Patents by Inventor Po-Hao Tsai

Po-Hao Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200006214
    Abstract: A method includes forming an interposer, which includes forming a rigid dielectric layer, and removing portions of the rigid dielectric layer. The method further includes bonding a package component to an interconnect structure, and bonding the interposer to the interconnect structure. A spacer in the interposer has a bottom surface contacting a top surface of the package component, and the spacer includes a feature selected from the group consisting of a metal feature, the rigid dielectric layer, and combinations thereof. A die-saw is performed on the interconnect structure.
    Type: Application
    Filed: August 31, 2018
    Publication date: January 2, 2020
    Inventors: Po-Hao Tsai, Techi Wong, Meng-Wei Chou, Meng-Liang Lin, Po-Yao Chuang, Shin-Puu Jeng
  • Patent number: 10522476
    Abstract: A package structure including an integrated fan-out package and plurality of conductive terminals is provided. The integrated fan-out package includes an integrated circuit component, a plurality of conductive through vias, an insulating encapsulation having a first surface and a second surface opposite to the first surface, and a redistribution circuit structure. The insulating encapsulation laterally encapsulates the conductive through vias and the integrated circuit component. Each of conductive through vias includes a protruding portion accessibly revealed by the insulating encapsulation. The redistribution circuit structure is electrically connected to the integrated circuit component and covers the first surface of the insulating encapsulation and the integrated circuit component.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: December 31, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Li-Hui Cheng, Jing-Cheng Lin, Po-Hao Tsai
  • Patent number: 10522496
    Abstract: A semiconductor device and method utilizing a dummy structure in association with a redistribution layer is provided. By providing the dummy structure adjacent to the redistribution layer, damage to the redistribution layer may be reduced from a patterning of an overlying passivation layer, such as by laser drilling. By reducing or eliminating the damage caused by the patterning, a more effective bond to an overlying structure, such as a package, may be achieved.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: December 31, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Li-Hui Cheng, Po-Hao Tsai, Jing-Cheng Lin
  • Patent number: 10515901
    Abstract: A method includes dispensing sacrificial region over a carrier, and forming a metal post over the carrier. The metal post overlaps at least a portion of the sacrificial region. The method further includes encapsulating the metal post and the sacrificial region in an encapsulating material, demounting the metal post, the sacrificial region, and the encapsulating material from the carrier, and removing at least a portion of the sacrificial region to form a recess extending from a surface level of the encapsulating material into the encapsulating material.
    Type: Grant
    Filed: February 28, 2018
    Date of Patent: December 24, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jing-Cheng Lin, Chen-Hua Yu, Po-Hao Tsai
  • Patent number: 10515937
    Abstract: A semiconductor device and method for providing an enhanced removal of heat from a semiconductor die within an integrated fan out package on package configuration is presented. In an embodiment a metal layer is formed on a backside of the semiconductor die, and the semiconductor die along and through vias are encapsulated. Portions of the metal layer are exposed and a thermal die is connected to remove heat from the semiconductor die.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jing-Cheng Lin, Po-Hao Tsai, Li-Hui Cheng, Porter Chen
  • Patent number: 10515875
    Abstract: An interconnect structure and a method of forming an interconnect structure are provided. The interconnect structure is formed over a carrier substrate, upon which a die may also be attached. Upon removal of the carrier substrate and singulation, a first package is formed. A second package may be attached to the first package, wherein the second package may be electrically coupled to through vias formed in the first package.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: December 24, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jui-Pin Hung, Jing-Cheng Lin, Po-Hao Tsai, Yi-Jou Lin, Shuo-Mao Chen, Chiung-Han Yeh, Der-Chyang Yeh
  • Patent number: 10515923
    Abstract: A semiconductor package structure is provided. The semiconductor package structure includes a chip structure. The semiconductor package structure includes a first conductive structure over the chip structure. The first conductive structure is electrically connected to the chip structure. The first conductive structure includes a first transition layer over the chip structure, and a first conductive layer on the first transition layer. The first conductive layer is substantially made of twinned copper.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jung-Hua Chang, Jing-Cheng Lin, Po-Hao Tsai
  • Patent number: 10515904
    Abstract: Methods for forming chip package structures are provided. The method includes disposing a first chip structure, a second chip structure over a carrier substrate and forming a molding compound layer surrounding the first chip structure and the second chip structure. The method includes forming a dielectric structure over the molding compound layer and a first grounding line in the dielectric structure and cutting the first grounding line to form a first end enlarged portion of the first grounding line. In addition, the first end enlarged portion has a gradually increased thickness.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jing-Cheng Lin, Po-Hao Tsai
  • Patent number: 10515827
    Abstract: A method for forming a chip package is provided. The method includes disposing a chip over a redistribution structure. The redistribution structure includes a first insulating layer and a first wiring layer, and the first wiring layer is in the first insulating layer and electrically connected to the chip. The method includes bonding an interposer substrate to the redistribution structure through a conductive structure. The chip is between the interposer substrate and the redistribution structure. The interposer substrate has a recess adjacent to the redistribution structure. A first portion of the chip is in the recess. The interposer substrate includes a substrate and a conductive via structure, and the conductive via structure passes through the substrate and is electrically connected to the first wiring layer through the conductive structure.
    Type: Grant
    Filed: January 18, 2018
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shin-Puu Jeng, Po-Hao Tsai, Po-Yao Chuang, Feng-Cheng Hsu, Shuo-Mao Chen, Techi Wong
  • Publication number: 20190355680
    Abstract: A semiconductor device and manufacturing process are provided wherein a first semiconductor device is electrically connected to redistribution structures. An antenna structure is located on an opposite side of the first semiconductor device from the redistribution structures, and electrical connections separate from the first semiconductor device connect the antenna structure to the redistribution structures.
