Patents by Inventor Ray Lee

Ray Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6322237
    Abstract: A lighted wheel rim system is provided for illuminating the wheel of a vehicle by projecting visible light through decorative openings disposed within the rim of a tire. The lighted wheel rim system includes a plurality of individual lights or lamps, which, together, form an arrangement which is stimulating and aesthetically pleasing to the human eye. The lighted wheel rim system has two major parts, including a light housing assembly and a lighting assembly. Flange portions on the light housing assembly are configured for mounting to the brake rotor splash guards or brake shield of a vehicle. The flange portions are dimensioned to correspond to the outer curvature, shape, and size of the brake shield and to hold the light housing assembly in spaced apart relation therefrom. Each wheel of a vehicle is configured with a ring of individual lights as an integrated electrical system.
    Type: Grant
    Filed: July 17, 2000
    Date of Patent: November 27, 2001
    Inventor: Dennis Ray Lee
  • Patent number: 6306772
    Abstract: A method to fabricate bottle-shaped deep trench into a semiconductor substrate. After a neck profile is formed, the chlorine gas at a predetermined flow rate is added to the etching plasma gas composition, while the flow rates of the plasma gases are increased by about 30% by volume, to create an enlarged lower portion of the deep trench. Preferably, the neck portion is etched using an etching composition which contains HBr, NF3, and (He/O2) provided at flow rates of about 87:13:35 sccm. The enlarged lower portion is etched using an etching composition which contains HBr, NF3, and (He/O2) provided at flow rates of about 113±12:17±2:46±5 sccm, and Cl2 provided at a flow rate between 10 and 40 sccm. It was found that the width of the lower portion of the deep trench can be increased by 100% with minimum side effects such as polymer deposition in the plasma chamber, which could occur as result of substantially increased flow rate of HBr and/or NF3.
    Type: Grant
    Filed: April 19, 2000
    Date of Patent: October 23, 2001
    Assignees: ProMos Technology, Inc, Mosel Vitelic Inc, Siemens AG
    Inventors: Ming-Horng Lin, Ray Lee, Nien-Yu Tsai
  • Patent number: 6106664
    Abstract: A clamp affixes a wafer by entirely covering the edge of the wafer, wherein the radius of the inner surface of the clamp is about 1 mm shorter than the radius of the wafer. Besides, there are four pairs of square protuberances distributed even along the inner surface of the clamp for affixing the wafer, wherein the square protuberances only hold the edge of the device regions of the wafer. Even though the wafer is slightly off position, the square protuberances are still able to affix the wafer properly. In addition, the lifetime of the clamp of the invention is about 100 hours, which is two times of a conventional clamp, so that the cost is reduced.
    Type: Grant
    Filed: August 25, 1998
    Date of Patent: August 22, 2000
    Assignees: ProMOS Technologies, Inc., Mosel Vitelic Inc., Siemens AG
    Inventors: Ray Lee, Shih-Po Lin, Jim Ho, Ming-Hong Lin
  • Patent number: 6071823
    Abstract: A method to fabricate bottle-shaped deep trench in a semiconductor substrate which mainly involves two substitute plasma etching steps from the conventional approach. After a neck profile is formed, instead of raising the plasma gas pressure while keeping the etching composition constant, as in the conventional approach, the plasma gas pressure is first maintained the same, then decreased substantially. On the other hand, the concentrations of HBr and NF.sub.3 are increased substantially in both new steps. The first substitute plasma etching step is conducted at a pressure of 100 mtorr an RF power of about 1,000 W, a magnetic field of 65 Gauss. The plasma gas composition consists of HBr, NF.sub.3, and (He/O.sub.2) a at a ratio of about 200:20:20. The second substitute plasma etching step is conducted at plasma gas pressure of 30 mtorr, an RF power of 600 W, a magnetic field of 65 Gauss. The plasma gas composition consists of HBr, NF.sub.3, and (He/O.sub.2) a at a ratio of about 150:13:20.
