstract: A display assembly including a stand, a mounting assembly and a display. The mounting assembly includes a fixed base, a first pivot, a pivotable base, a second pivot, a handle, a plurality of first engagement structures and a second engagement structure. The handle includes a handheld part and a mounting part. The mounting part is connected to the handheld part and pivotally connected to the pivotable base via the second pivot. The first engagement structures are disposed at one of the fixed base and the mounting part of the handle. The second engagement structure is disposed at another one of the fixed base and the mounting part of the handle. The display is fixed on the pivotable base. The first pivot is not coaxial with the second pivot so that the second engagement structure is configured to be engaged with any one of the first engagement structures.

Abstract: Various embodiments of the present application are directed towards an integrated memory chip comprising a memory array with a strap-cell architecture that reduces the number of distinct strap-cell types and that reduces strap-line density. In some embodiments, the memory array is limited to three distinct types of strap cells: a source line/erase gate (SLEG) strap cell; a control gate/word line (CGWL) strap cell; and a word-line strap cell. The small number of distinct strap-cell types simplifies design of the memory array and further simplifies design of a corresponding interconnect structure. Further, in some embodiments, the three distinct strap-cell types electrically couple word lines, erase gates, and control gates to corresponding strap lines in different metallization layers of an interconnect structure. By spreading the strap lines amongst different metallization layers, strap-line density is reduced.

Abstract: A one-piece dental implant guide pack based on photocuring molding includes: a guide socket for receiving a photosensitive resin at an outer edge of the guide socket, adjusting and positioning the guide socket by the photosensitive resin which is curable by light; a guide slot formed at a side edge of the guide socket, and having a receiving portion at the bottom; a positioning shaft, having a positioning part and a shaft, and the positioning part being socketed into the guide socket, and the shaft penetrating to the bottom of the guide socket; and at least one positioning part, with an end connected to the guide socket and another end connected to and positioning the positioning shaft. This disclosure facilitates the drilling process of subsequent operations and improves the convenience and accuracy of the implant guide plate and the accuracy of the dental implant surgery.