    Type: Application
    Filed: November 9, 2018
    Publication date: November 21, 2019
    Inventors: Po-Yao Chuang, Po-Hao Tsai, Shin-Puu Jeng
  • Publication number: 20190348370
    Abstract: A semiconductor device has a conductive via laterally separated from the semiconductor, an encapsulant between the semiconductor device and the conductive via, and a mark. The mark is formed from characters that are either cross-free characters or else have a overlap count of less than two. In another embodiment the mark is formed using a wobble scan methodology. By forming marks as described, defects from the marking process may be reduced or eliminated.
    Type: Application
    Filed: July 22, 2019
    Publication date: November 14, 2019
    Inventors: Jing-Cheng Lin, Chen-Hua Yu, Po-Hao Tsai
  • Patent number: 10468339
    Abstract: A semiconductor device and method of manufacture are provided whereby an interposer and a first semiconductor device are placed onto a carrier substrate and encapsulated. The interposer comprises a first portion and conductive pillars extending away from the first portion. A redistribution layer located on a first side of the encapsulant electrically connects the conductive pillars to the first semiconductor device.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: November 5, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Hao Tsai, Po-Yao Chuang, Shin-Puu Jeng, Techi Wong
  • Publication number: 20190333867
    Abstract: A package includes a plurality of dies, a wall structure, an encapsulant, and a redistribution structure. The wall structure surrounds at least one of the dies. The encapsulant encapsulates the dies and the wall structure. A first portion of the encapsulant penetrates through the wall structure. The redistribution structure is disposed on the encapsulant and is electrically connected to the dies and the wall structure.
    Type: Application
    Filed: April 29, 2019
    Publication date: October 31, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventor: Po-Hao Tsai
  • Publication number: 20190319002
    Abstract: A redistribution structure includes a first dielectric layer, a pad pattern, and a second dielectric layer. The pad pattern is disposed on the first dielectric layer and includes a pad portion and a peripheral portion. The pad portion is embedded in the first dielectric layer, wherein a lower surface of the pad portion is substantially coplanar with a lower surface of the first dielectric layer. The peripheral portion surrounds the pad portion. The second dielectric layer is disposed on the pad pattern and includes a plurality of extending portions extending through the peripheral portion.
    Type: Application
    Filed: September 12, 2018
    Publication date: October 17, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Po-Hao Tsai, Po-Yao Lin, Shin-Puu Jeng
  • Publication number: 20190252296
    Abstract: An interconnect structure and a method of forming an interconnect structure are provided. The interconnect structure is formed over a carrier substrate, upon which a die may also be attached. Upon removal of the carrier substrate and singulation, a first package is formed. A second package may be attached to the first package, wherein the second package may be electrically coupled to through vias formed in the first package.
    Type: Application
    Filed: April 22, 2019
    Publication date: August 15, 2019
    Inventors: Jui-Pin Hung, Jing-Cheng Lin, Po-Hao Tsai, Yi-Jou Lin, Shuo-Mao Chen, Chiung-Han Yeh, Der-Chyang Yeh
  • Publication number: 20190229046
    Abstract: A semiconductor device and method of manufacture are provided whereby an interposer and a first semiconductor device are placed onto a carrier substrate and encapsulated. The interposer comprises a first portion and conductive pillars extending away from the first portion. A redistribution layer located on a first side of the encapsulant electrically connects the conductive pillars to the first semiconductor device.
    Type: Application
    Filed: January 19, 2018
    Publication date: July 25, 2019
    Inventors: Po-Hao Tsai, Po-Yao Chuang, Shin-Puu Jeng, Techi Wong
  • Patent number: 10361161
    Abstract: A semiconductor device has a conductive via laterally separated from the semiconductor, an encapsulant between the semiconductor device and the conductive via, and a mark. The mark is formed from characters that are either cross-free characters or else have a overlap count of less than two. In another embodiment the mark is formed using a wobble scan methodology. By forming marks as described, defects from the marking process may be reduced or eliminated.
    Type: Grant
    Filed: August 7, 2017
    Date of Patent: July 23, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jing-Cheng Lin, Chen-Hua Yu, Po-Hao Tsai
  • Patent number: 10354982
    Abstract: A bottom package includes a molding compound, a buffer layer over and contacting the molding compound, and a through-via penetrating through the molding compound. A device die is molded in the molding compound. A guiding trench extends from a top surface of the buffer layer into the butter layer, wherein the guiding trench is misaligned with the device die.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: July 16, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Hao Tsai, Feng-Cheng Hsu, Li-Hui Cheng, Jui-Pin Hung, Jing-Cheng Lin
  • Publication number: 20190189594
    Abstract: An integrated fan out package on package architecture is utilized along with a reference via in order to provide a reference voltage that extends through the InFO-POP architecture. If desired, the reference via may be exposed and then connected to a shield coating that can be used to shield the InFO-POP architecture. The reference via may be exposed by exposing either a top surface or a sidewall of the reference via using one or more singulation processes.
    Type: Application
    Filed: December 28, 2018
    Publication date: June 20, 2019
    Inventors: Jing-Cheng Lin, Chen-Hua Yu, Po-Hao Tsai
  • Publication number: 20190172818
    Abstract: A method includes forming an under bump metallization (UBM) layer over a dielectric layer, forming a redistribution structure over the UBM layer, disposing a semiconductor device over the redistribution structure, removing a portion of the dielectric layer to form an opening to expose the UBM layer, and forming a conductive bump in the opening such that the conductive bump is coupled to the UBM layer.
    Type: Application
    Filed: February 11, 2019
    Publication date: June 6, 2019
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jing-Cheng LIN, Po-Hao TSAI