    Type: Grant
    Filed: September 21, 1999
    Date of Patent: June 6, 2000
    Assignees: ProMos Technology, Inc, Mosel Vitelic Inc, Siemens AG
    Inventors: Lin Ming Hung, Nien-Yu Tsai, Pao-Chu Chang, Ray Lee
  • Patent number: 5965462
    Abstract: A method for forming a gate structure used in borderless contact etching is disclosed including the steps described below. Forming a conductive layer on a substrate, followed by forming a first silicon nitride layer on the conductive layer. The next step is to pattern a gate electrode by etching all the layers formed in the steps mentioned previously. The following steps is to form a second silicon nitride layer on the surface of the gate electrode and the substrate. Finally, etching the second silicon nitride layer to form a nitride spacer on the side walls of the gate electrode. The altitude of the nitride spacer is higher than the altitude of the first silicon nitride layer.
    Type: Grant
    Filed: October 27, 1997
    Date of Patent: October 12, 1999
    Assignee: Mosel Vitelic, Inc.
    Inventors: Wen-Yi Tan, Marlon Tsai, Ray Lee
  • Patent number: 5928153
    Abstract: An ultrasound flow velocity and Doppler angle measurement method and system is provided for measuring the velocity and direction of a flow, such as the blood flow in a human body, in a non-contact manner through ultrasound means. In practical applications, this ultrasound flow velocity measurement method and system can be utilized, for example, in the field of physiological diagnosis for blood-flow velocity measurement to determine whether the patient suffers from blood vessel disorders, such as embolism and aneurysm. Precise measurement can be achieved through the use of just one set of ultrasound transducer in the system configuration; therefore, this ultrasound flow velocity measurement method and system is simpler in system configuration and more cost-effective to use than the prior art. Experimentation shows that the estimation has a standard deviation of less than 4.5.degree. for Doppler angle range from 45.degree. to 80.degree.. Therefore, the measurement results are trustworthy to use.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: July 27, 1999
    Assignee: Hui-Hua Chiang
    Inventors: Hui-Hua Chiang, Bor-Ray Lee
  • Patent number: 5823724
    Abstract: End caps for insertion into the ends of a tie-down track of the type used to secure cargo, wheelchairs and the like typically to the floor of a vehicle. The end caps are curved and permit the easy insertion of an assembly of the tie-down track and end caps into a routed groove in the floor. Preferably the end caps and the tie-down track have a beveled flange so that the resulting installed track has a smooth transition from the floor surface to the track surface. With the end caps of the present invention, there is no need to square off the ends of a routed groove.
    Type: Grant
    Filed: July 29, 1996
    Date of Patent: October 20, 1998
    Assignee: New Haven Moving Equipment Corp. of California, Inc.
    Inventor: Ray Lee
  • Patent number: 5823727
    Abstract: An anchor fitting assembly for securing objects on an elongated track. The track is of the type commonly used in aircraft and in various vehicles to secure seats, wheelchairs, cargo and other objects. The track has an elongated groove which has a bell-shaped profile. The top of the groove is open and has a series of opposed tabs and semicircular faces. There are many styles of fittings which are placed in such tracks and secured to the tracks. The anchor fitting assembly of the present invention has a securable fitting which has a flared based held beneath the opposed tabs of the groove. The fitting is prevented from sliding along the track by a pair of buttons which are inserted downwardly into two opposed semicircular openings adjacent the securable fitting. When an object is screwed onto the securable fitting it holds down the buttons preventing them from coming out of the semicircular openings.
    Type: Grant
    Filed: April 2, 1998
    Date of Patent: October 20, 1998
    Inventor: Ray Lee
  • Patent number: 5391030
    Abstract: A short wheelchair restraining strap formed from webbing is formed with a small loop at one end and a large loop at the other end. The small loop is passed around a portion of the wheelchair frame, and the large loop is then passed through the small loop. The short strap so attached then leaves the large loop end protruding from the wheelchair frame which provides an easy point of attachment for a tie-down strap. The tie-down strap is a length of webbing having two ends held to a fitting affixed to the floor of a vehicle. A length adjusting buckle is positioned in the length of webbing. The tie-down strap is looped through the large loop of the short wheelchair restraining strap.
    Type: Grant
    Filed: October 14, 1992
    Date of Patent: February 21, 1995
    Inventor: Ray Lee